205265 ⎘
Discharge tubes with provision for introducing objects or material to be exposed to the discharge, e.g. for the purpose of examination or processing thereof; Electron-beam or ion-beam tubes for localised treatment of objects Controlling tubes by information coming from the objects or from the beam , e.g. correction signals
Sub-classes:SUBSTRATE PROPERTY CONTROL USING DOSE-DEPENDENT RESPONSE
#2GRADIENT-BASED MILLING FOR SEGMENTED ENDPOINTING DURING LAMELLAE THINNING
#3MOBILE RADIATION DETECTOR SYSTEM FOR ION IMPLANTERS
#4BEAM CONDITIONING FOR DEFECT CONTROL IN BEAMLINE ION IMPLANTER
#5FORMATION OF ANGLED GRATINGS
#6FAST BEAM CALIBRATION PROCEDURE FOR BEAMLINE ION IMPLANTER
#7METHOD AND APPARATUS FOR CHARGE COMPENSATION DURING 3D TOMOGRAPHY
#8CHARGED PARTICLE BEAM DEVICE AND METHOD FOR CORRECTING ASTIGMATISM AND NUMERICAL APERTURE
#9RASTER BEAM WRITING METHOD AND RASTER BEAM WRITING APPARATUS
#10SUBSTRATE PROCESSING APPARATUS AND SUBSTRATE PROCESSING METHOD
#11CHARGED PARTICLE BEAM WRITING METHOD, CHARGED PARTICLE BEAM WRITING APPARATUS, AND NON-TRANSITORY COMPUTER-READABLE STORAGE MEDIUM STORING A PROGRAM
#12BEAM TUNING FOR NON-UNIFORM ION IMPLANTATION
#13ION IMPLANTER, CONTROL SYSTEM, AND TECHNIQUES FOR TUNING ION IMPLANTER
#14OPTIMIZATION AND ALIGNMENT OF SHAPED CHARGED PARTICLE BEAMS
#15NEUTRAL BEAM INJECTION POWER FEEDBACK CONTROL METHOD
#16METHOD AND SYSTEM FOR 3D RECONSTRUCTION OF WAFER STRUCTURE BY DIAGONAL MILLING
#17ELECTRON BEAM ADJUSTMENT METHOD, ELECTRON BEAM APPARATUS, AND STORAGE MEDIUM
#18INHOMOGENEOUS D-SHAPED FOCUSED ION BEAMS
#19ENERGY ACCURACY FOR AN RF LINEAR ACCELERATOR ION IMPLANTATION SYSTEM
#20RIBBON BEAM UNIFORMITY TUNING USING MACHINE LEARNING
#21ION IMPLANT DOSE MONITORING BY THERMAL WAVE MEASUREMENT
#22METHOD FOR ION IMPLANTATION UNIFORMITY CONTROL
#23FOCUSED ION BEAM APPARATUS AND CONTROL METHOD THEREOF
#24CHARGED PARTICLE BEAM WRITING APPARATUS, SHOT DATA CORRECTION METHOD AND CHARGED PARTICLE BEAM WRITING METHOD
#25METHOD FOR GENERATING WRITING DATA, WRITING DATA GENERATION APPARATUS, METHOD OF CHARGED-PARTICLE BEAM WRITING, CHARGED-PARTICLE BEAM WRITING APPARATUS, AND COMPUTER-READABLE RECORDING MEDIUM
#26MULTIMODE DOSE COMPENSATION SYSTEM
#27WAFER TOTAL THICKNESS VARIATION USING MASKLESS IMPLANT
#28MICROSCOPY IMAGING METHOD AND SYSTEM
#29BACKSIDE IMPLANT FOR WAFER CURVATURE CONTROL
#30E-BEAM EXPOSURE METHOD AND MASK MANUFACTURING METHOD COMPRISING THE SAME
#31Ion Milling Device
#32LOCALIZED STRESS MODULATION BY IMPLANT TO BACK OF WAFER
#33SUBSTRATE STRESS MANAGEMENT USING VARIABLE ENERGY AND VARIABLE DOSE IMPLANTATION
#34APPARATUS AND METHOD FOR TWO-DIMENSIONAL ION BEAM PROFILING
#35METHOD OF ADJUSTING CHARGED PARTICLE BEAM WRITING APPARATUS, CHARGED PARTICLE BEAM WRITING APPARATUS AND COMPUTER-READABLE RECORDING MEDIUM
#36MACHINING METHOD AND CHARGED PARTICLE BEAM DEVICE
#37INVERTING IMPLANTER PROCESS MODEL FOR PARAMETER GENERATION
#38METHOD FOR CALCULATING EFFECTIVE TEMPERATURE OF MULTI-CHARGED PARTICLE BEAM WRITING REGION, MULTI-CHARGED PARTICLE BEAM WRITING METHOD, NON-TRANSITORY COMPUTER-READABLE STORAGE MEDIUM STORING A PROGRAM, AND MULTI-CHARGED PARTICLE BEAM WRITING APPARATUS
#39ION PRODUCTION SYSTEM WITH A MASS RESOLVING APERTURE HAVING A SCATTER RECESS
#40MULTIPLE CHARGED PARTICLE BEAM WRITING APPARATUS AND MULTIPLE CHARGED PARTICLE BEAM WRITING METHOD
#41MULTI-CHARGED PARTICLE BEAM WRITING METHOD AND MULTI-CHARGED PARTICLE BEAM WRITING APPARATUS
#42CHARGED PARTICLE BEAM WRITING APPARATUS, DISCHARGE DETECTION METHOD, AND DISCHARGE DETECTION APPARATUS
#43CHARGED PARTICLE BEAM WRITING APPARATUS AND CHARGED PARTICLE BEAM WRITING METHOD
#44SEMICONDUCTOR PROCESSING APPARATUS
#45COMPENSATION RASTER SCANNING
#46INTEGRATED SYNCHRONOUS SYSTEM FOR GRIDDED ION SOURCES
#47MARK POSITION MEASUREMENT APPARATUS, CHARGED PARTICLE BEAM WRITING APPARATUS, AND MARK POSITION MEASUREMENT METHOD
#48Integrated Circuit with FIB-Ready Structures
