Patents-Review.com
ClassID:

206574 ⎘

H01J2237/303 - CPC Classification

Classification description:

Discharge tubes exposing object to beam, e.g. for analysis treatment, etching, imaging; Electron or ion beam tubes for processing objects Electron or ion optical systems

Recent Application in this class:
#1
20260045446
2026-02-12

OUTPUT WINDOW UNIT

 #2
20250253125
2025-08-07

SYSTEM AND METHOD FOR MANAGING SOLID PHASE PRECURSORS FOR AN ION IMPLANTATION SYSTEM

 #3
20250232948
2025-07-17

ION BEAM REFLECTOR, SUBSTRATE PROCESSING APPARATUS INCLUDING THE SAME, AND SUBSTRATE PROCESSING METHOD USING THE SAME

 #4
20210066036
2021-03-04

Methods of optical device fabrication using an electron beam apparatus

 #5
20200194218
2020-06-18

Methods of optical device fabrication using an electron beam apparatus

 #6
20200194217
2020-06-18

Ion beam source for optical device fabrication using a segmented ion source having one or more angled surfaces

 #7
20200192028
2020-06-18

Methods of optical device fabrication using an ion beam source

 #8
20200192027
2020-06-18

Electron beam apparatus for optical device fabrication

 #9
20190237291
2019-08-01

Ion milling device, ion source, and ion milling method

 #10
20190155160
2019-05-23

Ebeam universal cutter

 #11
20190153662
2019-05-23

Textiles and methods and systems for producing textiles

 #12
20190122856
2019-04-25

Multi-charged-particle beam writing apparatus

 #13
20190121236
2019-04-25

Cross scan proximity correction with ebeam universal cutter

 #14
20180330911
2018-11-15

Method and apparatus for an imaging system

 #15
20180143526
2018-05-24

Ebeam three beam aperture array

 #16
20170269481
2017-09-21

Cross scan proximity correction with ebeam universal cutter

 #17
20170221671
2017-08-03

Ion milling device, ion source and ion milling method

 #18
20170092473
2017-03-30

IN-SITU PLASMA CLEANING OF PROCESS CHAMBER ELECTROSTATIC ELEMENTS HAVING VARIED GEOMETRIES

 #19
20170084419
2017-03-23

Grid, method of manufacturing the same, and ion beam processing apparatus

 #20
20170077029
2017-03-16

Unidirectional metal on layer with ebeam

 #21
20170076905
2017-03-16

Ebeam three beam aperture array

 #22
20160225577
2016-08-04

Magnetic field fluctuation for beam smoothing

 #23
20160172151
2016-06-16

Apparatus and methods for aberration correction in electron beam based system

 #24
20160155600
2016-06-02

Blanking aperture array device for multi-beams, and fabrication method of blanking aperture array device for multi-beams

 #25
20160042915
2016-02-11

Ion implanter, ion implantation method, and beam measurement apparatus

 #26
20160027610
2016-01-28

Annular cooling fluid passage for magnets

 #27
20160027607
2016-01-28

Plasma ion source for use with a focused ion beam column with selectable ions

 #28
20160013017
2016-01-14

Method and apparatus for a high resolution imaging system

 #29
20150380213
2015-12-31

Apparatus and method for calculating drawing speeds of a charged particle beam

 #30
20150371857
2015-12-24

Lower dose rate ion implantation using a wider ion beam

 #31
20150348740
2015-12-03

Processing apparatus and processing method

 #32
20150340202
2015-11-26

Ion implantation apparatus

 #33
20150318139
2015-11-05

TARGET DEVICE, LITHOGRAPHY APPARATUS, AND ARTICLE MANUFACTURING METHOD

 #34
20150270101
2015-09-24

Method for correcting drift of charged particle beam, and charged particle beam writing apparatus

 #35
20150270099
2015-09-24

Ion beam uniformity control using ion beam blockers

 #36
20150243480
2015-08-27

Charged particle beam exposure apparatus and method of manufacturing semiconductor device

 #37
20150155129
2015-06-04

Ion implantation apparatus

 #38
20150137010
2015-05-21

Multi-electrode stack arrangement

 #39
20150137009
2015-05-21

Multi-electrode cooling arrangement

 #40
20150137003
2015-05-21

SPECIMEN PREPARATION METHOD

 #41
20150136995
2015-05-21

Multi-electrode electron optics

 #42
20150136967
2015-05-21

Deceleration apparatus for ribbon and spot beams

 #43
20150130353
2015-05-14

Arc chamber with multiple cathodes for an ion source

 #44
20150129779
2015-05-14

DRAWING APPARATUS, AND METHOD OF MANUFACTURING ARTICLE

 #45
20150129759
2015-05-14

Inductively-coupled plasma ion source for use with a focused ion beam column with selectable ions

 #46
20150114294
2015-04-30

Processing System

 #47
20150102237
2015-04-16

Techniques for processing a substrate

 #48
20150083928
2015-03-26

Method for determining beam parameters of a charge carrier beam, measuring device, and charge carrier beam device

 #49
20150082556
2015-03-26

Textiles and methods and systems for producing textiles

 #50
20140367587
2014-12-18

Scan head and scan arm using the same

 #51
20140197328
2014-07-17

Ion beam system and method of operating an ion beam system

 #52
20130140450
2013-06-06

Inductively-coupled plasma ion source for use with a focused ion beam column with selectable ions

 #53
20120256098
2012-10-11

Ion beam system and method of operating ion beam system

 #54
20120217042
2012-08-30

DEVICE FOR REFLECTING ACCELERATED ELECTRONS

 #55
20120097861
2012-04-26

Deceleration apparatus for ribbon and spot beams

 #56
20110092059
2011-04-21

Techniques for processing a substrate

 #57
20100024730
2010-02-04

Processing system

 #58
20080224063
2008-09-18

Charged particle optics with azimuthally-varying third-order aberrations for generation of shaped beams

 #59
20080116391
2008-05-22

Charged particle beam orbit corrector and charged particle beam apparatus

 #60
20060061285
2006-03-23

High power, long focus electron source for beam processing

 #61
14086578
2015-01-13

Method for measuring transverse beam intensity distribution