205278 ⎘
Discharge tubes with provision for introducing objects or material to be exposed to the discharge, e.g. for the purpose of examination or processing thereof; Electron-beam or ion-beam tubes for localised treatment of objects for changing properties of the objects or for applying thin layers thereon, e.g. for ion implantation for applying thin layers on objects
ION TRAPS WITH SLANTED HOLES IN SUBSTRATE PROCESSING SYSTEMS
#2LAMELLA HOLE TRENCH FILL METHOD
#3METHOD FOR DEPOSITING A COATING IN PROCESS CHAMBERS
#4REPAIR PROCESS FOR CLEAR DEFECTS ON EUV PSM MASKS
#5LAMINATED BODY AND LAMINATED BODY MANUFACTURING METHOD
#6ELECTROSTATIC CHUCK FOR ION BEAM DEPOSITION SYSTEMS
#7METHOD OF WAFER GROUNDING UTILIZING WAFER EDGE BACKSIDE COATING EXCLUSION AREA
#8ION BEAM SPUTTERING APPARATUS AND METHOD
#9ADJUSTABLE MULTIPLE FILAMENT ION BEAM DEPOSITION SYSTEM
#10GROUNDING DEVICE FOR THIN FILM FORMATION USING PLASMA
#11Air Gap Formation by Physical Vapor Deposition
#12ELECTRON-ENHANCED ATOMIC LAYER DEPOSITION (EE-ALD) METHODS AND DEVICES PREPARED BY SAME
#13ENHANCED DEPOSITION RATE BY APPLYING A NEGATIVE VOLTAGE TO A GAS INJECTION NOZZLE IN FIB SYSTEMS
#14OPTIMIZED SADDLE NOZZLE DESIGN FOR GAS INJECTION SYSTEM
#15METHOD AND SYSTEM FOR PREPARING A SPECIMEN
#16ION BEAM DEPOSITION APPARATUS AND ION BEAM DEPOSITION METHOD USING THE SAME
#17Enhanced deposition rate by thermal isolation cover for GIS manipulator
#18METHODS FOR FORMING COATING FILMS AND SUBSTRATE PROCESSING APPARATUS INCLUDING PARTS MANUFACTURED BY SUCH METHODS
#19Methods and structures for semiconductor device testing
#20METAL PATTERN INSPECTION METHOD AND FOCUSED ION BEAM APPARATUS
#21METHOD AND APPARATUS FOR MASK REPAIR
#22METHOD OF FAILURE ANALYSIS FOR DEFECT LOCATIONS
#23Method for Preparing TEM Sample
#24LAMINATED BODY AND LAMINATED BODY MANUFACTURING METHOD
#25Temperature-controlled surface with a cryo-nanomanipulator for improved deposition rate
#26Physical analysis method, sample for physical analysis and preparing method thereof
#27SYSTEMS AND METHODS FOR SELECTIVE MOLECULAR ION DEPOSITION
#28Device and method for analyzing a defect of a photolithographic mask or of a wafer
#29Method and apparatus for examining a beam of charged particles
#30Ion beam sputtering apparatus and method
#31Mask defect repair apparatus and mask defect repair method
#32Apparatus and method for repairing a photolithographic mask
#33Fixture for vapor deposition system
#34Image-forming device, and dimension measurement device
#35Nanofabrication using a new class of electron beam induced surface processing techniques
#36Optically transmissive devices and fabrication
#37Metal plating of grids for ion beam sputtering
#38Method and device for permanently repairing defects of absent material of a photolithographic mask
#39Chamber with flow-through source
#40ELECTRON BEAM SOURCE AND THE USE OF THE SAME
#41Semiconductor workpiece temperature measurement system
#42Image-forming device, and dimension measurement device
#43Chamber with flow-through source
#44Part temperature measurement device
#45Charged particle device and wiring method
#46Method for monitoring environmental states of a microscope sample with an electron microscope sample holder
#47Charged particle beam device, and method of manufacturing component for charged particle beam device
#48Composite charged particle beam detector, charged particle beam device, and charged particle beam detector
#49Electron microscope and method of controlling same
#50Composite charged particle beam apparatus and control method thereof
#51Device and method for analysing a defect of a photolithographic mask or of a wafer
#52Production method for magnetic inductor
#53Method for cross-section processing and observation and apparatus therefor
#54ULTRA-THIN CORROSION RESISTANT HARD OVERCOAT FOR HARD DISK MEDIA
#55Ultra broad band continuously tunable electron beam pulser
#56Ion generator and method of controlling ion generator
#57Method of reducing shot count in direct writing by a particle or photon beam
#58Embedded mask patterning process for fabricating magnetic media and other structures