#49Optimizing Image Distortion in a Multi Beam Charged Particle Processing Apparatus
#50APPARATUS AND TECHNIQUES FOR SUBSTRATE PROCESSING USING INDEPENDENT ION SOURCE AND RADICAL SOURCE
#51DETECTION USING SEMICONDUCTOR DETECTOR
#52BLANKING APERTURE ARRAY SYSTEM AND CHARGED PARTICLE BEAM WRITING APPARATUS
#53System and Method for Reducing Particle Formation in a Process Chamber of an Ion Implanter
#54MULTIPLE CHARGED PARTICLE BEAM WRITING APPARATUS, MULTIPLE CHARGED PARTICLE BEAM WRITING METHOD, AND COMPUTER READABLE RECORDING MEDIA STORING PROGRAM
#55XRAY DIFFRACTION ANGLE VERIFICATION IN AN ION IMPLANTER
#56METHOD FOR MANUFACTURING A HEAD FOR IRRADIATING A TARGET WITH A BEAM OF CHARGED PARTICLES
#57METHOD FOR PRECISION OXIDATION CONTROL BY ION IMPLANTATION
#58METHOD FOR ANALYZING DISTURBING INFLUENCES IN A MULTI-BEAM PARTICLE MICROSCOPE, ASSOCIATED COMPUTER PROGRAM PRODUCT AND MULTI-BEAM PARTICLE MICROSCOPE
#59ION BEAM CURRENT MEASUREMENT DEVICE AND ION BEAM IMPLANTATION SYSTEM
#60Fiducial guided cross-sectioning and lamella preparation with tomographic data collection
#61SUBSTRATE ANALYSIS SYSTEM
#62MULTI-BEAM CHARGED PARTICLE SYSTEM AND METHOD OF CONTROLLING THE WORKING DISTANCE IN A MULTI-BEAM CHARGED PARTICLE SYSTEM
#63Closed loop faraday correction of a horizontal beam current profile for uniform current tuning
#64METHOD OF OPERATING A PARTICLE BEAM SYSTEM AND RELATED SYSTEM AND COMPUTER PROGRAM PRODUCT
#65APPARATUS, SYSTEM AND METHOD FOR ENERGY SPREAD ION BEAM
#66MOUNTING SUBSTRATE, BLANKING APERTURE ARRAY CHIP, BLANKING APERTURE ARRAY SYSTEM AND MULTI CHARGED PARTICLE BEAM IRRADIATION APPARATUS
#67Operating a gas feed device for a particle beam apparatus
#68DRAWING APPARATUS, DRAWING METHOD, AND METHOD OF MANUFACTURING PLATE
#69System and methods for automated processing of multiple samples in a BIB system
#70Automated ion-beam alignment for dual-beam instrument
#71PROXIMITY EFFECT CORRECTION IN ELECTRON BEAM LITHOGRAPHY
#72DOSE MAPPING AND SUBSTRATE ROTATION FOR SUBSTRATE CURVATURE CONTROL WITH IMPROVED RESOLUTION
#73Ion Milling Device and Ion Milling Method
#74ION IMPLANTER AND ION IMPLANTATION METHOD
#75METHOD FOR PRODUCING A SAMPLE ON AN OBJECT, COMPUTER PROGRAM PRODUCT, AND MATERIAL PROCESSING DEVICE FOR CARRYING OUT THE METHOD
#76Real time photoresist outgassing control system and method
#77Focused Ion Beam System and Method of Correcting Deviation of Field of View of Ion Beam
#78Method of Automatic Detection of Required Peak for Sample Machining by Focused Ion Beam
#79Proximity effect correction in electron beam lithography
#80ION IMPLANTATION METHOD, ION IMPLANTER, AND METHOD FOR MANUFACTURING SEMICONDUCTOR DEVICE
#81IN-SITU ETCH RATE OR DEPOSITION RATE MEASUREMENT SYSTEM
#82Charged particle beam writing method and charged particle beam writing apparatus
#83MULTI-CHARGED PARTICLE BEAM WRITING APPARATUS AND MULTI-CHARGED PARTICLE BEAM WRITING METHOD
#84FAST BEAM CALIBRATION PROCEDURE FOR BEAMLINE ION IMPLANTER
#85Detection and correction of system responses in real-time
#86Microscopy imaging method for 3D tomography with predictive drift tracking for multiple charged particle beams
#87Ion implanter and model generation method
#88Blended energy ion implantation
#89METHOD FOR ION IMPLANTATION UNIFORMITY CONTROL
#90Method and apparatus for controlled ion implantation
#91Multi charged particle beam adjustment method, multi charged particle beam irradiation method, and multi charged particle beam irradiation apparatus
#923D metrology from 3D datacube created from stack of registered images obtained during delayering of the sample
#93Devices, systems, and methods for using an imaging device to calibrate and operate a plurality of electron beam guns in an additive manufacturing system
#94Specimen machining device and information provision method
#95Method for controlling dynamically controllable ultrawide-amplitude and high-response ion source
#96Tuning gas cluster ion beam systems
#97Localized stress modulation by implant to back of wafer
