205264 ⎘
Discharge tubes with provision for introducing objects or material to be exposed to the discharge, e.g. for the purpose of examination or processing thereof; Electron-beam or ion-beam tubes for localised treatment of objects; Controlling tubes by external information, e.g. programme control; Programme control Patterning strategy
METHOD AND APPARATUS FOR ELECTRON BEAM EXPOSURE
#2MULTI-CHARGED PARTICLE BEAM WRITING METHOD, MULTI-CHARGED PARTICLE BEAM WRITING APPARATUS, AND NON-TRANSITORY COMPUTER-READABLE STORAGE MEDIUM STORING A PROGRAM
#3Lithography System
#4STAGE SPEED OBTAINING METHOD, MULTIPLE CHARGED PARTICLE BEAM WRITING METHOD, AND METHOD FOR OBTAINING COMBINATION OF STAGE SPEED AND MULTIPLICITY IN MULTIPLE CHARGED PARTICLE BEAM WRITING
#5METHOD FOR GENERATING WRITING DATA, WRITING DATA GENERATION APPARATUS, METHOD OF CHARGED-PARTICLE BEAM WRITING, CHARGED-PARTICLE BEAM WRITING APPARATUS, AND COMPUTER-READABLE RECORDING MEDIUM
#6DRAWING DEVICE AND DRAWING METHOD
#7ELECTRON BEAM WRITING APPARATUS AND ELECTRON BEAM WRITING METHOD
#8CHARGED PARTICLE BEAM DEVICE AND IMAGING METHOD
#9Method and system for determining a charged particle beam exposure for a local pattern density
#10COVERAGE CALCULATING METHOD, CHARGED PARTICLE BEAM WRITING METHOD, COVERAGE CALCULATING DEVICE, CHARGED PARTICLE BEAM WRITING APPARATUS, AND COMPUTER-READABLE STORAGE MEDIUM
#11Correction of Thermal Expansion in a Lithographic Device
#12CHARGED PARTICLE BEAM WRITING METHOD, CHARGED PARTICLE BEAM WRITING APPARATUS, AND COMPUTER-READABLE RECORDING MEDIUM
#13METHOD AND SYSTEM FOR DETERMINING A CHARGED PARTICLE BEAM EXPOSURE FOR A LOCAL PATTERN DENSITY
#14Charged particle beam writing method and charged particle beam writing apparatus
#15FIB delayering endpoint detection by monitoring sputtered materials using RGA
#16CHARGED PARTICLE BEAM WRITING METHOD AND CHARGED PARTICLE BEAM WRITING APPARATUS
#17Pattern data processing for programmable direct-write apparatus
#18Charged particle beam writing method, charged particle beam writing apparatus, and computer-readable recording medium
#19Proximity effect correcting method, master plate manufacturing method, and drawing apparatus
#20Charged particle beam drawing device and method of controlling charged particle beam drawing device
#21Method and system for determining a charged particle beam exposure for a local pattern density
#22Procedural electron beam lithography
#23Multi-charged particle beam writing apparatus and multi-charged particle beam writing method
#24Multi-beam writing method and multi-beam writing apparatus
#25Charged particle beam writing apparatus, charged particle beam writing method, and a non-transitory computer-readable storage medium
#26Settling time determination method and multi charged particle beam writing method
#27Ion implanter irradiating ion mean onto wafer and ion implantation method using the same
#28Multi-beam writing method and multi-beam writing apparatus
#29Method and system for determining a charged particle beam exposure for a local pattern density
#30Adapting the duration of exposure slots in multi-beam writers
#31Bias correction for lithography
#32Multi charged particle beam writing apparatus and multi charged particle beam writing method
#33Charged particle beam device and optical examination device
#34Multi charged particle beam writing apparatus and multi charged particle beam writing method
#35Dummy insertion for improving throughput of electron beam lithography
#36Method of pattern data preparation and method of forming pattern in layer
#37METHOD OF OBTAINING DOSE CORRECTION AMOUNT, CHARGED PARTICLE BEAM WRITING METHOD, AND CHARGED PARTICLE BEAM WRITING APPARATUS
#38Bias correction for lithography
#39Device for controlling additive manufacturing machinery
#40Non-linear dose- and blur-dependent edge placement correction
#41Multiple charged particle beam writing method and apparatus using beams for straddling regions
#42Ebeam universal cutter
#43Charged particle beam writing apparatus and charged particle beam writing method
#44Cross scan proximity correction with ebeam universal cutter
#45Method for irradiating a target using restricted placement grids
#46Dose-related feature reshaping in an exposure pattern to be exposed in a multi beam writing apparatus
#47Charged particle beam writing apparatus and charged particle beam writing method
#48Aperture size modulation to enhance ebeam patterning resolution
#49METHOD AND SYSTEM FOR FORMING PATTERNS USING CHARGED PARTICLE BEAM LITHOGRAPHY WITH VARIABLE PATTERN DOSAGE
#50Data processing method, charged particle beam writing apparatus, and charged particle beam writing system
