205207 ⎘
Discharge tubes with provision for introducing objects or material to be exposed to the discharge, e.g. for the purpose of examination or processing thereof; Details; Arrangements of electrodes and associated parts for generating or controlling the discharge, e.g. electron-optical arrangement, ion-optical arrangement Diaphragms; Shields associated with electron or ion-optical arrangements; Compensation of disturbing fields
MULTI-BEAM PARTICLE BEAM SYSTEM HAVING AN ELECTROSTATIC BOOSTER LENS, METHOD FOR OPERATING A MULTI-BEAM PARTICLE BEAM SYSTEM, AND ASSOCIATED COMPUTER PROGRAM PRODUCT
#2ION BEAM SOURCE APPARATUS, ION BEAM PROCESSING SYSTEM, AND ION BEAM PROCESSING METHOD
#3ALIGNMENT OF ELECTRON-OPTICAL ELEMENTS
#4ELECTRON-OPTICAL MODULE
#5HIGH TEMPERATURE ION SOURCE
#6Sample Processing Apparatus and Sample Processing Method
#7COMPENSATOR FOR INTERNAL ELECTROMAGNETIC INTERFERENCE IN SEM-BASED AC PROBING
#8Shield for an Ion Implanter
#9APPARATUS AND METHOD FOR IMPROVED ELECTRON MULTI-BEAM INSPECTION
#10FIELD CURVATURE CORRECTOR FOR USE IN MULTI-ELECTRON-BEAM OPTICAL SYSTEM
#11MULTI-BEAM PARTICLE BEAM SYSTEM AND METHOD FOR OPERATING THE SAME
#12PROTECTING A DETECTOR WHILE DISCHARGING A REGION OF A SAMPLE
#13ULTRA-HIGH SENSITIVITY HYBRID INSPECTION WITH FULL WAFER COVERAGE CAPABILITY
#14ELECTRON-OPTICAL STACK, MODULE, ASSESSMENT APPARATUS, METHOD OF MANUFACTURING AN ELECTRON-OPTICAL STACK
#15SAMPLE INSPECTION SYSTEM
#16ION IMPLANTER AND ION IMPLANTATION METHOD
#17CHARGED PARTICLE OPTICAL DEVICE, ASSESSMENT APPARATUS, METHOD OF ASSESSING A SAMPLE
#18CHARGED PARTICLE BEAM DEVICE
#19ELECTRON GUN AND ELECTRON BEAM WRITING APPARATUS
#20CHARGED PARTICLE BEAM DEVICE
#21ION STRIPPING APPARATUS AND ION IMPLANTATION SYSTEM WITH SELECTABLE STRIPPING GAS SOURCE
#22HIGH TEMPERATURE ION SOURCE
#23MULTI-BEAM CHARGED PARTICLE MICROSCOPE DESIGN WITH ANISOTROPIC FILTERING FOR IMPROVED IMAGE CONTRAST
#24MULTIPLE PARTICLE BEAM SYSTEM WITH PROLONGED MAINTENANCE INTERVAL
#25ION EXTRACTION OPTICS FOR ION PROCESSING SYSTEM
#26STATIC ELECTRCITY CONTROL DEVICE FOR SEMICONDUCTOR PROCESSING SYSTEM
#27MULTI-BEAM PARTICLE MICROSCOPE WITH IMPROVED BEAM TUBE
#28OBJECTIVE LENSES, CHARGED PARTICLE MICROSCOPES INCLUDING THE SAME, AND ASSOCIATED METHODS
#29METHODS FOR DETERMINING THE VIRTUAL SOURCE LOCATION OF A LIQUID METAL ION SOURCE
#30LENS DESIGNS
#31MULTI-BEAM SYSTEM AND MULTI-BEAM FORMING UNIT WITH REDUCED SENSITIVITY TO SECONDARY RADIATION
#32ELECTRON-OPTICAL DEVICE
#33Charged particle beam apparatus
#34PLASMA PROCESSING APPARATUS AND CONTROL METHOD THEREFOR
#35Ion Milling Device
#36FIB AND SEM RESOLUTION ENHANCEMENT USING ASYMMETRIC PROBE DECONVOLUTION
#37VALVES FOR CHARGED PARTICLE BEAM MICROSCOPE, VALVE MEMBER AND CHARGED PARTICLE BEAM MICROSCOPE
#38APPARATUS AND METHOD FOR ANALYSING A SAMPLE BY MEANS OF ELECTRICALLY CHARGED PARTICLES
#39SEMICONDUCTOR MANUFACTURING DEVICE AND CONTROL OF THE SAME
#40MULTI-BEAM PARTICLE MICROSCOPE FOR REDUCING PARTICLE BEAM-INDUCED TRACES ON A SAMPLE
#41MULTI-BEAM SYSTEM AND MULTI-BEAM GENERATING UNIT WITH REDUCED SENSITIVITY TO DRIFT AND DAMAGES
#42FOCUSED ION BEAM SYSTEM
#43FOCUSED ION BEAM DEVICE
#44DETECTOR INSPECTION DEVICE, DETECTOR ASSEMBLY, DETECTOR ARRAY, APPARATUS, AND METHOD
#45HYBRID APPARATUS, SYSTEM AND TECHNIQUES FOR MASS ANALYZED ION BEAM
#46CHARGED-PARTICLE APPARATUS, MULTI-DEVICE APPARATUS, METHOD OF USING CHARGED-PARTICLE APPARATUS AND CONTROL METHOD
#47System and Method for Reducing Particle Formation in a Process Chamber of an Ion Implanter
#48METHOD OF FORMING A MULTIPOLE DEVICE, METHOD OF INFLUENCING AN ELECTRON BEAM, AND MULTIPOLE DEVICE
#49ION GENERATION DEVICE AND ION IMPLANTER
#50METHOD OF OPERATING A PARTICLE BEAM SYSTEM AND COMPUTER PROGRAM PRODUCT
#51Dose Cup Assembly for an Ion Implanter
#52SAMPLE HOLDER AND IMPEDANCE MICROSCOPE
#53MULTI CHARGED PARTICLE BEAM WRITING APPARATUS
#54BEAM DETECTOR, MULTI-CHARGED-PARTICLE-BEAM IRRADIATION APPARATUS, AND ADJUSTMENT METHOD FOR BEAM DETECTOR
#55Apparatus and Method for Fabrication of Shield Plate
#56ION EXTRACTION OPTICS HAVING NOVEL BLOCKER CONFIGURATION
