205259 ⎘
Discharge tubes with provision for introducing objects or material to be exposed to the discharge, e.g. for the purpose of examination or processing thereof; Electron-beam or ion-beam tubes for localised treatment of objects; Details Observing the objects or the point of impact on the object
METHOD AND APPARATUS FOR CHARGE COMPENSATION DURING 3D TOMOGRAPHY
#2SYSTEMS, DEVICES, AND METHODS FOR ALIGNING A PARTICLE BEAM AND PERFORMING A NON-CONTACT ELECTRICAL MEASUREMENT ON A CELL AND/OR NON-CONTACT ELECTRICAL MEASUREMENT CELL VEHICLE USING A REGISTRATION CELL
#3METHOD AND APPARATUS FOR PREPARING SAMPLES FOR IMAGING
#4MICROSCOPY IMAGING METHOD AND SYSTEM
#5MACHINING METHOD AND CHARGED PARTICLE BEAM DEVICE
#6CHARGED PARTICLE BEAM DEVICE
#7BEAM ANGLE ROTATION AND SAMPLE ROTATION
#8CONOSCOPIC WAFER ORIENTATION APPARATUS AND ION IMPLANTER INCLUDING SAME
#9Integrated Circuit with FIB-Ready Structures
#10SYSTEMS, DEVICES, AND METHODS FOR ALIGNING A PARTICLE BEAM AND PERFORMING A NON-CONTACT ELECTRICAL MEASUREMENT ON A CELL AND/OR NON-CONTACT ELECTRICAL MEASUREMENT CELL VEHICLE USING A REGISTRATION CELL
#11METHOD OF PREPARING A SAMPLE FOR TRANSMISSION ELECTRON MICROSCOPY (TEM) ANALYSIS
#12ELECTRONIC TWEEZERS
#13Processor System, Correction Method, and Correction Program
#14Fiducial guided cross-sectioning and lamella preparation with tomographic data collection
#15ELECTRONIC TWEEZERS
#16ENHANCED DEPOSITION RATE BY APPLYING A NEGATIVE VOLTAGE TO A GAS INJECTION NOZZLE IN FIB SYSTEMS
#17METHOD AND APPARATUS FOR PREPARING SAMPLES FOR IMAGING
#18Methods and structures for semiconductor device testing
#19Systems, devices, and methods for aligning a particle beam and performing a non-contact electrical measurement on a cell and/or non-contact electrical measurement cell vehicle using a registration cell
#20Tweezers, Conveyance Device, and Method for Conveying Sample Piece
#21Microscopy feedback for improved milling accuracy
#22Method Of Imaging And Milling A Sample
#23FIB delayering endpoint detection by monitoring sputtered materials using RGA
#24Processing an object using a material processing device
#25Microscopy imaging method for 3D tomography with predictive drift tracking for multiple charged particle beams
#26Method and apparatus for detecting discharge site
#27Systems, devices, and methods for aligning a particle beam and performing a non-contact electrical measurement on a cell and/or non-contact electrical measurement cell vehicle using a registration cell
#28Method and system for generating reciprocal space map
#29X-RAY REFERENCE OBJECT, X-RAY DETECTOR, ADDITIVE MANUFACTURING APPARATUS AND METHOD FOR CALIBRATING THE SAME
#30Writing data generating method, multi charged particle beam writing apparatus, pattern inspecting apparatus, and computer-readable recording medium
#31Uniform milling of adjacent materials using parallel scanning fib
#32Line-based endpoint detection
#33Dual beam microscope system for imaging during sample processing
#34Method and system for iteratively cross-sectioning a sample to correlatively targeted sites
#35Methods for aligning a particle beam and performing a non-contact electrical measurement on a cell using a registration cell
#36Particle beam irradiation apparatus
#37Charged particle beam apparatus
#38Inspection apparatus and inspection method
#39Inspection device
#40Writing data generating method, multi charged particle beam writing apparatus, pattern inspecting apparatus, and computer-readable recording medium
#41System and method for spatially resolved optical metrology of an ion beam
#42Method of preparing thin film sample piece and charged particle beam apparatus
#43CHARGED PARTICLE BEAM APPARATUS
#44Fixture for vapor deposition system
#45Charged particle beam apparatus
#46Method and system for cross-sectioning a sample with a preset thickness or to a target site
#47System and method for spatially resolved optical metrology of an ion beam
#48Charged particle beam inspection of ungrounded samples
#49Focusing magnet and charged particle irradiation apparatus
#50Focusing magnet and charged particle irradiation apparatus
#51Sensor characteristic evaluation method and charged particle beam device
#52Charged particle beam apparatus and sample processing observation method
#53Endpointing for focused ion beam processing
#54Method of obtaining beam deflection shape and method of obtaining arrangement angle of blanking aperture array plate
#55Cross section processing observation method and charged particle beam apparatus
#56Depth-controllable ion milling
#57Bi-metal foil for a beam intensity/position monitor, method for determining mass absorption coefficients
#58Method of analyzing surface modification of a specimen in a charged-particle microscope
#59Sample holder system and sample observation apparatus
#60Method for determining the changing location of the point of incidence of an energetic beam on a delimited surface
#61Ion milling device
#62Scanning electron microscope
#63GLANCING ANGLE MILL
#64Microstructure manufacturing method and ION beam apparatus
#65Part temperature measurement device
