H01J37/3172 - CPC Classification Index

ClassID:

205274 ⎘

H01J37/3172 - CPC Classification

Classification description:

Discharge tubes with provision for introducing objects or material to be exposed to the discharge, e.g. for the purpose of examination or processing thereof; Electron-beam or ion-beam tubes for localised treatment of objects for changing properties of the objects or for applying thin layers thereon, e.g. for ion implantation for ion implantation Maskless patterned ion implantation

Recent Application in this class:

20250343023

2025-11-06

RESONATOR, LINEAR ACCELERATOR CONFIGURATION AND ION IMPLANTATION SYSTEM HAVING TAPERED RESONATOR

20250014854

2025-01-09

ENERGY FILTER ELEMENT FOR ION IMPLANTATION SYSTEMS FOR THE USE IN THE PRODUCTION OF WAFERS

20240395500

2024-11-28

OBLIQUE ANGLED ION IMPLANTATION FOR SUBSTRATE STRESS CONTROL

20240153740

2024-05-09

FILAMENT ALIGNMENT DEVICE

20240055217

2024-02-15

Energy filter element for ion implantation systems for the use in the production of wafers

20230369014

2023-11-16

DOSE MAPPING AND SUBSTRATE ROTATION FOR SUBSTRATE CURVATURE CONTROL WITH IMPROVED RESOLUTION

20220367197

2022-11-17

Method for manufacturing semiconductor structure

20220020556

2022-01-20

Energy filter element for ion implantation systems for the use in the production of wafers

20210027975

2021-01-28

Energy filter element for ion implantation systems for the use in the production of wafers

#10

20200402806

2020-12-24

Method for manufacturing semiconductor structure

#11

20190385879

2019-12-19

DELIVERY DEVICE, SUBSTRATE ION-IMPLANTING SYSTEM AND METHOD THEREOF

#12

20190139742

2019-05-09

Varied component density for thermal isolation

#13

20180166291

2018-06-14

Semiconductor manufacturing apparatus and method thereof

#14

20170125214

2017-05-04

Ion implantation tool and ion implantation method

#15

20160254122

2016-09-01

Method for generating parameter pattern, ion implantation method and feed forward semiconductor manufacturing method

#16

20160111245

2016-04-21

ELECTRODE ASSEMBLY HAVING PIERCE ELECTRODES FOR CONTROLLING SPACE CHARGE EFFECTS

#17

20150371827

2015-12-24

Bias voltage frequency controlled angular ion distribution in plasma processing

#18

20150270103

2015-09-24

Ion beam dimension control for ion implantation process and apparatus, and advanced process control

#19

20150212429

2015-07-30

Using wafer geometry to improve scanner correction effectiveness for overlay control

#20

20150104949

2015-04-16

Semiconductor manufacturing apparatus and method thereof

#21

20140353527

2014-12-04

Using wafer geometry to improve scanner correction effectiveness for overlay control

#22

20140353517

2014-12-04

High-energy ion implanter

#23

20140261181

2014-09-18

Beam control assembly for ribbon beam of ions for ion implantation

#24

20140235042

2014-08-21

Ion implantation method and ion implantation apparatus

#25

20140106550

2014-04-17

ION IMPLANTATION TUNING TO ACHIEVE SIMULTANEOUS MULTIPLE IMPLANT ENERGIES

#26

20130295753

2013-11-07

Ion beam dimension control for ion implantation process and apparatus, and advanced process control

#27

20130196492

2013-08-01

Ion implantation method and ion implantation apparatus

#28

20120252194

2012-10-04

Ion implantation method and ion implantation apparatus

#29

20120248328

2012-10-04

Apparatus and method for multiple slot ion implantation

#30

20120244691

2012-09-27

Ion implantation method and ion implantation apparatus

#31

20120228515

2012-09-13

Apparatus and method for maskless patterned implantation

#32

20120196430

2012-08-02

Stepped masking for patterned implantation

#33

20120112323

2012-05-10

Apparatus and method for controlled particle beam manufacturing

#34

20110256698

2011-10-20

Stepped masking for patterned implantation

#35

20110068277

2011-03-24

Beam control assembly for ribbon beam of ions for ion implantation

#36

20100171126

2010-07-08

In situ dopant implantation and growth of a III-nitride semiconductor body

#37

20100098922

2010-04-22

APPARATUS AND METHOD FOR CONTROLLED PARTICLE BEAM MANUFACTURING

#38

20090317937

2009-12-24

Maskless Doping Technique for Solar Cells

#39

20090001291

2009-01-01

Apparatus and method for partial ion implantation

#40

20080230712

2008-09-25

Beam control assembly for ribbon beam of ions for ion implantation

#41

20080220596

2008-09-11

Delivery of Low Pressure Dopant Gas to a High Voltage Ion Source

#42

20080128640

2008-06-05

Partial ion implantation apparatus and method using bundled beam

#43

20080067434

2008-03-20

Non-uniform ion implantation

#44

20080049888

2008-02-28

High brightness—multiple beamlets source for patterned X-ray production

#45

20070284695

2007-12-13

Apparatus and method for controlled particle beam manufacturing

#46

20070284538

2007-12-13

Apparatus and method for controlled particle beam manufacturing

#47

20070284537

2007-12-13

Apparatus and method for controlled particle beam manufacturing

#48

20070284527

2007-12-13

Apparatus and method for controlled particle beam manufacturing

#49

20070278428

2007-12-06

Apparatus and method for controlled particle beam manufacturing

#50

20070278419

2007-12-06

Apparatus and method for controlled particle beam manufacturing

#51

20070278418

2007-12-06

Apparatus and method for controlled particle beam manufacturing

#52

20070194252

2007-08-23

Ion implantation device and a method of semiconductor manufacturing by the implantation of boron hydride cluster ions

#53

20070187620

2007-08-16

Apparatus and method for partial ion implantation

#54

20070164237

2007-07-19

Application of digital frequency and phase synthesis for control of electrode voltage phase in a high-energy ion implantation machine, and a means for accurate calibration of electrode voltage phase

#55