ClassID:

205327

H01J37/3244 - page 11 - CPC Classification

Classification description:

Discharge tubes with provision for introducing objects or material to be exposed to the discharge, e.g. for the purpose of examination or processing thereof; Gas-filled discharge tubes; Constructional details of the reactor Gas supply means

Recent Application in this class:
#3001
20100071210
2010-03-25

METHODS FOR FABRICATING FACEPLATE OF SEMICONDUCTOR APPARATUS

#3002
20100065214
2010-03-18

Showerhead electrode assembly for plasma processing apparatuses

#3003
20100055347
2010-03-04

Activated gas injector, film deposition apparatus, and film deposition method

#3004
20100051592
2010-03-04

Electrode design for plasma processing chamber

#3005
20100048022
2010-02-25

SEMICONDUCTOR MANUFACTURING APPARATUS AND METHOD OF MANUFACTURING SEMICONDUCTOR DEVICE

#3006
20100043975
2010-02-25

Movable gas introduction structure and substrate processing apparatus having same

#3007
20100041238
2010-02-18

Tunable multi-zone gas injection system

#3008
20100037824
2010-02-18

Plasma Reactor Having Injector

#3009
20100037822
2010-02-18

VACUUM PROCESSING APPARATUS

#3010
20100034985
2010-02-11

Apparatus and method for the plasma treatment of hollow bodies

#3011
20100033096
2010-02-11

Atmospheric pressure plasma apparatus

#3012
20100029024
2010-02-04

Plasma processing method

#3013
20100025370
2010-02-04

REACTIVE GAS DISTRIBUTOR, REACTIVE GAS TREATMENT SYSTEM, AND REACTIVE GAS TREATMENT METHOD

#3014
20100024840
2010-02-04

CHAMBER PLASMA-CLEANING PROCESS SCHEME

#3015
20100022099
2010-01-28

Method of forming non-conformal layers

#3016
20100022091
2010-01-28

METHOD FOR PLASMA ETCHING POROUS LOW-K DIELECTRIC LAYERS

#3017
20100018649
2010-01-28

Plasma processing apparatus and method

#3018
20100009098
2010-01-14

ATMOSPHERIC PRESSURE PLASMA ELECTRODE

#3019
20100006543
2010-01-14

Plasma processing apparatus, plasma processing method and storage medium

#3020
20100006226
2010-01-14

Apparatus for generating hollow cathode plasma and apparatus for treating large area substrate using hollow cathode plasma

#3021
20100003829
2010-01-07

Clamped monolithic showerhead electrode

#3022
20100003824
2010-01-07

Clamped showerhead electrode assembly

#3023
20100000683
2010-01-07

Showerhead electrode

#3024
20090325386
2009-12-31

Process and System For Varying the Exposure to a Chemical Ambient in a Process Chamber

#3025
20090324847
2009-12-31

Method of avoiding a parasitic plasma in a plasma source gas supply conduit

#3026
20090320756
2009-12-31

MICROWAVE PLASMA PROCESSING APPARATUS

#3027
20090314635
2009-12-24

PLASMA PROCESSING APPARATUS, PLASMA PROCESSING METHOD, AND ORGANIC ELECTRON DEVICE

#3028
20090314432
2009-12-24

Baffle plate and substrate processing apparatus

#3029
20090311876
2009-12-17

Manufacturing method of semiconductor device and substrate processing apparatus

#3030
20090311870
2009-12-17

PLASMA ETCHING METHOD AND PLASMA ETCHING APPARATUS

#3031
20090311869
2009-12-17

SHOWER PLATE AND MANUFACTURING METHOD THEREOF, AND PLASMA PROCESSING APPARATUS, PLASMA PROCESSING METHOD AND ELECTRONIC DEVICE MANUFACTURING METHOD USING THE SHOWER PLATE

#3032
20090305427
2009-12-10

Apparatus and process for sensing fluoro species in semiconductor processing systems

