206316 ⎘
Discharge tubes exposing object to beam, e.g. for analysis treatment, etching, imaging; Details; Protection arrangements Avoiding or diminishing effects of eddy currents
BEAM POSITION DISPLACEMENT CORRECTION IN CHARGED PARTICLE INSPECTION
#2Electron microscope and method of adjusting the same
#3MAGNETRON ASSEMBLY
#4MOUNTING STAGE AND PLASMA PROCESSING APPARATUS
#5CHARGED PARTICLE BEAM WRITING APPARATUS AND METHOD
#6Magnetron assembly