205327 ⎘
Discharge tubes with provision for introducing objects or material to be exposed to the discharge, e.g. for the purpose of examination or processing thereof; Gas-filled discharge tubes; Constructional details of the reactor Gas supply means
METHODS FOR FABRICATING FACEPLATE OF SEMICONDUCTOR APPARATUS
#3002Showerhead electrode assembly for plasma processing apparatuses
#3003Activated gas injector, film deposition apparatus, and film deposition method
#3004Electrode design for plasma processing chamber
#3005SEMICONDUCTOR MANUFACTURING APPARATUS AND METHOD OF MANUFACTURING SEMICONDUCTOR DEVICE
#3006Movable gas introduction structure and substrate processing apparatus having same
#3007Tunable multi-zone gas injection system
#3008Plasma Reactor Having Injector
#3009VACUUM PROCESSING APPARATUS
#3010Apparatus and method for the plasma treatment of hollow bodies
#3011Atmospheric pressure plasma apparatus
#3012Plasma processing method
#3013REACTIVE GAS DISTRIBUTOR, REACTIVE GAS TREATMENT SYSTEM, AND REACTIVE GAS TREATMENT METHOD
#3014CHAMBER PLASMA-CLEANING PROCESS SCHEME
#3015Method of forming non-conformal layers
#3016METHOD FOR PLASMA ETCHING POROUS LOW-K DIELECTRIC LAYERS
#3017Plasma processing apparatus and method
#3018ATMOSPHERIC PRESSURE PLASMA ELECTRODE
#3019Plasma processing apparatus, plasma processing method and storage medium
#3020Apparatus for generating hollow cathode plasma and apparatus for treating large area substrate using hollow cathode plasma
#3021Clamped monolithic showerhead electrode
#3022Clamped showerhead electrode assembly
#3023Showerhead electrode
#3024Process and System For Varying the Exposure to a Chemical Ambient in a Process Chamber
#3025Method of avoiding a parasitic plasma in a plasma source gas supply conduit
#3026MICROWAVE PLASMA PROCESSING APPARATUS
#3027PLASMA PROCESSING APPARATUS, PLASMA PROCESSING METHOD, AND ORGANIC ELECTRON DEVICE
#3028Baffle plate and substrate processing apparatus
#3029Manufacturing method of semiconductor device and substrate processing apparatus
#3030PLASMA ETCHING METHOD AND PLASMA ETCHING APPARATUS
#3031SHOWER PLATE AND MANUFACTURING METHOD THEREOF, AND PLASMA PROCESSING APPARATUS, PLASMA PROCESSING METHOD AND ELECTRONIC DEVICE MANUFACTURING METHOD USING THE SHOWER PLATE
#3032Apparatus and process for sensing fluoro species in semiconductor processing systems
#3033Method for designing shower plate for plasma CVD apparatus
#3034SILICIDE FORMING METHOD AND SYSTEM THEREOF
#3035Ceiling electrode with process gas dispersers housing plural inductive RF power applicators extending into the plasma
#3036Multiple-electrode plasma processing systems with confined process chambers and interior-bussed electrical connections with the electrodes
#3037Electrode and Vacuum Processing Apparatus
#3038SHOWER PLATE, AND PLASMA PROCESSING APPARATUS, PLASMA PROCESSING METHOD AND ELECTRONIC DEVICE MANUFACTURING METHOD USING THE SHOWER PLATE
#3039SELECTIVE INDUCTIVE DOUBLE PATTERNING
#3040FLOWABLE DIELECTRIC EQUIPMENT AND PROCESSES
#3041PLASMA PROCESS EMPLOYING MULTIPLE ZONE GAS DISTRIBUTION FOR IMPROVED UNIFORMITY OF CRITICAL DIMENSION BIAS
#3042Plasma reactor with center-fed multiple zone gas distribution for improved uniformity of critical dimension bias
#3043Plasma Processing Apparatus
#3044Substrate processing system for performing exposure process in gas atmosphere
#3045End point detection method, end point detection device, and gas phase reaction processing apparatus equipped with end point detection device
#3046COMPONENTS FOR USE IN A PLASMA CHAMBER HAVING REDUCED PARTICLE GENERATION AND METHOD OF MAKING
#3047Process gas introducing mechanism and plasma processing device
#3048PLASMA PROCESSING APPARATUS AND METHOD
#3049METHOD TO PREVENT PARASITIC PLASMA GENERATION IN GAS FEEDTHRU OF LARGE SIZE PECVD CHAMBER
#3050Plasma Processing Apparatus and the Upper Electrode Unit
#3051Microwave plasma processing device
#3052Plasma generator systems and methods of forming plasma
#3053Apparatus for depositing silicon-based thin film and method for depositing silicon-based thin film