#66Enhanced FIB-SEM systems for large-volume 3D imaging
#67Substrate alignment detection using circumferentially extending timing pattern
#68Detecting method and detecting equipment therefor
#69Monochromator and charged particle beam apparatus comprising the same
#70Bulk nanofabrication with single atomic plane precision via atomic-level sculpting of crystalline oxides
#71Microscopy imaging method and system
#72Ion beam mill etch depth monitoring with nanometer-scale resolution
#73Apparatus with two or more particle beams for processing a specimen
#74Material removal process for self-aligned contacts
#75Multi charged-particle beam writing apparatus and adjustment method for the same
#76Material removal process for self-aligned contacts
#77Composite charged particle beam apparatus and control method thereof
#78Method and device for characterizing an electron beam
#79Ion implantation apparatus and measurement device
#80High throughput TEM preparation processes and hardware for backside thinning of cross-sectional view lamella
#81Material removal process for self-aligned contacts
#82Multi charged particle beam apparatus, and shape adjustment method of multi charged particle beam image
#83Detecting charged particles
#84Isotope tagging for workpiece authentication
#85Adjustment method for charged particle beam drawing apparatus and charged particle beam drawing method
#86Method of analyzing surface modification of a specimen in a charged-particle microscope
#87Multi-charged particle beam writing apparatus and multi-charged particle beam writing method
#88Method for verifying characteristics of an electron beam
#89Substrate alignment through detection of rotating timing pattern
#90Method for rapid switching between a high current mode and a low current mode in a charged particle beam system
#91Ion beam device and emitter tip adjustment method
#92Method and device for characterizing an electron beam using an X-ray detector with a patterned aperture resolver and patterned aperture modulator
#93Method and device for characterizing an electron beam
#94Ion milling device
#95Method of specimen processing in an apparatus with two or more particle beams and apparatus for this processing
#96Endpointing for focused ion beam processing
#97Semiconductor inspection system and methods of inspecting a semiconductor device using the same
#98Method for monitoring ion implantation
#99Ion implanter, ion implantation method, and beam measurement apparatus
#100Method of fabricating an integrated circuit with a pattern density-outlier-treatment for optimized pattern density uniformity
#101Surface processing apparatus
#102Exposure method using control of settling times and methods of manufacturing integrated circuit devices by using the same
#103Charged particle beam drawing apparatus, information processing apparatus and pattern inspection apparatus
#104Cross-section processing and observation method and cross-section processing and observation apparatus
#105Multidimensional structural access
#106Charged particle beam device and sample preparation method
#107Bulk deposition for tilted mill protection
#108Apparatus and methods for implementing predicted systematic error correction in location specific processing
#109Scanning electron microscope
#110Focused ion beam system and method of making focal adjustment of ion beam
#111Particle beam transport apparatus
#112Automated slice milling for viewing a feature
#113Device for spot size measurement at wafer level using a knife edge and a method for manufacturing such a device
#114Method for imaging a sample in a charged particle apparatus
#115Drawing apparatus, and method of manufacturing article
#116Ion beam sample preparation apparatus and methods
#117Drawing apparatus and method of manufacturing article
#118Focused ion beam system, sample processing method using the same, and sample processing program using focused ion beam
#119Microscopy imaging method and system
#120Cross-section processing and observation method and cross-section processing and observation apparatus
#121SAMPLE PREPARATION APPARATUS, SAMPLE PREPARATION METHOD, AND CHARGED PARTICLE BEAM APPARATUS USING THE SAME
#122Electron beam layer manufacturing using scanning electron monitored closed loop control
#123Composite charged particle beam apparatus and thin sample processing method
#124Ion beam sample preparation apparatus and methods
#125High throughput TEM preparation processes and hardware for backside thinning of cross-sectional view lamella
#126ION MILLING DEVICE
#127Glancing angle mill
#128Composite charged particle beam apparatus
#129Method for checking ion implantation condition and method for manufacturing semiconductor wafer
#130Composite charged-particle-beam apparatus
#131Charged particle beam apparatus, and sample processing and observation method
#132Method for rapid switching between a high current mode and a low current mode in a charged particle beam system
#133Particle beam device and method for processing and/or analyzing a sample
#134Charged particle beam apparatus and film thickness measurement method