#57MULTI-BEAM GENERATING UNIT WITH INCREASED FOCUSING POWER
#58BEAM DETECTOR, MULTI-CHARGED-PARTICLE-BEAM IRRADIATION APPARATUS, AND ADJUSTMENT METHOD FOR BEAM DETECTOR
#59EBEAM INSPECTION
#60Sample Milling Apparatus, Shield Plate, and Sample Milling Method
#61Mesh Integrity Check
#62IMAGING, PROCESSING, AND/OR ANALYZING AN OBJECT USING A PARTICLE BEAM DEVICE
#63BLANKING APERTURE ARRAY SYSTEM AND MULTI CHARGED PARTICLE BEAM WRITING APPARATUS
#64Mechanism for adjusting angle of incidence on charged particle beam aperture, and charged particle beam device
#65FLOOD COLUMN AND CHARGED PARTICLE APPARATUS
#66Apparatus using charged particle beams
#67Methods for determining the virtual source location of a liquid metal ion source
#68CHARGED PARTICLE TOOL, CALIBRATION METHOD, INSPECTION METHOD
#69PARTICLE BEAM IRRADIATION APPARATUS
#70ELECTRON-OPTICAL ASSEMBLY COMPRISING ELECTROMAGNETIC SHIELDING
#71CHARGED PARTICLE BEAM PATTERN FORMING DEVICE AND CHARGED PARTICLE BEAM APPARATUS
#72Energy Filter, and Energy Analyzer and Charged Particle Beam Device Provided with Same
#73ION IMPLANTER AND ION IMPLANTATION METHOD
#74OBJECTIVE LENS ARRAY ASSEMBLY, ELECTRON-OPTICAL SYSTEM, ELECTRON-OPTICAL SYSTEM ARRAY, METHOD OF FOCUSING, OBJECTIVE LENS ARRANGEMENT
#75DEVICE FOR REDUCING ICE CONTAMINATION OF A SAMPLE, FOCUSED ION BEAM MILLING APPARATUS AND METHOD FOR FOCUSED ION BEAM MILLING OF A SAMPLE
#76MULTI-CHARGED PARTICLE BEAM WRITING APPARATUS, AND MULTI-CHARGED PARTICLE BEAM WRITING METHOD
#77Toroidal motion enhanced ion source
#78Shield for filament in an ion source
#79Systems and methods for real time stereo imaging using multiple electron beams
#80PATTERN INSPECTION APPARATUS, AND METHOD FOR ACQUIRING ALIGNMENT AMOUNT BETWEEN OUTLINES
#81BEAM MANIPULATOR IN CHARGED PARTICLE-BEAM EXPOSURE APPARATUS
#82PARTICLE BEAM SYSTEM
#83Systems and methods of creating multiple electron beams
#84Multi-leaf collimator
#85PARTICLE BEAM SYSTEM WITH MULTI-SOURCE SYSTEM AND MULTI-BEAM PARTICLE MICROSCOPE
#86Beam pattern device having beam absorber structure
#87APERTURE ASSEMBLY, BEAM MANIPULATOR UNIT, METHOD OF MANIPULATING CHARGED PARTICLE BEAMS, AND CHARGED PARTICLE PROJECTION APPARATUS
#88STACK ALIGNMENT TECHNIQUES
#89Multi charged particle beam adjustment method, multi charged particle beam irradiation method, and multi charged particle beam irradiation apparatus
#90Scanning electron microscope device and electron beam inspection apparatus
#91APERTURE BODY, FLOOD COLUMN AND CHARGED PARTICLE TOOL
#92Lens designs
#93Multi charged particle beam writing apparatus
#94Specimen Machining Device and Specimen Machining Method
#95CERTAIN IMPROVEMENTS OF MULTI-BEAM GENERATING AND MULTI-BEAM DEFLECTING UNITS
#96Carbon nanotube device
#97SEMICONDUCTOR APPARATUS AND METHOD OF OPERATING THE SAME
#98Particle beam device having a deflection unit
#99High throughput multi-electron beam system
#100Charged particle beam apparatus, multi-beamlet assembly, and method of inspecting a specimen
#101Sample holder, method for using sample holder, projection amount adjustment jig, projection amount adjustment method and charged particle beam device
#102Multiple charged-particle beam apparatus with low crosstalk
#103ABERRATION CORRECTION IN CHARGED PARTICLE SYSTEM
#104ELECTRON GUN AND ELECTRON BEAM IRRADIATION DEVICE
#105Charged particle beam device
#106Charged particle beam apparatus
#107Electron gun and charged particle beam device equipped with electron gun
#108Charged particle beam system
#109Illumination apertures for extended sample lifetimes in helical tomography
#110CHARGED PARTICLE BEAM APPARATUS
#111Aberration corrector
#112Method of determining an energy width of a charged particle beam
#113ELECTRON SOURCE WITH MAGNETIC SUPPRESSOR ELECTRODE
#114Depositive shielding for fiducial protection from redeposition
#115Particle beam system for azimuthal deflection of individual particle beams and method for azimuth correction in a particle beam system
#116APPARATUS FOR OBTAINING OPTICAL MEASUREMENTS IN A CHARGED PARTICLE APPARATUS