#51CHARGED PARTICLE BEAM WRITING APPARATUS AND CHARGED PARTICLE BEAM WRITING METHOD
#52Method of creating writing data
#53Multi charged particle beam writing apparatus and adjusting method for multi charged particle beam writing apparatus
#54Device for controlling additive manufacturing machinery
#55Charged particle beam writing method
#56Advanced dose-level quantization of multibeam-writers
#57Charged particle beam lithography apparatus and charged particle beam lithography method
#58Photonic probe for atomic force microscopy
#59Multi charged particle beam exposure method and multi charged particle beam exposure apparatus
#60Electron-beam lithography method and system
#61Ebeam three beam aperture array
#62Multi charged particle beam writing apparatus, and multi charged particle beam writing method
#63Method and system for dimensional uniformity using charged particle beam lithography
#64Charged particle beam apparatus and positional displacement correcting method of charged particle beam
#65Electron beam apparatus and positional displacement correcting method of electron beam
#66Methods, systems and computer program products configured to adjust a critical dimension of reticle patterns used to fabricate semiconductor devices
#67Charged particle beam writing apparatus and charged particle beam writing method
#68Generating method of drawing data and charged particle beam drawing method
#69Bias correction for lithography
#70Systems and methods for rapidly fabricating nanopatterns in a parallel fashion over large areas
#71Multi charged particle beam exposure method, and multi charged particle beam exposure apparatus
#72Method and system for forming a pattern on a reticle using charged particle beam lithography
#73Control device, charged particle beam apparatus, program and method for producing processed product
#74Pattern correction amount calculating apparatus, pattern correction amount calculating method, and storage medium
#75Cross scan proximity correction with ebeam universal cutter
#76Method and System for Forming Patterns Using Charged Particle Beam Lithography with Variable Pattern Dosage
#77Drawing data generating method
#78Data processing method, charged particle beam writing method, and charged particle beam writing apparatus
#79Method for determining the parameters of an IC manufacturing process model
#80Information processing apparatus, information processing method, and storage medium
#81Shaped beam lithography including temperature effects
#82Method of reducing shot count in direct writing by a particle or photon beam
#83Ebeam three beam aperture array
#84DATA COMPRESSION FOR EBEAM THROUGHPUT
#85Charged particle beam lithography apparatus and charged particle beam lithography method
#86Method of preparing a plan-view transmission electron microscope sample used in an integrated circuit analysis
#87Selective processing of a workpiece using ion beam implantation and workpiece rotation
#88Drawing data creation method and charged particle beam drawing apparatus
#89Method for preparing cross-sections by ion beam milling
#90Charged particle beam lithography method and charged particle beam lithography apparatus
#91Charged particle beam writing apparatus and charged particle beam writing method
#92System for manufacturing semiconductor device
#93Method and system for forming patterns using charged particle beam lithography with variable pattern dosage
#94Multi charged particle beam writing apparatus, and multi charged particle beam writing method
#95Charged particle beam drawing apparatus and drawing data generation method
#96Charged particle beam writing apparatus and method for calculating irradiation coefficient
#97Multi-beam writing of pattern areas of relaxed critical dimension
#98Bi-directional double-pass multi-beam writing
#99Method and system for dimensional uniformity using charged particle beam lithography
#100Method and system for forming a pattern on a reticle using charged particle beam lithography
#101Method for generating parameter pattern, ion implantation method and feed forward semiconductor manufacturing method
#102Alignment of multi-beam patterning tool
#103Free form fracturing method for electronic or optical lithography using resist threshold control
#104Method of generating write data for energy beam writing apparatus, method of writing with energy beam, and energy beam writing apparatus
#105System and method for maskless direct write lithography
#106Method for generating writing data
#107Charged particle beam writing apparatus, and charged particle beam writing method
#108Method for ion implantation