#3033
20090299701
2009-12-03

Method for designing shower plate for plasma CVD apparatus

#3034
20090298288
2009-12-03

SILICIDE FORMING METHOD AND SYSTEM THEREOF

#3035
20090294065
2009-12-03

Ceiling electrode with process gas dispersers housing plural inductive RF power applicators extending into the plasma

#3036
20090288773
2009-11-26

Multiple-electrode plasma processing systems with confined process chambers and interior-bussed electrical connections with the electrodes

#3037
20090288602
2009-11-26

Electrode and Vacuum Processing Apparatus

#3038
20090286405
2009-11-19

SHOWER PLATE, AND PLASMA PROCESSING APPARATUS, PLASMA PROCESSING METHOD AND ELECTRONIC DEVICE MANUFACTURING METHOD USING THE SHOWER PLATE

#3039
20090286397
2009-11-19

SELECTIVE INDUCTIVE DOUBLE PATTERNING

#3040
20090277587
2009-11-12

FLOWABLE DIELECTRIC EQUIPMENT AND PROCESSES

#3041
20090275206
2009-11-05

PLASMA PROCESS EMPLOYING MULTIPLE ZONE GAS DISTRIBUTION FOR IMPROVED UNIFORMITY OF CRITICAL DIMENSION BIAS

#3042
20090272492
2009-11-05

Plasma reactor with center-fed multiple zone gas distribution for improved uniformity of critical dimension bias

#3043
20090266488
2009-10-29

Plasma Processing Apparatus

#3044
20090263974
2009-10-22

Substrate processing system for performing exposure process in gas atmosphere

#3045
20090263911
2009-10-22

End point detection method, end point detection device, and gas phase reaction processing apparatus equipped with end point detection device

#3046
20090261065
2009-10-22

COMPONENTS FOR USE IN A PLASMA CHAMBER HAVING REDUCED PARTICLE GENERATION AND METHOD OF MAKING

#3047
20090260762
2009-10-22

Process gas introducing mechanism and plasma processing device

#3048
20090258162
2009-10-15

PLASMA PROCESSING APPARATUS AND METHOD

#3049
20090255798
2009-10-15

METHOD TO PREVENT PARASITIC PLASMA GENERATION IN GAS FEEDTHRU OF LARGE SIZE PECVD CHAMBER

#3050
20090255631
2009-10-15

Plasma Processing Apparatus and the Upper Electrode Unit

#3051
20090250444
2009-10-08

Microwave plasma processing device

#3052
20090250334
2009-10-08

Plasma generator systems and methods of forming plasma

#3053
20090246942
2009-10-01

Apparatus for depositing silicon-based thin film and method for depositing silicon-based thin film

#3054
20090246407
2009-10-01

Method for forming amorphous carbon film

#3055
20090244471
2009-10-01

LIQUID CRYSTAL DISPLAY DEVICE MANUFACTURING METHOD AND LIQUID CRYSTAL DISPLAY DEVICE

#3056
20090242514
2009-10-01

Down-stream plasma etching with deflectable radical stream

#3057
20090242130
2009-10-01

Plasma processing apparatus

#3058
20090238985
2009-09-24

SYSTEMS AND METHODS FOR DEPOSITION

#3059
20090236447
2009-09-24

METHOD AND APPARATUS FOR CONTROLLING GAS INJECTION IN PROCESS CHAMBER

#3060
20090236314
2009-09-24

Mono-energetic neutral beam activated chemical processing system and method of using

#3061
20090236313
2009-09-24

Gas flow distribution receptacles, plasma generator systems, and methods for performing plasma stripping processes

#3062
20090236041
2009-09-24

Shower head and substrate processing apparatus

#3063
20090229755
2009-09-17

Plasma processing apparatus

#3064
20090229754
2009-09-17

Shower head and substrate processing apparatus

#3065
20090229753
2009-09-17

METHOD FOR MANUFACTURING SHOWER PLATE, SHOWER PLATE MANUFACTURED USING THE METHOD, AND PLASMA PROCESSING APPARATUS INCLUDING THE SHOWER PLATE

