H01J37/3175 - CPC Classification Index

#1

20260066222

2026-03-05

MULTIBEAM WRITING METHOD AND MULTIBEAM WRITING APPARATUS

#2

20260011529

2026-01-08

SYSTEMS, DEVICES, AND METHODS FOR ALIGNING A PARTICLE BEAM AND PERFORMING A NON-CONTACT ELECTRICAL MEASUREMENT ON A CELL AND/OR NON-CONTACT ELECTRICAL MEASUREMENT CELL VEHICLE USING A REGISTRATION CELL

#3

20240304414

2024-09-12

SYSTEMS, DEVICES, AND METHODS FOR ALIGNING A PARTICLE BEAM AND PERFORMING A NON-CONTACT ELECTRICAL MEASUREMENT ON A CELL AND/OR NON-CONTACT ELECTRICAL MEASUREMENT CELL VEHICLE USING A REGISTRATION CELL

#4

20240087845

2024-03-14

ELECTRON BEAM WRITING APPARATUS AND ELECTRON BEAM WRITING METHOD

#5

20230282444

2023-09-07

Systems, devices, and methods for aligning a particle beam and performing a non-contact electrical measurement on a cell and/or non-contact electrical measurement cell vehicle using a registration cell

#6

20230154725

2023-05-18

EMITTER FOR EMITTING CHARGED PARTICLES

#7

20230154719

2023-05-18

Charged particle source module

#8

20230048507

2023-02-16

MEMORY DEVICE WITH PREDETERMINED START-UP VALUE

#9

20220336187

2022-10-20

Systems, devices, and methods for aligning a particle beam and performing a non-contact electrical measurement on a cell and/or non-contact electrical measurement cell vehicle using a registration cell

#10

20220238303

2022-07-28

Proximity effect correcting method, master plate manufacturing method, and drawing apparatus

#11

20220051871

2022-02-17

Pattern formation method and template manufacturing method

#12

20210335572

2021-10-28

MODULAR PARALLEL ELECTRON LITHOGRAPHY

#13

20210296080

2021-09-23

Focused ion beam processing apparatus

#14

20210257185

2021-08-19

Multi-charged particle beam writing apparatus and multi-charged particle beam writing method

#15

20210183616

2021-06-17

Ion beam lithography method based on ion beam lithography system

#16

20210151282

2021-05-20

E-beam apparatus

#17

20210098229

2021-04-01

Methods for aligning a particle beam and performing a non-contact electrical measurement on a cell using a registration cell

#18

20200348597

2020-11-05

Adapting the duration of exposure slots in multi-beam writers

#19

20200227235

2020-07-16

Charged particle beam lithography system

#20

20200203125

2020-06-25

Memory device with predetermined start-up value

#21

20200051781

2020-02-13

Methods and systems for forming a pattern on a surface using multi-beam charged particle beam lithography

#22

20200043693

2020-02-06

Charged particle source module

#23

20190341224

2019-11-07

E-beam apparatus

#24

20190324370

2019-10-24

Electron beam resist composition

#25

20190304747

2019-10-03

Method for projecting a beam of particles onto a substrate with correction of scattering effects

#26

20190237299

2019-08-01

METHOD AND SYSTEM FOR FORMING A PATTERN ON A SURFACE USING MULTI-BEAM CHARGED PARTICLE BEAM LITHOGRAPHY

#27

20190088448

2019-03-21

Method for irradiating a target using restricted placement grids

#28

20190035603

2019-01-31

Multi charged particle beam writing apparatus and multi charged particle beam writing method

#29

20180366297

2018-12-20

Data processing method, charged particle beam writing apparatus, and charged particle beam writing system

#30

20180358203

2018-12-13

MULTI CHARGED PARTICLE BEAM WRITING APPARATUS AND MULTI CHARGED PARTICLE BEAM ADJUSTING METHOD

#31

20180269034

2018-09-20

Charged particle beam writing method and charged particle beam writing apparatus

#32

20180210353

2018-07-26

Position correction method of stage mechanism and charged particle beam lithography apparatus

