206331 ⎘
Discharge tubes exposing object to beam, e.g. for analysis treatment, etching, imaging; Mounting, supporting, spacing or insulating electrodes Spacing
ISOLATING SPACER FOR ELECTRON-OPTICAL ASSEMBLY
#2SPACER FOR AN ORIFICE ELEMENT
#3SUBSTRATE PROCESSING APPARATUS
#4PROXIMITY-ELECTRODE, CHARGED PARTICLE BEAM DEVICE AND METHOD FOR INSPECTING AND/OR IMAGING A SAMPLE
#5TUNABLE PLASMA EXCLUSION ZONE IN SEMICONDUCTOR FABRICATION
#6ACTIVE GAS GENERATION APPARATUS
#7CHARGED PARTICLE DEVICE AND METHOD
#8TUNABLE PLASMA EXCLUSION ZONE IN SEMICONDUCTOR FABRICATION
#9Substrate processing apparatus
#10Electrostatic chucking process
#11Anode, and x-ray generating tube, x-ray generating apparatus, and radiography system using the same
#12X-ray tube including hybrid electron emission source
#13X-ray generation device having multiple metal target members
#14Sustained self-sputtering of lithium for lithium physical vapor deposition
#15Plasma generator
#16Cathode filament assembly
#17Insulation structure and insulation method
#18Insulation structure of high voltage electrodes for ion implantation apparatus
#19High-voltage insulation device for charged-particle optical apparatus
#20Sample observing device and sample observing method
#21GRID PROVIDING BEAMLET STEERING
#22Grid providing beamlet steering
#23End terminations for electrodes used in ion implantation systems
#24APPARATUS
#25Beam optical component for charged particle beams