ClassID:

205265

H01J37/304 - page 2 - CPC Classification

Classification description:

Discharge tubes with provision for introducing objects or material to be exposed to the discharge, e.g. for the purpose of examination or processing thereof; Electron-beam or ion-beam tubes for localised treatment of objects Controlling tubes by information coming from the objects or from the beam , e.g. correction signals

Recent Application in this class:
#301
20140166896
2014-06-19

Irradiation installation and control method for controlling same

#302
20140131575
2014-05-15

Cross-section processing and observation method and cross-section processing and observation apparatus

#303
20140076717
2014-03-20

Charged particle beam device and sample production method

#304
20140065737
2014-03-06

Ion implantation method and ion implantation apparatus

#305
20140065730
2014-03-06

Implant-induced damage control in ion implantation

#306
20140061167
2014-03-06

Electron beam layer manufacturing using scanning electron monitored closed loop control

#307
20140021655
2014-01-23

DRAWING APPARATUS, TRANSMISSION APPARATUS, RECEIVING APPARATUS, AND METHOD OF MANUFACTURING ARTICLE

#308
20140021373
2014-01-23

BEAMLINE ELECTRODE VOLTAGE MODULATION FOR ION BEAM GLITCH RECOVERY

#309
20140017825
2014-01-16

Ion implantation method and ion implantation apparatus

#310
20140016750
2014-01-16

X-ray imaging apparatus and method for controlling X-ray imaging apparatus

#311
20130330924
2013-12-12

Gas cluster ion beam process for opening conformal layer in a high aspect ratio contact via

#312
20130277552
2013-10-24

CHARGED PARTICLE BEAM DEVICE AND METHOD OF MANUFACTURE OF SAMPLE

#313
20130266894
2013-10-10

CHARGED PARTICLE BEAM DEFLECTION METHOD WITH SEPARATE STAGE TRACKING AND STAGE POSITIONAL ERROR SIGNALS

#314
20130256532
2013-10-03

Ion sources, systems and methods

#315
20130252172
2013-09-26

Multi charged particle beam writing apparatus and multi charged particle beam writing method

#316
20130252145
2013-09-26

Multi charged particle beam writing apparatus utilizing multiple staged mutually orthogonal beam blankers

#317
20130250293
2013-09-26

Method and Apparatus for Actively Monitoring an Inductively-Coupled Plasma Ion Source using an Optical Spectrometer

#318
20130180962
2013-07-18

Methods and systems for raster scanning a surface of an object using a particle beam

#319
20130175446
2013-07-11

Method for preparing lamella

#320
20130157390
2013-06-20

Ion implantation method and ion implantation apparatus

#321
20130146760
2013-06-13

System and method for ion implantation with improved productivity and uniformity

#322
20130134307
2013-05-30

Inductively coupled plasma source as an electron beam source for spectroscopic analysis

#323
20130115723
2013-05-09

Method of manufacturing semiconductor device

#324
20130105710
2013-05-02

Diagnostic method and apparatus for characterization of a neutral beam and for process control therewith

#325
20130092825
2013-04-18

Ion implantation apparatus and ion implantation method

#326
20130069622
2013-03-21

Electron radiation monitoring system to prevent gold spitting and resist cross-linking during evaporation

#327
20130068962
2013-03-21

Drawing apparatus, and article manufacturing method

#328
20130068162
2013-03-21

System and method of dosage profile control

#329
20130042809
2013-02-21

Ion implanter

#330
20130037724
2013-02-14

Charged particle beam drawing apparatus and charged particle beam drawing method

#331
20130035897
2013-02-07

Ion beam incident angle detection assembly and method

#332
20130032714
2013-02-07

Apparatus and method for probe shape processing by ion beam

#333
20130011797
2013-01-10

Charged particle beam drawing apparatus and article manufacturing method

#334
20130001433
2013-01-03

Real time monitoring ion beam

#335
20120229143
2012-09-13

Sensitivity correction method for dose monitoring device and particle beam therapy system