#3066
20090223932
2009-09-10

ELECTRODE UNIT, SUBSTRATE PROCESSING APPARATUS, AND TEMPERATURE CONTROL METHOD FOR ELECTRODE UNIT

#3067
20090223633
2009-09-10

Apparatus and method for plasma etching

#3068
20090223449
2009-09-10

Cover part, process gas diffusing and supplying unit, and substrate processing apparatus

#3069
20090221151
2009-09-03

Electrode for plasma processing apparatus, plasma processing apparatus, plasma processing method and storage medium

#3070
20090221150
2009-09-03

ETCH RATE AND CRITICAL DIMENSION UNIFORMITY BY SELECTION OF FOCUS RING MATERIAL

#3071
20090221149
2009-09-03

MULTIPLE PORT GAS INJECTION SYSTEM UTILIZED IN A SEMICONDUCTOR PROCESSING SYSTEM

#3072
20090220692
2009-09-03

METHOD OF SUBSTRATE TREATMENT, RECORDING MEDIUM AND SUBSTRATE TREATING APPARATUS

#3073
20090218317
2009-09-03

Method to control uniformity using tri-zone showerhead

#3074
20090218315
2009-09-03

METHOD AND SYSTEM FOR CONTROLLING CENTER-TO-EDGE DISTRIBUTION OF SPECIES WITHIN A PLASMA

#3075
20090218212
2009-09-03

Hollow cathode device and method for using the device to control the uniformity of a plasma process

#3076
20090218043
2009-09-03

Gas flow equalizer plate suitable for use in a substrate process chamber

#3077
20090215205
2009-08-27

SHOWER HEAD STRUCTURE FOR PROCESSING SEMICONDUCTOR

#3078
20090214401
2009-08-27

Plasma processing method

#3079
20090211085
2009-08-27

Method of making an electrode assembly for plasma processing apparatus

#3080
20090206056
2009-08-20

Method and Apparatus for Plasma Process Performance Matching in Multiple Wafer Chambers

#3081
20090205782
2009-08-20

Plasma processing apparatus

#3082
20090202720
2009-08-13

Film Forming and Cleaning Method

#3083
20090194235
2009-08-06

Plasma processing apparatus

#3084
20090191711
2009-07-30

HARDMASK OPEN PROCESS WITH ENHANCED CD SPACE SHRINK AND REDUCTION

#3085
20090191337
2009-07-30

Gas supply system, substrate processing apparatus and gas supply method

#3086
20090188524
2009-07-30

AUTOMATIC INSITU POST PROCESS CLEANING FOR PROCESSING SYSTEMS HAVING TURBO PUMPS

#3087
20090184089
2009-07-23

Fabrication of a silicon structure and deep silicon etch with profile control

#3088
20090181526
2009-07-16

Plasma Doping Method and Apparatus

#3089
20090179085
2009-07-16

Heated showerhead assembly

#3090
20090179003
2009-07-16

Substrate processing method, substrate processing apparatus and recording medium

#3091
20090178763
2009-07-16

SHOWERHEAD INSULATOR AND ETCH CHAMBER LINER

#3092
20090178614
2009-07-16

Film-forming apparatus

#3093
20090173444
2009-07-09

SURFACE PROCESSING APPARATUS

#3094
20090173389
2009-07-09

Methods and apparatus for a wide conductance kit

#3095
20090166622
2009-07-02

PLASMA PROCESSING APPARATUS AND SEMICONDUCTOR ELEMENT MANUFACTURED BY SUCH APPARATUS

#3096
20090166328
2009-07-02

PLASMA ETCHING METHOD

#3097
20090166327
2009-07-02

Method for in-situ refurbishing a ceramic substrate holder

#3098
20090165722
2009-07-02

APPARATUS FOR TREATING SUBSTRATE

#3099
20090165716
2009-07-02

Method and system for plasma enhanced chemical vapor deposition

#3100
20090165279
2009-07-02

CVD showerhead alignment apparatus

#3101
20090163034
2009-06-25

Composite showerhead electrode assembly for a plasma processing apparatus

#3102
20090162263
2009-06-25

ATMOSPHERIC-PRESSURE PLASMA REACTOR

#3103
20090162262
2009-06-25

Plasma reactor gas distribution plate having path splitting manifold side-by-side with showerhead

