206507 ⎘
Discharge tubes exposing object to beam, e.g. for analysis treatment, etching, imaging; Detection characterised by the variable being measured; Intensity, dose or other characteristics of particle beams or electromagnetic radiation; Beam diagnostics including control of the parameter or property diagnosed Beam profile
FAST BEAM CALIBRATION PROCEDURE FOR BEAMLINE ION IMPLANTER
#2METHOD FOR ION IMPLANTATION UNIFORMITY CONTROL
#3PLASMA ANALYSIS DEVICE, PLASMA ANALYSIS METHOD, AND SUBSTRATE PROCESSING APPARATUS
#4ION ANGLE SENSOR
#5MULTI-BEAM MICROSCOPE AND METHOD FOR OPERATING A MULTI-BEAM MICROSCOPE USING SETTINGS ADJUSTED TO AN INSPECTION SITE
#6Electron gun, electron beam applicator, and method for controlling electron gun
#7FAST BEAM CALIBRATION PROCEDURE FOR BEAMLINE ION IMPLANTER
#8METHOD FOR ION IMPLANTATION UNIFORMITY CONTROL
#9Systems and methods of profiling charged-particle beams
#10Ion beam profiling system and related methods
#11Ion milling device
#12Ion implanter and beam profiler
#13Particle beam profiles for analytic equipment configuration
#14Beam profile determination method and ion beam irradiation apparatus
#15Angled slit design for computed tomographic imaging of electron beams
#16Dual cathode ion source
#17APPARATUS AND TECHNIQUES FOR BEAM MAPPING IN ION BEAM SYSTEM
#18Dual cathode ion source
#19Ion source and ion implantation apparatus
#20Method of obtaining beam deflection shape and method of obtaining arrangement angle of blanking aperture array plate
#21Apparatus and techniques for beam mapping in ion beam system
#22Multi charged particle beam writing apparatus and multi charged particle beam writing method
#23Focused ion beam apparatus
#24Multi charged particle beam writing apparatus and multi charged particle beam writing method
#25Multi charged-particle beam writing apparatus and adjustment method for the same
#26Ion implantation apparatus and semiconductor manufacturing method
#27Apparatus and method for controlling implant process
#28Method of measuring vertical beam profile in an ion implantation system having a vertical beam angle device
#29Beam profiling speed enhancement for scanned beam implanters
#30Ion implantation method and ion implantation apparatus performing the same
#31Ion beam line
#32Method for monitoring ion implantation
#33Electron beam exposure apparatus and method of detecting error using the same
#34Method for determining beam parameters of a charge carrier beam, measuring device, and charge carrier beam device
#35Non-invasive charged particle beam monitor
#36System and method for characterizing focused charged beams
#37Electron beam diagnostic system using computed tomography and an annular sensor
#38Beam monitoring device, method, and system
#39Current regulation method of multiple beams
#40Beam control assembly for ribbon beam of ions for ion implantation
#41Ion beam line
#42Implant method and implanter by using a variable aperture
#43Apparatus for monitoring ion implantation
#44Beam monitoring device, method, and system
#45Apparatus for monitoring ion implantation
#46System and method for ion implantation with improved productivity and uniformity
#47Ion implanting system
#48Ion sources and methods for generating an ion beam with controllable ion current density distribution
#49MANUFACTURING METHOD AND MANUFACTURING APPARATUS FOR SEMICONDUCTOR DEVICE
#50Apparatus for adjusting ion beam by bended bar magnets
#51Technique and apparatus for monitoring ion mass, energy, and angle in processing systems
#52ION IMPLANTATION METHOD AND ION IMPLANTER
#53Method for monitoring ion implantation
#54Ion beam irradiation device and method for suppressing ion beam divergence
#55Ion beam tuning
#56UNIFORMITY CONTROL USING ION BEAM BLOCKERS
#57Implant method and implanter by using a variable aperture
#58Apparatus and system for controlling ion ribbon beam uniformity in an ion implanter
#59Electron beam diagnostic system using computed tomography and an annular sensor
#60Beam control assembly for ribbon beam of ions for ion implantation
#61Use of beam scanning to improve uniformity and productivity of a 2D mechanical scan implantation system
#62System and method for ion implantation with improved productivity and uniformity
#63Apparatus and method for ion beam implantation using scanning and spot beams with improved high dose beam quality
#64Apparatus and method for ion beam implantation using scanning and spot beams
#65Techniques for improving extracted ion beam quality using high-transparency electrodes
#66Ion beam angle calibration and emittance measurement system for ribbon beams
#67Ion implantation with diminished scanning field effects
#68Method and apparatus for controlling beam current uniformity in an ion implanter
#69Defect inspection apparatus, defect inspection method, and semiconductor device manufacturing method
#70Charged particle beam profile measurement
#71Multi-column electron beam exposure apparatus and multi-column electron beam exposure method
#72System and method of controlling broad beam uniformity
#73System and method for reducing particles and contamination by matching beam complementary aperture shapes to beam shapes
#74Method and apparatus for controlling beam current uniformity in an ion implanter
#75Techniques for improved uniformity tuning in an ion implanter system
#76Ion source and ion implantation apparatus
#77Apparatus for measuring beam characteristics and a method thereof
#78Predicting dose repeatability in an ion implantation
#79TECHNIQUES FOR SHAPING AN ION BEAM
#80Ion source, ion implantation apparatus, and ion implantation method
#81Techniques for optical ion beam metrology
#82Ion source and method for operating same
#83Methods and apparatus for assigning a beam intensity profile to a gas cluster ion beam used to process workpieces
#84Apparatus for ion beam fabrication
#85Method and system for ion beam profiling
#86Beam control assembly for ribbon beam of ions for ion implantation
#87Ion beam apparatus having plasma sheath controller
#88Methods of operating an electromagnet of an ion source
#89Method and apparatus of measuring beam current waveforms
#90Ion beam diagnostics
#91Ion implanter
#92Ion implantation apparatus
#93Miniature modified Faraday cup for micro electron beams
#94ION BEAM PROFILER
#95Methods and apparatus for beam density measurement in two dimensions
#96Measurement of critical dimension and quantification of electron beam size at real time using electron beam induced current
#97Ion beam monitoring in an ion implanter using an imaging device
#98Determining ion beam parallelism using refraction method
#99Electron beam displacement measuring method, electron beam displacement measuring device, and electron beam recording apparatus
#100Ion implanation method and device using thereof
#101Method and apparatus which enable high resolution particle beam profile measurement
#102Ion beam profiler
#103Apparatus for measuring a position of an ion beam profiler and a method for its use
#104Technique for uniformity tuning in an ion implanter system
#105Technique for uniformity tuning in an ion implanter system
#106Method of measuring ion beam position
#107Ion beam implant current, spot width and position tuning
#108Charged particle beam detection system
#109Ion implanting apparatus