STABILIZING A TIP WIRE OF AN ELECTRON SOURCE

WAFER PLACEMENT TABLE

ORIENTATION TOOL FOR ELECTRON BACKSCATTER DIFFRACTION

AFE (ACTIVE FAR EDGE) HEATER/BIPOLAR ESC WITH SIMPLIFIED AND OPTIMIZED STRUCTURE FOR GREATER RELIABILITY, LOWER COST AND BETTER MANUFACTURABILITY

UNIFORM PLASMA PROCESSING WITH A LINEAR PLASMA SOURCE

LIQUID METAL ION SOURCE DEVICE FOR USING BISMUTH AND ALLOY OF BISMUTH

ACTIVE GAS GENERATION APPARATUS

ELECTRODE FIXING ASSEMBLY AND DRY ETCHING DEVICE

Lattice Based Voltage Standoff

Device and method for substrate transport in vacuum processing systems

PLASMA PROCESSING APPARATUS

Vacuum chamber arrangement for charged particle beam generator

SUBSTRATE PROCESSING APPARATUS, SUBSTRATE PROCESSING METHOD AND PLASMA GENERATING METHOD

PROCESS GAS SUPPLYING UNIT AND SUBSTRATE TREATING APPARATUS INCLUDING THE SAME

Cathode mechanism of electron emission source, and method for manufacturing cathode mechanism of electron emission source

Optimization of Radiofrequency Signal Ground Return in Plasma Processing System

Interlocking fastening upper electrode assembly having improved fastening force, and plasma device including same

WORKPIECE SUPPORT SYSTEM FOR PLASMA TREATMENT AND METHOD OF USING THE SAME

Aberration corrector and method of aligning aberration corrector

Substrate processing apparatus

Thread profiles for semiconductor process chamber components

Multistage-connected multipole, multistage multipole unit, and charged particle beam device

APPARATUS, SYSTEM, AND METHOD FOR IMPEDANCE ADJUSTMENT OF PROCESSING STATION

Vacuum chamber arrangement for charged particle beam generator

Height measuring device, charged particle beam apparatus, and height measuring method

Cleaning method and plasma processing apparatus

Charged particle beam lithography system

Vacuum chamber arrangement for charged particle beam generator

Radiation detector and radiation detection apparatus

PLASMA PROCESSING APPARATUS

Ion implantation apparatus and ion implantation method

Charged particle device, structure manufacturing method, and structure manufacturing system

Detecting method and detecting equipment therefor

Coil filament for plasma enhanced chemical vapor deposition source

Electron-beam spot optimization

Shielded, transmission-target, x-ray tube

Vacuum chamber arrangement for charged particle beam generator

Anode, and x-ray generating tube, x-ray generating apparatus, and radiography system using the same

X-ray tube including hybrid electron emission source

X-ray tube including support for latitude supply wires

Transmission electron microscopy supports and methods of making

Inspection device

Stage apparatus with braking system for lens, beam, or vibration compensation

X-ray generation device having multiple metal target members

Filament holder for hot cathode PECVD source

Electron gun supporting member and electron gun apparatus

Method for attachment of an electrode into an inductively-coupled plasma

Extraction electrode

Aberration corrector and charged particle beam apparatus using the same

High-energy ion implanter, beam collimator, and beam collimation method

Scanning electron microscope

Multi-electrode electron optics

Cathode filament assembly

X-ray tube

Method of controlling temperature and plasma processing apparatus

Film deposition method

Insulation structure and insulation method

Source bushing shielding

Insulation structure of high voltage electrodes for ion implantation apparatus

Electrode of electrostatic lens and method of manufacturing the same

System for attachment of an electrode into a plasma source

Charged particle system for reticle/wafer defects inspection and review

Inspection device

Anchoring inserts, electrode assemblies, and plasma processing chambers

Showerhead electrodes

Deceleration lens

SUBSTRATE PLASMA-PROCESSING APPARATUS

APPARATUS

Anchoring inserts, electrode assemblies, and plasma processing chambers

Fastening apparatus

Fastening apparatus

Gas field ionization ion source, scanning charged particle microscope, optical axis adjustment method and specimen observation method

Techniques for reducing an electrical stress in an acceleration/deceleraion system

Showerhead electrode assemblies and plasma processing chambers incorporating the same

Aberration corrector and charged particle beam apparatus using the same

Electrostatic lens assembly

Arc chamber for an ion implantation system

Ion beam inspection apparatus, ion beam inspecting method, semiconductor manufacturing apparatus, and ion source apparatus

Bushing unit with integrated conductor in ion accelerating device and related method

Ion source

PROCESSING SYSTEM AND PLASMA GENERATION DEVICE

Kinematic ion implanter electrode mounting

Apparatus and method for plasma coating solid fuels and coated solid fuels produced using same

Filament clamp assembly