Patents-Review.com
ClassID:

206340 ⎘

H01J2237/0451 - CPC Classification

Classification description:

Discharge tubes exposing object to beam, e.g. for analysis treatment, etching, imaging; Means for controlling the discharge; Diaphragms with fixed aperture

Sub-classes:
Recent Application in this class:
#1
20260018367
2026-01-15

THERMALLY OPTIMIZED EXTRACTION PLATE FOR ION IMPLANTER

 #2
20260018365
2026-01-15

REDUCED BOERSCH EFFECT IN DISPERSIVE OPTICS

 #3
20250266237
2025-08-21

REFLECTANCE CONFOCAL SCANNING ELECTRON MICROSCOPE AND OPERATING METHOD THEREOF

 #4
20250166956
2025-05-22

Transmission electron microscopy with square beams

 #5
20250157789
2025-05-15

E-BEAM EXPOSURE METHOD AND MASK MANUFACTURING METHOD COMPRISING THE SAME

 #6
20250029806
2025-01-23

Transmission electron microscopy with square beams

 #7
20250014855
2025-01-09

CHARGED PARTICLE APPARATUS AND METHOD

 #8
20240387151
2024-11-21

INDUCTIVELY COUPLED PLASMA APPARATUS WITH NOVEL FARADAY SHIELD

 #9
20240258065
2024-08-01

METHOD OF OPERATING A PARTICLE BEAM SYSTEM AND COMPUTER PROGRAM PRODUCT

 #10
20240234083
2024-07-11

BEAM DETECTOR, MULTI-CHARGED-PARTICLE-BEAM IRRADIATION APPARATUS, AND ADJUSTMENT METHOD FOR BEAM DETECTOR

 #11
20240136148
2024-04-25

BEAM DETECTOR, MULTI-CHARGED-PARTICLE-BEAM IRRADIATION APPARATUS, AND ADJUSTMENT METHOD FOR BEAM DETECTOR

 #12
20240096586
2024-03-21

Method and system of image-forming multi-electron beams

 #13
20230005699
2023-01-05

APERTURE BODY, FLOOD COLUMN AND CHARGED PARTICLE TOOL

 #14
20220382145
2022-12-01

SEMICONDUCTOR APPARATUS AND METHOD OF OPERATING THE SAME

 #15
20220367142
2022-11-17

Particle beam device having a deflection unit

 #16
20220254599
2022-08-11

MULTIPLE LANDING ENERGY SCANNING ELECTRON MICROSCOPY SYSTEMS AND METHODS

 #17
20220208511
2022-06-30

Illumination apertures for extended sample lifetimes in helical tomography

 #18
20220020560
2022-01-20

Transmission electron microscope and adjustment method of objective aperture

 #19
20210398772
2021-12-23

TUNING APPARATUS FOR MINIMUM DIVERGENCE ION BEAM

 #20
20210233741
2021-07-29

Electron microscope and sample observation method using the same

 #21
20210151286
2021-05-20

Transmission electron microscope and method of controlling same

 #22
20210090843
2021-03-25

Method and device for a carrier proximity mask

 #23
20200393752
2020-12-17

Semiconductor apparatus and method of operating the same

 #24
20200194271
2020-06-18

Techniques and apparatus for unidirectional hole elongation using angled ion beams

 #25
20190180972
2019-06-13

Aperture system of electron beam apparatus, electron beam exposure apparatus, and electron beam exposure apparatus system

 #26
20170316916
2017-11-02

Compressive scanning spectroscopy

 #27
20170221673
2017-08-03

Charged-particle microscope with astigmatism compensation and energy-selection

 #28
20170200581
2017-07-13

Heat-spreading blanking system for high throughput electron beam apparatus

 #29
20160336141
2016-11-17

Charged particle beam writing apparatus and charged particle beam writing method

 #30
20160276129
2016-09-22

Compressive transmission microscopy

 #31
20160276050
2016-09-22

Electron beam masks for compressive sensors

 #32
20150014530
2015-01-15

Charged particle beam apparatus

 #33
20140273536
2014-09-18

Charged particle beam writing apparatus, aperture unit, and charged particle beam writing method

 #34
20110204252
2011-08-25

Focused ion beam apparatus

 #35
20100266959
2010-10-21

Pattern forming method

 #36
20090159797
2009-06-25

Transmission electron microscope

 #37
20090084759
2009-04-02

Method and system for multi-pass correction of substrate defects

 #38
20090050820
2009-02-26

Ion implanting apparatus for forming ion beam shape

 #39
20080099696
2008-05-01

Shaped apertures in an ion implanter

 #40
20080099693
2008-05-01

Charged-particle exposure apparatus

 #41
20080061246
2008-03-13

Apparatus for blanking a charged particle beam