206335 ⎘
Discharge tubes exposing object to beam, e.g. for analysis treatment, etching, imaging; Means for controlling the discharge Beam blanking
Sub-classes:Beam blanking device for a multi-beamlet charged particle beam apparatus
#2Pulsed CFE electron source with fast blanker for ultrafast TEM applications
#3Coating on dielectric insert of a resonant RF cavity
#4Charged particle beam device, multi-beam blanker for a charged particle beam device, and method for operating a charged particle beam device
#5Data processing method, data processing apparatus, and multiple charged-particle beam writing apparatus
#6Studying dynamic specimens in a transmission charged particle microscope
#7DEVICE AND METHOD FOR GENERATING CHARGED PARTICLE BEAM PULSES
#8Charged particle beam device with distance setting between irradiation regions in a scan line
#9Multi charged particle beam writing apparatus and multi charged particle beam writing method
#10Sample holding mechanism, manufacturing method for same, and charged particle beam device
#11Multi charged particle beam writing apparatus and method of adjusting the same
#12Charged particle beam drawing apparatus and charged particle beam drawing method
#13Charged particle beam writing apparatus and charged particle beam writing method
#14Exposure apparatus and exposure method
#15Charged particle beam device and charged particle beam measurement method
#16Apparatus and method for processing substrate using ion beam
#17Blanking aperture array device for multi-beams, and fabrication method of blanking aperture array device for multi-beams
#18Ozone supplying apparatus, ozone supplying method, and charged particle beam drawing system
#19Blanking device for multi-beam of charged particle writing apparatus using multi-beam of charged particle and defective beam blocking method for multi-beam of charged particle
#20Compensation of imaging deviations in a particle-beam writer using a convolution kernel
#21Customizing a particle-beam writer using a convolution kernel
#22System for electron beam detection
#23Apparatus and method for calculating drawing speeds of a charged particle beam
#24Multi charged particle beam writing method, and multi charged particle beam writing apparatus
#25TARGET DEVICE, LITHOGRAPHY APPARATUS, AND ARTICLE MANUFACTURING METHOD
#26Electron beam writing apparatus, and method for adjusting convergence half angle of electron beam
#27LITHOGRAPHY APPARATUS, AND METHOD OF MANUFACTURING AN ARTICLE
#28Multi charged particle beam writing apparatus
#29Proximity effect correction in a charged particle lithography system
#30PARTICLE BEAM SYSTEM AND METHOD FOR OPERATING THE SAME
#31Charged particle beam device
#32DRAWING DATA GENERATING METHOD, PROCESSING APPARATUS, STORAGE MEDIUM, DRAWING APPARATUS, AND METHOD OF MANUFACTURING ARTICLE
#33Ion implantation at high temperature surface equilibrium conditions
#34Method and apparatus for generating electron beams
#35Automated ion beam idle
#36Charged particle energy filter
#37Particle beam system and method for operating the same
#38Charged particle beam drawing apparatus and method of manufacturing article
#39Method of protecting a radiation detector in a charged particle instrument
#40Apparatus and method for processing substrate using ion beam
#41Charged particle beam drawing apparatus and article manufacturing method using same
#42Blocking member for use in the diffraction plane of a TEM
#43Inspection system
#44Ion beam source
#45Charged particle beam writing apparatus
#46Methods of operating a nanoprober to electrically probe a device structure of an integrated circuit
#47ELECTRON BEAM APPARATUS
#48Apparatus and method including a direct bombardment detector and a secondary detector for use in electron microscopy
#49Optics for generation of high current density patterned charged particle beams
#50ELECTRON BEAM LITHOGRAPHY APPARATUS AND DESIGN METHOD OF PATTERNED BEAM-DEFINING APERTURE
#51Charged particle beam apparatus
#52Method of inspecting pattern and inspecting instrument
#53Methods for rapidly switching off an ion beam
#54Charged particle beam exposure apparatus
#55Charged particle beam exposure apparatus
#56Semiconductor device manufacturing method and ion implanter used therein
#57Optics for generation of high current density patterned charged particle beams
#58Electron beam exposure method and electron beam exposure apparatus
#59Scanning particle beam instrument
#60Charged particle beam apparatus and method of forming electrodes having narrow gap therebetween by using the same
#61Method of inspecting pattern and inspecting instrument
#62Charged particle beam device, multi-beam blanker for a charged particle beam device, and method for operating a charged particle beam device