#336
20120190135
2012-07-26

MANUFACTURING METHOD AND MANUFACTURING APPARATUS FOR SEMICONDUCTOR DEVICE

#337
20120187285
2012-07-26

Measurement and endpointing of sample thickness

#338
20120145895
2012-06-14

Method of processing of an object

#339
20120141693
2012-06-07

Ion sources, systems and methods

#340
20120126138
2012-05-24

Charged particle beam drawing apparatus and article manufacturing method using same

#341
20120112323
2012-05-10

Apparatus and method for controlled particle beam manufacturing

#342
20120056088
2012-03-08

Navigation and sample processing using an ion source containing both low-mass and high-mass species

#343
20120009692
2012-01-12

System and method of dosage profile control

#344
20110315899
2011-12-29

Handling beam glitches during ion implantation of workpieces

#345
20110297842
2011-12-08

Ion beam irradiation system and ion beam irradiation method

#346
20110255388
2011-10-20

Pattern writing system and method and abnormality diagnosing method

#347
20110251713
2011-10-13

Defect analyzer

#348
20110240853
2011-10-06

Ion sources, systems and methods

#349
20110240847
2011-10-06

Transmission energy contamination detector

#350
20110240607
2011-10-06

Raster methodology, apparatus and system for electron beam layer manufacturing using closed loop control

#351
20110233414
2011-09-29

Method and device for monitoring the intensity of an electron beam

#352
20110215262
2011-09-08

Method for improving implant uniformity during photoresist outgassing

#353
20110210263
2011-09-01

Particle beam transport apparatus and method of transporting a particle beam with small beam spot size

#354
20110193576
2011-08-11

Electron radiation monitoring system to prevent gold spitting and resist cross-linking during evaporation

#355
20110155929
2011-06-30

Apparatus and system for controlling ion ribbon beam uniformity in an ion implanter

#356
20110114853
2011-05-19

Electron beam apparatus

#357
20110114839
2011-05-19

Electron beam layer manufacturing using scanning electron monitored closed loop control

#358
20110073777
2011-03-31

Ion beam incident angle detection assembly and method

#359
20110068281
2011-03-24

Charged particle beam drawing apparatus and proximity effect correction method thereof

#360
20110057114
2011-03-10

Electron beam lithography apparatus and electron beam lithography method

#361
20110042578
2011-02-24

Ion beam monitoring arrangement

#362
20110017927
2011-01-27

Variable-tilt specimen holder and method and for monitoring milling in a charged-particle instrument

#363
20110012034
2011-01-20

Manufacturing method of semiconductor device, method for controlling ion beam, and ion implantation apparatus

#364
20100306721
2010-12-02

Write error verification method of writing apparatus and creation apparatus of write error verification data for writing apparatus

#365
20100297362
2010-11-25

METHOD FOR PROCESSING AN OBJECT WITH MINIATURIZED STRUCTURES

#366
20100263590
2010-10-21

Vapor Deposition Electron Beam Current Control

#367
20100260410
2010-10-14

Closed-loop process control for electron beam freeform fabrication and deposition processes

#368
20100247807
2010-09-30

Electron gun evaporation apparatus and film formation method using the electron gun evaporation apparatus

#369
20100243889
2010-09-30

Forming an image while milling a work piece

#370
20100200775
2010-08-12

Real Time Monitoring Ion Beam

#371
20100200768
2010-08-12

Techniques for improving extracted ion beam quality using high-transparency electrodes

#372
20100193686
2010-08-05

Electron beam exposure or system inspection or measurement apparatus and its method and height detection apparatus

#373
20100155624
2010-06-24

Focused ion beam apparatus, sample processing method using the same, and computer program for focused ion beam processing

#374
20100119698
2010-05-13

Electron microscope for inspecting and processing of an object with miniaturized structures and method thereof

#375
20100116977
2010-05-13

Measurement and endpointing of sample thickness

#376
20100098922
2010-04-22

APPARATUS AND METHOD FOR CONTROLLED PARTICLE BEAM MANUFACTURING

#377
20100096361
2010-04-22

Methods and apparatus for sensing unconfinement in a plasma processing chamber

#378
20100093113
2010-04-15

Semiconductor manufacturing apparatus

#379
20100038553
2010-02-18

System and method of beam energy identification for single wafer ion implantation

#380
20100026161
2010-02-04

Method of controlling electron beam focusing of pierce-type electron gun and control apparatus therefor

