Patents-Review.com
ClassID:

206694 ⎘

H01J2237/3387 - CPC Classification

Classification description:

Discharge tubes exposing object to beam, e.g. for analysis treatment, etching, imaging; Processing objects by plasma generation characterised by the type of processing; Changing chemical properties of treated surfaces Nitriding

Recent Application in this class:
#1
20260024728
2026-01-22

PROCESSING APPARATUS AND PROCESSING METHOD

 #2
20260009124
2026-01-08

FILM FORMING METHOD AND FILM FORMING APPARATUS

 #3
20250385075
2025-12-18

SPLITTER CIRCUIT FOR WAFER PROCESSING SYSTEM

 #4
20250364210
2025-11-27

PECVD TRENCH BOTTOM PROFILE CONTROL WITH PULSED DUAL RF PLASMA

 #5
20250226210
2025-07-10

FILM FORMATION METHOD AND SUBSTRATE PROCESSING APPARATUS

 #6
20240321563
2024-09-26

FILM FORMING APPARATUS

 #7
20240194487
2024-06-13

PLASMA PROCESSING METHOD AND MANUFACTURING METHOD OF SEMICONDUCTOR DEVICE

 #8
20240047180
2024-02-08

SUBSTRATE PROCESSING APPARATUS, METHOD OF PROCESSING SUBSTRATE, METHOD OF MANUFACTURING SEMICONDUCTOR DEVICE AND RECORDING MEDIUM

 #9
20230360932
2023-11-09

METHOD OF FABRICATING AN ELECTRODE STRUCTURE AND APPARATUS FOR FABRICATING THE ELECTRODE STRUCTURE

 #10
20230215702
2023-07-06

UNIFORMITY CONTROL FOR PLASMA PROCESSING USING WALL RECOMBINATION

 #11
20230129976
2023-04-27

IGNITION CONTROLLING METHOD, FILM FORMING METHOD, AND FILM FORMING APPARATUS

 #12
20230127138
2023-04-27

PLASMA PROCESSING WITH TUNABLE NITRIDATION

 #13
20220406572
2022-12-22

Substrate processing method, substrate processing apparatus, and method for producing nanowire or nanosheet transistor

 #14
20210351015
2021-11-11

Nitriding apparatus and nitriding method

 #15
20200091092
2020-03-19

Substrate treatment apparatus, method of manufacturing semiconductor device and workpiece substrate

 #16
20160281207
2016-09-29

Plasma nitriding apparatus

 #17
20160155616
2016-06-02

SUBSTRATE PROCESSING APPARATUS

 #18
20150371832
2015-12-24

Plasma processing apparatus and method of manufacturing semiconductor device

 #19
20130022760
2013-01-24

PLASMA NITRIDING METHOD

 #20
20130017690
2013-01-17

PLASMA NITRIDING METHOD AND PLASMA NITRIDING APPARATUS

 #21
20120251737
2012-10-04

PLASMA-NITRIDING METHOD

 #22
20120184111
2012-07-19

SELECTIVE PLASMA NITRIDING METHOD AND PLASMA NITRIDING APPARATUS

 #23
20110308461
2011-12-22

Electron Beam Enhanced Nitriding System (EBENS)

 #24
20090269940
2009-10-29

Method for nitriding substrate and method for forming insulating film

 #25
20090032143
2009-02-05

ELECTRON BEAM ENHANCED NITRIDING SYSTEM

 #26
20080268657
2008-10-30

Plasma processing method and method for manufacturing an electronic device

 #27
20070099435
2007-05-03

Method and system for forming a nitrided germanium-containing layer using plasma processing

 #28
20070049048
2007-03-01

Method and apparatus for improving nitrogen profile during plasma nitridation

 #29
20060280876
2006-12-14

Method for switching decoupled plasma nitridation processes of different doses

 #30
20050281958
2005-12-22

Electron beam enhanced nitriding system (EBENS)