ClassID:

206692

H01J2237/3382 - CPC Classification

Classification description:

Discharge tubes exposing object to beam, e.g. for analysis treatment, etching, imaging; Processing objects by plasma generation characterised by the type of processing; Changing chemical properties of treated surfaces Polymerising

Recent Application in this class:
#1
20260125574
2026-05-07

COATINGS

#2
20240321571
2024-09-26

INSULATING FILM FORMING METHOD AND SUBSTRATE PROCESSING SYSTEM

#3
20240188208
2024-06-06

A Device and Method For Generating A Plasma Jet

#4
20230065627
2023-03-02

Method for depositing a gap-fill layer by plasma-assisted deposition

#5
20220068618
2022-03-03

Methods of treating a surface of a polymer material by atmospheric pressure plasma

#6
20210384030
2021-12-09

Method for depositing a gap-fill layer by plasma-assisted deposition

#7
20210355341
2021-11-18

COATINGS

#8
20210305026
2021-09-30

Plasma polymerization apparatus and plasma polymerization method using the same

#9
20200343079
2020-10-29

Methods of treating a surface of a polymer material by atmospheric pressure plasma

#10
20190375961
2019-12-12

Coatings

#11
20180171171
2018-06-21

Coatings

#12
20160141152
2016-05-19

METHOD AND SYSTEM FOR MODIFYING A SUBSTRATE USING A PLASMA

#13
20150371834
2015-12-24

Apparatus and Methods for Defining a Plasma

#14
20140374919
2014-12-25

Method for producing contact areas on a semiconductor substrate

#15
20140199544
2014-07-17

Modified polysilazane film and method for producing gas barrier film

#16
20120329287
2012-12-27

Low k porous SiCOH dielectric and integration with post film formation treatment

#17
20090061649
2009-03-05

LOW k POROUS SiCOH DIELECTRIC AND INTEGRATION WITH POST FILM FORMATION TREATMENT

#18
20060166183
2006-07-27

Preparation of coatings through plasma polymerization

#19
20060127598
2006-06-15

Method for providing a coating on the surfaces of a product with an open cell structure throughout its structure and use of such a method