#117CHARGED PARTICLE SOURCE
#118Ion milling apparatus and method of manufacturing sample
#119Pattern inspection apparatus and pattern outline position acquisition method
#120Electromagnetic field shielding plate, method for manufacturing same, electromagnetic field shielding structure, and semiconductor manufacturing environment
#121Apparatus and method for forming a three-dimensional article
#122Beam adjustment method and three-dimensional powder bed fusion additive manufacturing apparatus
#123TUNING APPARATUS FOR MINIMUM DIVERGENCE ION BEAM
#124Focused ion beam processing apparatus
#125Ion milling apparatus
#126Ion milling device
#127Multi-stage vacuum equipment with stages separation controlled by SMA actuator
#128Electron microscope and sample observation method using the same
#129Multi-beam particle beam system and method for operating same
#130High-resolution multiple beam source
#131E-beam apparatus
#132Multibeamlet charged particle device and method
#133Time-of-flight mass spectrometer
#134Charged particle beam device
#135Multi-leaf collimator
#136Multi-source ion beam etch system
#137Pulsed CFE electron source with fast blanker for ultrafast TEM applications
#138Method and device for a carrier proximity mask
#139Liquid metal ion source and focused ion beam apparatus
#140Charged particle beam apparatus
#141Beam irradiation device
#142Aberration corrector and multiple electron beam irradiation apparatus
#143Semiconductor apparatus and method of operating the same
#144Multi-beam particle microscope
#145MULTI-BEAM SCANNING ELECTRON MICROSCOPE
#146Ion milling device
#147Multi-beam charged particle system
#148Multi charged particle beam writing apparatus
#149Multi charged particle beam writing apparatus
#150Device and method for electron transfer from a sample to an energy analyzer and electron spectrometer device
#151Ion implanter
#152ELECTRON BEAM INSPECTION TOOL AND METHOD FOR POSITIONING AN OBJECT TABLE
#153BEAM SPLITTER FOR A CHARGED PARTICLE DEVICE
#154Apparatus using charged particle beams
#155Interferometric electron microscope
#156Multi-beam charged particle system
#157Low emission cladding and ion implanter
#158Charged particle beam device
#159Charged particle beam device, interchangeable multi-aperture arrangement for a charged particle beam device, and method for operating a charged particle beam device
#160Ion source with tailored extraction shape
#161Particle beam system and method for operating a particle beam system
#162Electron diffraction imaging system for determining molecular structure and conformation
#163Charged particle source
#164Multi-electron-beam imaging apparatus with improved performance
#165Repeller, cathode, chamber wall and slit member for ion implanter and ion generating devices including the same
#166Charged particle beam optical system, exposure apparatus, exposure method and device manufacturing method
#167Electron optical system and multi-beam image acquiring apparatus
#168Vacuum condition processing apparatus, system and method for specimen observation
#169Functional membrane for ion beam transmission, beam line device and filter device each having the same, and method of adjusting filter device
#170Charged particle beam device, multi-beam blanker for a charged particle beam device, and method for operating a charged particle beam device
#171Charged particle beam device
#172Multi-beam charged particle imaging apparatus
#173Data processing method, data processing apparatus, and multiple charged-particle beam writing apparatus
#174MULTIPLE ELECTRON BEAM IMAGE ACQUISITION APPARATUS AND MULTIPLE ELECTRON BEAM IMAGE ACQUISITION METHOD
#175Charged particle beam system and method
#176Scanning electron microscope and sample observation method using scanning electron microscope
#177E-beam apparatus
#178Beam irradiation device
#179Two-axis variable width mass resolving aperture with fast acting shutter motion
#180Charged particle beam device
#181Charged particle beam apparatus and sample processing observation method
#182Charged particle beam device
#183Device and method for forming a plurality of charged particle beamlets
