206437 ⎘
Discharge tubes exposing object to beam, e.g. for analysis treatment, etching, imaging; Vacuum control means Obtaining or maintaining desired pressure
Sub-classes:PRINTED CIRCUIT BOARD FOR SEALING VACUUM SYSTEM
#2INFORMATION PROCESSING APPARATUS, COMPUTER-READABLE MEDIUM, AND INFORMATION PROCESSING METHOD
#3HYBRID VACUUM ELECTROSTATIC CHUCK IN DEDICATED CHAMBER FOR HIGH WARPAGE WAFERS
#4IN-SITU BACK SIDE PLASMA TREATMENT FOR RESIDUE REMOVAL FROM SUBSTRATES
#5SELECTIVE DEPOSITION OF MATERIAL COMPRISING SILICON AND OXYGEN USING PLASMA
#6DIRECTIONAL SELECTIVE FILL OF SILICON OXIDE MATERIALS
#7INCREASED ETCH RATES OF SILICON-CONTAINING MATERIALS
#8METHODS OF SELECTIVELY ETCHING SILICON NITRIDE
#9HALOGEN-FREE ETCHING OF SILICON NITRIDE
#10MULTI-CHAMBER PROCESSING TOOL WITH ENHANCED THROUGHPUT
#11METHOD FOR MANUFACTURING CAPACITOR STRUCTURE
#12ETCHING APPARATUS AND METHODS OF CLEANING THEREOF
#13Program, Information Processing Method, Information Processing Device and Model Generation Method
#14APPARATUS AND METHODS FOR APPLYING VACUUM-PLASMA TREATMENT
#15DENSIFIED SEAM-FREE SILICON GAP FILL PROCESSES
#16PROCESSING METHODS TO IMPROVE ETCHED SILICON-AND-GERMANIUM-CONTAINING MATERIAL SURFACE ROUGHNESS
#17Ceramic susceptor
#18SEMICONDUCTOR MANUFACTURING FACILITY AND METHOD OF OPERATING THE SAME
#19SUBSTRATE PROCESSING METHOD AND SUBSTRATE PROCESSING APPARATUS
#20IN-SITU CARBON LINER FOR HIGH ASPECT RATIO FEATURES
#21SUBSTRATE PROCESSING METHOD AND SUBSTRATE PROCESSING APPARATUS
#22METHODS, SYSTEMS, AND APPARATUS FOR FORMING LAYERS HAVING SINGLE CRYSTALLINE STRUCTURES
#23NEUTRAL BEAM ANNEALING APPARATUS AND METHOD OF MANUFACTURING DISPLAY APPARATUS USING THE SAME
#24METHOD FOR SELECTIVE DEPOSITION OF SILICON NITRIDE AND STRUCTURE INCLUDING SELECTIVELY-DEPOSITED SILICON NITRIDE LAYER
#25PLASMA PRECLEAN SYSTEM FOR CLUSTER TOOL
#26PLASMA PROCESSING APPARATUS, PLASMA PROCESSING METHOD, PRESSURE VALVE CONTROL DEVICE, PRESSURE VALVE CONTROL METHOD, AND PRESSURE REGULATION SYSTEM
#27PLASMA PROCESSING APPARATUS AND PLASMA PROCESSING METHOD
#28LOW TEMPERATURE CARBON GAPFILL
#29Device and method for sputtering and depositing metal on surface of magnetic powder materials
#30Plasma processing apparatus and plasma processing method
#31METHOD FOR ETCHING LITHIUM NIOBATE AND METHOD FOR FORMING LITHIUM NIOBATE PATTERN USING THE SAME
#32PLASMA TREATMENT APPARATUS AND PLASMA TREATMENT METHOD
#33SEMICONDUCTOR PROCESSING SYSTEM WITH GAS LINE FOR TRANSPORTING EXCITED SPECIES AND RELATED METHODS
#34DELIVERY OF HIGH CONCENTRATIONS OF MOLECULAR HYDROGEN AND OTHER GASES TO SUBSTRATE PROCESSING SYSTEMS
#35SUBSTRATE TREATMENT APPARATUS AND SEMICONDUCTOR DEVICE MANUFACTURING METHOD USING THE SAME
#36SUBSTRATE PROCESSING APPARATUS, METHOD OF MANUFACTURING SEMICONDUCTOR DEVICE AND NON-TRANSITORY COMPUTER-READABLE RECORDING MEDIUM
#37DEPOSITION APPARATUS AND METHOD OF CLEANSING THE SAME
#38HIGH DIELECTRIC FILMS AND SEMICONDUCTOR OR CAPACITOR DEVICES COMPRISING SAME
#39Forming method of plasma resistant oxyfluoride coating layer
#40PLASMA PROCESSING APPARATUS AND PLASMA PROCESSING METHOD
#41Charged Particle Beam Device
#42Method of Plasma Etching
#43Selective deposition of material comprising silicon and oxygen using plasma
#44Carrier device, semiconductor apparatus, and residual charge detection method
#45PLASMA PROCESSING WITH TUNABLE NITRIDATION
#46HIGH ASPECT RATIO ETCH WITH INFINITE SELECTIVITY
#47ELECTRON BEAM WELDING SYSTEMS EMPLOYING A PLASMA CATHODE
#48WATERBORNE DISPERSION COMPOSITION
#49PLASMA PROCESSING APPARATUS AND PLASMA PROCESSING METHOD
#50Pressure-induced temperature modification during atomic scale processing
#51Etching apparatus and methods of cleaning thereof
#52Coupling for connecting analytical systems with vibrational isolation
#53PRINTED CIRCUIT BOARD FOR SEALING VACUUM SYSTEM
#54Etching apparatus and methods of cleaning thereof
#55Plasma processing apparatus and operating method of plasma processing apparatus
#56Charged particle beam apparatus and adjustment method for charged particle beam apparatus
#57SURFACE ENCASING MATERIAL LAYER
#58Charge neutralizer and plasma generator
#59Plasma processing apparatus
#60PRESSURE CONTROL RING, PLASMA PROCESSING APPARATUS INCLUDING THE SAME AND METHOD OF MANUFACTURING SEMICONDUCTOR DEVICE
#61SEMICONDUCTOR SUBSTRATE PROCESSING APPARATUS AND METHOD
#62Processing system and processing method
#63Charged particle beam system, opto-electro simultaneous detection system and method
#64Low-pressure plasma chamber, low-pressure plasma installation and method for producing a low-pressure plasma chamber
#65Ion transfer tube flow and pumping system load
#66Imaging device for imaging an object and for imaging a structural unit in a particle beam apparatus
#67APPARATUS FOR VACUUM SPUTTER DEPOSITION AND METHOD THEREFOR
#68Method for safe control of gas delivery to an electron microscope sample holder
#69Film forming method, boron film, and film forming apparatus
#70Liner tube and electron microscope
#71Sample chamber device for electron microscope, and electron microscope comprising same