#98Charged particle beam writing apparatus and charged particle beam writing method
#99Apparatus, system and method for energy spread ion beam
#100FORMATION OF ANGLED GRATINGS
#101Ion beam irradiation apparatus and program therefor
#102Ion milling device and milling processing method using same
#103Sample milling apparatus and method of adjustment therefor
#104Ion implanter and ion implantation method
#105Temperature controlled/electrically biased wafer surround
#106Ion implantation apparatus
#107Apparatus of plural charged-particle beams
#108ION BEAM DELAYERING SYSTEM AND METHOD, AND ENDPOINT MONITORING SYSTEM AND METHOD THEREFOR
#109Multiple charged particle beam writing apparatus and multiple charged particle beam writing method
#110Multiple-charged particle-beam irradiation apparatus and multiple-charged particle-beam irradiation method
#111Ion implanter and particle detection method
#112Data generation method and charged particle beam irradiation device
#113Ion implantation method and device
#114Ion beam delayering system and method, topographically enhanced delayered sample produced thereby, and imaging methods and systems related thereto
#115Detection using semiconductor detector
#116Particle beam apparatus, defect repair method, lithographic exposure process and lithographic system
#117Beam steering correction for attenuating the degradation of positional accuracy of charged particle and laser light beams caused by mechanical vibrations
#118Ion implanter and model generation method
#119Multi-charged particle beam writing apparatus and multi-charged particle beam writing method
#120Charged particle beam optical apparatus, exposure apparatus, exposure method, control apparatus, control method, information generation apparatus, information generation method and device manufacturing method
#121Ion milling device and ion milling method
#122Ion milling device
#123Techniques for determining and correcting for expected dose variation during implantation of photoresist-coated substrates
#124Apparatus and techniques for substrate processing using independent ion source and radical source
#125Obtaining an energy spectrum of a focused ion beam
#126Method and system for iteratively cross-sectioning a sample to correlatively targeted sites
#127Isolated LINAC resonator pickup circuit
#128Method and apparatus for examining a beam of charged particles
#129System and method of preparing integrated circuits for backside probing using charged particle beams
#130Ion implanter and ion implantation method
#131Methods for directed irradiation synthesis with ion and thermal beams
#132Ion implanter and ion implantation method
#133Apparatus of plural charged-particle beams
#134Charged particle beam writing method and charged particle beam writing apparatus
#135Operating a gas supply device for a particle beam device
#136Ion implanter
#137Method of mixing upstream and downstream current measurements for inference of the beam current at the bend of an optical element for realtime dose control
#138Charged particle beam writing apparatus and charged particle beam writing method
#139Multiple electron beam irradiation apparatus, multiple electron beam inspection apparatus, and multiple electron beam irradiation method
#140Optical alignment correction using convolutional neural network evaluation of a beam image
#141Detection and correction of system responses in real-time
#142Particle beam system and method for operating a particle beam system
#143Method and system for cross-sectioning a sample with a preset thickness or to a target site
#144Formation of angled gratings
#145Proximity effect correction in electron beam lithography
#146Dose-based end-pointing for low-kV FIB milling in TEM sample preparation
#147Compensated location specific processing apparatus and method
#148Charged particle beam optical apparatus, exposure apparatus, exposure method, control apparatus, control method, information generation apparatus, information generation method and device manufacturing method