#184Accelerator system for mineral component analysis, system and method for mineral component analysis
#185Enhanced electron beam generation
#186Aperture system of electron beam apparatus, electron beam exposure apparatus, and electron beam exposure apparatus system
#187Adjustable Mass Resolving Aperture
#188Transparent halo assembly for reduced particle generation
#189Particle beam system
#190Charged-particle beam apparatus, charged-particle beam writing apparatus, and charged-particle beam controlling method
#191Charged particle source
#192MULTI CHARGED PARTICLE BEAM WRITING APPARATUS
#193Multi charged particle beam writing apparatus and multi charged particle beam writing method
#194Charged particle beam device, charged particle beam influencing device, and method of operating a charged particle beam device
#195Sample holder and electron microscope
#196Multi charged particle beam drawing apparatus and multi charged particle beam drawing method
#197Sample holder unit and sample observation apparatus
#198Particle source for producing a particle beam and particle-optical apparatus
#199Ion milling system
#200Aberration correction in charged particle system
#201Charged particle beam apparatus
#202Charged particle beam apparatus
#203Charged particle beam writing method and charged particle beam writing apparatus
#204Evaluation method, correction method, recording medium and electron beam lithography system
#205Scanning electron microscope
#206Simplified particle emitter and method of operating thereof
#207Temperature control using temperature control element coupled to faraday shield
#208Electron source architecture for a scanning electron microscopy system
#209Method for proactive mitigation of coronal discharge and flash-over events within high voltage x-ray generators used in borehole logging
#210Focused ion beam apparatus
#211Repeller, cathode, chamber wall and slit member for ion implanter and ion generating devices including the same
#212Electrostatic lens, and parallel beam generation device and parallel beam convergence device which use electrostatic lens and collimator
#213Aperture set for multi-beam and multi-charged particle beam writing apparatus
#214Charged particle device, charged particle irradiation method, and analysis device
#215Method for inspecting a specimen and charged particle multi-beam device
#216Electron microscope and image acquisition method
#217Multi-beam optical system adjustment method, and multi-beam exposure apparatus
#218Charged particle beam device for moving an aperture having plurality of openings and sample observation method
#219Multi charged particle beam writing apparatus and method of adjusting the same
#220Fine alignment system for electron beam exposure system
#221Multi charged particle beam writing apparatus and multi charged particle beam writing method
#222Method and device for characterizing an electron beam
#223Particle-optical systems and arrangements and particle-optical components for such systems and arrangements
#224Charged particle filter
#225COMPOSITE CHARGED PARTICLE BEAM APPARATUS
#226High voltage shielding and cooling in a charged particle beam generator
#227Exposure apparatus
#228Board, semiconductor fabrication plant (FAB) and fabrication facility
#229Charged-particle microscope with astigmatism compensation and energy-selection
#230Multi-piece electrode aperture
#231Charged particle beam device, optical device, irradiation method, diffraction grating system, and diffraction grating
#232Evaluation method, correction method, recording medium and electron beam lithography system
#233Housing device for magnetic shielding, housing arrangement for magnetic shielding, charged particle beam device, and method of manufacturing a housing device
#234Particle beam system
#235Charged particle source
#236Charged particle source
#237Charged particle source
#238Charged particle filter
#239Method and system for noise mitigation in a multi-beam scanning electron microscopy system
#240Backscattered electrons (BSE) imaging using multi-beam tools