#3054Method for forming amorphous carbon film
#3055LIQUID CRYSTAL DISPLAY DEVICE MANUFACTURING METHOD AND LIQUID CRYSTAL DISPLAY DEVICE
#3056Down-stream plasma etching with deflectable radical stream
#3057Plasma processing apparatus
#3058SYSTEMS AND METHODS FOR DEPOSITION
#3059METHOD AND APPARATUS FOR CONTROLLING GAS INJECTION IN PROCESS CHAMBER
#3060Mono-energetic neutral beam activated chemical processing system and method of using
#3061Gas flow distribution receptacles, plasma generator systems, and methods for performing plasma stripping processes
#3062Shower head and substrate processing apparatus
#3063Plasma processing apparatus
#3064Shower head and substrate processing apparatus
#3065METHOD FOR MANUFACTURING SHOWER PLATE, SHOWER PLATE MANUFACTURED USING THE METHOD, AND PLASMA PROCESSING APPARATUS INCLUDING THE SHOWER PLATE
#3066ELECTRODE UNIT, SUBSTRATE PROCESSING APPARATUS, AND TEMPERATURE CONTROL METHOD FOR ELECTRODE UNIT
#3067Apparatus and method for plasma etching
#3068Cover part, process gas diffusing and supplying unit, and substrate processing apparatus
#3069Electrode for plasma processing apparatus, plasma processing apparatus, plasma processing method and storage medium
#3070ETCH RATE AND CRITICAL DIMENSION UNIFORMITY BY SELECTION OF FOCUS RING MATERIAL
#3071MULTIPLE PORT GAS INJECTION SYSTEM UTILIZED IN A SEMICONDUCTOR PROCESSING SYSTEM
#3072METHOD OF SUBSTRATE TREATMENT, RECORDING MEDIUM AND SUBSTRATE TREATING APPARATUS
#3073Method to control uniformity using tri-zone showerhead
#3074METHOD AND SYSTEM FOR CONTROLLING CENTER-TO-EDGE DISTRIBUTION OF SPECIES WITHIN A PLASMA
#3075Hollow cathode device and method for using the device to control the uniformity of a plasma process
#3076Gas flow equalizer plate suitable for use in a substrate process chamber
#3077SHOWER HEAD STRUCTURE FOR PROCESSING SEMICONDUCTOR
#3078Plasma processing method
#3079Method of making an electrode assembly for plasma processing apparatus
#3080Method and Apparatus for Plasma Process Performance Matching in Multiple Wafer Chambers
#3081Plasma processing apparatus
#3082Film Forming and Cleaning Method
#3083Plasma processing apparatus
#3084HARDMASK OPEN PROCESS WITH ENHANCED CD SPACE SHRINK AND REDUCTION
#3085Gas supply system, substrate processing apparatus and gas supply method
#3086AUTOMATIC INSITU POST PROCESS CLEANING FOR PROCESSING SYSTEMS HAVING TURBO PUMPS
#3087Fabrication of a silicon structure and deep silicon etch with profile control
#3088Plasma Doping Method and Apparatus
#3089Heated showerhead assembly
#3090Substrate processing method, substrate processing apparatus and recording medium
#3091SHOWERHEAD INSULATOR AND ETCH CHAMBER LINER
#3092Film-forming apparatus
#3093SURFACE PROCESSING APPARATUS
#3094Methods and apparatus for a wide conductance kit
#3095PLASMA PROCESSING APPARATUS AND SEMICONDUCTOR ELEMENT MANUFACTURED BY SUCH APPARATUS
#3096PLASMA ETCHING METHOD
#3097Method for in-situ refurbishing a ceramic substrate holder
#3098APPARATUS FOR TREATING SUBSTRATE
#3099Method and system for plasma enhanced chemical vapor deposition
#3100CVD showerhead alignment apparatus
#3101Composite showerhead electrode assembly for a plasma processing apparatus
#3102ATMOSPHERIC-PRESSURE PLASMA REACTOR
#3103Plasma reactor gas distribution plate having path splitting manifold side-by-side with showerhead
#3104Plasma reactor gas distribution plate having a vertically stacked path splitting manifold
#3105Plasma reactor gas distribution plate with radially distributed path splitting manifold
#3106Batch-type remote plasma processing apparatus
#3107Thin-film deposition apparatus using discharge electrode and solar cell fabrication method
#3108Dual zone gas injection nozzle
#3109Plasma reactor gas distribution plate having a path splitting manifold immersed within a showerhead
#3110Gas distribution plate with annular plenum having a sloped ceiling for uniform distribution
#3111Method and apparatus for removing polymer from the wafer backside and edge
#3112Plasma treatment apparatus and plasma treatment method