#149Ion implantation method
#150Tomography-assisted TEM prep with requested intervention automation workflow
#151Neutral atom imaging system
#152Electron beam irradiation method, electron beam irradiation apparatus, and computer readable non-transitory storage medium
#153Process window analysis
#154Charged-particle beam writing apparatus and charged-particle beam writing method
#155CHARGED PARTICLE BEAM WRITING APPARATUS AND CHARGED PARTICLE BEAM WRITING METHOD
#156Multiple charged particle beam writing apparatus, and multiple charged particle beam writing method
#157Charged particle beam system and method
#158Intelligent pre-scan in scanning transmission charged particle microscopy
#159Methods for directed irradiation synthesis with ion and thermal beams
#160Sensor characteristic evaluation method and charged particle beam device
#161Apparatus, method, and program for processing and observing cross section, and method of measuring shape
#162Two-axis variable width mass resolving aperture with fast acting shutter motion
#163Methods and systems for raster scanning a surface of an object using a particle beam
#164Charged particle beam apparatus comprising a controller to set control parameters based on movement of the sample stage
#165Ion implantation apparatus and measurement device
#166CHARGED PARTICLE BEAM SYSTEM AND METHODS
#167Endpointing for focused ion beam processing
#168Method of obtaining beam deflection shape and method of obtaining arrangement angle of blanking aperture array plate
#169Multi charged particle beam writing apparatus and multi charged particle beam writing method
#170Depth-controllable ion milling
#171Ion implantation method, ion implantation apparatus and semiconductor device
#172Multi charged particle beam writing apparatus and multi charged particle beam writing method
#173Micro-electro-mechanical-systems processing method, and micro-electro-mechanical-systems processing apparatus
#174Method of analyzing surface modification of a specimen in a charged-particle microscope
#175Multi charged particle beam writing apparatus and multi charged particle beam writing method
#176Multi charged particle beam writing apparatus and multi charged particle beam writing method
#177Charged particle beam treatment apparatus
#178Raster methodology, apparatus and system for electron beam layer manufacturing using closed loop control
#179Method for acquiring parameter for dose correction of charged particle beam, charged particle beam writing method, and charged particle beam writing apparatus
#180METHOD AND APPARATUS FOR INSPECTING A SAMPLE
#181Ion implanter, ion beam irradiated target, and ion implantation method
#182CHARGED PARTICLE BEAM WRITING APPARATUS AND CHARGED PARTICLE BEAM WRITING METHOD
#183Ion milling device
#184Method and apparatus for transmission electron microscopy
#185Methods for directed irradiation synthesis with ion and thermal beams
#186Compensated location specific processing apparatus and method
#187Charged particle beam apparatus and method for controlling charged beam apparatus
#188Multi charged particle beam exposure method and multi charged particle beam exposure apparatus
#189Blanking deflector, and multi charged particle beam writing apparatus using three deflector electrodes and a transmission line
#190Multi charged particle beam writing apparatus and multi charged particle beam writing method
#191Multi charged particle beam writing apparatus and multi charged particle beam writing method
#192Charged particle beam writing apparatus, and charged particle beam writing method
#193Blanking aperture array apparatus, charged particle beam lithography apparatus, and electrode testing method
#194Ion implantation apparatus and ion implantation method
#195In situ beam current monitoring and control in scanned ion implantation systems
#196Microscopy imaging method and system
