END POINT DETERMINATION BY MEANS OF CONTRAST GAS

ENDPOINTING WITH DETERMINATION OF REMAINING DISTANCE

Method of Automatic Detection of Required Peak for Sample Machining by Focused Ion Beam

IN-SITU ETCH RATE OR DEPOSITION RATE MEASUREMENT SYSTEM

Ion beam device

ION BEAM DELAYERING SYSTEM AND METHOD, AND ENDPOINT MONITORING SYSTEM AND METHOD THEREFOR

Line-based endpoint detection

System and method of preparing integrated circuits for backside probing using charged particle beams

ELECTRON BEAM PVD ENDPOINT DETECTION AND CLOSED-LOOP PROCESS CONTROL SYSTEMS

Measurement and endpointing of sample thickness

Dose-based end-pointing for low-kV FIB milling in TEM sample preparation

Tomography-assisted TEM prep with requested intervention automation workflow

Method and device for permanently repairing defects of absent material of a photolithographic mask

METHOD OF PROCESSING A SURFACE BY MEANS OF A PARTICLE BEAM

Endpointing for focused ion beam processing

Depth-controllable ion milling

Method of cleaning electrostatic chuck

Differential imaging with pattern recognition for process automation of cross sectioning applications

Charged particle beam drawing apparatus and charged particle beam drawing method

Endpointing for focused ion beam processing

Method of reducing the thickness of a target sample

Apparatus for preparing a sample for microscopy

Endpoint determination for capillary-assisted flow control

Endpoint detection for photolithography mask repair

Differential imaging with pattern recognition for process automation of cross sectioning applications

Focused ion beam system, sample processing method using the same, and sample processing program using focused ion beam

Endpoint detection for photolithography mask repair

Dose-based end-pointing for low-kV FIB milling TEM sample preparation

Ion beam device and machining method

Charged particle beam apparatus, and sample processing and observation method

Particle beam device and method for processing and/or analyzing a sample

Measurement and endpointing of sample thickness

SEMICONDUCTOR DEVICE

Sample holder, method for use of the sample holder, and charged particle device

Navigation and sample processing using an ion source containing both low-mass and high-mass species

Micro-sample processing method, observation method and apparatus

Variable-tilt specimen holder and method and for monitoring milling in a charged-particle instrument

Electron induced chemical etching and deposition for local circuit repair

Ion source cleaning end point detection

METHOD FOR PROCESSING AN OBJECT WITH MINIATURIZED STRUCTURES

Method and apparatus for manufacturing magnetic recording media

Electron gun evaporation apparatus and film formation method using the electron gun evaporation apparatus

Forming an image while milling a work piece

Electron microscope for inspecting and processing of an object with miniaturized structures and method thereof

Measurement and endpointing of sample thickness

Method and Apparatus for Treating Workpieces

System and Method of Fabricating Pores in Polymer Membranes

System and method for focused ion beam data analysis

Charged particle source with automated tip formation

CHARGED PARTICLE BEAM APPARATUS, AND SAMPLE PROCESSING AND OBSERVATION METHOD

Focused ion beam processing system and method

Micro-sample processing method, observation method and apparatus

Electron microscope for inspecting and processing of an object with miniaturized structures and method thereof

Method and system for identifying events in FIB

Focused ion beam apparatus and sample section forming and thin-piece sample preparing methods

Electron induced chemical etching and deposition for local circuit repair

Apparatus and method for optical interference fringe based integrated circuit processing

Etching depth measuring device, etching apparatus, and etching depth measuring method

Method and apparatus for manufacturing magnetic recording media

Method and apparatus for preparing specimen

Semiconductor processing method and system

Method and apparatus for the improvement of material/voltage contrast

Charged particle beam apparatus and sample manufacturing method

Charged particle beam apparatus and method of forming electrodes having narrow gap therebetween by using the same

Method and apparatus for the improvement of material/voltage contrast

Method and apparatus for the improvement of material/voltage contrast

Method and apparatus for determining thickness of a semiconductor substrate at the floor of a trench

Film-processing method and film-processing apparatus

Focused ion beam endpoint detection using charge pulse detection electronics

Patterned atomic layer etching and deposition using miniature-column charged particle beam arrays

Precision substrate material removal using miniature-column charged particle beam arrays