206341 ⎘
Discharge tubes exposing object to beam, e.g. for analysis treatment, etching, imaging; Means for controlling the discharge; Diaphragms with fixed aperture multiple apertures
CHARGED PARTICLE ASSESSMENT TOOL, INSPECTION METHOD
#2CHARGED PARTICLE ASSESSMENT TOOL, INSPECTION METHOD
#3ALIGNMENT OF ELECTRON-OPTICAL ELEMENTS
#4APPARATUS AND METHOD FOR IMPROVED ELECTRON MULTI-BEAM INSPECTION
#5FIELD CURVATURE CORRECTOR FOR USE IN MULTI-ELECTRON-BEAM OPTICAL SYSTEM
#6APPARATUS OF PLURAL CHARGED-PARTICLE BEAMS
#7MULTI-BEAM PARTICLE BEAM SYSTEM AND METHOD FOR OPERATING THE SAME
#8PARTICLE BEAM SYSTEM
#9METHOD AND SYSTEM FOR FINE FOCUSING SECONDARY BEAM SPOTS ON DETECTOR FOR MULTI-BEAM INSPECTION APPARATUS
#10METHOD FOR INSPECTING A SPECIMEN AND CHARGED PARTICLE BEAM DEVICE
#11METHOD FOR INSPECTING A SPECIMEN AND CHARGED PARTICLE BEAM DEVICE
#12SEMICONDUCTOR CHAMBER COMPONENTS WITH ADVANCED COATING TECHNIQUES
#13OPTICAL SYSTEM FOR A PLURALITY OF PRIMARY BEAMLETS, CHARGED PARTICLE MULTI-BEAM APPARATUS AND METHOD OF FOCUSING A PLURALITY OF PRIMARY BEAMLETS
#14SYSTEMS AND METHODS FOR HIGH-THROUGHPUT ANGLED ION PROCESSING
#15CHARGED PARTICLE OPTICAL DEVICE, ASSESSMENT APPARATUS, METHOD OF ASSESSING A SAMPLE
#16MULTI-BEAM CHARGED PARTICLE IMAGING SYSTEM WITH REDUCED CHARGING EFFECTS
#17SUBSTRATE PROCESSING APPARATUS
#18PARTICLE BEAM SYSTEM
#19APPARATUS OF PLURAL CHARGED-PARTICLE BEAMS
#20MULTIPLE PARTICLE BEAM SYSTEM WITH PROLONGED MAINTENANCE INTERVAL
#21ION EXTRACTION OPTICS FOR ION PROCESSING SYSTEM
#22STATIC ELECTRCITY CONTROL DEVICE FOR SEMICONDUCTOR PROCESSING SYSTEM
#23MULTI-BEAM PARTICLE MICROSCOPE WITH IMPROVED BEAM TUBE
#24SYSTEMS AND METHODS FOR VOLTAGE CONTRAST DEFECT DETECTION
#25MULTI-BEAM SYSTEM AND MULTI-BEAM FORMING UNIT WITH REDUCED SENSITIVITY TO SECONDARY RADIATION
#26ELECTRON-OPTICAL DEVICE
#27CHARGED PARTICLE OPTICAL DEVICE AND METHOD
#28MULTIPLE ELECTRON BEAM OPTICS
#29SYSTEMS AND METHODS FOR CHARGED PARTICLE FLOODING TO ENHANCE VOLTAGE CONTRAST DEFECT SIGNAL
#30CHARGED-PARTICLE BEAM DEVICE FOR DIFFRACTION ANALYSIS
#31METHOD FOR OPERATING A MULTIPLE PARTICLE BEAM SYSTEM WHILE ALTERING THE NUMERICAL APERTURE, ASSOCIATED COMPUTER PROGRAM PRODUCT AND MULTIPLE PARTICLE BEAM SYSTEM
#32CHARGED-PARTICLE APPARATUS, MULTI-DEVICE APPARATUS, METHOD OF USING CHARGED-PARTICLE APPARATUS AND CONTROL METHOD
#33CHARGED-PARTICLE OPTICAL DEVICE
#34SEMICONDUCTOR CHAMBER COMPONENTS WITH ADVANCED COATING TECHNIQUES
#35System and Method for Reducing Particle Formation in a Process Chamber of an Ion Implanter
#36CHARGED PARTICLE ASSESSMENT TOOL, INSPECTION METHOD
#37Dose Cup Assembly for an Ion Implanter
#38CHARGED PARTICLE APPARATUS AND METHOD
#39ION EXTRACTION OPTICS HAVING NOVEL BLOCKER CONFIGURATION
#40MULTI-BEAM GENERATING UNIT WITH INCREASED FOCUSING POWER
#41MULTIPLE CHARGED-PARTICLE BEAM APPARATUS AND METHODS
#42Apparatus of plural charged-particle beams
#43MULTI-BEAM CHARGED PARTICLE SYSTEM AND METHOD OF CONTROLLING THE WORKING DISTANCE IN A MULTI-BEAM CHARGED PARTICLE SYSTEM
#44ELECTRON-OPTICAL DEVICE
#45ELECTRON-OPTICAL SYSTEM AND METHOD OF OPERATING AN ELECTRON-OPTICAL SYSTEM
#46Method and system for the removal and/or avoidance of contamination in charged particle beam systems
#47APPARATUS OF PLURAL CHARGED-PARTICLE BEAMS
#48Charged particle beam device for inspection of a specimen with a plurality of charged particle beamlets
#49Apparatus using charged particle beams
#50MULTI CHARGED PARTICLE BEAM EVALUATION METHOD, MULTI CHARGED PARTICLE BEAM WRITING METHOD, INSPECTION METHOD FOR APERTURE ARRAY SUBSTRATE FOR MULTI CHARGED PARTICLE BEAM IRRADIATION APPARATUS, AND COMPUTER-READABLE RECORDING MEDIUM
#51CHARGED PARTICLE TOOL, CALIBRATION METHOD, INSPECTION METHOD
#52CHARGED PARTICLE BEAM PATTERN FORMING DEVICE AND CHARGED PARTICLE BEAM APPARATUS
