Patents-Review.com
ClassID:

206412 ⎘

H01J2237/1502 - CPC Classification

Classification description:

Discharge tubes exposing object to beam, e.g. for analysis treatment, etching, imaging; Means for deflecting or directing discharge Mechanical adjustments

Sub-classes:
Recent Application in this class:
#1
20260142134
2026-05-21

SEGMENTED FOCUS RING FOR PLASMA SEMICONDUCTOR PROCESSING AND PROCESSING TOOL CONFIGURED TO USE The SEGMENTED FOCUS RING

 #2
20260058090
2026-02-26

TEACHING OF CHARGED-PARTICLE MICROSCOPY ROBOTIC GRIPPERS VIA BEAMSPLITTING

 #3
20260018376
2026-01-15

APPARATUS OF PLURAL CHARGED-PARTICLE BEAMS

 #4
20250391633
2025-12-25

ION EXTRACTION OPTICS WITH DYNAMIC EXTRACTION ANGLE CONTROL

 #5
20250336640
2025-10-30

ILLUMINATION LENS ADJUSTMENT METHOD, MULTIPLE CHARGED PARTICLE BEAM WRITING APPARATUS, AND STORAGE MEDIUM

 #6
20250293005
2025-09-18

PLASMA PROCESSING APPARATUS

 #7
20250259817
2025-08-14

SUBSTRATE PROCESSING APPARATUS

 #8
20250087464
2025-03-13

FOCUS RING ALIGNMENT APPARATUS

 #9
20240429089
2024-12-26

ADJUSTABLE EDGE RING TILT FOR EDGE OF WAFER SKEW COMPENSATION

 #10
20240014003
2024-01-11

APPARATUS OF PLURAL CHARGED-PARTICLE BEAMS

 #11
20230402269
2023-12-14

Cleaning method and plasma processing apparatus

 #12
20230207251
2023-06-29

MULTIPLE PARTICLE BEAM SYSTEM WITH A CONTRAST CORRECTION LENS SYSTEM

 #13
20230110414
2023-04-13

Optical system for monitoring plasma reactions and reactors

 #14
20210384013
2021-12-09

PLASMA PROCESSING APPARATUS

 #15
20210384008
2021-12-09

Apparatus of plural charged-particle beams

 #16
20210272782
2021-09-02

Cleaning method and plasma processing apparatus

 #17
20210265130
2021-08-26

Ion milling device

 #18
20210066020
2021-03-04

Ion milling device and ion source adjusting method for ion milling device

 #19
20200312639
2020-10-01

Optical system for monitoring plasma reactions and reactors

 #20
20200312638
2020-10-01

Plasma reactors having recuperators

 #21
20200312629
2020-10-01

Controlling exhaust gas pressure of a plasma reactor for plasma stability

 #22
20200312627
2020-10-01

Plasma reactor for processing gas

 #23
20200306716
2020-10-01

Durable auto-ignition device for plasma reactor

 #24
20200258716
2020-08-13

Multi-charged-particle beam writing apparatus and multi-charged-particle beam writing method

 #25
20200234929
2020-07-23

PLASMA PROCESSING APPARATUS AND METHOD FOR MEASURING MISALIGNMENT OF RING MEMBER

 #26
20200152421
2020-05-14

Apparatus of plural charged-particle beams

 #27
20180350555
2018-12-06

Apparatus of plural charged-particle beams

 #28
20180226220
2018-08-09

CONTINUOUSLY VARIABLE APERTURE

 #29
20170160212
2017-06-08

Method of adjusting the primary side of an X-ray diffractometer

 #30
20170110295
2017-04-20

Support unit, substrate treating apparatus including the same, and method for treating a substrate

 #31
20170025241
2017-01-26

Apparatus of plural charged-particle beams

 #32
20160379844
2016-12-29

TECHNIQUES AND APPARATUS FOR ANISOTROPIC METAL ETCHING

 #33
20160042922
2016-02-11

Techniques and apparatus for anisotropic metal etching

 #34
20150303026
2015-10-22

Electron beam writing apparatus, and method for adjusting convergence half angle of electron beam

 #35
20150243480
2015-08-27

Charged particle beam exposure apparatus and method of manufacturing semiconductor device

 #36
20150109601
2015-04-23

Charged particle lithography system with alignment sensor and beam measurement sensor

 #37
20140352890
2014-12-04

Substrate processing apparatus

 #38
20140197327
2014-07-17

High-voltage insulation device for charged-particle optical apparatus

 #39
20130270450
2013-10-17

Double ended electrode manipulator

 #40
20120273691
2012-11-01

Electro-optical element for multiple beam alignment

 #41
20120168638
2012-07-05

Charged particle source with multiple selectable particle emitters

 #42
20110204253
2011-08-25

Pattern definition device with multiple multibeam array

 #43
20110174985
2011-07-21

LITHOGRAPHY SYSTEM WITH LENS ROTATION

 #44
20100243167
2010-09-30

Substrate processing apparatus

 #45
20080067435
2008-03-20

Beam tuning with automatic magnet pole rotation for ion implanters

 #46
20060151716
2006-07-13

Micro-column electron beam apparatus

 #47
20060124850
2006-06-15

Scanning interference electron microscope

 #48
20060071175
2006-04-06

Extractor for an microcolumn, an alignment method for an extractor aperture to an electron emitter, and a measuring method and an alignment method using thereof

 #49
20050253089
2005-11-17

Ion implanting apparatus