ClassID:

206329

H01J2237/03 - CPC Classification

Classification description:

Discharge tubes exposing object to beam, e.g. for analysis treatment, etching, imaging Mounting, supporting, spacing or insulating electrodes

Sub-classes:
Recent Application in this class:
#1
20180114672
2018-04-26

Monochromator and charged particle beam apparatus comprising the same

#2
20170287579
2017-10-05

Ion source repeller shield comprising a labyrinth seal

#3
20140224999
2014-08-14

Electrostatic lens and charged particle beam apparatus using the same

#4
20140103223
2014-04-17

Charged particle beam lens having a particular support electrically insulating first and second electrodes from each other

#5
20130320854
2013-12-05

Inductively coupled plasma flood gun using an immersed low inductance RF coil and multicusp magnetic arrangement

#6
20130112891
2013-05-09

Charged particle optical system and scribing apparatus

#7
20130087717
2013-04-11

Electrostatic lens

#8
20120288799
2012-11-15

In situ cleaning device for lithographic apparatus

#9
20120273691
2012-11-01

Electro-optical element for multiple beam alignment

#10
20120085917
2012-04-12

Inductively coupled plasma flood gun using an immersed low inductance FR coil and multicusp magnetic arrangement

#11
20110216299
2011-09-08

Electrostatic lens structure

#12
20110059615
2011-03-10

Hybrid RF capacitively and inductively coupled plasma source using multifrequency RF powers and methods of use thereof

#13
20100300623
2010-12-02

Plasma etching apparatus

#14
20100224323
2010-09-09

Plasma processing apparatus and electrode for same

#15
20100193679
2010-08-05

Guiding charged droplets and ions in an electrospray ion source

#16
20100187433
2010-07-29

IMPROVED PARTICLE BEAM GENERATOR

#17
20090243490
2009-10-01

Unbalanced ion source

#18
20090020708
2009-01-22

Modular gas ion source

#19
20080231192
2008-09-25

ELECTRON BEAM DRAWING APPARATUS

#20
20080067429
2008-03-20

STATIC ELECTRICITY DEFLECTING DEVICE, ELECTRON BEAM IRRADIATING APPARATUS, SUBSTRATE PROCESSING APPARATUS, SUBSTRATE PROCESSING METHOD AND METHOD OF MANUFACTURING SUBSTRATE

#21
20080062608
2008-03-13

Static electricity deflecting device, electron beam irradiating apparatus, substrate processing apparatus, substrate processing method, and method of manufacturing substrate

#22
20080054180
2008-03-06

APPARATUS AND METHOD OF DETECTING SECONDARY ELECTRONS

#23
20080020574
2008-01-24

Hybrid RF capacitively and inductively coupled plasma source using multifrequency RF powers and methods of use thereof

#24
20070273288
2007-11-29

Thermal control plate for ion source

#25
20070228297
2007-10-04

Charged beam drawing apparatus

#26
20070228285
2007-10-04

Static electricity deflecting device, electron beam irradiating apparatus, substrate processing apparatus, substrate processing method and method of manufacturing substrate

#27
20070228275
2007-10-04

Static electricity deflecting device, electron beam irradiating apparatus, substrate processing apparatus, substrate processing method and method of manufacturing substrate

#28
20060131752
2006-06-22

Micro column electron beam apparatus formed in low temperature co-fired ceramic substrate

#29
20050199822
2005-09-15

MEMS based charged particle deflector design

#30
20050199821
2005-09-15

Compact microcolumn for automated assembly