#197Ion beam mill etch depth monitoring with nanometer-scale resolution
#198Multi charged particle beam writing apparatus and method of adjusting the same
#199Charged particle beam drawing method and charged particle beam drawing apparatus
#200Material removal process for self-aligned contacts
#201Material removal process for self-aligned contacts
#202Low voltage electron beam dosimeter device and method
#203Method and device for characterizing an electron beam
#204Charged particle beam writing method, and charged particle beam writing apparatus
#205Ion implantation apparatus and measurement device
#206Multi charged particle beam writing apparatus and multi charged particle beam writing method
#207Ion milling device and ion milling method
#208Method for implantation of semiconductor wafers having high bulk resistivity
#209Material removal process for self-aligned contacts
#210Electron gun, control method and control program thereof, and three-dimensional shaping apparatus
#211Method of aperture alignment and multi charged particle beam writing apparatus
#212Microscopy imaging method and system
#213Particle beam irradiation apparatus for irradiating a subject with an arbitrary number of particles
#214Method of cleaning electrostatic chuck
#215Multi charged particle beam writing method, and multi charged particle beam writing apparatus
#216Method for high throughput using beam scan size and beam position in gas cluster ion beam processing system
#217Charged particle beam lithography apparatus and charged particle beam lithography method
#218Method of analyzing surface modification of a specimen in a charged-particle microscope
#219Method for evaluating charged particle beam drawing apparatus
#220Multi-charged particle beam writing apparatus and multi-charged particle beam writing method
#221Charged particle beam writing apparatus and charged particle beam writing method
#222Device, manufacturing method, and exposure apparatus
#223Apparatus and method for controlling implant process
#224Method for verifying characteristics of an electron beam
#225System for manufacturing semiconductor device
#226Method for generating parameter pattern, ion implantation method and feed forward semiconductor manufacturing method
#227Bipolar wafer charge monitor system and ion implantation system comprising same
#228Monitoring device, ion implantation device, and monitoring method
#229Method and device for characterizing an electron beam
#230Method for the correction of electron proximity effects
#231Differential imaging with pattern recognition for process automation of cross sectioning applications
#232Charged particle beam system and methods
#233System and method to improve productivity of hybrid scan ion beam implanters
#234Method of measuring vertical beam profile in an ion implantation system having a vertical beam angle device
#235Beam profiling speed enhancement for scanned beam implanters
#236Charged particle beam drawing apparatus and charged particle beam drawing method
#237Multi charged particle beam writing apparatus, and multi charged particle beam writing method
#238Method for processing and/or for observing an object, and particle beam device for carrying out the method
#239Apparatus and method to control an ion beam
#240Source for selectively providing positively or negatively charged particles for a focusing column
#241Ion milling device
#242Deposition method and focused ion beam system
#243Multi charged particle beam writing apparatus and multi charged particle beam writing method
#244Multi charged particle beam writing apparatus, and multi charged particle beam writing method
#245High energy ion implanter, beam current adjuster, and beam current adjustment method
#246Charged particle beam exposure apparatus suitable for drawing on line patterns, and exposure method using the same
#247Endpointing for focused ion beam processing
#248Methods and apparatus for determining, using, and indicating ion beam working properties
