206353 ⎘
Discharge tubes exposing object to beam, e.g. for analysis treatment, etching, imaging; Means for controlling the discharge Focusing means
Sub-classes:OPTICAL SYSTEM FOR A PLURALITY OF PRIMARY BEAMLETS, CHARGED PARTICLE MULTI-BEAM APPARATUS AND METHOD OF FOCUSING A PLURALITY OF PRIMARY BEAMLETS
#2BOTTOM AND MIDDLE EDGE RINGS
#3FOCUS RING ALIGNMENT APPARATUS
#4SYSTEMS AND METHODS FOR CHARGED PARTICLE FLOODING TO ENHANCE VOLTAGE CONTRAST DEFECT SIGNAL
#5ELECTRON BEAM MICROSCOPE
#6ELECTRON BEAM WELDING SYSTEMS EMPLOYING A PLASMA CATHODE
#7ELECTRON BEAM WELDING SYSTEMS EMPLOYING A PLASMA CATHODE
#8Charged particle beam apparatus and method of controlling sample charge
#9Back-scatter electrons (BSE) imaging with a SEM in tilted mode using cap bias voltage
#10Charged particle beam apparatus, multi-beamlet assembly, and method of inspecting a specimen
#11BOTTOM AND MIDDLE EDGE RINGS
#12Bottom and middle edge rings
#13Bottom electrode assembly, plasma processing apparatus, and method of replacing focus ring
#14Charged particle beam device for inspection of a specimen with a plurality of charged particle beamlets
#15Multiple charged-particle beam apparatus with low crosstalk
#16Systems and methods for charged particle flooding to enhance voltage contrast defect signal
#17Focused ion beam apparatus
#18In-situ plasma cleaning of process chamber components
#19Apparatus and method for measuring energy spectrum of backscattered electrons
#20Plasma processing apparatus and method of manufacturing semiconductor device using the same
#21Charged particle beam device, objective lens module, electrode device, and method of inspecting a specimen
#22Plasma processing apparatuses having a dielectric injector
#23High power wafer cooling
#24Ion focusing device
#25Bottom and middle edge rings
#26Substrate processing apparatus and substrate processing method
#27In-situ plasma cleaning of process chamber components
#28Height detection apparatus and charged particle beam apparatus
#29Focusing magnet and charged particle irradiation apparatus
#30Focusing magnet and charged particle irradiation apparatus
#31Transmission Electron Microscopy
#32Rock sample preparation method by using focused ion beam for minimizing curtain effect
#33Plasma beam penetration of millimeter scale holes with high aspect ratios
#34Ion focusing device
#35Plasma processing apparatus and method of manufacturing semiconductor device using the same
#36Systems and methods for charged particle flooding to enhance voltage contrast defect signal
#37Rock sample preparation method by using focused ion beam for minimizing curtain effect
#38Charged particle beam apparatus
#39Method and system for aberration correction in an electron beam system
#40Method for rapid switching between a high current mode and a low current mode in a charged particle beam system
#41Plasma ion source for use with a focused ion beam column with selectable ions
#42Apparatus for focusing and for storage of ions and for separation of pressure areas
#43Method and System of Creating a Symmetrical FIB Deposition
#44Processing apparatus and processing method
#45Method for detecting an electrical defect of contact/via plugs
#46Focusing a charged particle system
#47Focus ring for plasma processing apparatus
#48Method and apparatus for control of coherent synchrotron radiation effects during recirculation with bunch compression
#49Charged particle beam apparatus
#50Inductively-coupled plasma ion source for use with a focused ion beam column with selectable ions
#51THERMALLY CONDUCTIVE SILICONE SHEET, MANUFACTURING METHOD THEREOF, AND PLASMA PROCESSING APPARATUS USING THE SAME
#52X-ray tube
#53Plasma processing apparatus
#54Device and method for electron emission and device including such an electron emission system
#55Inductively-coupled plasma ion source for use with a focused ion beam column with selectable ions
#56Method and apparatus for improved uniformity control with dynamic beam shaping
#57Method for rapid switching between a high current mode and a low current mode in a charged particle beam system
#58Systems And Methods For Scanning A Beam Of Charged Particles
#59Apparatus and method for multi-directionally scanning a beam of charged particles
#60Systems and methods for scanning a beam of charged particles
#61Ion implantation ion source, system and method
#62ADJUSTABLE DEFLECTION OPTICS FOR ION IMPLANTATION
#63Charged particle beam apparatus
#64Broad beam ion implantation architecture
#65Methods and systems for trapping ion beam particles and focusing an ion beam
#66ION IMPLANTATION ION SOURCE, SYSTEM AND METHOD
#67Ion implantation ion source, system and method
#68Dual mode ion source for ion implantation
#69Charged particle beam apparatus and method for operating the same
#70Ion implantation ion source, system and method
#71Ion implantation ion source, system and method
#72Method for focusing an electron beam on a wafer having a transparent substrate
#73Automatic optimization of etch process for accelerated yield ramp with matched charged particle multi-beam systems