205241 ⎘
Discharge tubes with provision for introducing objects or material to be exposed to the discharge, e.g. for the purpose of examination or processing thereof; Details Components associated with high voltage supply
SYSTEMS FOR AND METHODS OF IMPROVED PLASMA ENHANCED DEPOSITION, SURFACE MODIFICATION, AND ABATEMENT
#2METHOD AND APPARATUS FOR PREPARING SAMPLES FOR IMAGING
#3MULTI-BEAM PARTICLE MICROSCOPE WITH IMPROVED MULTI-BEAM GENERATOR FOR FIELD CURVATURE CORRECTION AND MULTI-BEAM GENERATOR
#4HIGH POWER GENERATOR AND METHOD OF SUPPLYING HIGH POWER PULSES
#5Method for Magnetron Sputtering
#6High-Voltage Insulating Structure, Charged Particle Gun, and Charged Particle Beam Device
#7METHOD AND APPARATUS FOR PREPARING SAMPLES FOR IMAGING
#8Plasma processing method and plasma processing apparatus
#9DC High-Voltage Source Device and Charged Particle Beam Device
#10Creating Ion Energy Distribution Functions (IEDF)
#11Charged Particle Beam Apparatus
#12HIGH VOLTAGE FEEDTHROUGH AND CONNECTOR FOR A CHARGED PARTICLE APPARATUS
#13High voltage amplifier circuit and analyzer apparatus
#14Common substrate and shadow ring lift apparatus
#15Power supply module and charged particle beam device
#16COMPACT DEVICE FOR PULSED ELECTRIC FIELDS IN A TREATMENT CELL
#17Plasma processing apparatus
#18Charged particle beam device
#19Creating ion energy distribution functions (IEDF)
#20Charged particle beam generator and charged particle beam apparatus
#21Plasma processing method and plasma processing apparatus
#22Plasma etching apparatus and plasma etching method
#23Composite charged particle beam apparatus and control method thereof
#24Creating ion energy distribution functions (IEDF)
#25Electron gun and electron beam application device
#26Nanosecond pulser bias compensation
#27Plasma delivery system for modulated plasma systems
#28Automatic ESC bias compensation when using pulsed DC bias
#29Filament power supply for electron accelerator and electron accelerator
#30Plasma-Treatment Device for Contactlessly Supplying HF Voltage to a Movable Plasma Electrode Unit and Method for Operating Such a Plasma-Treatment Device
#31Creating ion energy distribution functions (IEDF)
#32System and method to monitor glitch energy
#33Method and apparatus for an imaging system
#34Charged particle beam device
#35Creating ion energy distribution functions (IEDF)
#36Charged particle beam device provided with ion pump
#37High voltage electron beam system and method
#38High voltage generation circuit
#39High voltage feedthrough assembly, time-resolved transmission electron microscope and method of electrode manipulation in a vacuum environment
#40Charged particle beam device and installation method
#41Analytical apparatus, sample holder and analytical method
#42Flame-Assisted Flash Sintering
#43Compact, configurable power supply for energizing ozone-producing cells
#44Self cleaning ion generator
#45Method and apparatus for a high resolution imaging system
#46Focused ion beam low kV enhancement
#47RF impedance matching network
#48Charged particle beam generating apparatus, charged particle beam apparatus, high voltage generating apparatus, and high potential apparatus
#49Focused ion beam low kV enhancement
#50Source bushing shielding
#51Insulation structure of high voltage electrodes for ion implantation apparatus
#52X-ray CT apparatus
#53Reducing glitching in an ion implanter
#54Thick-film resistorized ceramic insulators for sealed high voltage tube electrodes
#55Compact, configurable power supply for energizing ozone-producing cells
#56High-voltage supply unit for a particle beam device
#57Glitch control during implantation
#58Device and method for generating a stable high voltage
#59Isolation circuit for transmitting AC power to a high-voltage region
#60Guiding charged droplets and ions in an electrospray ion source
#61TECHNIQUES FOR TERMINAL INSULATION IN AN ION IMPLANTER
#62Charged particle beam apparatus
#63Ion acceleration column connection mechanism with integrated shielding electrode and related methods
#64Method of reducing particle contamination for ion implanters
#65Electron beam system and method of operating the same
#66Charged particle beam apparatus
#67Application of digital frequency and phase synthesis for control of electrode voltage phase in a high-energy ion implantation machine, and a means for accurate calibration of electrode voltage phase
#68Integrated feedthrough for high voltage cables
#69Ion source with multiple configurations
#70System and method of arc detection using dynamic threshold