205254 ⎘
Discharge tubes with provision for introducing objects or material to be exposed to the discharge, e.g. for the purpose of examination or processing thereof; Electron or ion microscopes; Electron or ion diffraction tubes; Reflection microscopes using scanning ray
REFLECTANCE CONFOCAL SCANNING ELECTRON MICROSCOPE AND OPERATING METHOD THEREOF
#2AUTOFOCUS METHOD FOR SINGLE BEAM AND MULTI-BEAM SYSTEMS
#3NON-DESTRUCTIVE SEM-BASED DEPTH-PROFILING OF SAMPLES
#4Arbitrary electron dose waveforms for electron microscopy
#5ANALYSIS SYSTEM, ANALYSIS METHOD, COMPUTER PROGRAM PRODUCT AND SAMPLE HOLDER
#6BEAM ARRAY GEOMETRY OPTIMIZER FOR MULTI-BEAM INSPECTION SYSTEM
#7Arbitrary electron dose waveforms for electron microscopy
#8Arbitrary electron dose waveforms for electron microscopy
#9SYSTEMS, APPARATUS AND METHODS FOR FORMING METAL STRIPS INTO DIES
#10Particle beam system and method for the particle-optical examination of an object
#11Apparatus of plural charged-particle beams
#12SCANNING ELECTRON MICROSCOPE
#13CHARGED PARTICLE BEAM APPARATUS
#14Particle beam system and method for the particle-optical examination of an object
#15Electron channeling pattern acquisition from small crystalline areas
#16Measuring spherical and chromatic aberrations in cathode lens electrode microscopes
#17Composite beam apparatus
#18Apparatus of plural charged-particle beams
#19Particle beam system and method for the particle-optical examination of an object
#20Electron channeling pattern acquisition from small crystalline areas
#21Electron channeling pattern acquisition from small crystalline areas
#22Composite beam apparatus
#23Charged particle beam device
#24Particle beam system and method for the particle-optical examination of an object
#25Apparatus of plural charged-particle beams
#26Electron source
#27Scanning electron microscope
#28MEASUREMENT APPARATUS, MEASUREMENT METHOD, AND MANUFACTURING METHOD OF SEMICONDUCTOR DEVICE
#29Method for imaging wafer with focused charged particle beam in semiconductor fabrication
#30System and method for providing a clean environment in an electron-optical system
#31Cross-section processing-and-observation method and cross-section processing-and-observation apparatus
#32System for inspecting and reviewing a sample
#33Method and apparatus for inspection of scattered hot spot areas on a manufactured substrate
#34Charged particle beam device and charged particle beam device control method
#35Imaging apparatus having a plurality of movable beam columns, and method of inspecting a plurality of regions of a substrate intended to be substantially identical
#36Charged particle beam apparatus and image generation method
#37Apparatus for preparing a sample for microscopy
#38Charged particle beam apparatus
#39Stage apparatus and sample observation apparatus
#40Charged particle beam apparatus
#41Charged particle beam apparatus
#42Charged particle radiation apparatus
#43PATTERN INSPECTION METHOD AND PATTERN INSPECTION APPARATUS
#44System and method for controlling charge-up in an electron beam apparatus
#45Method for detecting information of an electronic potential on a sample and charged particle beam apparatus
#46Method and apparatus for inspection of scattered hot spot areas on a manufactured substrate
#47Method for detecting information of an electric potential on a sample and charged particle beam apparatus
#48Method and apparatus for inspecting pattern defects and mirror electron projection type or multi-beam scanning type electron beam apparatus
#49Inspection system, inspection method, and process management method
#50Inspection system, inspection method, and process management method
#51Charged particle beam substrate inspection using both vector and raster scanning