#381
20100025597
2010-02-04

ION IMPLANTING DEVICE AND METHOD

#382
20100019141
2010-01-28

ENERGY CONTAMINATION MONITOR WITH NEUTRAL CURRENT DETECTION

#383
20100012861
2010-01-21

Method and apparatus for measurement of beam angle in ion implantation

#384
20090321657
2009-12-31

System and method of controlling broad beam uniformity

#385
20090289196
2009-11-26

Deflection signal compensation for charged particle beam

#386
20090289191
2009-11-26

Ultra high precision measurement tool with control loop

#387
20090272918
2009-11-05

System and method of performing uniform dose implantation under adverse conditions

#388
20090242808
2009-10-01

Techniques for improved uniformity tuning in an ion implanter system

#389
20090230303
2009-09-17

Defect analyzer

#390
20090206273
2009-08-20

Apparatus for measuring beam characteristics and a method thereof

#391
20090200492
2009-08-13

Ion implantation method and apparatus

#392
20090200491
2009-08-13

Ion implantation method and apparatus

#393
20090189066
2009-07-30

Ion implantation device control method, control system thereof, control program thereof, and ion implantation device

#394
20090179161
2009-07-16

Ion sources, systems and methods

#395
20090162953
2009-06-25

Predicting dose repeatability in an ion implantation

#396
20090140165
2009-06-04

Method and apparatus for controlling a gas cluster ion beam formed from a gas mixture

#397
20090135240
2009-05-28

System and method for focused ion beam data analysis

#398
20090134327
2009-05-28

Defect recognizing method, defect observing method, and charged particle beam apparatus

#399
20090121160
2009-05-14

Charged particle source with automated tip formation

#400
20090121122
2009-05-14

TECHNIQUES FOR MEASURING AND CONTROLLING ION BEAM ANGLE AND DENSITY UNIFORMITY

#401
20090090876
2009-04-09

Implant beam utilization in an ion implanter

#402
20090084759
2009-04-02

Method and system for multi-pass correction of substrate defects

#403
20090084672
2009-04-02

Method and system for adjusting beam dimension for high-gradient location specific processing

#404
20090078883
2009-03-26

Techniques for optical ion beam metrology

#405
20090058437
2009-03-05

Method and apparatus for reviewing defects by detecting images having voltage contrast

#406
20090039260
2009-02-12

Charged particle beam apparatus

#407
20090037015
2009-02-05

Method and system for increasing throughput during location specific processing of a plurality of substrates

#408
20090014725
2009-01-15

Ion doping apparatus, ion doping method, semiconductor device and method of fabricating semiconductor device

#409
20090001293
2009-01-01

Charged particle beam writing method

#410
20080315130
2008-12-25

Focused ion beam processing system and method

#411
20080315112
2008-12-25

Charged particle beam deflection method with separate stage tracking and stage positional error signals

#412
20080302979
2008-12-11

Working method by focused ion beam and focused ion beam working apparatus

#413
20080296472
2008-12-04

Dosage accuracy monitoring systems of implanters

#414
20080283778
2008-11-20

Apparatus for ion beam fabrication

#415
20080283777
2008-11-20

In-situ high-resolution light-optical channel for optical viewing and surface processing in parallel with charged particle (FIB and SEM) techniques

#416
20080265866
2008-10-30

Method and system for ion beam profiling

#417
20080251737
2008-10-16

Ion implantation apparatus

#418
20080251734
2008-10-16

Ion implantation apparatus and method of converging/shaping ion beam used therefor

#419
20080251713
2008-10-16

Ion implantation apparatus and ion implantation method

#420
20080245957
2008-10-09

TUNING AN ION IMPLANTER FOR OPTIMAL PERFORMANCE

#421
20080223409
2008-09-18

METHOD AND APPARATUS FOR EXTENDING EQUIPMENT UPTIME IN ION IMPLANTATION

#422
20080217553
2008-09-11

Focusing method of charged particle beam and astigmatism adjusting method of charged particle

