H01J2237/0432 - CPC Classification Index

ClassID:

206336 ⎘

H01J2237/0432 - CPC Classification

Classification description:

Discharge tubes exposing object to beam, e.g. for analysis treatment, etching, imaging; Means for controlling the discharge; Beam blanking High speed and short duration

Recent Application in this class:

20260142118

2026-05-21

ULTRA FAST PULSER FOR LOW ENERGY ELECTRON BEAMS

20250349491

2025-11-13

BEAM ALIGNMENT AND SYNCHRONIZATION IN MICROSCOPY

20200176219

2020-06-04

Systems and methods for charged particle beam modulation

20180358203

2018-12-13

MULTI CHARGED PARTICLE BEAM WRITING APPARATUS AND MULTI CHARGED PARTICLE BEAM ADJUSTING METHOD

20180261421

2018-09-13

MULTI CHARGED PARTICLE BEAM WRITING METHOD AND MULTI CHARGED PARTICLE BEAM WRITING APPARATUS

20180151327

2018-05-31

Beam blanker and method for blanking a charged particle beam

20180151326

2018-05-31

Time-resolved charged particle microscopy

20170243713

2017-08-24

Studying dynamic specimen behavior in a charged-particle microscope

20170162361

2017-06-08

Ultra broad band continuously tunable electron beam pulser

#10

20170133199

2017-05-11

Systems including a beam projection device providing variable exposure duration resolution

#11

20170098524

2017-04-06

Multi charged particle beam writing method and multi charged particle beam writing apparatus

#12

20160148784

2016-05-26

Dynamic pattern generator and method of toggling mirror cells of the dynamic pattern generator

#13

20160042908

2016-02-11

Multi charged particle beam writing method and multi charged particle beam writing apparatus

#14

20160005567

2016-01-07

High-speed multiframe dynamic transmission electron microscope image acquisition system with arbitrary timing

#15

20150008323

2015-01-08

Device and method for electron emission and device including such an electron emission system

#16

20140346355

2014-11-27

Electron microscope

#17

20140124684

2014-05-08

Multi charged particle beam writing method and multi charged particle beam writing apparatus

#18

20140106279

2014-04-17

Drawing apparatus, and method of manufacturing article

#19

20140103225

2014-04-17

Beam pulsing device for use in charged-particle microscopy

#20

20140084160

2014-03-27

Photon induced near field electron microscope and biological imaging system

#21

20140008534

2014-01-09

Measuring/inspecting apparatus and measuring/inspecting method enabling blanking control of electron beam

#22

20130187541

2013-07-25

Photocathode high-frequency electron-gun cavity apparatus

#23

20120301043

2012-11-29

Image processing method

#24

20120261586

2012-10-18

Beam blanker for interrupting a beam of charged particles

#25

20120112323

2012-05-10

Apparatus and method for controlled particle beam manufacturing

#26

20120043457

2012-02-23

OPTICAL SWITCHING IN A LITHOGRAPHY SYSTEM

#27

20120025093

2012-02-02

Particle beam system

#28

20110284744

2011-11-24

Method and system for 4D tomography and ultrafast scanning electron microscopy

#29

20110220792

2011-09-15

Photon induced near field electron microscope and biological imaging system

#30

20110168888

2011-07-14

WEAK-LENS COUPLING OF HIGH CURRENT ELECTRON SOURCES TO ELECTRON MICROSCOPE COLUMNS

#31

20100224592

2010-09-09

Charged particle beam processing

#32

20100117510

2010-05-13

Apparatus and method for generating femtosecond electron beam

#33

20100098922

2010-04-22

APPARATUS AND METHOD FOR CONTROLLED PARTICLE BEAM MANUFACTURING

#34

20100045958

2010-02-25

Lithography system

#35

20090236521

2009-09-24

Method and system for ultrafast photoelectron microscope

#36

20090084990

2009-04-02

Charged-particle beam writing apparatus and charged-particle beam writing method

#37

20090026912

2009-01-29

INTENSITY MODULATED ELECTRON BEAM AND APPLICATION TO ELECTRON BEAM BLANKER

#38

20080158537

2008-07-03

OPTICAL SWITCHING IN LITHOGRAPHY SYSTEM

#39

20080158536

2008-07-03

OPTICAL SWITCHING IN LITHOGRAPHY SYSTEM

#40

20080157681

2008-07-03

Method of reducing particle contamination for ion implanters

#41

20080061247

2008-03-13

Lithography system

#42

20080017796

2008-01-24

Method and system for ultrafast photoelectron microscope

#43

20070284695

2007-12-13

Apparatus and method for controlled particle beam manufacturing

#44

20070284538

2007-12-13

Apparatus and method for controlled particle beam manufacturing

#45

20070284537

2007-12-13

Apparatus and method for controlled particle beam manufacturing

#46

20070284527

2007-12-13

Apparatus and method for controlled particle beam manufacturing

#47

20070278428

2007-12-06

Apparatus and method for controlled particle beam manufacturing

#48

20070278419

2007-12-06

Apparatus and method for controlled particle beam manufacturing

#49

20070278418

2007-12-06

Apparatus and method for controlled particle beam manufacturing

#50

20070187625

2007-08-16

Optical switching in a lithography system

#51

20070138413

2007-06-21

Charged particle beam writing method and apparatus

#52

20070075256

2007-04-05

Electrostatic deflection system with impedance matching for high positioning accuracy

#53

20070045534

2007-03-01

Apparatus and method for controlled particle beam manufacturing

#54

20060151696

2006-07-13

Electron microscope and a method of imaging objects

#55

20060006349

2006-01-12

Optical switching in lithography system

#56

20050253069

2005-11-17

Method and system for ultrafast photoelectron microscope

#57

16225298

2019-12-24

System and method of arc detection using dynamic threshold