#3113Vapor-phase process apparatus, vapor-phase process method, and substrate
#3114PROCESSING APPARATUS, EXHAUST PROCESSING PROCESS AND PLASMA PROCESSING PROCESS
#3115Suppressor of hollow cathode discharge in a shower head fluid distribution system
#3116Gas shower plate for plasma processing apparatus
#3117Process and apparatus for atmospheric pressure plasma enhanced chemical vapor deposition coating of a substrate
#3118Multi-station plasma reactor with multiple plasma regions
#3119Method of manufacturing semiconductor device, film deposition method, and film deposition apparatus
#3120Plasma processing method and plasma processing apparatus
#3121SPUTTERING APPARATUS AND SPUTTERING METHOD
#3122COATING DEVICE AND METHOD OF PRODUCING AN ELECTRODE ASSEMBLY
#3123Batch-type remote plasma processing apparatus
#3124Phase change alloy etch
#3125Plasma processing apparatus and plasma processing method
#3126Film formation apparatus and method for using same
#3127METHODS OF MAKING GAS DISTRIBUTION MEMBERS FOR PLASMA PROCESSING APPARATUSES
#3128Shower plate and substrate processing apparatus
#3129Gas Supply Pipe for Plasma Treatment
#3130PROCESSING APPARATUS, EXHAUST PROCESSING PROCESS AND PLASMA PROCESSING PROCESS
#3131METHOD FOR REMOVING OXIDES
#3132Plasma-enhanced cyclic layer deposition process for barrier layers
#3133Gas diffusion shower head design for large area plasma enhanced chemical vapor deposition
#3134RF RETURN PLATES FOR BACKING PLATE SUPPORT
#3135SUPPORT ASSEMBLY
#3136APPARATUS AND METHOD FOR PLASMA ETCHING
#3137PROCESSING APPARATUS, EXHAUST PROCESSING PROCESS AND PLASMA PROCESSING PROCESS
#3138Showerhead assembly
#3139Temperature controlled showerhead
#3140Method of manufacturing semiconductor device
#3141Corrosion-resistant gas distribution plate for plasma processing chamber
#3142PROCESSING APPARATUS, EXHAUST PROCESSING PROCESS AND PLASMA PROCESSING PROCESS
#3143Integrated steerability array arrangement for minimizing non-uniformity
#3144Plasma processing apparatus and method
#3145PECVD PROCESS CHAMBER WITH COOLED BACKING PLATE
#3146Method and apparatus for deposition
#3147Plasma processing apparatus
#3148PLASMA PROCESSING APPARATUS
#3149Methods for treating surfaces, and methods for removing one or more materials from surfaces
#3150Film coating system and isolating device thereof
#3151Method of Manufacturing Semiconductor Device
#3152Alternate gas delivery and evacuation system for plasma processing apparatuses
#3153Method of processing a workpiece in a plasma reactor with independent wafer edge process gas injection
#3154Cathode liner with wafer edge gas injection in a plasma reactor chamber
#3155Apparatus for cyclical depositing of thin films
#3156Processing apparatus and processing method
#3157SUCTION DEVICE FOR PLASMA COATING CHAMBER
#3158Dual Top Gas Feed Through Distributor for High Density Plasma Chamber
#3159APPARATUS AND METHOD FOR PLASMA DOPING
#3160Method of manufacturing semiconductor device
#3161Plasma processing method for forming a film and an electronic component manufactured by the method
#3162Flat panel display manufacturing apparatus
#3163RF choke for gas delivery to an RF driven electrode in a plasma processing apparatus
#3164PLASMA PROCESSING APPARATUS AND PLASMA GENERATION CHAMBER
#3165Remote Plasma Atomic Layer Deposition Apparatus and Method Using Dc Bias
#3166Diffuser gravity support
#3167SUBSTRATE PROCESSING APPARATUS AND SHOWER HEAD
#3168Shower Plate and Plasma Treatment Apparatus Using Shower Plate
#3169Amorphous carbon film forming method and device
#3170Gas supply mechanism and substrate processing apparatus
#3171Method and apparatus for manufacturing semiconductor device, and storage medium
#3172Particle Reduction Through Gas and Plasma Source Control
#3173Evacuation method and storage medium
#3174Gas supply system and gas supply accumulation unit of semiconductor manufacturing apparatus
#3175Substrate cleaning chamber and components
#3176Plasma based ion implantation system
#3177Plasma immersion ion implantation with highly uniform chamber seasoning process for a toroidal source reactor