#3104
20090162261
2009-06-25

Plasma reactor gas distribution plate having a vertically stacked path splitting manifold

#3105
20090162260
2009-06-25

Plasma reactor gas distribution plate with radially distributed path splitting manifold

#3106
20090159440
2009-06-25

Batch-type remote plasma processing apparatus

#3107
20090159432
2009-06-25

Thin-film deposition apparatus using discharge electrode and solar cell fabrication method

#3108
20090159424
2009-06-25

Dual zone gas injection nozzle

#3109
20090159213
2009-06-25

Plasma reactor gas distribution plate having a path splitting manifold immersed within a showerhead

#3110
20090159002
2009-06-25

Gas distribution plate with annular plenum having a sloped ceiling for uniform distribution

#3111
20090156013
2009-06-18

Method and apparatus for removing polymer from the wafer backside and edge

#3112
20090152242
2009-06-18

Plasma treatment apparatus and plasma treatment method

#3113
20090148704
2009-06-11

Vapor-phase process apparatus, vapor-phase process method, and substrate

#3114
20090145555
2009-06-11

PROCESSING APPARATUS, EXHAUST PROCESSING PROCESS AND PLASMA PROCESSING PROCESS

#3115
20090145553
2009-06-11

Suppressor of hollow cathode discharge in a shower head fluid distribution system

#3116
20090145359
2009-06-11

Gas shower plate for plasma processing apparatus

#3117
20090142511
2009-06-04

Process and apparatus for atmospheric pressure plasma enhanced chemical vapor deposition coating of a substrate

#3118
20090139453
2009-06-04

Multi-station plasma reactor with multiple plasma regions

#3119
20090137087
2009-05-28

Method of manufacturing semiconductor device, film deposition method, and film deposition apparatus

#3120
20090134120
2009-05-28

Plasma processing method and plasma processing apparatus

#3121
20090134012
2009-05-28

SPUTTERING APPARATUS AND SPUTTERING METHOD

#3122
20090133631
2009-05-28

COATING DEVICE AND METHOD OF PRODUCING AN ELECTRODE ASSEMBLY

#3123
20090133630
2009-05-28

Batch-type remote plasma processing apparatus

#3124
20090130855
2009-05-21

Phase change alloy etch

#3125
20090127227
2009-05-21

Plasma processing apparatus and plasma processing method

#3126
20090124083
2009-05-14

Film formation apparatus and method for using same

#3127
20090120583
2009-05-14

METHODS OF MAKING GAS DISTRIBUTION MEMBERS FOR PLASMA PROCESSING APPARATUSES

#3128
20090120582
2009-05-14

Shower plate and substrate processing apparatus

#3129
20090120363
2009-05-14

Gas Supply Pipe for Plasma Treatment

#3130
20090114155
2009-05-07

PROCESSING APPARATUS, EXHAUST PROCESSING PROCESS AND PLASMA PROCESSING PROCESS

#3131
20090111280
2009-04-30

METHOD FOR REMOVING OXIDES

#3132
20090111264
2009-04-30

Plasma-enhanced cyclic layer deposition process for barrier layers

#3133
20090104376
2009-04-23

Gas diffusion shower head design for large area plasma enhanced chemical vapor deposition

