205265 ⎘
Discharge tubes with provision for introducing objects or material to be exposed to the discharge, e.g. for the purpose of examination or processing thereof; Electron-beam or ion-beam tubes for localised treatment of objects Controlling tubes by information coming from the objects or from the beam , e.g. correction signals
Irradiation installation and control method for controlling same
#302Cross-section processing and observation method and cross-section processing and observation apparatus
#303Charged particle beam device and sample production method
#304Ion implantation method and ion implantation apparatus
#305Implant-induced damage control in ion implantation
#306Electron beam layer manufacturing using scanning electron monitored closed loop control
#307DRAWING APPARATUS, TRANSMISSION APPARATUS, RECEIVING APPARATUS, AND METHOD OF MANUFACTURING ARTICLE
#308BEAMLINE ELECTRODE VOLTAGE MODULATION FOR ION BEAM GLITCH RECOVERY
#309Ion implantation method and ion implantation apparatus
#310X-ray imaging apparatus and method for controlling X-ray imaging apparatus
#311Gas cluster ion beam process for opening conformal layer in a high aspect ratio contact via
#312CHARGED PARTICLE BEAM DEVICE AND METHOD OF MANUFACTURE OF SAMPLE
#313CHARGED PARTICLE BEAM DEFLECTION METHOD WITH SEPARATE STAGE TRACKING AND STAGE POSITIONAL ERROR SIGNALS
#314Ion sources, systems and methods
#315Multi charged particle beam writing apparatus and multi charged particle beam writing method
#316Multi charged particle beam writing apparatus utilizing multiple staged mutually orthogonal beam blankers
#317Method and Apparatus for Actively Monitoring an Inductively-Coupled Plasma Ion Source using an Optical Spectrometer
#318Methods and systems for raster scanning a surface of an object using a particle beam
#319Method for preparing lamella
#320Ion implantation method and ion implantation apparatus
#321System and method for ion implantation with improved productivity and uniformity
#322Inductively coupled plasma source as an electron beam source for spectroscopic analysis
#323Method of manufacturing semiconductor device
#324Diagnostic method and apparatus for characterization of a neutral beam and for process control therewith
#325Ion implantation apparatus and ion implantation method
#326Electron radiation monitoring system to prevent gold spitting and resist cross-linking during evaporation
#327Drawing apparatus, and article manufacturing method
#328System and method of dosage profile control
#329Ion implanter
#330Charged particle beam drawing apparatus and charged particle beam drawing method
#331Ion beam incident angle detection assembly and method
#332Apparatus and method for probe shape processing by ion beam
#333Charged particle beam drawing apparatus and article manufacturing method
#334Real time monitoring ion beam
#335Sensitivity correction method for dose monitoring device and particle beam therapy system
#336MANUFACTURING METHOD AND MANUFACTURING APPARATUS FOR SEMICONDUCTOR DEVICE
#337Measurement and endpointing of sample thickness
#338Method of processing of an object
#339Ion sources, systems and methods
#340Charged particle beam drawing apparatus and article manufacturing method using same
#341Apparatus and method for controlled particle beam manufacturing
#342Navigation and sample processing using an ion source containing both low-mass and high-mass species
#343System and method of dosage profile control
#344Handling beam glitches during ion implantation of workpieces
#345Ion beam irradiation system and ion beam irradiation method
#346Pattern writing system and method and abnormality diagnosing method
#347Defect analyzer
#348Ion sources, systems and methods
#349Transmission energy contamination detector
#350Raster methodology, apparatus and system for electron beam layer manufacturing using closed loop control
#351Method and device for monitoring the intensity of an electron beam
#352Method for improving implant uniformity during photoresist outgassing
#353Particle beam transport apparatus and method of transporting a particle beam with small beam spot size
#354Electron radiation monitoring system to prevent gold spitting and resist cross-linking during evaporation
#355Apparatus and system for controlling ion ribbon beam uniformity in an ion implanter
#356Electron beam apparatus
#357Electron beam layer manufacturing using scanning electron monitored closed loop control
#358Ion beam incident angle detection assembly and method
#359Charged particle beam drawing apparatus and proximity effect correction method thereof
#360Electron beam lithography apparatus and electron beam lithography method
#361Ion beam monitoring arrangement
#362Variable-tilt specimen holder and method and for monitoring milling in a charged-particle instrument
#363Manufacturing method of semiconductor device, method for controlling ion beam, and ion implantation apparatus
#364Write error verification method of writing apparatus and creation apparatus of write error verification data for writing apparatus
#365METHOD FOR PROCESSING AN OBJECT WITH MINIATURIZED STRUCTURES
#366Vapor Deposition Electron Beam Current Control
