206686 ⎘
Discharge tubes exposing object to beam, e.g. for analysis treatment, etching, imaging; Processing objects by plasma generation characterised by the type of processing; Etching; Problems associated with etching control of ion bombardment energy
ETCHING APPARATUS AND ETCHING METHOD
#2GRID-LESS ION ENERGY DETECTOR
#3GRID-LESS ION ANGLE DETECTOR
#4SELECTIVE ETCHING IN SEMICONDUCTOR DEVICES
#5PLASMA PROCESSING SYSTEM, ASSISTANCE DEVICE, ASSISTANCE METHOD, AND ASSISTANCE PROGRAM
#6Systems and Methods for Extracting Process Control Information from Radiofrequency Supply System of Plasma Processing System
#7Semiconductor processing chamber
#8MULTI-STATE RF PULSING IN CYCLING RECIPES TO REDUCE CHARGING INDUCED DEFECTS
#9APPARATUS FOR TREATING SUBSTRATE
#10Systems and methods for extracting process control information from radiofrequency supply system of plasma processing system
#11SEMICONDUCTOR CHAMBER COMPONENTS WITH MULTI-LAYER COATING
#12PLASMA PROCESSING METHOD AND PLASMA PROCESSING APPARATUS
#13METHOD OF MANUFACTURING SEMICONDUCTOR DEVICE, METHOD OF MANUFACTURING STACKED WIRING STRUCTURE, AND ION BEAM IRRADIATION APPARATUS
#14Ion Stratification Using Bias Pulses of Short Duration
#15Low Electron Temperature Etch Chamber with Independent Control Over Plasma Density, Radical Composition Ion Energy for Atomic Precision Etching
#16Low electron temperature etch chamber with independent control over plasma density, radical composition and ion energy for atomic precision etching
#17Etching method and etching apparatus
#18Plasma processing apparatus and plasma processing method
#19Negative ion control for dielectric etch
#20Method for preparing samples for imaging
#21DIELECTRIC WINDOW, ANTENNA AND PLASMA PROCESSING APPARATUS
#22Feature etching using varying supply of power pulses
#23INDUCTIVELY COUPLED SPATIALLY DISCRETE MULTI-LOOP RF-DRIVEN PLASMA SOURCE
#24Plasma processing apparatus
#25Etching apparatus
#26Method for producing contact areas on a semiconductor substrate
#27Plasma processing apparatus
#28Etching method and etching apparatus
#29Plasma processing in a capacitively-coupled reactor with trapezoidal-waveform excitation
#30Negative ion control for dielectric etch
#31Plasma processing apparatus and plasma processing method
#32Plasma processing method and plasma processing apparatus
#33PLASMA ETCHING METHOD AND APPARATUS THEREOF
#34Modulated multi-frequency processing method
#35Plasma processing apparatus
#36Ion stratification using bias pulses of short duration