#3178Method and system for introducing process fluid through a chamber component
#3179Component, an apparatus and a method for the manufacture of a layer system
#3180PLASMA PROCESSING APPARATUS
#3181Hollow anode plasma reactor and method
#3182Method for front end of line fabrication
#3183PECVD process chamber backing plate reinforcement
#3184Apparatus and process for plasma-enhanced atomic layer deposition
#3185Media Injector
#3186Apparatus and method for removing a photoresist structure from a substrate
#3187METHOD OF FORMING AMORPHOUS CARBON LAYER USING CROSS TYPE HYDROCARBON COMPOUND AND METHOD OF FORMING LOW-K DIELECTRIC LAYER USING THE SAME
#3188APPARATUS AND METHOD FOR INTEGRATED SURFACE TREATMENT AND FILM DEPOSITION
#3189Plasma processing apparatus
#3190Substrate Processing Apparatus and Reaction Container
#3191Substrate processing apparatus and reaction container
#3192ATOMIC LAYER DEPOSITION REACTOR
#3193Substrate processing apparatus and substrate processing method
#3194Plasma processing apparatus
#3195MULTIFLOW INTEGRATED ICP SOURCE
#3196PLASMA REACTOR WITH AN OVERHEAD INDUCTIVE ANTENNA AND AN OVERHEAD GAS DISTRIBUTION SHOWERHEAD
#3197Multichannel array as window protection
#3198Gas flow diffuser
#3199Plasma CVD apparatus and film deposition method
#3200Dynamic control of process chemistry for improved within-substrate process uniformity
#3201Substrate processing apparatus and electrode structure
#3202SPUTTERING SYSTEM
#3203Plasma Reaction Apparatus Having Pre-Seasoned Showerheads and Methods for Manufacturing the Same
#3204PLASMA PROCESSING APPARATUS, CLEANING METHOD THEREOF, CONTROL PROGRAM AND COMPUTER STORAGE MEDIUM
#3205Plasma Processing Method
#3206Method and system for distributing gas for a bevel edge etcher
#3207Plasma film-forming apparatus and plasma film-forming method
#3208Plasma process for inductively coupling power through a gas distribution plate while adjusting plasma distribution
#3209Silicon carbide gas distribution plate and RF electrode for plasma etch chamber
#3210Method and apparatus for controlling gas flow to a processing chamber
#3211Method and apparatus for controlling gas flow to a processing chamber
#3212Shower head and cvd apparatus using the same
#3213Apparatus and method for focused electric field enhanced plasma-based ion implantation
#3214surface treatment apparatus
#3215Multi-zone gas distribution system for a treatment system
#3216Process for wafer backside polymer removal and wafer front side photoresist removal
#3217GAS DISTRIBUTION UNIFORMITY IMPROVEMENT BY BAFFLE PLATE WITH MULTI-SIZE HOLES FOR LARGE SIZE PECVD SYSTEMS
#3218Surface processing apparatus
#3219Plasma Generator Apparatus
#3220Control Method for plasma etching apparatus
#3221Methods and apparatuses for controlling gas flow conductance in a capacitively-coupled plasma processing chamber
#3222PLASMA PROCESSING APPARATUS
#3223Showerhead electrode assembly with gas flow modification for extended electrode life
#3224Substrate damage prevention system and method
#3225Hyperthermal neutral beam source and method of operating
#3226Plasma processing apparatus
#3227PLASMA PROCESSING APPARATUS
#3228Substrate processing apparatus and reaction container
#3229Gas baffle and distributor for semiconductor processing chamber
#3230Dual top gas feed through distributor for high density plasma chamber
#3231DUAL TOP GAS FEED THROUGH DISTRIBUTOR FOR HIGH DENSITY PLASMA CHAMBER
#3232Substrate processing system for performing exposure process in gas atmosphere
#3233SYSTEM AND METHOD FOR CONTAINMENT SHIELDING DURING PECVD DEPOSITION PROCESSES
#3234SYSTEM AND METHOD FOR HIGH-ENERGY SPUTTERING USING RETURN CONDUCTORS
#3235PLASMA CONFINEMENT BAFFLE AND FLOW EQUALIZER FOR ENHANCED MAGNETIC CONTROL OF PLASMA RADIAL DISTRIBUTION
#3236Vacuum processing apparatus
#3237Hollow cathode discharging apparatus
#3238Plasma apparatus and plasma processing method
#3239Mask etch plasma reactor with variable process gas distribution
#3240Method and apparatus for photomask plasma etching
#3241Suspension for showerhead in process chamber