#367Closed-loop process control for electron beam freeform fabrication and deposition processes
#368Electron gun evaporation apparatus and film formation method using the electron gun evaporation apparatus
#369Forming an image while milling a work piece
#370Real Time Monitoring Ion Beam
#371Techniques for improving extracted ion beam quality using high-transparency electrodes
#372Electron beam exposure or system inspection or measurement apparatus and its method and height detection apparatus
#373Focused ion beam apparatus, sample processing method using the same, and computer program for focused ion beam processing
#374Electron microscope for inspecting and processing of an object with miniaturized structures and method thereof
#375Measurement and endpointing of sample thickness
#376APPARATUS AND METHOD FOR CONTROLLED PARTICLE BEAM MANUFACTURING
#377Methods and apparatus for sensing unconfinement in a plasma processing chamber
#378Semiconductor manufacturing apparatus
#379System and method of beam energy identification for single wafer ion implantation
#380Method of controlling electron beam focusing of pierce-type electron gun and control apparatus therefor
#381ION IMPLANTING DEVICE AND METHOD
#382ENERGY CONTAMINATION MONITOR WITH NEUTRAL CURRENT DETECTION
#383Method and apparatus for measurement of beam angle in ion implantation
#384System and method of controlling broad beam uniformity
#385Deflection signal compensation for charged particle beam
#386Ultra high precision measurement tool with control loop
#387System and method of performing uniform dose implantation under adverse conditions
#388Techniques for improved uniformity tuning in an ion implanter system
#389Defect analyzer
#390Apparatus for measuring beam characteristics and a method thereof
#391Ion implantation method and apparatus
#392Ion implantation method and apparatus
#393Ion implantation device control method, control system thereof, control program thereof, and ion implantation device
#394Ion sources, systems and methods
#395Predicting dose repeatability in an ion implantation
#396Method and apparatus for controlling a gas cluster ion beam formed from a gas mixture
#397System and method for focused ion beam data analysis
#398Defect recognizing method, defect observing method, and charged particle beam apparatus
#399Charged particle source with automated tip formation
#400TECHNIQUES FOR MEASURING AND CONTROLLING ION BEAM ANGLE AND DENSITY UNIFORMITY
#401Implant beam utilization in an ion implanter
#402Method and system for multi-pass correction of substrate defects
#403Method and system for adjusting beam dimension for high-gradient location specific processing
#404Techniques for optical ion beam metrology
#405Method and apparatus for reviewing defects by detecting images having voltage contrast
#406Charged particle beam apparatus
#407Method and system for increasing throughput during location specific processing of a plurality of substrates
#408Ion doping apparatus, ion doping method, semiconductor device and method of fabricating semiconductor device
#409Charged particle beam writing method
#410Focused ion beam processing system and method
#411Charged particle beam deflection method with separate stage tracking and stage positional error signals
#412Working method by focused ion beam and focused ion beam working apparatus
#413Dosage accuracy monitoring systems of implanters
#414Apparatus for ion beam fabrication
#415In-situ high-resolution light-optical channel for optical viewing and surface processing in parallel with charged particle (FIB and SEM) techniques
#416Method and system for ion beam profiling
#417Ion implantation apparatus
#418Ion implantation apparatus and method of converging/shaping ion beam used therefor
#419Ion implantation apparatus and ion implantation method
#420TUNING AN ION IMPLANTER FOR OPTIMAL PERFORMANCE
#421METHOD AND APPARATUS FOR EXTENDING EQUIPMENT UPTIME IN ION IMPLANTATION
#422Focusing method of charged particle beam and astigmatism adjusting method of charged particle
#423Ion implanting apparatus and method for implanting ions
#424Ion implantation device and method for implanting ions
#425Method and apparatus of measuring beam current waveforms
#426Ion beam monitoring arrangement
#427Semiconductor manufacturing apparatus
#428Electron beam physical vapor deposition apparatus and processes for adjusting the feed rate of a target and manufacturing a multi-component condensate free of lamination
#429Method to measure ion beam angle
#430Magnetic monitoring of a Faraday cup for an ion implanter
#431Ion implanter
#432Adaptive controller for ion source
#433Use of ion induced luminescence (IIL) as feedback control for ion implantation
#434Column simultaneously focusing a particle beam and an optical beam
#435Determining dopant information
#436Electron microscope for inspecting and processing of an object with miniaturized structures and method thereof
#437Methods for beam current modulation by ion source parameter modulation
#438Beam line architecture for ion implanter
#439Technique for improving ion implantation throughput and dose uniformity
#440Technique for improving ion implantation based on ion beam angle-related information