#423
20080191154
2008-08-14

Ion implanting apparatus and method for implanting ions

#424
20080173828
2008-07-24

Ion implantation device and method for implanting ions

#425
20080173811
2008-07-24

Method and apparatus of measuring beam current waveforms

#426
20080169435
2008-07-17

Ion beam monitoring arrangement

#427
20080166822
2008-07-10

Semiconductor manufacturing apparatus

#428
20080160171
2008-07-03

Electron beam physical vapor deposition apparatus and processes for adjusting the feed rate of a target and manufacturing a multi-component condensate free of lamination

#429
20080157074
2008-07-03

Method to measure ion beam angle

#430
20080135776
2008-06-12

Magnetic monitoring of a Faraday cup for an ion implanter

#431
20080135753
2008-06-12

Ion implanter

#432
20080129209
2008-06-05

Adaptive controller for ion source

#433
20080128621
2008-06-05

Use of ion induced luminescence (IIL) as feedback control for ion implantation

#434
20080111084
2008-05-15

Column simultaneously focusing a particle beam and an optical beam

#435
20080111069
2008-05-15

Determining dopant information

#436
20080099674
2008-05-01

Electron microscope for inspecting and processing of an object with miniaturized structures and method thereof

#437
20080078957
2008-04-03

Methods for beam current modulation by ion source parameter modulation

#438
20080078954
2008-04-03

Beam line architecture for ion implanter

#439
20080078953
2008-04-03

Technique for improving ion implantation throughput and dose uniformity

#440
20080078952
2008-04-03

Technique for improving ion implantation based on ion beam angle-related information

#441
20080078933
2008-04-03

Electron beam exposure or system inspection or measurement apparatus and its method and height detection apparatus

#442
20080073583
2008-03-27

ION BEAM APPARATUS AND METHOD FOR ALIGNING SAME

#443
20080073581
2008-03-27

Ion beam irradiating apparatus and method of adjusting uniformity of a beam

#444
20080073580
2008-03-27

Method and system for identifying events in FIB

#445
20080073579
2008-03-27

Ion beam measuring method and ion implanting apparatus

#446
20080073575
2008-03-27

Scan pattern for an ion implanter

#447
20080073569
2008-03-27

Mask position detection

#448
20080073553
2008-03-27

ION BEAM PROFILER

#449
20080067444
2008-03-20

Ion beam scanning control methods and systems for ion implantation uniformity

#450
20080067442
2008-03-20

Beam angle adjustment in ion implanters

#451
20080067441
2008-03-20

Charged-particle beam lithography with grid matching for correction of beam shot position deviation

#452
20080067435
2008-03-20

Beam tuning with automatic magnet pole rotation for ion implanters

#453
20080067433
2008-03-20

System and method of ion beam control in response to a beam glitch

#454
20080067412
2008-03-20

Ion source

#455
20080067403
2008-03-20

Charged particle beam exposure apparatus

#456
20080067402
2008-03-20

Charged particle beam exposure apparatus

#457
20080067338
2008-03-20

Charged particle beam lithography system and method for evaluating the same

#458
20080061250
2008-03-13

Ion beam monitoring in an ion implanter using an imaging device

#459
20080018460
2008-01-24

Manufacturing equipment using ION beam or electron beam

#460
20080011963
2008-01-17

Charged particle beam apparatus and charged particle beam resolution measurement method

#461
20080006778
2008-01-10

Lithography system and lithography method using the same

#462
20080006777
2008-01-10

LITHOGRAPHY SYSTEM AND ERROR DETECTION METHOD IN SAME

#463
20070296343
2007-12-27

Electron beam generator for multiple columns

#464
20070284695
2007-12-13

Apparatus and method for controlled particle beam manufacturing

#465
20070284538
2007-12-13

Apparatus and method for controlled particle beam manufacturing

#466
20070284537
2007-12-13

Apparatus and method for controlled particle beam manufacturing

#467
20070284527
2007-12-13

Apparatus and method for controlled particle beam manufacturing

#468
20070278428
2007-12-06

Apparatus and method for controlled particle beam manufacturing

#469
20070278427
2007-12-06

Closed loop dose control for ion implantation

#470
20070278419
2007-12-06

Apparatus and method for controlled particle beam manufacturing

#471
20070278418
2007-12-06

Apparatus and method for controlled particle beam manufacturing

#472
20070262272
2007-11-15

Semiconductor mask correcting device and semiconductor mask correcting method

#473
20070259511
2007-11-08

Method of implanting a substrate and an ion implanter for performing the method

#474
20070257210
2007-11-08

Preventing dosage drift with duplicate dose integrators

#475
20070241276
2007-10-18

Ion beam contamination determination

#476
20070235659
2007-10-11

Method and device for aligning a charged particle beam column

#477
20070228292
2007-10-04

Adjusting device of an apparatus for generating a beam of charged particles

#478
20070222464
2007-09-27

Method and apparatus for reviewing defects by detecting images having voltage contrast