#72Electron scanning microscope and image generation method
#73Ion transfer tube flow and pumping system load
#74Low energy electron microscopy
#75X-ray analysis in air
#76High voltage shielding and cooling in a charged particle beam generator
#77Ion transfer tube flow and pumping system load
#78Device for generating a composition-controlled and intensity-controlled ionic flow and related method
#79System and method for providing a clean environment in an electron-optical system
#80Electron scanning microscope and image generation method
#81Electron beam microscope with improved imaging gas and method of use
#82System and method for forming a sealed chamber
#83Charged particle source arrangement for a charged particle beam device, charged particle beam device for sample inspection, and method for providing a primary charged particle beam for sample inspection in a charged particle beam
#84X-ray analysis in air
#85Anti-contamination trap, and vacuum application device
#86Localized, in-vacuum modification of small structures
#87Method for S/TEM sample analysis
#88Ion milling device and processing method using the ion milling device
#89LIQUID DROPLET INJECTING APPARATUS AND ION SOURCE
#90Electron microscope and sample observation method
#91System, method and apparatus for plasma etch having independent control of ion generation and dissociation of process gas
#92Method for safe control of gas delivery to an electron microscope sample holder
#93Apparatus for focusing and for storage of ions and for separation of pressure areas
#94Method for creating S/TEM sample and sample structure
#95Sample storage container, charged particle beam apparatus, and image acquiring method
#96Scanning electron microscope, an interface and a method for observing an object within a non-vacuum environment
#97Interface, a method for observing an object within a non-vacuum environment and a scanning electron microscope
#98Charged particle beam apparatus having needle probe that tracks target position changes
#99Method for S/TEM sample analysis
#100Focused ion beam apparatus with precious metal emitter surface
#101Charged particle beam instrument
#102Charged particle lithography system and beam generator
#103Inspection or observation apparatus and sample inspection or observation method
#104Ion implantation apparatus and method of cleaning ion implantation apparatus
#105Method and apparatus for controlling beam angle during ion implantation of a semiconductor wafer based upon pressure
#106Scanning electron microscope, an interface and a method for observing an object within a non-vacuum environment
#107Charged particle beam apparatus, and article manufacturing method
#108Localized, in-vacuum modification of small structures
#109System and method for ion implantation with improved productivity and uniformity
#110Interface, a method for observing an object within a non-vacuum environment and a scanning electron microscope
#111Method for creating S/TEM sample and sample structure
#112Gas field ion source, charged particle microscope, and apparatus
#113System, method and apparatus for plasma etch having independent control of ion generation and dissociation of process gas
#114Electron microscope
#115Vacuum processing chambers incorporating a moveable flow equalizer
#116Method for S/TEM sample analysis
#117Device and method for introducing gas for analysis device
#118Method for creating S/TEM sample and sample structure
#119System and method for ion implantation with improved productivity and uniformity
#120Method for creating S/tem sample and sample structure
#121Method for venting gas into closed space and gas supply assembly thereof
#122Interface, a method for observing an object within a non-vacuum environment and a scanning electron microscope
#123Vapor-barrier vacuum isolation system
#124Method and apparatus for controlling beam current uniformity in an ion implanter
#125Method of controlling electron beam focusing of pierce-type electron gun and control apparatus therefor
#126Charged particle beam apparatus
#127Table guided by aerostatic bearing elements for vacuum application
#128Apparatus and method for inspecting sample
#129Gas field ion source, charged particle microscope, and apparatus
#130Transmission electron microscope
#131Charged particle beam system and method for evacuation of the system
#132Focused ion beam apparatus
#133GUN CHAMBER, CHARGED PARTICLE BEAM APPARATUS AND METHOD OF OPERATING SAME
#134APPARATUS HAVING VACUUM VESSEL
#135Deicing of radiation detectors in analytical instruments
#136Ion implantation device with a dual pumping mode and method thereof
#137Digital parallel electron beam lithography stamp
#138Parallel electron beam lithography stamp (PEBLS)
#139Particle optical apparatus with a predetermined final vacuum pressure
#140Techniques for reducing effects of photoresist outgassing
#141Techniques for preventing parasitic beamlets from affecting ion implantation
#142Ion implantation apparatus
#143Particle beam apparatus