ClassID:

206353

H01J2237/049 - CPC Classification

Classification description:

Discharge tubes exposing object to beam, e.g. for analysis treatment, etching, imaging; Means for controlling the discharge Focusing means

Sub-classes:
Recent Application in this class:
#1
20250299906
2025-09-25

OPTICAL SYSTEM FOR A PLURALITY OF PRIMARY BEAMLETS, CHARGED PARTICLE MULTI-BEAM APPARATUS AND METHOD OF FOCUSING A PLURALITY OF PRIMARY BEAMLETS

#2
20250132135
2025-04-24

BOTTOM AND MIDDLE EDGE RINGS

#3
20250087464
2025-03-13

FOCUS RING ALIGNMENT APPARATUS

#4
20240379325
2024-11-14

SYSTEMS AND METHODS FOR CHARGED PARTICLE FLOODING TO ENHANCE VOLTAGE CONTRAST DEFECT SIGNAL

#5
20240304410
2024-09-12

ELECTRON BEAM MICROSCOPE

#6
20240153739
2024-05-09

ELECTRON BEAM WELDING SYSTEMS EMPLOYING A PLASMA CATHODE

#7
20220384138
2022-12-01

ELECTRON BEAM WELDING SYSTEMS EMPLOYING A PLASMA CATHODE

#8
20220359152
2022-11-10

Charged particle beam apparatus and method of controlling sample charge

#9
20220351937
2022-11-03

Back-scatter electrons (BSE) imaging with a SEM in tilted mode using cap bias voltage

#10
20220336186
2022-10-20

Charged particle beam apparatus, multi-beamlet assembly, and method of inspecting a specimen

#11
20220189745
2022-06-16

BOTTOM AND MIDDLE EDGE RINGS

#12
20220189744
2022-06-16

Bottom and middle edge rings

#13
20220165551
2022-05-26

Bottom electrode assembly, plasma processing apparatus, and method of replacing focus ring

#14
20210296088
2021-09-23

Charged particle beam device for inspection of a specimen with a plurality of charged particle beamlets

#15
20210193437
2021-06-24

Multiple charged-particle beam apparatus with low crosstalk

#16
20210142979
2021-05-13

Systems and methods for charged particle flooding to enhance voltage contrast defect signal

#17
20210090854
2021-03-25

Focused ion beam apparatus

#18
20210013001
2021-01-14

In-situ plasma cleaning of process chamber components

#19
20210012999
2021-01-14

Apparatus and method for measuring energy spectrum of backscattered electrons

#20
20200395196
2020-12-17

Plasma processing apparatus and method of manufacturing semiconductor device using the same

#21
20200381208
2020-12-03

Charged particle beam device, objective lens module, electrode device, and method of inspecting a specimen

#22
20200365372
2020-11-19

Plasma processing apparatuses having a dielectric injector

#23
20200350139
2020-11-05

High power wafer cooling

#24
20200321190
2020-10-08

Ion focusing device

#25
20200312633
2020-10-01

Bottom and middle edge rings

#26
20200176227
2020-06-04

Substrate processing apparatus and substrate processing method

#27
20200126757
2020-04-23

In-situ plasma cleaning of process chamber components

#28
20190323835
2019-10-24

Height detection apparatus and charged particle beam apparatus

#29
20190311879
2019-10-10

Focusing magnet and charged particle irradiation apparatus

#30
20190311878
2019-10-10

Focusing magnet and charged particle irradiation apparatus

#31
20190287759
2019-09-19

Transmission Electron Microscopy

#32
20190234889
2019-08-01

Rock sample preparation method by using focused ion beam for minimizing curtain effect

#33
20190221402
2019-07-18

Plasma beam penetration of millimeter scale holes with high aspect ratios

#34
20190189393
2019-06-20

Ion focusing device

#35
20190074165
2019-03-07

Plasma processing apparatus and method of manufacturing semiconductor device using the same

#36
20190043691
2019-02-07

Systems and methods for charged particle flooding to enhance voltage contrast defect signal

#37
20180231477
2018-08-16

Rock sample preparation method by using focused ion beam for minimizing curtain effect

#38
20170025251
2017-01-26

Charged particle beam apparatus

#39
20160329189
2016-11-10

Method and system for aberration correction in an electron beam system

#40
20160233053
2016-08-11

Method for rapid switching between a high current mode and a low current mode in a charged particle beam system

#41
20160027607
2016-01-28

Plasma ion source for use with a focused ion beam column with selectable ions

#42
20160020064
2016-01-21

Apparatus for focusing and for storage of ions and for separation of pressure areas

#43
20150369710
2015-12-24

Method and System of Creating a Symmetrical FIB Deposition

#44
20150348740
2015-12-03

Processing apparatus and processing method

#45
20150323583
2015-11-12

Method for detecting an electrical defect of contact/via plugs

#46
20150287568
2015-10-08

Focusing a charged particle system

#47
20150243488
2015-08-27

Focus ring for plasma processing apparatus

#48
20150228444
2015-08-13

Method and apparatus for control of coherent synchrotron radiation effects during recirculation with bunch compression

#49
20150170875
2015-06-18

Charged particle beam apparatus

#50
20150129759
2015-05-14

Inductively-coupled plasma ion source for use with a focused ion beam column with selectable ions

#51
20150122422
2015-05-07

THERMALLY CONDUCTIVE SILICONE SHEET, MANUFACTURING METHOD THEREOF, AND PLASMA PROCESSING APPARATUS USING THE SAME

#52
20150117617
2015-04-30

X-ray tube

#53
20150107773
2015-04-23

Plasma processing apparatus

#54
20150008323
2015-01-08

Device and method for electron emission and device including such an electron emission system

#55
20130140450
2013-06-06

Inductively-coupled plasma ion source for use with a focused ion beam column with selectable ions

#56
20120248324
2012-10-04

Method and apparatus for improved uniformity control with dynamic beam shaping

#57
20120217152
2012-08-30

Method for rapid switching between a high current mode and a low current mode in a charged particle beam system

#58
20110186748
2011-08-04

Systems And Methods For Scanning A Beam Of Charged Particles

#59
20110186747
2011-08-04

Apparatus and method for multi-directionally scanning a beam of charged particles

#60
20110186743
2011-08-04

Systems and methods for scanning a beam of charged particles

#61
20100148089
2010-06-17

Ion implantation ion source, system and method

#62
20100065761
2010-03-18

ADJUSTABLE DEFLECTION OPTICS FOR ION IMPLANTATION

#63
20080272300
2008-11-06

Charged particle beam apparatus

#64
20080078956
2008-04-03

Broad beam ion implantation architecture

#65
20070295901
2007-12-27

Methods and systems for trapping ion beam particles and focusing an ion beam

#66
20070278417
2007-12-06

ION IMPLANTATION ION SOURCE, SYSTEM AND METHOD

#67
20070262262
2007-11-15

Ion implantation ion source, system and method

#68
20070108394
2007-05-17

Dual mode ion source for ion implantation

#69
20060192145
2006-08-31

Charged particle beam apparatus and method for operating the same

#70
20050269520
2005-12-08

Ion implantation ion source, system and method

#71
20050051096
2005-03-10

Ion implantation ion source, system and method

#72
17164803
2022-07-05

Method for focusing an electron beam on a wafer having a transparent substrate

#73
14299891
2015-04-07

Automatic optimization of etch process for accelerated yield ramp with matched charged particle multi-beam systems