#241System for imaging a secondary charged particle beam with adaptive secondary charged particle optics
#242Charged particle beam device and detection method using said device
#243Ion milling apparatus and sample processing method
#244Electron beam device
#245Electron microscope and measurement method
#246TEM phase contrast imaging with image plane phase grating
#247Nano-patterned system and magnetic-field applying device thereof
#248System and method for imaging a secondary charged particle beam with adaptive secondary charged particle optics
#249Charged particle beam writing apparatus and charged particle beam writing method
#250Inspection device
#251Adjustable mass resolving aperture
#252Charged particle inspection method and charged particle system
#253Electron microscope
#254Device manufacturing apparatus and manufacturing method of magnetic device using structure to pass ion beam
#255Multi charged particle beam writing apparatus, and multi charged particle beam writing method
#256Electron beam window tile having non-uniform cross-sections
#257Charged particle source
#258Particle-optical systems and arrangements and particle-optical components for such systems and arrangements
#259Conductive interface system between vacuum chambers in a charged particle beam device
#260Method for adjusting charged particle beam device and adjusting beam aperture based on a selected emission condition and charged particle beam device for same
#261Particle-optical systems and arrangements and particle-optical components for such systems and arrangements
#262Beam grid layout
#263Compensation of imaging deviations in a particle-beam writer using a convolution kernel
#264Customizing a particle-beam writer using a convolution kernel
#265Charged-particle beam device for irradiating a charged particle beam on a sample
#266Inspection apparatus
#267Multi-beam tool for cutting patterns
#268Apparatus and Method for Sample Preparation
#269Focusing a charged particle system
#270Observation apparatus and optical axis adjustment method
#271Two-dimensional mass resolving slit mechanism for semiconductor processing systems
#272Cone beam computed tomography volumetric imaging system
#273Charged particle beam device
#274Charged particle lithography system and beam generator
#275Nano-patterned system and magnetic-field applying device thereof
#276Charged particle beam apparatus
#277Scanning electron microscope
#278Charged particle beam apparatus
#279Charged particle inspection method and charged particle system
#280Device for spot size measurement at wafer level using a knife edge and a method for manufacturing such a device
#281Method for imaging a sample in a charged particle apparatus
#282Substrate processing apparatus, etching method of metal film, and manufacturing method of magnetoresistive effect element
#283Charged particle beam apparatus sample holder with magnetic field generating element and sample holding element
#284Inspection apparatus
#285Charged particle beam writing apparatus, aperture unit, and charged particle beam writing method
#286Processing apparatus and shield
#287Adjustable mass resolving aperture
#288Phase plate and electron microscope
#289Focusing a charged particle imaging system
#290Charged particle device
#291Implant method and implanter by using a variable aperture
#292Particle-optical systems and arrangements and particle-optical components for such systems and arrangements
#293Apparatus having a magnetic lens configured to diverge an electron beam
#294System and method for electromagnetic interference shielding for critical dimension-scanning electron microscope
#295Dual-lens-gun electron beam apparatus and methods for high-resolution imaging with both high and low beam currents
#296Charged particle lithography system with intermediate chamber
#297Radiation generating tube, radiation generating unit, and radiation image taking system
#298Electron microscope
#299Switchable multi perspective detector, optics therefor and method of operating thereof
#300Electron beam writing apparatus and electron beam writing method