H01J2237/1503 - CPC Classification Index

ClassID:

206413 ⎘

H01J2237/1503 - CPC Classification

Classification description:

Discharge tubes exposing object to beam, e.g. for analysis treatment, etching, imaging; Means for deflecting or directing discharge; Mechanical adjustments Mechanical scanning

Recent Application in this class:

20260058109

2026-02-26

VERTICALLY MOUNTED PROCESSING SYSTEM

20250336643

2025-10-30

ELECTRON BEAM PROCESSING METHODS

20170213690

2017-07-27

Charged particle system and methods for irradiating a planning target volume

20130130484

2013-05-23

Ion implanter and ion implant method thereof

20110186748

2011-08-04

Systems And Methods For Scanning A Beam Of Charged Particles

20110186747

2011-08-04

Apparatus and method for multi-directionally scanning a beam of charged particles

20110186743

2011-08-04

Systems and methods for scanning a beam of charged particles

20110049383

2011-03-03

ION IMPLANTER AND ION IMPLANT METHOD THEREOF

20100012860

2010-01-21

Electron beam processing device

#10

20090189096

2009-07-30

Apparatus and methods for ion beam implantation using ribbon and spot beams

#11

20080315096

2008-12-25

Portable electron microscope using micro-column

#12

20080210866

2008-09-04

Motioning Equipment for Electron Column

#13

20080029716

2008-02-07

Apparatus and method for ion beam implantation using ribbon and spot beams

#14

20070272856

2007-11-29

Method of inspecting a specimen surface, apparatus and use of fluorescent material

#15

20070125957

2007-06-07

Techniques for reducing effects of photoresist outgassing

#16

20070125955

2007-06-07

Techniques for preventing parasitic beamlets from affecting ion implantation