206591 ⎘
Discharge tubes exposing object to beam, e.g. for analysis treatment, etching, imaging; Electron or ion beam tubes for processing objects; Controlling tubes; Controlling the beam; Scanning Raster scan
RASTER BEAM WRITING METHOD AND RASTER BEAM WRITING APPARATUS
#2MULTI-BEAM CHARGED PARTICLE MICROSCOPE DESIGN WITH ADAPTIVE DETECTION SYSTEM
#3FAST CLOSED-LOOP CONTROL OF MULTI-BEAM CHARGED PARTICLE SYSTEM
#4METHOD FOR OPERATING A PARTICLE BEAM APPARATUS, COMPUTER PROGRAM PRODUCT AND PARTICLE BEAM APPARATUS FOR CARRYING OUT THE METHOD
#5MULTI-BEAM CHARGED PARTICLE IMAGING SYSTEM WITH IMPROVED IMAGING OF SECONDARY ELECTRON BEAMLETS ON A DETECTOR
#6METHOD FOR DETERMINING A DISTORTION-CORRECTED POSITION OF A FEATURE IN AN IMAGE IMAGED WITH A MULTI-BEAM CHARGED PARTICLE MICROSCOPE, CORRESPONDING COMPUTER PROGRAM PRODUCT AND MULTI-BEAM CHARGED PARTICLE MICROSCOPE
#7COMPENSATION RASTER SCANNING
#8METHOD FOR ANALYZING DISTURBING INFLUENCES IN A MULTI-BEAM PARTICLE MICROSCOPE, ASSOCIATED COMPUTER PROGRAM PRODUCT AND MULTI-BEAM PARTICLE MICROSCOPE
#9MULTI-BEAM GENERATING UNIT WITH INCREASED FOCUSING POWER
#10INSPECTION DEVICE AND INSPECTION METHOD
#11OPTICAL SYSTEM ADJUSTMENT METHOD FOR MULTI CHARGED PARTICLE BEAM APPARATUS AND COMPUTER READABLE RECORDING MEDIUM
#12METHOD FOR PARTICLE BEAM-INDUCED PROCESSING OF A DEFECT OF A MICROLITHOGRAPHIC PHOTOMASK
#13Image acquisition method and electron microscope
#14Writing data generation method, computer-readable recording medium on which program is recorded, and multi-charged particle beam writing apparatus
#15Methods and systems for raster scanning a surface of an object using a particle beam
#16Multiple charged particle beam writing apparatus, and multiple charged particle beam writing method
#17Planarization, densification, and exfoliation of porous materials by high-energy ion beams
#18Ion implantation apparatus and ion implantation method
#19Method for processing and/or for observing an object, and particle beam device for carrying out the method
#20Method for processing and/or for observing an object, and particle beam device for carrying out the method
#21Method and system for E-beam lithography with multi-exposure
#22Method and system for E-beam lithography with multi-exposure
#23Method and apparatus for scanning a surface of an object using a particle beam
#24Sample preparation method and apparatus
#25Methods and systems for raster scanning a surface of an object using a particle beam
#26Ion implantation method and ion implantation apparatus
#27Ion implanter and ion implant method thereof
#28METHOD AND IMPLANTER FOR IMPLANTING A WORKPIECE
#29Throughput Enhancement for Scanned Beam Ion Implanters
#30ION IMPLANTER AND ION IMPLANT METHOD THEREOF
#31Scanning charged particle beams
#32Method and system for counting secondary particles
#33Ion implanter having combined hybrid and double mechanical scan architecture
#34Ion implantation method
#35Charged-particle beam writing apparatus and charged-particle beam writing method
#36Method and system for multi-pass correction of substrate defects
#37Ion implanter having combined hybrid and double mechanical scan architecture
#38Technique for improving ion implantation throughput and dose uniformity
#39Scan pattern for an ion implanter
#40Non-uniform ion implantation
#41Focused ion beam apparatus and sample section forming and thin-piece sample preparing methods
#42Throughput enhancement for scanned beam ion implanters
#43Method of implanting a substrate and an ion implanter for performing the method
#44Ion implanter with variable scan frequency
#45Techniques for reducing effects of photoresist outgassing
#46Techniques for preventing parasitic beamlets from affecting ion implantation
#47Charged particle beam irradiation method and charged particle beam apparatus
#48Ion implanter and ion implantation control method thereof
#49Method of implanting a substrate and an ion implanter for performing the method
#50Beam exposure writing strategy system and method
#51Methods for forming a MRAM with non-orthogonal wiring
#52Method of implanting a substrate and an ion implanter for performing the method
#53System and method for voltage contrast analysis of a wafer
#54Photolithographic techniques for producing angled lines
#55Method of implanting a substrate and an ion implanter for performing the method
#56Ion implantation
#57Charged particle beam irradiation method, method of manufacturing semiconductor device and charged particle beam apparatus
#58Device and method of positionally accurate implantation of individual particles in a substrate surface
#59Photolithographic techniques for producing angled lines
#60Photolithographic techniques for producing angled lines
#61Photolithographic techniques for producing angled lines