#249Method of reducing the thickness of a target sample
#250Method for correcting drift of accelerating voltage, method for correcting drift of charged particle beam, and charged particle beam writing apparatus
#251Method for structuring an object with the aid of a particle beam apparatus
#252Ion implanter and method of ion beam tuning
#253Charged particle radiation device and specimen preparation method using said device
#254Ion implantation method and ion implantation apparatus performing the same
#255Method for analyzing and/or processing an object as well as a particle beam device for carrying out the method
#256Apparatus for preparing a sample for microscopy
#257Raster methodology, apparatus and system for electron beam layer manufacturing using closed loop control
#258Charged particle beam writing apparatus and charged particle beam writing method
#259Beam irradiation apparatus and beam irradiation method
#260Compensation of dose inhomogeneity using overlapping exposure spots
#261Charged particle beam apparatus and program
#262Processing apparatus and method of treating a substrate
#263LITHOGRAPHY APPARATUS AND METHOD, AND METHOD OF MANUFACTURING AN ARTICLE
#264Ion implantation method and ion implantation apparatus
#265LITHOGRAPHY APPARATUS, AND METHOD OF MANUFACTURING AN ARTICLE
#266Methods for directed irradiation synthesis with ion and thermal beams
#267Charged particle beam treatment apparatus and method of adjusting path length of charged particle beam
#268Charged particle beam treatment apparatus
#269ELECTRON BEAM DRAWING METHOD, ELECTRON BEAM DRAWING APPARATUS AND DATA GENERATING METHOD
#270Cross-section processing and observation method and cross-section processing and observation apparatus
#271Electron radiation monitoring electrode system to prevent gold spitting and resist cross-linking during evaporation
#272Apparatus and methods for implementing predicted systematic error correction in location specific processing
#273Method for acquiring settling time
#274Charged particle beam apparatus
#275Endpoint detection for photolithography mask repair
#276Method for enhancing beam utilization in a scanned beam ion implanter
#277Ion sources, systems and methods
#278Using wafer geometry to improve scanner correction effectiveness for overlay control
#279Charged particle beam apparatus and processing method
#280Inspection of regions of interest using an electron beam system
#281System and method for controlling ion implanter
#282DRAWING APPARATUS, DRAWING METHOD, AND METHOD FOR FABRICATING ARTICLE
#283Focused ion beam system and method of making focal adjustment of ion beam
#284Differential imaging with pattern recognition for process automation of cross sectioning applications
#285Particle beam transport apparatus
#286Cross section processing method and cross section processing apparatus
#287Electron beam exposure apparatus and method of detecting error using the same
#288WRITING DATA CORRECTING METHOD, WRITING METHOD, AND MANUFACTURING METHOD OF MASK OR TEMPLATE FOR LITHOGRAPHY
#289Method and apparatus for predicting a growth rate of deposited contaminants
#290Method for processing and/or for observing an object, and particle beam device for carrying out the method
#291Sensitivity correction method for dose monitoring device and particle beam therapy system
#292Multi charged particle beam writing method, and multi charged particle beam writing apparatus
#293Using wafer geometry to improve scanner correction effectiveness for overlay control
#294Source for selectively providing positively or negatively charged particles for a focusing column
#295Particle beam irradiation apparatus
#296Electron beam melting furnace and method for operating same
#297Current regulation method of multiple beams
#298Endpoint detection for photolithography mask repair
#299Cathode operating temperature adjusting method, and writing apparatus
#300Multi charged particle beam writing apparatus and multi charged particle beam writing method