#33

20180090298

2018-03-29

Electron beam apparatus and positional displacement correcting method of electron beam

#34

20170352522

2017-12-07

Method for producing patterns by ion implantation

#35

20170235227

2017-08-17

Electron beam resist composition

#36

20170169994

2017-06-15

Data processing method, charged particle beam writing method, and charged particle beam writing apparatus

#37

20170125212

2017-05-04

Information processing apparatus, information processing method, and storage medium

#38

20170023862

2017-01-26

METHOD AND SYSTEM FOR FORMING PATTERNS WITH CHARGED PARTICLE BEAM LITHOGRAPHY

#39

20160365223

2016-12-15

Method for evaluating charged particle beam drawing apparatus

#40

20160284513

2016-09-29

Multi charged particle beam writing apparatus, and multi charged particle beam writing method

#41

20160276132

2016-09-22

Multi-beam writing of pattern areas of relaxed critical dimension

#42

20160233054

2016-08-11

Self-aligned dynamic pattern generator device and method of fabrication

#43

20160211115

2016-07-21

Method for the correction of electron proximity effects

#44

20160181065

2016-06-23

Charged particle beam drawing apparatus and charged particle beam drawing method

#45

20160172151

2016-06-16

Apparatus and methods for aberration correction in electron beam based system

#46

20160126062

2016-05-05

Drawing apparatus, lithography system, pattern data creation method, drawing method, and method of manufacturing articles

#47

20160013019

2016-01-14

Compensation of imaging deviations in a particle-beam writer using a convolution kernel

#48

20160012170

2016-01-14

Customizing a particle-beam writer using a convolution kernel

#49

20150380213

2015-12-31

Apparatus and method for calculating drawing speeds of a charged particle beam

#50

20150303027

2015-10-22

Charged-particle beam lithographic system

#51

20150279611

2015-10-01

Charged particle beam writing apparatus and charged particle beam writing method

#52

20150261907

2015-09-17

Method and system for forming patterns with charged particle beam lithography

#53

20150254393

2015-09-10

Method and system for forming a pattern on a surface using multi-beam charged particle beam lithography

#54

20150243482

2015-08-27

Electron beam exposure method

#55

20150179403

2015-06-25

Method and apparatus for transferring pixel data for electron beam lithography

#56

20150160568

2015-06-11

Mirror array in digital pattern generator (DPG)

#57

20150137010

2015-05-21

Multi-electrode stack arrangement

#58

20150137009

2015-05-21

Multi-electrode cooling arrangement

#59

20150136995

2015-05-21

Multi-electrode electron optics

#60

20150131077

2015-05-14

Electron beam lithography methods including time division multiplex loading

#61

20150104737

2015-04-16

Method and system for forming non-manhattan patterns using variable shaped beam lithography

#62

20150060704

2015-03-05

WRITING DATA CORRECTING METHOD, WRITING METHOD, AND MANUFACTURING METHOD OF MASK OR TEMPLATE FOR LITHOGRAPHY

#63

20150053867

2015-02-26

PATTERN FORMATION METHOD, MASK FOR PATTERN FORMATION, METHOD FOR MANUFACTURING MASK, AND PATTERN FORMATION APPARATUS

#64

20150053331

2015-02-26

Method for manufacturing patterned layer and method for manufacturing electrochromic device

#65

20150044615

2015-02-12

DRAWING DATA GENERATING METHOD, PROCESSING APPARATUS, STORAGE MEDIUM, DRAWING APPARATUS, AND METHOD OF MANUFACTURING ARTICLE

#66

20150028230

2015-01-29

Method for charged-particle multi-beam exposure

#67

20140346369

2014-11-27

Multi charged particle beam writing apparatus, and multi charged particle beam writing method

#68

20140264086

2014-09-18

Charged particle lithography system

#69

20140264085

2014-09-18

Method for exposing a wafer

#70

20140264066

2014-09-18

Deflection scan speed adjustment during charged particle exposure

#71

20140097362

2014-04-10

System and method for compressed data transmission in a maskless lithography system

