205258 ⎘
Discharge tubes with provision for introducing objects or material to be exposed to the discharge, e.g. for the purpose of examination or processing thereof; Electron-beam or ion-beam tubes for localised treatment of objects Details
Sub-classes:AUTOMATED CHEMICAL SWITCHING FOR MATERIAL DELAYERING
#2Heated Dynamic Seal Rotary Union for Delivery of Cryogenic Fluid
#3MIXED-GAS SPECIES PLASMA SOURCE SYSTEM
#4FASTENER FOR SECURING FACEPLATE TO ION SOURCE
#5Actively Cooled Gas Line For Ion Source
#6ION BEAM EXTRACTION ELECTRODE, ION SOURCE AND EXTRACTION ELECTRODE STRUCTURE
#7DETECTION USING SEMICONDUCTOR DETECTOR
#8Systems and methods for electron beam focusing in electron beam additive manufacturing
#9Resonator, linear accelerator, and ion implanter having adjustable pickup loop
#10Extended cathode and repeller life by active management of halogen cycle
#11Low-blur electrostatic transfer lens for multi-beam electron gun
#12Systems and methods for electron beam focusing in electron beam additive manufacturing
#13Detection using semiconductor detector
#14Dynamic electron impact ion source
#15Beam position monitor for charged particles passing through a chamber
#16MeV-based ion beam analysis apparatus
#17Implanter calibration
#18POROUS CARBONACEOUS VACUUM CHAMBER LINERS
#19X-ray calibration standard object
#20Liquid metal ion source
#21Ion source and cleaning method thereof
#22Focused ion beam impurity identification
#23LOW EMISSION CLADDING AND ION IMPLANTER
#24ELECTRON BEAM IRRADIATION DEVICE
#25PROCESSING BIOMASS
#26Implanter calibration
#27Electrostatic element having grooved exterior surface
#28Dynamic electron impact ion source
#29Multi-charged-particle-beam writing apparatus and beam evaluating method for the same
#30Methods for acquiring planar view STEM images of device structures
#31Charged particle beam apparatus comprising a controller to set control parameters based on movement of the sample stage
#32Deflection sensitivity calculation method and deflection sensitivity calculation system
#33Ion source and ion implantation apparatus
#34Chamber with flow-through source
#35Ion source and electron source having single-atom termination structure, tip having single-atom termination structure, gas field ion source, focused ion beam apparatus, electron source, electron microscope, mask repair apparatus, and method of manufacturing tip having single-atom termination structure
#36Method of evaluating carbon concentration of silicon sample, method of evaluating silicon wafer manufacturing process, method of manufacturing silicon wafer, method of manufacturing silicon single crystal ingot, silicon single crystal ingot and silicon wafer
#37Processing biomass
#38Electronic beam machining system
#39Lanthanated tungsten ion source and beamline components
#40PROCESSING BIOMASS
#41Chamber with flow-through source
#42Ion generator mounting device
#43Electron-beam lithography method and system
#44Chamber with flow-through source
#45Temperature controlled ion source
#46Ion implantation apparatus and ion implantation method
#47Ion generator device
#48Charged particle instruments
#49Electronic beam machining system
#50Apparatus for modifying surfaces of titanium implants made of titanium alloy
#51METHOD AND APPARATUS FOR ENHANCED LIFETIME AND PERFORMANCE OF ION SOURCE IN AN ION IMPLANTATION SYSTEM
#52LANTHANATED TUNGSTEN ION SOURCE AND BEAMLINE COMPONENTS
#53Board, semiconductor fabrication plant (FAB) and fabrication facility
#54ROTATING ENERGY DEGRADER
#55Ion implanter
#56Temperature controlled ion source
#57Self-cleaning linear ionizing bar and methods therefor
#58Iridium tip, gas field ion source, focused ion beam apparatus, electron source, electron microscope, electron beam applied analysis apparatus, ion-electron multi-beam apparatus, scanning probe microscope, and mask repair apparatus
#59Controlling an ion beam in a wide beam current operation range
#60X-ray calibration standard object
#61DYNAMIC APERTURE FOR THREE-DIMENSIONAL CONTROL OF THIN-FILM DEPOSITION AND ION-BEAM EROSION
#62STORAGE AND SUB-ATMOSPHERIC DELIVERY OF DOPANT COMPOSITIONS FOR CARBON ION IMPLANTATION
#63Ion generator device
#64Ion generator mounting device
#65Electron exit window foil
#66Charged particle beam processing using process gas and cooled surface
#67APPARATUS AND METHOD
#68Processing biomass
#69Ion generator device
#70Multiple gas injection system