#135Method of processing of an object
#136METHOD AND APPARATUS FOR GENERATING THREE-DIMENSIONAL IMAGE DATA
#137CHARGED PARTICLE BEAM MICROSCOPE AND MEASURING METHOD USING SAME
#138Charged particle beam system having multiple user-selectable operating modes
#139METHOD AND SYSTEM FOR PREPARING A LAMELA
#140Gas field ion microscopes having multiple operation modes
#141Navigation and sample processing using an ion source containing both low-mass and high-mass species
#142Charged particle beam processing system with visual and infrared imaging
#143METHOD AND SYSTEM FOR PREPARING A SAMPLE
#144Charged particle beam device and method for correcting position with respect to charged particle beam
#145Automated slice milling for viewing a feature
#146Sample processing and observing method
#147Composite charged particle beam apparatus and sample processing and observing method
#148Particle beam transport apparatus and method of transporting a particle beam with small beam spot size
#149Electron beam layer manufacturing using scanning electron monitored closed loop control
#150Thermal material-processing method
#151Charged particle beam system having multiple user-selectable operating modes
#152Composite focused ion beam device, process observation method using the same, and processing method
#153Composite focused ion beam device, and processing observation method and processing method using the same
#154Method and system for counting secondary particles
#155Device and method for analyzing a sample
#156Method and device for producing an image
#157Composite charged particle beam apparatus, method of processing a sample and method of preparing a sample for a transmission electron microscope using the same
#158Nanotube processing employing solid-condensed-gas-layers
#159System and method for processing an object
#160Methods for sample preparation and observation, charged particle apparatus
#161Patterning by energetically-stimulated local removal of solid-condensed-gas layers and solid state chemical reactions produced with such layers
#162CHARGED PARTICLE BEAM APPARATUS, AND SAMPLE PROCESSING AND OBSERVATION METHOD
#163Methods and systems for measuring a characteristic of a substrate or preparing a substrate for analysis
#164Method and apparatus for simultaneously depositing and observing materials on a target
#165Electron beam physical vapor deposition apparatus and processes for adjusting the feed rate of a target and manufacturing a multi-component condensate free of lamination
#166Method and system for identifying events in FIB
#167Charged-particle beam lithography with grid matching for correction of beam shot position deviation
#168Focused ion beam apparatus and sample section forming and thin-piece sample preparing methods
#169Manufacturing equipment using ION beam or electron beam
#170Patterning by energetically-stimulated local removal of solid-condensed-gas layers and solid state chemical reactions produced with such layers
#171Focused ion beam system and a method of sample preparation and observation
#172Stage assembly, particle-optical apparatus comprising such a stage assembly, and method of treating a sample in such an apparatus
#173Method and apparatus for the improvement of material/voltage contrast
#174Methods for sample preparation and observation, charged particle apparatus
#175Method and apparatus for simultaneously depositing and observing materials on a target
#176Sample milling/observing apparatus and method of observing sample
#177Method of making lamina specimen
#178Method and apparatus for the improvement of material/voltage contrast
#179Apparatus and method for evaluating cross section of specimen
#180Method and apparatus for the improvement of material/voltage contrast
#181Method and apparatus for the improvement of material/voltage contrast
#182Charged particle guide
#183Method and apparatus for determining thickness of a semiconductor substrate at the floor of a trench
#184Methods and systems for measuring a characteristic of a substrate or preparing a substrate for analysis
#185PT COATING INITIATED BY INDIRECT ELECTRON BEAM FOR RESIST CONTACT HOLE METROLOGY
#186Image noise removing method in FIB/SEM complex apparatus
#187Method and apparatus for simultaneously depositing and observing materials on a target
#188Ion beam apparatus and sample processing method
#189Holes tilt angle measurement using FIB diagonal cut
#190End-point detection for similar adjacent materials
#191Systems and methods for interferometric end point detection for a focused ion beam fabrication tool
#192Substrate alignment detection using circumferentially extending timing pattern
#193Alignment and registration targets for charged particle beam substrate patterning and inspection
#194Alignment and registration targets for charged particle beam substrate patterning and inspection
#195Alignment and registration targets for multiple-column charged particle beam lithography and inspection
#196Automatic optimization of etch process for accelerated yield ramp with matched charged particle multi-beam systems