#53OBJECTIVE LENS ARRAY ASSEMBLY, ELECTRON-OPTICAL SYSTEM, ELECTRON-OPTICAL SYSTEM ARRAY, METHOD OF FOCUSING
#54Apparatus of plural charged-particle beams
#55OBJECTIVE LENS ARRAY ASSEMBLY, ELECTRON-OPTICAL SYSTEM, ELECTRON-OPTICAL SYSTEM ARRAY, METHOD OF FOCUSING, OBJECTIVE LENS ARRANGEMENT
#56PLASMA SOURCE FOR SEMICONDUCTOR PROCESSING
#57CHARGED-PARTICLE MULTI-BEAM COLUMN, CHARGED-PARTICLE MULTI-BEAM COLUMN ARRAY, INSPECTION METHOD
#58A DETECTOR SUBSTRATE FOR USE IN A CHARGED PARTICLE MULTI-BEAM ASSESSMENT TOOL
#59MULTI-CHARGED PARTICLE BEAM WRITING APPARATUS, AND MULTI-CHARGED PARTICLE BEAM WRITING METHOD
#60PATTERN INSPECTION APPARATUS, AND METHOD FOR ACQUIRING ALIGNMENT AMOUNT BETWEEN OUTLINES
#61CHARGED PARTICLE ASSESSMENT TOOL, INSPECTION METHOD
#62BEAM MANIPULATOR IN CHARGED PARTICLE-BEAM EXPOSURE APPARATUS
#63MANIPULATOR, MANIPULATOR ARRAY, CHARGED PARTICLE TOOL, MULTI-BEAM CHARGED PARTICLE TOOL, AND METHOD OF MANIPULATING A CHARGED PARTICLE BEAM
#64Systems and methods of creating multiple electron beams
#65Electron optical module for providing an off-axial electron beam with a tunable coma
#66HIGH RESOLUTION, MULTI-ELECTRON BEAM APPARATUS
#67PARTICLE BEAM SYSTEM WITH MULTI-SOURCE SYSTEM AND MULTI-BEAM PARTICLE MICROSCOPE
#68PARTICLE BEAM COLUMN
#69Charged particle assessment tool, inspection method
#70Beam pattern device having beam absorber structure
#71APERTURE ASSEMBLY, BEAM MANIPULATOR UNIT, METHOD OF MANIPULATING CHARGED PARTICLE BEAMS, AND CHARGED PARTICLE PROJECTION APPARATUS
#72Multiple charged-particle beam apparatus with low crosstalk
#73Multi-modal operations for multi-beam inspection system
#74Multi-source charged particle illumination apparatus
#75METHOD FOR INSPECTING A SPECIMEN AND CHARGED PARTICLE BEAM DEVICE
#76CERTAIN IMPROVEMENTS OF MULTI-BEAM GENERATING AND MULTI-BEAM DEFLECTING UNITS
#77Systems and methods for voltage contrast defect detection
#78High throughput multi-electron beam system
#79Charged particle beam apparatus, multi-beamlet assembly, and method of inspecting a specimen
#80Method to correct first order astigmatism and first order distortion in multi-beam scanning electron microscopes
#81Multiple charged-particle beam apparatus with low crosstalk
#82E-BEAM POSITION TRACKER
#83ABERRATION CORRECTION IN CHARGED PARTICLE SYSTEM
#84ELECTRON GUN AND ELECTRON BEAM IRRADIATION DEVICE
#85Charged particle beam apparatus
#86Charged particle beam manipulation device and method for manipulating charged particle beamlets
#87Apparatus for and method of local control of a charged particle beam
#88Aberration corrector
#89Plasma source with ceramic electrode plate
#90Particle beam system and the use thereof for flexibly setting the current intensity of individual particle beams
#91Method for operating a multiple particle beam system while altering the numerical aperture, associated computer program product and multiple particle beam system
#92Stage driving system and apparatus or device such as apparatus of charged-particle beam comprising the same
#93Particle beam system for azimuthal deflection of individual particle beams and method for azimuth correction in a particle beam system
#94CHARGED PARTICLE SOURCE
#95Apparatus for multiple charged-particle beams
#96PLASMA SOURCE FOR SEMICONDUCTOR PROCESSING
#97Pattern inspection apparatus and pattern outline position acquisition method
#98Apparatus of plural charged-particle beams
#99Charged-particle source
#100Particle beam system and method for the particle-optical examination of an object
#101Multi-stage vacuum equipment with stages separation controlled by SMA actuator
#102Method and system for the removal and/or avoidance of contamination in charged particle beam systems
#103Apparatus of plural charged-particle beams