#479
20070191036
2007-08-16

Charged particle beam device

#480
20070152169
2007-07-05

Move mechanism for moving target object and charged particle beam writing apparatus

#481
20070152150
2007-07-05

Charged particle beam apparatus

#482
20070145298
2007-06-28

Ion beam angle measurement systems and methods for ion implantation systems

#483
20070138412
2007-06-21

Ion beam angle measurement systems and methods employing varied angle slot arrays for ion implantation systems

#484
20070125956
2007-06-07

Particle-optical projection system

#485
20070120078
2007-05-31

Method and apparatus of measuring pattern dimension and controlling semiconductor device process having an error revising unit

#486
20070120075
2007-05-31

Beam current stabilization utilizing gas feed control loop

#487
20070120073
2007-05-31

Ion implanation method and device using thereof

#488
20070114456
2007-05-24

Ion implanter and ion implantation control method thereof

#489
20070114454
2007-05-24

Charged particle beam scan and irradiation method, charged particle beam apparatus, workpiece observation method and workpiece processing method

#490
20070114434
2007-05-24

Multi-pixel electron microbeam irradiator systems and methods for selectively irradiating predetermined locations

#491
20070069158
2007-03-29

Charged particle beam apparatus

#492
20070069151
2007-03-29

Beam exposure correction system and method

#493
20070067131
2007-03-22

Defect analyzer

#494
20070045569
2007-03-01

Ion implant beam angle integrity monitoring and adjusting

#495
20070045560
2007-03-01

Charged particle beam apparatus

#496
20070045534
2007-03-01

Apparatus and method for controlled particle beam manufacturing

#497
20070045228
2007-03-01

Etching depth measuring device, etching apparatus, and etching depth measuring method

#498
20070034797
2007-02-15

Electron beam apparatus, and inspection instrument and inspection process thereof

#499
20070029506
2007-02-08

Systems, control subsystems, and methods for projecting an electron beam onto a specimen

#500
20070023654
2007-02-01

Charged particle beam application system

#501
20060289798
2006-12-28

Methods and apparatus for ion beam angle measurement in two dimensions

#502
20060289781
2006-12-28

Method and apparatus for applying charged particle beam

#503
20060289754
2006-12-28

Charged particle beam apparatus

#504
20060289753
2006-12-28

Charged particle beam apparatus

#505
20060284114
2006-12-21

Technique for uniformity tuning in an ion implanter system

#506
20060266957
2006-11-30

Technique for uniformity tuning in an ion implanter system

#507
20060255295
2006-11-16

Method and apparatus for preparing specimen

#508
20060255284
2006-11-16

Deflection signal compensation for charged particle beam

#509
20060255270
2006-11-16

Semiconductor processing method and system

#510
20060219955
2006-10-05

Method of measuring ion beam position

#511
20060219954
2006-10-05

Methods and apparatus for glitch recovery in stationary-beam ion implantation process using fast ion beam control

#512
20060219953
2006-10-05

Subsurface imaging using an electron beam

#513
20060208203
2006-09-21

Technique for ion beam angle process control

#514
20060208202
2006-09-21

Technique for ion beam angle spread control

#515
20060197017
2006-09-07

Information acquisition apparatus, cross section evaluating apparatus, cross section evaluating method, and cross section working apparatus

#516
20060192143
2006-08-31

Charged particle beam lithography apparatus and method

#517
20060192142
2006-08-31

Ion implanter, and angle measurement apparatus and beam divergence measurement apparatus for ion implanter

#518
20060192118
2006-08-31

Sample height regulating method, sample observing method, sample processing method and charged particle beam apparatus

#519
20060169927
2006-08-03

Aberration adjusting method, device fabrication method, and charged particle beam lithography machine

