206436 ⎘
Discharge tubes exposing object to beam, e.g. for analysis treatment, etching, imaging Vacuum control means
Sub-classes:Physical Package for Optical Lattice Clock
#2PLASMA PROCESSING APPARATUS AND SEMICONDUCTOR DEVICE MANUFACTURING METHOD
#3MACHINE AND WAFER PROCESSING APPARATUS
#4Multi-zone plasma-enhanced chemical vapor deposition apparatus and methods for operating the same
#5Rotary plasma reactor
#6In-situ deposition and etch process and apparatus for precision patterning of semiconductor devices
#7Method for operating a pressure system of a device for imaging, analyzing and/or processing an object and a device for carrying out the method
#8Shaped welding head for electron or laser beam welding
#9Plasma processing apparatus
#10Electron-Beam Inspection Systems with optimized throughput
#11Ionization vacuum measuring cell
#12METHOD AND APPARATUS FOR INSPECTING A SAMPLE
#13Mass spectrometry device and analysis method for gas phase molecule-ion reaction
#14In-situ cleaning using hydrogen peroxide as co-gas to primary dopant or purge gas for minimizing carbon deposits in an ion source
#15Charged particle beam device and evacuation method for same
#16Manufacturing method of semiconductor device
#17Ion beam materials processing system with grid short clearing system for gridded ion beam source
#18Apparatus for exhaust cooling
#19Multi-Stage/Multi-Chamber Electron-Beam Inspection System
#20Multi-stage/multi-chamber electron-beam inspection system
#21Spark gap device and method of measurement of X-ray tube vacuum pressure
#22Vacuum tube electron microscope
#23ORGANIC ELECTROLUMINESCENT ELEMENT
#24Charged particle beam device and charged particle beam device control method
#25Electron beam window tile having non-uniform cross-sections
#26Electron microscope having a carrier
#27Charged particle beam device, method for adjusting charged particle beam device, and method for inspecting or observing sample
#28Imaging and processing for plasma ion source
#29Apparatus and method for processing sample, and charged particle radiation apparatus
#30Vacuum trap
#31Ion implantation apparatus and method of controlling ion implantation apparatus
#32Ion implantation device
#33LITHOGRAPHY APPARATUS AND METHOD OF MANUFACTURING ARTICLE
#34Charged particle beam device
#35PLASMA PROCESSING APPARATUS
#36Plasma processing method and plasma processing apparatus
#37Ion beam device having gas introduction port disposed on structure maintained at ground potential
#38Vacuum trap
#39Ion implantation apparatus and ion implantation method
#40ION IMPLANTATION APPARATUS AND METHOD
#41Film deposition apparatus
#42Charged particle beam apparatus
#43Electron microscope for inspecting and processing of an object with miniaturized structures and method thereof
#44Retractable lens-coupled electron microscope camera with image sensor in electron microscope vacuum chamber
#45CHARGED PARTICLE BEAM APPARATUS AND METHOD FOR GENERATING CHARGED PARTICLE BEAM IMAGE
#46Method and system for etching a MEM device
#47ACCELERATOR PARTICLE BEAM APPARATUS AND METHOD FOR LOW CONTAMINATE PROCESSING
#48Method of manufacturing semiconductor device, film deposition method, and film deposition apparatus
#49Method for Differentially Pumping Endblock Seal Cavity
#50Electron microscope for inspecting and processing of an object with miniaturized structures and method thereof
#51RF Coil Plasma Generation
#52PUMPING LINE DEVICE OF DRY ETCHING APPARATUS
#53Ion beam guide tube
#54SYSTEMS AND METHODS FOR A HELIUM ION PUMP
#55Charged particle beam apparatus
#56System and method for electronic diagnostics of a process vacuum environment
#57High-energy ion implanter and method of operation thereof
#58Light weight portable scanning electron microscope
#59Method of controlling implant dosage and pressure compensation factor in-situ
#60Utilization of an ion gauge in the process chamber of a semiconductor ion implanter
#61Method for differentially pumping endblock seal cavity
#62Charged-particle beam microscopy