#104Multi-beam particle beam system and method for operating same
#105Charged particle assessment tool, inspection method
#106Particle beam system for adjusting the current of individual particle beams
#107Apparatus of plural charged-particle beams
#108High-resolution multiple beam source
#109Particle beam system
#110Systems and methods for charged particle flooding to enhance voltage contrast defect signal
#111Multibeamlet charged particle device and method
#112Ion implanter and beam profiler
#113Charged particle beam device
#114Beam irradiation device
#115Charged particle beam system and method
#116Aberration corrector and multiple electron beam irradiation apparatus
#117Multiple charged-particle beam apparatus and methods
#118Multiple charged-particle beam apparatus with low crosstalk
#119Multi-beam particle microscope
#120Multi-beam charged particle system
#121Multi charged particle beam writing apparatus
#122Multi charged particle beam writing apparatus
#123Multi-beam inspection apparatus with single-beam mode
#124BEAM SPLITTER FOR A CHARGED PARTICLE DEVICE
#125Apparatus using charged particle beams
#126Charged particle beam apparatus, and systems and methods for operating the apparatus
#127CHARGED PARTICLE BEAM DEVICE FOR INSPECTION OF A SPECIMEN WITH A PLURALITY OF CHARGED PARTICLE BEAMLETS
#128Device and method for operating a charged particle device with multiple beamlets
#129Multi-beam charged particle system
#130Method and system for the removal and/or avoidance of contamination in charged particle beam systems
#131Ionization chamber chip for a nano-aperture ion source, method of fabrication thereof, and a proton beam writing system
#132APPARATUS FOR GENERATING A MULTIPLICITY OF PARTICLE BEAMS, AND MULTI-BEAM PARTICLE BEAM SYSTEMS
#133Apparatus of plural charged-particle beams
#134Apparatus of plural charged-particle beams
#135Charged particle source
#136Particle beam system and method for the particle-optical examination of an object
#137Multi-electron-beam imaging apparatus with improved performance
#138Aberration-corrected multibeam source, charged particle beam device and method of imaging or illuminating a specimen with an array of primary charged particle beamlets
#139Charged particle beam device, multi-beam blanker for a charged particle beam device, and method for operating a charged particle beam device
#140Multi-beam charged particle imaging apparatus
#141Data processing method, data processing apparatus, and multiple charged-particle beam writing apparatus
#142Collimator, fabrication apparatus including the same, and method of fabricating a semiconductor device using the same
#143Beam irradiation device
#144Device and method for forming a plurality of charged particle beamlets
#145Multiple beam image acquisition apparatus and multiple beam image acquisition method
#146Aperture set for multi-beam
#147Apparatus of plural charged-particle beams
#148Ebeam universal cutter
#149Electron beam apparatus comprising monochromator
#150Transparent halo assembly for reduced particle generation
#151Particle beam system and method for the particle-optical examination of an object
#152Cross scan proximity correction with ebeam universal cutter
#153Particle beam system
#154Charged particle source
#155Multi charged particle beam writing apparatus and multi charged particle beam writing method
#156Systems and methods for charged particle flooding to enhance voltage contrast defect signal
#157Charged particle beam device, charged particle beam influencing device, and method of operating a charged particle beam device
#158Apparatus of plural charged-particle beams
#159Multi charged particle beam drawing apparatus and multi charged particle beam drawing method
#160Particle source for producing a particle beam and particle-optical apparatus