#520
20060169922
2006-08-03

Ion implant ion beam parallelism and direction integrity determination and adjusting

#521
20060169898
2006-08-03

Aberration measuring apparatus for charged particle beam optical system, charged particle beam lithography machine having the aberration measuring apparatus, and device fabrication method using the apparatus

#522
20060157341
2006-07-20

Method of making lamina specimen

#523
20060151721
2006-07-13

Electron beam drawing apparatus, deflection amplifier, deflection control device, electron beam drawing method, method of manufacturing semiconductor device, and electron beam drawing program

#524
20060151712
2006-07-13

Focusing apparatus and lithography system using the same

#525
20060151710
2006-07-13

Exposure device, exposure method, and semiconductor device manufacturing method

#526
20060138359
2006-06-29

Charged-particle beam exposure apparatus and method

#527
20060138353
2006-06-29

Ion-implanting apparatus, ion-implanting method, and device manufactured thereby

#528
20060116858
2006-06-01

Projection electron beam lithography apparatus and method employing an estimator

#529
20060113492
2006-06-01

Wafer charge compensation device and ion implantation system having the same

#530
20060108544
2006-05-25

Power sag detection and control in ion implanting system

#531
20060097198
2006-05-11

Column simultaneously focusing a particle beam and an optical beam

#532
20060097196
2006-05-11

Dose uniformity during scanned ion implantation

#533
20060097195
2006-05-11

Apparatus and methods for two-dimensional ion beam profiling

#534
20060063078
2006-03-23

Exposure parameter obtaining method, exposure parameter evaluating method, semiconductor device manufacturing method, charged beam exposure apparatus, and method of the same

#535
20060057303
2006-03-16

Controlled dose ion implantation

#536
20060038137
2006-02-23

Charged particle beam apparatus and method of forming electrodes having narrow gap therebetween by using the same

#537
20060033045
2006-02-16

Ion beam measurement systems and methods for ion implant dose and uniformity control

#538
20060027765
2006-02-09

Device for controlling an apparatus generating a charged particle beam

#539
20060022138
2006-02-02

Electron beam apparatus, and inspection instrument and inspection process thereof

#540
20060006346
2006-01-12

Device and method for measurement of beam angle and divergence

#541
20050263721
2005-12-01

Uniformity control multiple tilt axes, rotating wafer and variable scan velocity

#542
20050258379
2005-11-24

Uniformity control using multiple fixed wafer orientations and variable scan velocity

#543
20050242299
2005-11-03

Diagnostic system for profiling micro-beams

#544
20050242286
2005-11-03

Electron beam apparatus and method with surface height calculator and a dual projection optical unit

#545
20050224725
2005-10-13

System and method for proximity effect correction in imaging systems

#546
20050218345
2005-10-06

Ion implantation apparatus and method

#547
20050212440
2005-09-29

Field emission gun and electron beam instruments

#548
20050201246
2005-09-15

Particle-optical projection system

#549
20050196712
2005-09-08

Film-processing method and film-processing apparatus

#550
20050191409
2005-09-01

Ion beam monitoring arrangement

#551
20050189500
2005-09-01

Modulating ion beam current

#552
20050184257
2005-08-25

Characterizing an electron beam treatment apparatus

#553
20050181584
2005-08-18

Ion implantation

#554
20050173650
2005-08-11

Method for measuring the intensity profile of an electron beam, in particular a beam of an electron-beam machining device, and/or for measuring an optical system for an electron beam and/or for adjusting an optical system for an electron beam, measuring structure for such a method and electron-beam machining device

#555
20050133737
2005-06-23

Ion implanting apparatus and ion implanting method using the same

#556
20050133728
2005-06-23

Method and system for in-situ calibration of a dose controller for ion implantation

#557
20050116182
2005-06-02

Method of measuring pattern dimension and method of controlling semiconductor device process

#558
20050109956
2005-05-26

Precise, in-situ endpoint detection for charged particle beam processing

#559
20050095800
2005-05-05

Method of calculating a pressure compensation recipe for a semiconductor wafer implanter

#560
20050092939
2005-05-05

Fault detection and control methodologies for ion implantation processes, and system for performing same

#561
20050088099
2005-04-28

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