#109Drawing apparatus, lithography system, pattern data creation method, drawing method, and method of manufacturing articles
#110Charged particle beam writing apparatus, charged particle beam writing method, and shot correction method of charged particle beam writing method
#111Writing data verification method and multi-charged particle beam writing apparatus
#112Method of generating write data, multi charged particle beam writing apparatus, and pattern inspection apparatus
#113Method for fracturing and forming a pattern using shaped beam charged particle beam lithography
#114Lithography method with combined optimization of the radiated energy and of the geometry applicable to complex shapes
#115Data generating apparatus, energy beam writing apparatus, and energy beam writing method
#116Compensation of imaging deviations in a particle-beam writer using a convolution kernel
#117Customizing a particle-beam writer using a convolution kernel
#118Multi charged particle beam writing method, and multi charged particle beam writing apparatus
#119Method and system for forming patterns using charged particle beam lithography with variable pattern dosage
#120Charged particle beam drawing apparatus
#121Shot data generation method and multi charged particle beam writing method
#122Enhanced stitching by overlap dose and feature reduction
#123Charged particle beam writing apparatus, and charged particle beam writing method
#124Multi charged particle beam writing apparatus and multi charged particle beam writing method
#125Method and apparatus for transferring pixel data for electron beam lithography
#126Electron beam drawing apparatus, electron beam drawing method, and storage medium
#127Free form fracturing method for electronic or optical lithography
#128Multi charged particle beam writing apparatus and multi charged particle beam writing method
#129WRITING DATA CORRECTING METHOD, WRITING METHOD, AND MANUFACTURING METHOD OF MASK OR TEMPLATE FOR LITHOGRAPHY
#130DRAWING DATA GENERATING METHOD, PROCESSING APPARATUS, STORAGE MEDIUM, DRAWING APPARATUS, AND METHOD OF MANUFACTURING ARTICLE
#131Charged particle beam writing apparatus and method utilizing a sum of the weighted area density of each figure pattern
#132Charged particle beam writing method and charged particle beam writing apparatus
#133Method for charged-particle multi-beam exposure
#134Charged particle beam writing apparatus and charged particle beam writing method
#135Electron beam data storage system and method for high volume manufacturing
#136Drawing apparatus, and method of manufacturing article by controlling a plurality of charged particle optical systems based on respective sets of sub-drawing regions
#137Multi charged particle beam writing method, and multi charged particle beam writing apparatus
#138METHOD AND SYSTEM FOR FORMING HIGH ACCURACY PATTERNS USING CHARGED PARTICLE BEAM LITHOGRAPHY
#139Drawing apparatus, and method of manufacturing article
#140Charged particle beam writing apparatus and method for acquiring dose modulation coefficient of charged particle beam
#141Charged particle lithography system
#142Method for exposing a wafer
#143Deflection scan speed adjustment during charged particle exposure
#144Free form fracturing method for electronic or optical lithography
#145Exposure apparatus for forming a reticle
#146Multi charged particle beam writing apparatus and multi charged particle beam writing method
#147Charged particle beam writing apparatus
#148Method and system for forming a pattern on a reticle using charged particle beam lithography
#149Method and system for forming a pattern on a reticle using charged particle beam lithography
#150CHARGED PARTICLE BEAM WRITING APPARATUS AND CHARGED PARTICLE BEAM DOSE CHECK METHOD
#151Method and system for improving critical dimension uniformity using shaped beam lithography
#152Charged particle beam writing apparatus and charged particle beam writing method
#153Providing electron beam proximity effect correction by simulating write operations of polygonal shapes
#154Charged particle beam writing apparatus and irradiation time apportionment method of charged particle beams for multiple writing
#155Electron beam lithography system and method for improving throughput
#156Electron beam lithography system and method for improving throughput
#157Method and apparatus for scanning a surface of an object using a particle beam
#158Preparation of lamellae for TEM viewing
#159Electron beam data storage system and method for high volume manufacturing
#160Charged particle beam lithography apparatus and charged particle beam pattern writing method
#161Method for fracturing and forming a pattern using shaped beam charged particle beam lithography