#161Aberration correction in charged particle system
#162Evaluation method, correction method, recording medium and electron beam lithography system
#163Patterned substrate imaging using multiple electron beams
#164Method and system for the removal and/or avoidance of contamination in charged particle beam systems
#165Method for inspecting a specimen and charged particle multi-beam device
#166Multi charged particle beam writing apparatus and multi charged particle beam writing method
#167Ebeam three beam aperture array
#168Multi charged particle beam writing apparatus and multi charged particle beam writing method
#169Multi charged particle beam writing apparatus and multi charged particle beam writing method
#170Electron microscope and image acquisition method
#171Fine alignment system for electron beam exposure system
#172Multi charged particle beam writing apparatus and multi charged particle beam writing method
#173Particle beam system and method for the particle-optical examination of an object
#174Method and device for characterizing an electron beam
#175Particle-optical systems and arrangements and particle-optical components for such systems and arrangements
#176Cross scan proximity correction with ebeam universal cutter
#177Electron microscope and method of aberration measurement
#178Exposure apparatus
#179Apparatus of plural charged-particle beams
#180Evaluation method, correction method, recording medium and electron beam lithography system
#181Particle beam system
#182Charged particle source
#183Charged particle source
#184Charged particle source
#185Unidirectional metal on layer with ebeam
#186System for imaging a secondary charged particle beam with adaptive secondary charged particle optics
#187Ebeam three beam aperture array
#188Electron microscope and measurement method
#189TEM phase contrast imaging with image plane phase grating
#190Apparatus of plural charged-particle beams
#191Apparatus of plural charged-particle beams
#192System and method for imaging a secondary charged particle beam with adaptive secondary charged particle optics
#193Compressive transmission microscopy
#194Electron beam masks for compressive sensors
#195Charged particle inspection method and charged particle system
#196Method for rapid switching between a high current mode and a low current mode in a charged particle beam system
#197Electron microscope and method of measuring aberrations
#198Charged particle source
#199Particle-optical systems and arrangements and particle-optical components for such systems and arrangements
#200Particle-optical systems and arrangements and particle-optical components for such systems and arrangements
#201Charged particle microscope with special aperture plate
#202Beam grid layout
#203Multi-beam particle microscope and method for operating same
#204Focusing a charged particle system
#205Charged particle beam exposure apparatus
#206Charged particle multi-beam inspection system and method of operating the same
#207Charged particle inspection method and charged particle system
#208Focusing a charged particle imaging system
#209Particle-optical systems and arrangements and particle-optical components for such systems and arrangements
#210Charged particle lithography system with intermediate chamber
#211Switchable multi perspective detector, optics therefor and method of operating thereof
#212APPARATUS FOR CONTAMINANTS BEING DEPOSITED THEREON
#213Apparatus and method for controllably implanting workpieces
#214Particle-optical systems and arrangements and particle-optical components for such systems and arrangements
#215Charged particle beam system aperture
#216ION BEAM EXTRACTION ELECTRODE AND ION SOURCE
#217CHARGED PARTICLE BEAM IRRADIATION APPARATUS, CHARGED PARTICLE BEAM DRAWING APPARATUS, AND METHOD OF MANUFACTURING ARTICLE
