205280 ⎘
Discharge tubes with provision for introducing objects or material to be exposed to the discharge, e.g. for the purpose of examination or processing thereof; Gas-filled discharge tubes Arrangements for generation of plasma specially adapted for examination or treatment of objects, e.g. plasma sources
Apparatus for processing substrate and apparatus for processing electron source substrate
#902Apparatus and method utilizing high power density electron beam for generating pulsed stream of ablation plasma
#903Semiconductor processing system and method
#904System and method for semiconductor processing
#905Plasma source and plasma processing apparatus
#906Multi chamber plasma process system
#907Plasma source with discharge inducing bridge and plasma processing system using the same
#908Electrode assembly and plasma processing apparatus
#909Substrate processing device
#910Method and apparatus for cleaning and surface conditioning objects using plasma
#911Method and apparatus for cleaning and surface conditioning objects using plasma
#912Method and apparatus for cleaning and surface conditioning objects using plasma
#913Plasma processing apparatus and method thereof
#914Plasma processing apparatus
#915Plasma booster for plasma treatment installation
#916Plasma catalyst
#917Pulsed dielectric barrier discharge
#918Atmospheric glow discharge with concurrent coating deposition
#919Method and apparatus for cleaning and surface conditioning objects with plasma
#920Tilted Plasma Doping
#921Direct ion beam deposition method and system
#922Temperature control method and apparatus, and plasma processing apparatus
#923Plasma enhanced atomic layer deposition system and method
#924Plasma enhanced atomic layer deposition system and method
#925Plasma reactor
#926Plasma igniting method and substrate processing method
#927Method and apparatus for cleaning and surface conditioning objects using plasma
#928Nonthermal plasma processor utilizing additive-gas injection and/or gas extraction
#929Plasma processing member
#930Plasma treating apparatus and its electrode structure
#931Plasma reactor and method of determining abnormality in plasma reactor
#932PLASMA PROCESSING SYSTEM AND PLASMA TREATMENT PROCESS
#933Member for plasma processing apparatus and plasma processing apparatus
#934Beam plasma source
#935Plasma producing apparatus and doping apparatus
#936GAS DECOMPOSITION APPARATUS AND GAS TREATMENT CARTRIDGE
#937Method for producing coated workpieces, uses and installation for the method
#938Plasma processing apparatus
#939Power supply unit for gas discharge processes
#940Laser ablation apparatus and method of preparing nanoparticles using the same
#941Dry etching apparatus, etching method, and method of forming a wiring
#942Atmospheric pressure plasma processing reactor
#943Plasma processing apparatus, method for producing reaction vessel for plasma generation, and plasma processing method
#944Highly efficient compact capacitance coupled plasma reactor/generator and method
#945Reducing plasma ignition pressure
#946Device for carrying out a plasma-assisted process
#947Method of reworking structures incorporating low-k dielectric materials
#948Method and apparatus for treating wafer edge region with toroidal plasma
#949Plasma generating apparatus and method of forming alignment film of liquid crystal display using the same
#950Electron beam enhanced nitriding system (EBENS)
#951Dielectric barrier discharge method for depositing film on substrates
#952Plasma reactor with high productivity
#953Plasma processing apparatus, electrode plate for plasma processing apparatus, and electrode plate manufacturing method
#954Apparatus including gas distribution member supplying process gas and radio frequency (RF) power for plasma processing
#955Apparatus including showerhead electrode and heater for plasma processing
#956Plasma surface treatment electrode assembly and arrangement
#957Plasma processing apparatus
#958Thermally sprayed member, electrode and plasma processing apparatus using the electrode
#959Low-thermal-budget gapfill process
#960Electrode for dry etching a wafer
#961Electrode assembly and method for producing an electrode plate
#962Formation of photoconductive and photovoltaic films
#963Plasma reactor and purification equipment
#964Plasma processing system
#965Method of cleaning the surface of a material coated with an organic substrate and a generator and device for carrying out said method
#966Toroidal low-field reactive gas and plasma source having a dielectric vacuum vessel
#967Method and apparatus for forming thin film
#968Field-enhanced electrodes for additive-injection non-thermal plasma (NTP) processor
#969Surface treatment apparatus
#970Highly efficient compact capacitance coupled plasma reactor/generator and method
#971Method and apparatus for improved electrode plate
#972Apparatus and method for depositing large area coatings on planar surfaces
#973Voltage non-uniformity compensation method for high frequency plasma reactor for the treatment of rectangular large area substrates
#974Plasma-assisted joining
#975Method for monitoring plasma processing apparatus
#976Replaceable plate expanded thermal plasma apparatus and method
#977Silicon parts having reduced metallic impurity concentration for plasma reaction chambers
#978Plasma processing apparatus, electrode unit, feeder member and radio frequency feeder rod
#979Atmospheric glow discharge with concurrent coating deposition
#980Elementary plasma source and plasma generation apparatus using the same
#981Upper electrode and plasma processing apparatus
#982Atmospheric pressure plasma reduction of copper oxide to copper metal
#983Low temperature atmospheric pressure plasma for cleaning and activating metals
#984Plasma processing apparatus
#985Polygonal toroidal plasma source
#986Neutral radical etching of dielectric sacrificial material from reentrant multi-layer metal structures
#987Low temperature atmospheric pressure plasma for cleaning and activating metals
#988Three or more states for achieving high aspect ratio dielectric etch
#989Atmospheric-pressure plasma jet generating device
#990Method of fabricating conductive thin film
#991Removal methods for high aspect ratio structures
#992Wafer positioning pedestal for semiconductor processing
#993Chemical modification of hardmask films for enhanced etching and selective removal
#994Method of manufacturing semiconductor device
#995Method and apparatus for filling a gap
#996Plasma etching of dielectric sacrificial material from reentrant multi-layer metal structures
#997Etching technique for microfabrication substrates
#998Reactive radical treatment for polymer removal and workpiece cleaning
#999Transformer coupled capacitive tuning circuit with fast impedance switching for plasma etch chambers
#1000Substrate processing apparatus and substrate processing system
#1001Oxide etch selectivity systems and methods
#1002Thermal pyrolytic graphite shadow ring assembly for heat dissipation in plasma chamber
#1003Systems and methods for reducing copper contamination due to substrate processing chambers with components made of alloys including copper
#1004Selective titanium nitride etch
#1005Residue free systems and methods for isotropically etching silicon in tight spaces
#1006Making imprinted multi-layer structure
#1007Microplasma ion source for focused ion beam applications