#71Ion milling device
#72Ozone supplying apparatus, ozone supplying method, and charged particle beam drawing system
#73Sanitizer
#74Electron beam-induced etching
#75Ion generator mounting device
#76GAS CLUSTER REACTOR FOR ANISOTROPIC FILM GROWTH
#77Gas cluster reactor for anisotropic film growth
#78Ion implantation method and ion implantation apparatus
#79Method for increased target utilization in ion beam deposition tools
#80Semiconductor device manufacturing method and semiconductor manufacturing apparatus
#81Method and apparatus for enhanced lifetime and performance of ion source in an ion implantation system
#82Ion implantation apparatus and method of controlling ion implantation apparatus
#83Formation of an alignment film for a liquid crystal on a substrate
#84Charged particle beam lithography system and target positioning device
#85Plasma source apparatus and methods for generating charged particle beams
#86Multi-electrode stack arrangement
#87Multi-electrode cooling arrangement
#88Multi-electrode electron optics
#89DRAWING APPARATUS, AND METHOD OF MANUFACTURING ARTICLE
#90Particle beam transport apparatus
#91Processing biomass
#92Semiconductor process pumping arrangements
#93Electron exit window foil
#94Device for spot size measurement at wafer level using a knife edge and a method for manufacturing such a device
#95Ion generator mounting device
#96Ion generator device
#97Electron beam-induced etching
#98DRAWING APPARATUS, AND METHOD OF MANUFACTURING ARTICLE
#99Method and apparatus for enhanced lifetime and performance of ion source in an ion implantation system
#100Extended lifetime ion source
#101Flourine and HF Resistant Seals for an Ion Source
#102Charged particle beam drawing apparatus and charged particle beam drawing method
#103Mask cover, charged particle beam drawing apparatus and charged particle beam drawing method
#104Ion source and a method for in-situ cleaning thereof
#105Methods and structures for rapid switching between different process gases in an inductively-coupled plasma (ICP) ion source
#106Insulation structure of high voltage electrodes for ion implantation apparatus
#107Charged particle beam apparatus and sample processing method using charged particle beam apparatus
#108Charged particle lithography system
#109Method for exposing a wafer
#110Deflection scan speed adjustment during charged particle exposure
#111Plasma generator
#112Storage and sub-atmospheric delivery of dopant compositions for carbon ion implantation
#113DRAWING APPARATUS, AND ARTICLE MANUFACTURING METHOD
#114Drawing apparatus, and method of manufacturing article
#115Charged particle beam writing method, computer-readable recording medium, and charged particle beam writing apparatus
#116Pre-aligned nozzle/skimmer
#117Electron-beam device
#118Techniques for improving the performance and extending the lifetime of an ion source
#119Method for ex-situ lift-out specimen preparation
#120Drift correction method and pattern writing data generation method
#121Multiple gas injection system
#122Method and apparatus for ex-situ lift-out specimen preparation
#123Charged particle beam device and sample production method
#124Methods and structures for rapid switching between different process gases in an inductively-coupled plasma (ICP) ion source
#125Method and apparatus for enhanced lifetime and performance of ion source in an ion implantation system
#126Dual pass scanning
#127Processing system
#128Method and apparatus for enhanced lifetime and performance of ion source in an ion implantation system
#129Charged particle beam lithography system and target positioning device
#130Particle-Beam Induced Processing Using Liquid Reactants
#131Gas cluster ion beam system with cleaning apparatus
#132Particle beam transport apparatus and method of transporting a particle beam with small beam spot size
#133Ion implantation through laser fields
#134Ion implanting system
#135PROCESSING BIOMASS
#136PRE-ALIGNED NOZZLE/SKIMMER
#137Charged particle beam lithography system and target positioning device
#138Ion source and a method for in-situ cleaning thereof
#139Device and method for milling of material using ions
#140Device and method for milling of material using ions
#141LUT-based focused ion beam friendly fill-cell design
#142Methods for acquiring planar view stem images of device structures
#143System and tool for manipulating insert