#441Electron beam exposure or system inspection or measurement apparatus and its method and height detection apparatus
#442ION BEAM APPARATUS AND METHOD FOR ALIGNING SAME
#443Ion beam irradiating apparatus and method of adjusting uniformity of a beam
#444Method and system for identifying events in FIB
#445Ion beam measuring method and ion implanting apparatus
#446Scan pattern for an ion implanter
#447Mask position detection
#448ION BEAM PROFILER
#449Ion beam scanning control methods and systems for ion implantation uniformity
#450Beam angle adjustment in ion implanters
#451Charged-particle beam lithography with grid matching for correction of beam shot position deviation
#452Beam tuning with automatic magnet pole rotation for ion implanters
#453System and method of ion beam control in response to a beam glitch
#454Ion source
#455Charged particle beam exposure apparatus
#456Charged particle beam exposure apparatus
#457Charged particle beam lithography system and method for evaluating the same
#458Ion beam monitoring in an ion implanter using an imaging device
#459Manufacturing equipment using ION beam or electron beam
#460Charged particle beam apparatus and charged particle beam resolution measurement method
#461Lithography system and lithography method using the same
#462LITHOGRAPHY SYSTEM AND ERROR DETECTION METHOD IN SAME
#463Electron beam generator for multiple columns
#464Apparatus and method for controlled particle beam manufacturing
#465Apparatus and method for controlled particle beam manufacturing
#466Apparatus and method for controlled particle beam manufacturing
#467Apparatus and method for controlled particle beam manufacturing
#468Apparatus and method for controlled particle beam manufacturing
#469Closed loop dose control for ion implantation
#470Apparatus and method for controlled particle beam manufacturing
#471Apparatus and method for controlled particle beam manufacturing
#472Semiconductor mask correcting device and semiconductor mask correcting method
#473Method of implanting a substrate and an ion implanter for performing the method
#474Preventing dosage drift with duplicate dose integrators
#475Ion beam contamination determination
#476Method and device for aligning a charged particle beam column
#477Adjusting device of an apparatus for generating a beam of charged particles
#478Method and apparatus for reviewing defects by detecting images having voltage contrast
#479Charged particle beam device
#480Move mechanism for moving target object and charged particle beam writing apparatus
#481Charged particle beam apparatus
#482Ion beam angle measurement systems and methods for ion implantation systems
#483Ion beam angle measurement systems and methods employing varied angle slot arrays for ion implantation systems
#484Particle-optical projection system
#485Method and apparatus of measuring pattern dimension and controlling semiconductor device process having an error revising unit
#486Beam current stabilization utilizing gas feed control loop
#487Ion implanation method and device using thereof
#488Ion implanter and ion implantation control method thereof
#489Charged particle beam scan and irradiation method, charged particle beam apparatus, workpiece observation method and workpiece processing method
#490Multi-pixel electron microbeam irradiator systems and methods for selectively irradiating predetermined locations
#491Charged particle beam apparatus
#492Beam exposure correction system and method
#493Defect analyzer
#494Ion implant beam angle integrity monitoring and adjusting
#495Charged particle beam apparatus
#496Apparatus and method for controlled particle beam manufacturing
#497Etching depth measuring device, etching apparatus, and etching depth measuring method
#498Electron beam apparatus, and inspection instrument and inspection process thereof
#499Systems, control subsystems, and methods for projecting an electron beam onto a specimen
#500Charged particle beam application system
#501Methods and apparatus for ion beam angle measurement in two dimensions
#502Method and apparatus for applying charged particle beam
#503Charged particle beam apparatus
#504Charged particle beam apparatus
#505Technique for uniformity tuning in an ion implanter system
#506Technique for uniformity tuning in an ion implanter system
#507Method and apparatus for preparing specimen
#508Deflection signal compensation for charged particle beam
#509Semiconductor processing method and system
#510Method of measuring ion beam position
#511Methods and apparatus for glitch recovery in stationary-beam ion implantation process using fast ion beam control
#512Subsurface imaging using an electron beam
#513Technique for ion beam angle process control
#514Technique for ion beam angle spread control
#515Information acquisition apparatus, cross section evaluating apparatus, cross section evaluating method, and cross section working apparatus
#516Charged particle beam lithography apparatus and method
#517Ion implanter, and angle measurement apparatus and beam divergence measurement apparatus for ion implanter
#518Sample height regulating method, sample observing method, sample processing method and charged particle beam apparatus
