206589 ⎘
Discharge tubes exposing object to beam, e.g. for analysis treatment, etching, imaging; Electron or ion beam tubes for processing objects; Controlling tubes; Controlling the beam Beam diameter
METHOD FOR ANALYZING DISTURBING INFLUENCES IN A MULTI-BEAM PARTICLE MICROSCOPE, ASSOCIATED COMPUTER PROGRAM PRODUCT AND MULTI-BEAM PARTICLE MICROSCOPE
#2Systems and methods for optimizing full horizontal scanned beam distance
#3Apparatus and Method for Milling Sample
#4APPARATUS AND TECHNIQUES FOR BEAM MAPPING IN ION BEAM SYSTEM
#5Apparatus and techniques for beam mapping in ion beam system
#6Assessment and calibration of a high energy beam
#7Ion implantation apparatus and ion implantation method
#8In situ beam current monitoring and control in scanned ion implantation systems
#9Assessment and calibration of a high energy beam
#10Lower dose rate ion implantation using a wider ion beam
#11Ion beam dimension control for ion implantation process and apparatus, and advanced process control
#12Ion implantation apparatus
#13Device for spot size measurement at wafer level using a knife edge and a method for manufacturing such a device
#14Current regulation method of multiple beams
#15Ion beam dimension control for ion implantation process and apparatus, and advanced process control
#16Ion implantation method and ion implantation apparatus
#17Method and apparatus for improved uniformity control with dynamic beam shaping
#18Method and apparatus for modifying a ribbon-shaped ion beam
#19Method and apparatus for modifying a ribbon-shaped ion beam
#20Ion beam apparatus and method employing magnetic scanning
#21ELECTRON BEAM LITHOGRAPHY METHOD AND METHOD FOR PRODUCING A MOLD
#22Method and apparatus for controlling beam current uniformity in an ion implanter
#23Implant uniformity control
#24Charged particle beam profile measurement
#25Ion beam apparatus and method employing magnetic scanning
#26Ion implanting apparatus
#27Ion beam apparatus and method for ion implantation
#28Charged particle source with automated tip formation
#29Method and system for multi-pass correction of substrate defects
#30Methods and apparatus for assigning a beam intensity profile to a gas cluster ion beam used to process workpieces
#31Method and system for ion beam profiling
#32Ion implantation apparatus and method of converging/shaping ion beam used therefor
#33ION BEAM PROFILER
#34Electrostatic beam deflection scanner and beam deflection scanning method
#35Charged particle beam exposure apparatus
#36Charged particle beam exposure apparatus
#37Measurement of critical dimension and quantification of electron beam size at real time using electron beam induced current
#38Ion beam monitoring in an ion implanter using an imaging device
#39Determining ion beam parallelism using refraction method
#40Technique for improving uniformity of a ribbon beam
#41Charged particle beam system, semiconductor inspection system, and method of machining sample
#42Ion source and polishing system using the same
#43Ion implanter and ion implantation control method thereof
#44Ion beam profiler
#45Device and method for milling of material using ions
#46Focused ion beam system
#47Irradiation system ion beam and method to enhance accuracy of irradiation
#48Irradiation system with ion beam
#49Method to increase low-energy beam current in irradiation system with ion beam
#50Device and method for milling of material using ions
#51Method for measuring the intensity profile of an electron beam, in particular a beam of an electron-beam machining device, and/or for measuring an optical system for an electron beam and/or for adjusting an optical system for an electron beam, measuring structure for such a method and electron-beam machining device
#52Pattern writing equipment
#53Charged particle beam exposure method, charged particle beam exposure apparatus, and device manufacturing method