#162Method and system for forming a pattern using charged particle beam lithography with multiple exposure passes
#163Method and system for forming a pattern using charged particle beam lithography with multiple exposure passes with different dosages
#164Structure and method for E-beam writing
#165Charged particle beam writing apparatus and charged particle beam writing method
#166Method and system for forming high precision patterns using charged particle beam lithography
#167Multiple-grid exposure method
#168Method of and apparatus for evaluating an optimal irradiation amount of an electron beam for drawing a pattern onto a sample
#169Charged particle beam writing apparatus and charged particle beam writing method
#170Charged particle beam drawing method and charged particle beam drawing apparatus
#171DRAWING APPARATUS AND DRAWING METHOD
#172Multi charged particle beam writing apparatus and multi charged particle beam writing method
#173Exposure apparatus for forming a reticle and method of forming a reticle using the same
#174Method and system for charged particle beam lithography
#175Exposure systems for integrated circuit fabrication
#176Methods of forming a photolithography reticle
#177CHARGED PARTICLE BEAM WRITING APPARATUS AND CHARGED PARTICLE BEAM WRITING METHOD
#178Dual pass scanning
#179Method and system for fracturing a pattern using lithography with multiple exposure passes
#180Electron beam lithography system and method for improving throughput
#181Electron beam data storage system and method for high volume manufacturing
#182METHOD AND SYSTEM FOR DESIGN OF A SURFACE TO BE MANUFACTURED USING CHARGED PARTICLE BEAM LITHOGRAPHY
#183Method for compensating proximity effects of particle beam lithography processes
#184Method and system for design of enhanced edge slope patterns for charged particle beam lithography
#185METHOD AND SYSTEM FOR DESIGN OF ENHANCED ACCURACY PATTERNS FOR CHARGED PARTICLE BEAM LITHOGRAPHY
#186METHOD AND SYSTEM FOR FORMING PATTERNS USING CHARGED PARTICLE BEAM LITHOGRAPHY WITH VARIABLE PATTERN DOSAGE
#187METHOD AND SYSTEM FOR FORMING PATTERNS USING CHARGED PARTICLE BEAM LITHOGRAPHY WITH OVERLAPPING SHOTS
#188Charged particle beam writing apparatus and charged particle beam writing method
#189Method and system for feature function aware priority printing
#190Providing electron beam proximity effect correction by simulating write operations of polygonal shapes
#191Pattern forming method
#192Method for resizing pattern to be written by lithography technique, and charged particle beam writing method
#193Charged particle beam writing apparatus and charged particle beam writing method
#194Using beam blockers to perform a patterned implant of a workpiece
#195Method for manufacturing semiconductor device by correcting overlapping shots based on a radiation influenced pattern
#196Method for resizing pattern to be written by lithography technique, and charged particle beam writing method
#197Method for fracturing and forming a pattern using circular characters with charged particle beam lithography
#198Method for fracturing and forming a pattern using curvilinear characters with charged particle beam lithography
#199METHOD AND IMPLANTER FOR IMPLANTING A WORKPIECE
#200Throughput Enhancement for Scanned Beam Ion Implanters
#201Charged particle beam writing apparatus and charged particle beam writing method
#202System and method of electron beam writing
#203Method and system for feature function aware priority printing
#204Method and system for fracturing a pattern using charged particle beam lithography with multiple exposure passes
#205Method and system for fracturing a pattern using charged particle beam lithography with multiple exposure passes which expose different surface area
#206Method and system for fracturing a pattern using charged particle beam lithography with multiple exposure passes having different dosages
#207Method for fracturing and forming a pattern using curvilinear characters with charged particle beam lithography
#208Pattern modification schemes for improved FIB patterning
#209Charged particle beam writing apparatus, charged particle beam writing method and apparatus of processing data for charged particle beam writing
#210Charged particle beam writing apparatus and method thereof
#211Charged particle beam drawing method and apparatus
#212Scanning charged particle beams
#213PHOTOMASK, SEMICONDUCTOR DEVICE, AND CHARGED BEAM WRITING APPARATUS
#214Charged particle beam drawing method and apparatus
#215Method for producing a multi-beam deflector array device having electrodes
#216Pattern forming apparatus and pattern forming method