#519Aberration adjusting method, device fabrication method, and charged particle beam lithography machine
#520Ion implant ion beam parallelism and direction integrity determination and adjusting
#521Aberration measuring apparatus for charged particle beam optical system, charged particle beam lithography machine having the aberration measuring apparatus, and device fabrication method using the apparatus
#522Method of making lamina specimen
#523Electron beam drawing apparatus, deflection amplifier, deflection control device, electron beam drawing method, method of manufacturing semiconductor device, and electron beam drawing program
#524Focusing apparatus and lithography system using the same
#525Exposure device, exposure method, and semiconductor device manufacturing method
#526Charged-particle beam exposure apparatus and method
#527Ion-implanting apparatus, ion-implanting method, and device manufactured thereby
#528Projection electron beam lithography apparatus and method employing an estimator
#529Wafer charge compensation device and ion implantation system having the same
#530Power sag detection and control in ion implanting system
#531Column simultaneously focusing a particle beam and an optical beam
#532Dose uniformity during scanned ion implantation
#533Apparatus and methods for two-dimensional ion beam profiling
#534Exposure parameter obtaining method, exposure parameter evaluating method, semiconductor device manufacturing method, charged beam exposure apparatus, and method of the same
#535Controlled dose ion implantation
#536Charged particle beam apparatus and method of forming electrodes having narrow gap therebetween by using the same
#537Ion beam measurement systems and methods for ion implant dose and uniformity control
#538Device for controlling an apparatus generating a charged particle beam
#539Electron beam apparatus, and inspection instrument and inspection process thereof
#540Device and method for measurement of beam angle and divergence
#541Uniformity control multiple tilt axes, rotating wafer and variable scan velocity
#542Uniformity control using multiple fixed wafer orientations and variable scan velocity
#543Diagnostic system for profiling micro-beams
#544Electron beam apparatus and method with surface height calculator and a dual projection optical unit
#545System and method for proximity effect correction in imaging systems
#546Ion implantation apparatus and method
#547Field emission gun and electron beam instruments
#548Particle-optical projection system
#549Film-processing method and film-processing apparatus
#550Ion beam monitoring arrangement
#551Modulating ion beam current
#552Characterizing an electron beam treatment apparatus
#553Ion implantation
#554Method for measuring the intensity profile of an electron beam, in particular a beam of an electron-beam machining device, and/or for measuring an optical system for an electron beam and/or for adjusting an optical system for an electron beam, measuring structure for such a method and electron-beam machining device
#555Ion implanting apparatus and ion implanting method using the same
#556Method and system for in-situ calibration of a dose controller for ion implantation
#557Method of measuring pattern dimension and method of controlling semiconductor device process
#558Precise, in-situ endpoint detection for charged particle beam processing
#559Method of calculating a pressure compensation recipe for a semiconductor wafer implanter
#560Fault detection and control methodologies for ion implantation processes, and system for performing same
#561Correction system, method of correcting deflection distortion, program and method for manufacturing a semiconductor device
#562Methods for integrated implant monitoring
#563Electron microscope observation system and observation method
#564Apparatus for low temperature semiconductor fabrication
#565Charged particle beam apparatus
#566Charged particle beam exposure method and apparatus and device manufacturing method using the apparatus
#567Electron beam exposure apparatus and electron beam measurement module
#568Method and device for aligning a charged particle beam column
#569Method and device for aligning a charged particle beam column
#570Effective temperature calculation method for multi-charged particle beam writing region, multi-charged particle beam writing apparatus, multi-charged particle beam writing method, and recording medium recording program
#571Three-dimensional (3D) imaging system and method for nanostructure
#572System and method for hi-precision ion implantation
#573System, apparatus and method for bunched ribbon ion beam
#574System, apparatus and method for variable length electrode in linear accelerator
#575Patterned atomic layer etching and deposition using miniature-column charged particle beam arrays
#576Precision substrate material removal using miniature-column charged particle beam arrays
#577Automatic optimization of etch process for accelerated yield ramp with matched charged particle multi-beam systems
#578Automatic optimization of etch process for accelerated yield ramp with matched charged particle multi-beam systems