#3134
20090101069
2009-04-23

RF RETURN PLATES FOR BACKING PLATE SUPPORT

#3135
20090095621
2009-04-16

SUPPORT ASSEMBLY

#3136
20090095423
2009-04-16

APPARATUS AND METHOD FOR PLASMA ETCHING

#3137
20090095420
2009-04-16

PROCESSING APPARATUS, EXHAUST PROCESSING PROCESS AND PLASMA PROCESSING PROCESS

#3138
20090095334
2009-04-16

Showerhead assembly

#3139
20090095220
2009-04-16

Temperature controlled showerhead

#3140
20090093124
2009-04-09

Method of manufacturing semiconductor device

#3141
20090087615
2009-04-02

Corrosion-resistant gas distribution plate for plasma processing chamber

#3142
20090084500
2009-04-02

PROCESSING APPARATUS, EXHAUST PROCESSING PROCESS AND PLASMA PROCESSING PROCESS

#3143
20090078677
2009-03-26

Integrated steerability array arrangement for minimizing non-uniformity

#3144
20090078375
2009-03-26

Plasma processing apparatus and method

#3145
20090071403
2009-03-19

PECVD PROCESS CHAMBER WITH COOLED BACKING PLATE

#3146
20090065351
2009-03-12

Method and apparatus for deposition

#3147
20090065147
2009-03-12

Plasma processing apparatus

#3148
20090065146
2009-03-12

PLASMA PROCESSING APPARATUS

#3149
20090065026
2009-03-12

Methods for treating surfaces, and methods for removing one or more materials from surfaces

#3150
20090064933
2009-03-12

Film coating system and isolating device thereof

#3151
20090064765
2009-03-12

Method of Manufacturing Semiconductor Device

#3152
20090061640
2009-03-05

Alternate gas delivery and evacuation system for plasma processing apparatuses

#3153
20090057269
2009-03-05

Method of processing a workpiece in a plasma reactor with independent wafer edge process gas injection

#3154
20090056629
2009-03-05

Cathode liner with wafer edge gas injection in a plasma reactor chamber

#3155
20090056626
2009-03-05

Apparatus for cyclical depositing of thin films

#3156
20090053900
2009-02-26

Processing apparatus and processing method

#3157
20090044754
2009-02-19

SUCTION DEVICE FOR PLASMA COATING CHAMBER

#3158
20090042407
2009-02-12

Dual Top Gas Feed Through Distributor for High Density Plasma Chamber

#3159
20090042321
2009-02-12

APPARATUS AND METHOD FOR PLASMA DOPING

#3160
20090029558
2009-01-29

Method of manufacturing semiconductor device

#3161
20090026588
2009-01-29

Plasma processing method for forming a film and an electronic component manufactured by the method

#3162
20090025877
2009-01-29

Flat panel display manufacturing apparatus

#3163
20090022905
2009-01-22

RF choke for gas delivery to an RF driven electrode in a plasma processing apparatus

#3164
20090020228
2009-01-22

PLASMA PROCESSING APPARATUS AND PLASMA GENERATION CHAMBER

#3165
20090011150
2009-01-08

Remote Plasma Atomic Layer Deposition Apparatus and Method Using Dc Bias

#3166
20090007846
2009-01-08

Diffuser gravity support

#3167
20090000743
2009-01-01

SUBSTRATE PROCESSING APPARATUS AND SHOWER HEAD

#3168
20080318431
2008-12-25

Shower Plate and Plasma Treatment Apparatus Using Shower Plate

#3169
20080317976
2008-12-25

Amorphous carbon film forming method and device

#3170
20080314523
2008-12-25

Gas supply mechanism and substrate processing apparatus

#3171
20080314520
2008-12-25

Method and apparatus for manufacturing semiconductor device, and storage medium

#3172
20080302652
2008-12-11

Particle Reduction Through Gas and Plasma Source Control

#3173
20080301972
2008-12-11

Evacuation method and storage medium

#3174
20080295963
2008-12-04

Gas supply system and gas supply accumulation unit of semiconductor manufacturing apparatus

#3175
20080295872
2008-12-04

Substrate cleaning chamber and components

#3176
20080289576
2008-11-27

Plasma based ion implantation system

#3177
20080286982
2008-11-20

Plasma immersion ion implantation with highly uniform chamber seasoning process for a toroidal source reactor

#3178
20080282979
2008-11-20

Method and system for introducing process fluid through a chamber component

#3179
20080280130
2008-11-13

Component, an apparatus and a method for the manufacture of a layer system

#3180
20080277064
2008-11-13

PLASMA PROCESSING APPARATUS

#3181
20080271849
2008-11-06

Hollow anode plasma reactor and method

#3182
20080268645
2008-10-30

Method for front end of line fabrication

#3183
20080268173
2008-10-30

PECVD process chamber backing plate reinforcement

#3184
20080268171
2008-10-30

Apparatus and process for plasma-enhanced atomic layer deposition

#3185
20080264784
2008-10-30

Media Injector

#3186
20080264566
2008-10-30

Apparatus and method for removing a photoresist structure from a substrate

#3187
20080260968
2008-10-23

METHOD OF FORMING AMORPHOUS CARBON LAYER USING CROSS TYPE HYDROCARBON COMPOUND AND METHOD OF FORMING LOW-K DIELECTRIC LAYER USING THE SAME