#72

20140014852

2014-01-16

Projection lens arrangement

#73

20140001380

2014-01-02

Method and apparatus of mask drawing using a grounding body at lowest resistance value position of the mask

#74

20130320225

2013-12-05

Devices and methods for improved reflective electron beam lithography

#75

20130309610

2013-11-21

Method and system for forming a pattern using charged particle beam lithography with multiple exposure passes

#76

20130309608

2013-11-21

Method and system for forming a pattern using charged particle beam lithography with multiple exposure passes with different dosages

#77

20130306884

2013-11-21

Method and system for forming non-manhattan patterns using variable shaped beam lithography

#78

20120286170

2012-11-15

Dual pass scanning

#79

20120281191

2012-11-08

Method and system for fracturing a pattern using lithography with multiple exposure passes

#80

20120278770

2012-11-01

METHOD AND SYSTEM FOR FORMING NON-MANHATTAN PATTERNS USING VARIABLE SHAPED BEAM LITHOGRAPHY

#81

20110291021

2011-12-01

Reflection electron beam projection lithography using an ExB separator

#82

20110226967

2011-09-22

Electron beam lithography apparatus and electron beam lithography method

#83

20110204251

2011-08-25

Electron reflector with multiple reflective modes

#84

20110159434

2011-06-30

Method and system for fracturing a pattern using charged particle beam lithography with multiple exposure passes having different dosages

#85

20090200495

2009-08-13

Particle-beam exposure apparatus with overall-modulation of a patterned beam

#86

20090127473

2009-05-21

Electron beam irradiation device

#87

20090057571

2009-03-05

Charged-particle beam lithography apparatus and device manufacturing method

#88

20080258084

2008-10-23

Charged-particle exposure apparatus

#89

20080035853

2008-02-14

Illumination condenser for a particle optical projection system

#90

20070215812

2007-09-20

Correction lens system for a particle beam projection device

#91

20070177132

2007-08-02

Reticle for use in rapid determination of average intrafield scanning distortion having transmissivity of a complementary alignment attribute being different than the transmissivity of at least one alignment attribute

#92

20060243921

2006-11-02

Electron beam exposure apparatus, electron beam exposure method and method of manufacturing semiconductor device

#93

20060118735

2006-06-08

Lithography systems and methods for operating the same

#94

20060108546

2006-05-25

Charged beam exposure apparatus, charged beam control method and manufacturing method of semiconductor device

#95

20060104584

2006-05-18

Optical elements formed by inducing changes in the index of refraction by utilizing electron beam radiation

#96

20060097190

2006-05-11

Method and apparatus for forming optical elements by inducing changes in the index of refraction by utilizing electron beam radiation

#97

20060071176

2006-04-06

Electron beam method and apparatus for reducing or patterning the birefringence of halogenated optical materials

#98

20060033048

2006-02-16

Method of generation of charged particle beam exposure data and charged particle beam exposure method using a block mask

#99

20060011863

2006-01-19

Electron beam method and apparatus for improved melt point temperatures and optical clarity of halogenated optical materials

#100

20060007431

2006-01-12

Method and apparatus for self-referenced dynamic step and scan intra-field scanning distortion

#101

20050256600

2005-11-17

Electron beam lithography system, method of electron beam lithography, program and method for manufacturing a semiconductor device with direct writing

#102

20050219516

2005-10-06

Method and apparatus for self-referenced dynamic step and scan intra-field scanning distortion

#103

20050218346

2005-10-06

System and method for passing particles on selected areas on a wafer

#104

20050208772

2005-09-22

Method of producing electron beam writing data, program of producing electron beam writing data, and electron beam writing apparatus

#105

20050170265

2005-08-04

Mask, exposure method and production method of semiconductor device

#106

20050104014

2005-05-19

Ion printer

#107

20050058913

2005-03-17

Stencil mask, charged particle irradiation apparatus and the method

#108

15894813

2020-01-07

Electron flood lithography

#109

14088667

2015-03-10

Method and apparatus for electron beam lithography