#59Radical generator and molecular beam epitaxy apparatus
#60Charged particle beam processing using process gas and cooled surface
#61LAMINATED MATERIALS, METHODS AND APPARATUS FOR MAKING SAME, AND USES THEREOF
#62Deposition method and focused ion beam system
#63Charged particle beam generator, charged particle irradiation system, method for operating charged particle beam generator and method for operating charged particle irradiation system
#64Methods and apparatus for determining, using, and indicating ion beam working properties
#65Ion beam sample preparation and coating apparatus and methods
#66Method and System of Creating a Symmetrical FIB Deposition
#67METHODS OF FORMING LAYERS
#68TEM sample preparation
#69Multi-source plasma focused ion beam system
#70Charged particle device and wiring method
#71Charged particle beam device and sample preparation method
#72High aspect ratio structure analysis
#73Scanning electron microscope
#74DRAWING APPARATUS, DRAWING METHOD AND MANUFACTURING METHOD OF ARTICLE
#75Processing System
#76Charged particle beam device
#77Image-forming device, and dimension measurement device
#78Plan view sample preparation
#79Multi-source plasma focused ion beam system
#80Low energy ion milling or deposition
#81ANGLED GAS CLUSTER ION BEAM
#82Method and system for ion-assisted processing
#83Method and apparatus for generating electron beams
#84Charged particle beam apparatus, thin film forming method, defect correction method and device forming method
#85Processing system
#86Processing system
#87Multi-source plasma focused ion beam system
#88PLUME STEERING
#89Producing images of a specimen
#90Method for modifying a material layer using gas cluster ion beam processing
#91Method for treating non-planar structures using gas cluster ion beam processing
#92GAS CLUSTER ION BEAM PROCESSING METHOD FOR PREPARING AN ISOLATION LAYER IN NON-PLANAR GATE STRUCTURES
#93Particle beam microscopy system and method for operating the same
#94Method for forming microscopic 3D structures
#95Method for modifying a material layer using gas cluster ion beam processing
#96Electron beam vapor deposition apparatus and method of coating
#97Ion deposition apparatus having rotatable carousel for supporting a plurality of targets
#98Electron beam vapor deposition apparatus and method
#99Electrospray deposition: devices and methods thereof
#100PLASMA GENERATING APPARATUS RENDERED ELECTRICALLY NEUTRAL ON THE PERIPHERY OF PLASMA GUN
#101Processing system
#102Method of machining a work piece with a focused particle beam
#103Method to direct pattern metals on a substrate
#104Processing system
#105PLASMA GENERATING APPARATUS AND FILM FORMING APPARATUS USING PLASMA GENERATING APPARATUS
#106METHOD FOR FORMING TRENCH ISOLATION
#107Multi-source plasma focused ion beam system
#108PLASMA AND ELECTRON BEAM ETCHING DEVICE AND METHOD
#109CAPILLARITRON ION BEAM SPUTTERING SYSTEM AND THIN FILM PRODUCTION METHOD
#110METHOD AND SYSTEM FOR DEPOSITING SILICON CARBIDE FILM USING A GAS CLUSTER ION BEAM
#111Ion gun system, vapor deposition apparatus, and method for producing lens
#112METHOD AND APPARATUS FOR MAKING DIAMOND-LIKE CARBON FILMS
#113Method and apparatus for making diamond-like carbon films
#114Gas cluster ion beam emitting apparatus and method for ionization of gas cluster
#115Symmetrical shaper for an ion beam deposition and etching apparatus
#116THIN FILM FORMING APPARATUS
#117Charged particle-beam processing using a cluster source
#118Plasma and electron beam etching device and method
#119APPARATUS FOR REACTIVE SPUTTERING
#120Deposition on charge sensitive materials with ion beam deposition
#121Method and apparatus for precision coating of molecules on the surfaces of materials and devices
#122Gas cluster ion beam emitting apparatus and method for ionization of gas cluster
#123Multiple gas injection system for charged particle beam instruments
#124System and method for performing sputter etching using independent ion and electron sources and a substrate biased with an a-symmetric bi-polar DC pulse signal
#125Patterned atomic layer etching and deposition using miniature-column charged particle beam arrays