#3188
20080260967
2008-10-23

APPARATUS AND METHOD FOR INTEGRATED SURFACE TREATMENT AND FILM DEPOSITION

#3189
20080254220
2008-10-16

Plasma processing apparatus

#3190
20080251015
2008-10-16

Substrate Processing Apparatus and Reaction Container

#3191
20080251014
2008-10-16

Substrate processing apparatus and reaction container

#3192
20080241387
2008-10-02

ATOMIC LAYER DEPOSITION REACTOR

#3193
20080237182
2008-10-02

Substrate processing apparatus and substrate processing method

#3194
20080236752
2008-10-02

Plasma processing apparatus

#3195
20080236491
2008-10-02

MULTIFLOW INTEGRATED ICP SOURCE

#3196
20080236490
2008-10-02

PLASMA REACTOR WITH AN OVERHEAD INDUCTIVE ANTENNA AND AN OVERHEAD GAS DISTRIBUTION SHOWERHEAD

#3197
20080233016
2008-09-25

Multichannel array as window protection

#3198
20080230518
2008-09-25

Gas flow diffuser

#3199
20080226838
2008-09-18

Plasma CVD apparatus and film deposition method

#3200
20080223873
2008-09-18

Dynamic control of process chemistry for improved within-substrate process uniformity

#3201
20080223523
2008-09-18

Substrate processing apparatus and electrode structure

#3202
20080217170
2008-09-11

SPUTTERING SYSTEM

#3203
20080216958
2008-09-11

Plasma Reaction Apparatus Having Pre-Seasoned Showerheads and Methods for Manufacturing the Same

#3204
20080216957
2008-09-11

PLASMA PROCESSING APPARATUS, CLEANING METHOD THEREOF, CONTROL PROGRAM AND COMPUTER STORAGE MEDIUM

#3205
20080216865
2008-09-11

Plasma Processing Method

#3206
20080216864
2008-09-11

Method and system for distributing gas for a bevel edge etcher

#3207
20080213504
2008-09-04

Plasma film-forming apparatus and plasma film-forming method

#3208
20080206483
2008-08-28

Plasma process for inductively coupling power through a gas distribution plate while adjusting plasma distribution

#3209
20080202688
2008-08-28

Silicon carbide gas distribution plate and RF electrode for plasma etch chamber

#3210
20080202610
2008-08-28

Method and apparatus for controlling gas flow to a processing chamber

#3211
20080202609
2008-08-28

Method and apparatus for controlling gas flow to a processing chamber

#3212
20080196666
2008-08-21

Shower head and cvd apparatus using the same

#3213
20080193666
2008-08-14

Apparatus and method for focused electric field enhanced plasma-based ion implantation

#3214
20080193330
2008-08-14

surface treatment apparatus

#3215
20080185104
2008-08-07

Multi-zone gas distribution system for a treatment system

#3216
20080179291
2008-07-31

Process for wafer backside polymer removal and wafer front side photoresist removal

#3217
20080178807
2008-07-31

GAS DISTRIBUTION UNIFORMITY IMPROVEMENT BY BAFFLE PLATE WITH MULTI-SIZE HOLES FOR LARGE SIZE PECVD SYSTEMS

#3218
20080156440
2008-07-03

Surface processing apparatus

#3219
20080156264
2008-07-03

Plasma Generator Apparatus

#3220
20080154422
2008-06-26

Control Method for plasma etching apparatus

#3221
20080149596
2008-06-26

Methods and apparatuses for controlling gas flow conductance in a capacitively-coupled plasma processing chamber