#3242Gas sealing skirt for suspended showerhead in process chamber
#3243Ashing system
#3244APPARATUS FOR DEPOSITING THIN FILM AND METHOD OF DEPOSITING THE SAME
#3245RF plasma reactor having a distribution chamber with at least one grid
#3246Batch-Type Remote Plasma Processing Apparatus
#3247By-product collecting processes for cleaning processes
#3248Methods of and apparatus for accessing a process chamber using a dual zone gas injector with improved optical access
#3249Film formation method and apparatus for forming silicon oxide film
#3250Substrate processing system, gas supply unit, method of substrate processing, computer program, and storage medium
#3251High chamber temperature process and chamber design for photo-resist stripping and post-metal etch passivation
#3252Enhanced virtual anode
#3253Plasma processing apparatus capable of adjusting pressure within processing chamber
#3254Batch-type remote plasma processing apparatus
#3255Batch-Type Remote Plasma Processing Apparatus
#3256Oxidation method and apparatus for semiconductor process
#3257Surface Processing Apparatus
#3258Methods of cleaning processing chamber in semiconductor device fabrication equipment
#3259SUBSTRATE TREATMENT APPARATUS AND CLEANING METHOD
#3260Method and Apparatus for the Etching of Microstructures
#3261Capacitively coupled plasma reactor with magnetic plasma control
#3262Diffuser plate with slit valve compensation
#3263PROCESSING APPARATUS, EXHAUST PROCESSING PROCESS AND PLASMA PROCESSING PROCESS
#3264Plasma processing method
#3265Plasma Processing Apparatus And Method
#3266Plasma process for surface treatment of workpieces
#3267Edge gas injection for critical dimension uniformity improvement
#3268PLASMA PROCESSING APPARATUS AND PLASMA PROCESSING METHOD
#3269Etching method, plasma processing system and storage medium
#3270PROCESS CHAMBER FOR DIELECTRIC GAPFILL
#3271Semiconductor device manufacturing apparatus and method of using the same
#3272Apparatus and method for avoidance of parasitic plasma in plasma source gas supply conduits
#3273REACTIVE SPUTTERING ZINC OXIDE TRANSPARENT CONDUCTIVE OXIDES ONTO LARGE AREA SUBSTRATES
#3274SEMICONDUCTOR MANUFACTURING APPARATUS
#3275Apparatus for etching high aspect ratio features
#3276Plasma etch process with separately fed carbon-lean and carbon-rich polymerizing etch gases in independent inner and outer gas injection zones
#3277Plasma etch process using polymerizing etch gases and an inert diluent gas in independent gas injection zones to improve etch profile or etch rate uniformity
#3278Plasma processing method for forming a silicon nitride film on a silicon oxide film
#3279Method of operating a plasma reactor having an overhead electrode with a fixed impedance match element
#3280Plasma reactor apparatus with multiple gas injection zones having time-changing separate configurable gas compositions for each zone
#3281Plasma processing apparatus having an evacuating arrangement to evacuate gas from a gas-introducing part of a process chamber
#3282Plasma etch reactor with distribution of etch gases across a wafer surface and a polymer oxidizing gas in an independently fed center gas zone
#3283Batch-type remote plasma processing apparatus
#3284Process for preparation of multi-thin layered structure
#3285Reactive sputtering chamber with gas distribution tubes
#3286Reduced contaminant gas injection system and method of using
#3287Method of removing residue from a substrate
#3288SPUTTER CHAMBER FOR COATING A SUBSTRATE
#3289Plasma processing apparatus
#3290Plasma treatment apparatus
#3291ETCHING METHOD
#3292Substrate Processing Apparatus
#3293Process for producing materials for electronic device
#3294APPARATUS AND PROCESS FOR SURFACE TREATMENT OF SUBSTRATE USING AN ACTIVATED REACTIVE GAS
#3295Plasma etching apparatus and plasma etching method
#3296APPARATUS FOR CLEANING CHAMBER USING GAS SEPARATION TYPE SHOWERHEAD
#3297Apparatus and method of gas injection sequencing
#3298Apparatus and method for plasma etching
#3299Gas port assembly
#3300Process tuning gas injection from the substrate edge