#218GRID PROVIDING BEAMLET STEERING
#219Charged particle detection system and multi-beamlet inspection system
#220Phase-shifting element and particle beam device having a phase-shifting element
#221Charged particle lithography system with intermediate chamber
#222In situ cleaning device for lithographic apparatus
#223Method for rapid switching between a high current mode and a low current mode in a charged particle beam system
#224Lithography system and method of refracting
#225Charged particle source with integrated electrostatic energy filter
#226Particle-optical systems and arrangements and particle-optical components for such systems and arrangements
#227Grid providing beamlet steering
#228Gas field ion microscopes having multiple operation modes
#229Multi-axis lens, beam system making use of the compound lens, and method of manufacturing the compound lens
#230Phase-shifting element and particle beam device having a phase-shifting element
#231Twin beam charged particle column and method of operating thereof
#232Selectable coulomb aperture in E-beam system
#233Apparatus and method for controllably implanting workpieces
#234Ion implanter, ion implantation method and program
#235Charged particle optical system comprising an electrostatic deflector
#236Transmission electron microscope
#237Electron microscope
#238Techniques for improving extracted ion beam quality using high-transparency electrodes
#239PARTICLE BEAM DEVICE WITH REDUCED EMISSION OF UNDESIRED MATERIAL
#240Particle-optical systems and arrangements and particle-optical components for such systems and arrangements
#241Pattern forming apparatus and pattern forming method
#242Substrate processing apparatus, and magnetic recording medium manufacturing method
#243Frequency adjusting apparatus
#244Focused ion beam apparatus
#245Charged Particle Inspection Method and Charged Particle System
#246Method for manufacturing a semiconductor device, stencil mask and method for manufacturing a the same
#247Dynamic pattern generator with cup-shaped structure
#248Charged particle-optical systems, methods and components
#249Method and system for adjusting beam dimension for high-gradient location specific processing
#250Multi-beam source
#251Phase-shifting element and particle beam device having a phase-shifting element
#252Charged particle beam writing apparatus and charged particle beam writing method
#253Transmission electron microscope provided with electronic spectroscope
#254Charged-particle exposure apparatus
#255Particle-optical systems and arrangements and particle-optical components for such systems and arrangements
#256High current density particle beam system
#257Particle optical apparatus
#258Method for manufacturing a semiconductor device, stencil mask and method for manufacturing a the same
#259Particle-optical systems and arrangements and particle-optical components for such systems and arrangements
#260Charged particle beam device
#261Charged-particle beam exposure apparatus and method
#262System and method for evaluation using electron beam and manufacture of devices
#263Nonlithographic method of defining geometries for plasma and/or ion implantation treatments on a semiconductor wafer
#264Charged particle beamlet exposure system
#265Pattern-definition device for maskless particle-beam exposure apparatus
#266Stencil mask, charged particle irradiation apparatus and the method
#267Ion irradiation of a target at very high and very low kinetic ion energies
#268Multi-beam scanning transmission charged particle microscope
#269Charged particle beam device, multi-beam blanker for a charged particle beam device, and method for operating a charged particle beam device
#270Method for inspecting a specimen and charged particle multi-beam device