206482 ⎘
Discharge tubes exposing object to beam, e.g. for analysis treatment, etching, imaging; Detection characterized by the detecting means Faraday cages
METHOD FOR SUBSTRATE PROCESSING
#2GRID-LESS ION ENERGY DETECTOR
#3GRID-LESS ION ANGLE DETECTOR
#4ION COLLECTOR FOR USE IN PLASMA SYSTEMS
#5ION BEAM CURRENT MEASUREMENT DEVICE AND ION BEAM IMPLANTATION SYSTEM
#6Closed loop faraday correction of a horizontal beam current profile for uniform current tuning
#7Systems and methods for optimizing full horizontal scanned beam distance
#8Ion collector for use in plasma systems
#9Device and method for measuring electron beam
#10Ion collector for use in plasma systems
#11APPARATUS AND TECHNIQUES FOR BEAM MAPPING IN ION BEAM SYSTEM
#12Ion implantation apparatus and measurement device
#13Apparatus and techniques for beam mapping in ion beam system
#14Assessment and calibration of a high energy beam
#15Ion implantation apparatus and measurement device
#16Systems for controlling a high power ion beam
#17Ion implantation apparatus and semiconductor manufacturing method
#18Measurement of the electric current profile of particle clusters in gases and in a vacuum
#19System and method to improve productivity of hybrid scan ion beam implanters
#20Method of measuring vertical beam profile in an ion implantation system having a vertical beam angle device
#21Micro machined two dimensional faraday collector grid
#22Assessment and calibration of a high energy beam
#23Ion implanter, ion implantation method, and beam measurement apparatus
#24Beam imaging sensor and method for using same
#25Mechanisms for monitoring ion beam in ion implanter system
#26Ion beam measuring device and method of measuring ion beam
#27Electron beam diagnostic system using computed tomography and an annular sensor
#28Lithography apparatus, lithography method, and method of manufacturing article
#29Beam monitoring device, method, and system
#30Beam imaging sensor
#31Dose measurement device for plasma-immersion ion implantation
#32System and method for ion implantation with improved productivity and uniformity
#33Beam monitoring device, method, and system
#34DEVICE AND METHOD FOR ANALYZING THE DENSITY OF A BEAM OF CHARGED PARTICLES
#35ION IMPLANTATION METHOD AND ION IMPLANTER
#36Ion beam tuning
#37Ion beam irradiation system and ion beam irradiation method
#38Electron beam diagnostic system using computed tomography and an annular sensor
#39Faraday cup array integrated with a readout IC and method for manufacture thereof
#40Charged particle beam writing apparatus and optical axis deviation correcting method for charged particle beam
#41Method and apparatus for monitoring leakage current of a faraday cup
#42Integrated optical element and Faraday cup
#43Ion current measurement device
#44Charged particle beam profile measurement
#45Slit disk for modified faraday cup diagnostic for determining power density of electron and ion beams
#46System and method of performing uniform dose implantation under adverse conditions
#47Ion implanters
#48TECHNIQUES FOR MEASURING AND CONTROLLING ION BEAM ANGLE AND DENSITY UNIFORMITY
#49Apparatus for ion beam fabrication
#50Method and system for ion beam profiling
#51Ion implantation apparatus
#52Ion beam diagnostics
#53Magnetic monitoring of a Faraday cup for an ion implanter
#54Miniature modified Faraday cup for micro electron beams
#55Sensor for ion implanter
#56Ion beam current uniformity monitor, ion implanter and related method
#57Ion beam irradiating apparatus and method of adjusting uniformity of a beam
#58Ion beam measuring method and ion implanting apparatus
#59ION BEAM PROFILER
#60Automated faraday sensor test system
#61Beam stop for an ion implanter
#62Determining ion beam parallelism using refraction method
#63Electron beam displacement measuring method, electron beam displacement measuring device, and electron beam recording apparatus
#64Wafer charge monitoring
#65Faraday system integrity determination
#66Method, system, and apparatus for improving doping uniformity in high-tilt ion implantation
#67Faraday cup assembly and method of controlling the same
#68Faraday system and ion implantation apparatus comprising the faraday system
#69Ion beam profiler
#70Ion beam measuring method and ion implanting apparatus
#71Method of measuring ion beam position
#72Electron beam welding method and apparatus
#73Ion beam measurement apparatus and method
#74Process and device for measuring ions
#75Irradiation system ion beam and method to enhance accuracy of irradiation
#76Irradiation system with ion beam
#77Method to increase low-energy beam current in irradiation system with ion beam
#78Trigger probe for determining the orientation of the power distribution of an electron beam
#79Ion implantation monitor system and method thereof
#80Method and device of monitoring and controlling ion beam energy distribution
#81Electron beam diagnostic for profiling high power beams
#82Faraday dose and uniformity monitor for plasma based ion implantation
#83Fast Faraday cup with high bandwidth
#84Ion beam neutral detection