ClassID:

206436

H01J2237/18 - CPC Classification

Classification description:

Discharge tubes exposing object to beam, e.g. for analysis treatment, etching, imaging Vacuum control means

Sub-classes:
Recent Application in this class:
#1
20230229115
2023-07-20

Physical Package for Optical Lattice Clock

#2
20230207292
2023-06-29

PLASMA PROCESSING APPARATUS AND SEMICONDUCTOR DEVICE MANUFACTURING METHOD

#3
20230009477
2023-01-12

MACHINE AND WAFER PROCESSING APPARATUS

#4
20210351058
2021-11-11

Multi-zone plasma-enhanced chemical vapor deposition apparatus and methods for operating the same

#5
20200335311
2020-10-22

Rotary plasma reactor

#6
20200006080
2020-01-02

In-situ deposition and etch process and apparatus for precision patterning of semiconductor devices

#7
20190295811
2019-09-26

Method for operating a pressure system of a device for imaging, analyzing and/or processing an object and a device for carrying out the method

#8
20190262931
2019-08-29

Shaped welding head for electron or laser beam welding

#9
20190244795
2019-08-08

Plasma processing apparatus

#10
20190088442
2019-03-21

Electron-Beam Inspection Systems with optimized throughput

#11
20190043702
2019-02-07

Ionization vacuum measuring cell

#12
20180364563
2018-12-20

METHOD AND APPARATUS FOR INSPECTING A SAMPLE

#13
20180108523
2018-04-19

Mass spectrometry device and analysis method for gas phase molecule-ion reaction

#14
20180096828
2018-04-05

In-situ cleaning using hydrogen peroxide as co-gas to primary dopant or purge gas for minimizing carbon deposits in an ion source

#15
20180082819
2018-03-22

Charged particle beam device and evacuation method for same

#16
20170372876
2017-12-28

Manufacturing method of semiconductor device

#17
20170330738
2017-11-16

Ion beam materials processing system with grid short clearing system for gridded ion beam source

#18
20170301524
2017-10-19

Apparatus for exhaust cooling

#19
20170301509
2017-10-19

Multi-Stage/Multi-Chamber Electron-Beam Inspection System

#20
20170301508
2017-10-19

Multi-stage/multi-chamber electron-beam inspection system

#21
20170248485
2017-08-31

Spark gap device and method of measurement of X-ray tube vacuum pressure

#22
20170062179
2017-03-02

Vacuum tube electron microscope

#23
20170054098
2017-02-23

ORGANIC ELECTROLUMINESCENT ELEMENT

#24
20160203947
2016-07-14

Charged particle beam device and charged particle beam device control method

#25
20160181056
2016-06-23

Electron beam window tile having non-uniform cross-sections

#26
20160172152
2016-06-16

Electron microscope having a carrier

#27
20150380208
2015-12-31

Charged particle beam device, method for adjusting charged particle beam device, and method for inspecting or observing sample

#28
20150380204
2015-12-31

Imaging and processing for plasma ion source

#29
20150340198
2015-11-26

Apparatus and method for processing sample, and charged particle radiation apparatus

#30
20150262795
2015-09-17

Vacuum trap

#31
20150214007
2015-07-30

Ion implantation apparatus and method of controlling ion implantation apparatus

#32
20150206710
2015-07-23

Ion implantation device

#33
20150072445
2015-03-12

LITHOGRAPHY APPARATUS AND METHOD OF MANUFACTURING ARTICLE

#34
20150060694
2015-03-05

Charged particle beam device

#35
20150053553
2015-02-26

PLASMA PROCESSING APPARATUS

#36
20150050750
2015-02-19

Plasma processing method and plasma processing apparatus

#37
20140197329
2014-07-17

Ion beam device having gas introduction port disposed on structure maintained at ground potential

#38
20130248112
2013-09-26

Vacuum trap

#39
20130092825
2013-04-18

Ion implantation apparatus and ion implantation method

#40
20120085941
2012-04-12

ION IMPLANTATION APPARATUS AND METHOD

#41
20110197815
2011-08-18

Film deposition apparatus

#42
20100258739
2010-10-14

Charged particle beam apparatus

#43
20100119698
2010-05-13

Electron microscope for inspecting and processing of an object with miniaturized structures and method thereof

#44
20100032576
2010-02-11

Retractable lens-coupled electron microscope camera with image sensor in electron microscope vacuum chamber

#45
20100006756
2010-01-14

CHARGED PARTICLE BEAM APPARATUS AND METHOD FOR GENERATING CHARGED PARTICLE BEAM IMAGE

#46
20100000964
2010-01-07

Method and system for etching a MEM device

#47
20090206275
2009-08-20

ACCELERATOR PARTICLE BEAM APPARATUS AND METHOD FOR LOW CONTAMINATE PROCESSING

#48
20090137087
2009-05-28

Method of manufacturing semiconductor device, film deposition method, and film deposition apparatus

#49
20090095055
2009-04-16

Method for Differentially Pumping Endblock Seal Cavity

#50
20080099674
2008-05-01

Electron microscope for inspecting and processing of an object with miniaturized structures and method thereof

#51
20080078506
2008-04-03

RF Coil Plasma Generation

#52
20080060932
2008-03-13

PUMPING LINE DEVICE OF DRY ETCHING APPARATUS

#53
20080054193
2008-03-06

Ion beam guide tube

#54
20070227883
2007-10-04

SYSTEMS AND METHODS FOR A HELIUM ION PUMP

#55
20070120068
2007-05-31

Charged particle beam apparatus

#56
20070043534
2007-02-22

System and method for electronic diagnostics of a process vacuum environment

#57
20060011866
2006-01-19

High-energy ion implanter and method of operation thereof

#58
20050178966
2005-08-18

Light weight portable scanning electron microscope

#59
20050092940
2005-05-05

Method of controlling implant dosage and pressure compensation factor in-situ

#60
20050092938
2005-05-05

Utilization of an ion gauge in the process chamber of a semiconductor ion implanter

#61
20050053481
2005-03-10

Method for differentially pumping endblock seal cavity

#62
14607079
2018-06-12

Charged-particle beam microscopy