206344 ⎘
Discharge tubes exposing object to beam, e.g. for analysis treatment, etching, imaging; Means for controlling the discharge; Diaphragms; Supports movable, i.e. for changing between differently sized apertures
SYSTEMS AND METHODS FOR VOLTAGE CONTRAST DEFECT DETECTION
#2METHODS FOR DETERMINING THE VIRTUAL SOURCE LOCATION OF A LIQUID METAL ION SOURCE
#3X-RAY IMAGING SYSTEM FOR RADIATION THERAPY
#4SYSTEMS AND METHODS FOR CHARGED PARTICLE FLOODING TO ENHANCE VOLTAGE CONTRAST DEFECT SIGNAL
#5COMPOSITE STAGE FOR ELECTRON ENHANCED MATERIAL PROCESSING
#6METHOD OF OPERATING A PARTICLE BEAM SYSTEM AND COMPUTER PROGRAM PRODUCT
#7Methods for determining the virtual source location of a liquid metal ion source
#8CHARGED PARTICLE BEAM PATTERN FORMING DEVICE AND CHARGED PARTICLE BEAM APPARATUS
#9Slit diaphragm
#10Systems and methods for voltage contrast defect detection
#11MULTI-LEAF COLLIMATOR AND DRIVING SYSTEM
#12Charged particle beam device
#13Transmission electron microscope and inspection method using transmission electron microscope
#14Multiple-charged particle-beam irradiation apparatus and multiple-charged particle-beam irradiation method
#15TUNING APPARATUS FOR MINIMUM DIVERGENCE ION BEAM
#16Sputtering apparatus
#17Systems and methods for charged particle flooding to enhance voltage contrast defect signal
#18Charged particle beam device
#19Charged particle beam apparatus
#20Multi-charged-particle beam writing apparatus and multi-charged-particle beam writing method
#21Charged particle beam device, interchangeable multi-aperture arrangement for a charged particle beam device, and method for operating a charged particle beam device
#22Multi-leaf collimator and driving system
#23Method and device for implanting ions in wafers
#24Systems and methods for charged particle flooding to enhance voltage contrast defect signal
#25Charged particle beam apparatus
#26Multi-leaf collimator and driving system
#27Charged particle beam writing apparatus and charged particle beam writing method
#28Inspection device
#29Actuator, sample positioning device, and charged particle beam system
#30Particle-optical systems and arrangements and particle-optical components for such systems and arrangements
#31Interface, a method for observing an object within a non-vacuum environment and a scanning electron microscope
#32Exposure apparatus for forming a reticle
#33Dual-lens-gun electron beam apparatus and methods for high-resolution imaging with both high and low beam currents
#34Particle-optical systems and arrangements and particle-optical components for such systems and arrangements
#35Exposure apparatus for forming a reticle and method of forming a reticle using the same
#36Interface, a method for observing an object within a non-vacuum environment and a scanning electron microscope
#37Focused ion beam device and focused ion beam processing method
#38Inspection device
#39Electron beam column and methods of using same
#40Charged particle beam system having multiple user-selectable operating modes
#41Pattern definition device with multiple multibeam array
#42Focused ion beam apparatus
#43ION Beam System and Machining Method
#44Selectable coulomb aperture in E-beam system
#45Method for controlling charging of sample and scanning electron microscope
#46High-sensitivity and high-throughput electron beam inspection column enabled by adjustable beam-limiting aperture
#47Charged particle beam system having multiple user-selectable operating modes
#48ION IMPLANTER AND ION IMPLANT METHOD THEREOF
#49Manufacturing method of semiconductor device, method for controlling ion beam, and ion implantation apparatus
#50Pattern forming method
#51Electron microscope
#52Techniques for improving extracted ion beam quality using high-transparency electrodes
#53Technique for processing a substrate
#54Interface, a method for observing an object within a non-vacuum environment and a scanning electron microscope
#55Extraction electrode manipulator
#56APPARATUS
#57Frequency adjusting apparatus
#58Ion source cleaning method and apparatus
#59Electron-beam device and detector system
#60Focused ion beam apparatus
#61Charged particle beam apparatus and method adjusting axis of aperture
#62Extraction electrode system for high current ion implanter
#63Transmission electron microscope
#64Gas field ionization ion source, scanning charged particle microscope, optical axis adjustment method and specimen observation method
#65Method and system for multi-pass correction of substrate defects
#66Charged-particle beam instrument
#67Scanning Electron Microscope
#68System and method for two-dimensional beam scan across a workpiece of an ion implanter
#69ADJUSTABLE APERTURE ELEMENT FOR PARTICLE BEAM DEVICE, METHOD OF OPERATING AND MANUFACTURING THEREOF
#70Ion beam system and machining method
#71Charged-particle exposure apparatus
#72Ion beam irradiating apparatus and method of adjusting uniformity of a beam
#73Variable shaped electron beam lithography system and method for manufacturing substrate
#74Scanning electron microscope
#75Technique for isocentric ion beam scanning
#76Charged particle beam column
#77Energy-filtering cathode lens microscopy instrument
#78Particle optical apparatus
#79Techniques for reducing effects of photoresist outgassing
#80Techniques for preventing parasitic beamlets from affecting ion implantation
#81Electron-beam device and detector system
#82Electron beam device and its control method
#83Focused ion beam system
#84Method and apparatus for applying charged particle beam
#85Irradiation system ion beam and method to enhance accuracy of irradiation
#86Irradiation system with ion beam
#87Method to increase low-energy beam current in irradiation system with ion beam
#88Focused ion beam system
#89Ion beam system and machining method
#90Charged particle beam column