#217Charged particle beam writing apparatus and method
#218Charged-particle beam writing method and charged-particle beam writing apparatus
#219Electron beam writing method, fine pattern writing system, and manufacturing method of uneven pattern carrying substrate
#220Data generation method for semiconductor device, and electron beam exposure system
#221Charged particle beam writing method
#222Charged particle beam lithography apparatus and charged particle beam lithography method
#223Writing data creation method and charged particle beam writing apparatus
#224Focused ion beam defining process enhancement
#225Electron beam lithography system
#226Writing data processing control apparatus, writing method, and writing apparatus
#227Device manufacturing method, lithographic apparatus and device manufactured thereby
#228Method for resizing pattern to be written by lithography technique, and charged particle beam writing method
#229Irradiation pattern data generation method, mask fabrication method, and plotting system
#230Lithography system and projection method
#231Writing method of charged particle beam, support apparatus of charged particle beam writing apparatus, writing data generating method and program-recorded readable recording medium
#232Non-uniform ion implantation
#233Electron beam lithography apparatus and method for compensating for electron beam misalignment
#234Method for writing a large-area closed curvilinear pattern with a cartesian electron beam writing system
#235Pattern writing and forming method
#236Method of forming pattern writing data by using charged particle beam
#237Pattern area value calculating method, proximity effect correcting method, and charged particle beam writing method and apparatus
#238Method of calculating deflection aberration correcting voltage and charged particle beam writing method
#239Charged particle beam system, semiconductor inspection system, and method of machining sample
#240System and method of electron beam writing
#241Charged particle beam irradiation method and charged particle beam apparatus
#242Charged particle beam writing method and apparatus and readable storage medium
#243Exposure method using complementary divided mask, exposure apparatus, semiconductor device, and method of producing the same
#244Beam exposure writing strategy system and method
#245Creation method and conversion method of charged particle beam writing data, and writing method of charged particle beam
#246Pattern drawing method, stamper manufacturing method, and pattern drawing apparatus
#247Electron beam lithography apparatus, lithography method, lithography program, and manufacturing method of a semiconductor device
#248Method for correcting electron beam exposure data
#249Pattern drawing system, electrically charged beam drawing method, photomask manufacturing method, and semiconductor device manufacturing method
#250Fixed pattern extracting apparatus, pattern writing apparatus, fixed pattern extracting method and recording medium
#251Electron beam lithography apparatus and lithography method
#252Method for eliminating low frequency error sources to critical dimension uniformity in shaped beam writing systems
#253Electron beam control method, electron beam drawing apparatus and method of fabricating a semiconductor device
#254Method of verifying electron beam data
#255Variably shaped beam EB writing system
#256Design pattern data preparing method, mask pattern data preparing method, mask manufacturing method, semiconductor device manufacturing method, and program recording medium
#257Charged particle beam drawing apparatus
#258Method and apparatus for generating exposure data
#259Electron beam writing method and lithography mask manufacturing method
#260Exposure method using complementary divided mask, exposure apparatus, semiconductor device, and method of producing the same
#261Method of exposing using electron beam
#262Charged beam writing method and writing tool
#263Method and system for forming a mask pattern, method of manufacturing a semiconductor device, system forming a mask pattern on data, cell library and method of forming a photomask
#264Method for generating backscattering intensity on the basis of lower layer structure in charged particle beam exposure, and method for fabricating semiconductor device utilizing this method
#265Pattern writing equipment
#266Electron-beam writing device and electron-beam writing method
#267Photo mask, method of manufacturing photo mask, and method of generating mask data
#268End-point detection for similar adjacent materials
#269Method and system for determining a charged particle beam exposure for a local pattern density