#3222
20080149273
2008-06-26

PLASMA PROCESSING APPARATUS

#3223
20080141941
2008-06-19

Showerhead electrode assembly with gas flow modification for extended electrode life

#3224
20080138535
2008-06-12

Substrate damage prevention system and method

#3225
20080135742
2008-06-12

Hyperthermal neutral beam source and method of operating

#3226
20080131336
2008-06-05

Plasma processing apparatus

#3227
20080128089
2008-06-05

PLASMA PROCESSING APPARATUS

#3228
20080121180
2008-05-29

Substrate processing apparatus and reaction container

#3229
20080121179
2008-05-29

Gas baffle and distributor for semiconductor processing chamber

#3230
20080121178
2008-05-29

Dual top gas feed through distributor for high density plasma chamber

#3231
20080121177
2008-05-29

DUAL TOP GAS FEED THROUGH DISTRIBUTOR FOR HIGH DENSITY PLASMA CHAMBER

#3232
20080121173
2008-05-29

Substrate processing system for performing exposure process in gas atmosphere

#3233
20080113107
2008-05-15

SYSTEM AND METHOD FOR CONTAINMENT SHIELDING DURING PECVD DEPOSITION PROCESSES

#3234
20080110752
2008-05-15

SYSTEM AND METHOD FOR HIGH-ENERGY SPUTTERING USING RETURN CONDUCTORS

#3235
20080110567
2008-05-15

PLASMA CONFINEMENT BAFFLE AND FLOW EQUALIZER FOR ENHANCED MAGNETIC CONTROL OF PLASMA RADIAL DISTRIBUTION

#3236
20080110400
2008-05-15

Vacuum processing apparatus

#3237
20080106202
2008-05-08

Hollow cathode discharging apparatus

#3238
20080102222
2008-05-01

Plasma apparatus and plasma processing method

#3239
20080102202
2008-05-01

Mask etch plasma reactor with variable process gas distribution

#3240
20080099431
2008-05-01

Method and apparatus for photomask plasma etching

#3241
20080099146
2008-05-01

Suspension for showerhead in process chamber

#3242
20080099145
2008-05-01

Gas sealing skirt for suspended showerhead in process chamber

#3243
20080096392
2008-04-24

Ashing system

#3244
20080095953
2008-04-24

APPARATUS FOR DEPOSITING THIN FILM AND METHOD OF DEPOSITING THE SAME

#3245
20080093341
2008-04-24

RF plasma reactor having a distribution chamber with at least one grid

#3246
20080093215
2008-04-24

Batch-Type Remote Plasma Processing Apparatus

#3247
20080093212
2008-04-24

By-product collecting processes for cleaning processes

#3248
20080083883
2008-04-10

Methods of and apparatus for accessing a process chamber using a dual zone gas injector with improved optical access

#3249
20080081104
2008-04-03

Film formation method and apparatus for forming silicon oxide film

#3250
20080078746
2008-04-03

Substrate processing system, gas supply unit, method of substrate processing, computer program, and storage medium

#3251
20080078744
2008-04-03

High chamber temperature process and chamber design for photo-resist stripping and post-metal etch passivation

#3252
20080067057
2008-03-20

Enhanced virtual anode

#3253
20080066859
2008-03-20

Plasma processing apparatus capable of adjusting pressure within processing chamber

#3254
20080066681
2008-03-20

Batch-type remote plasma processing apparatus

#3255
20080060580
2008-03-13

Batch-Type Remote Plasma Processing Apparatus

#3256
20080057199
2008-03-06

Oxidation method and apparatus for semiconductor process

#3257
20080053614
2008-03-06

Surface Processing Apparatus

#3258
20080041819
2008-02-21

Methods of cleaning processing chamber in semiconductor device fabrication equipment

#3259
20080041308
2008-02-21

SUBSTRATE TREATMENT APPARATUS AND CLEANING METHOD

#3260
20080035607
2008-02-14

Method and Apparatus for the Etching of Microstructures

#3261
20080023143
2008-01-31

Capacitively coupled plasma reactor with magnetic plasma control

#3262
20080020146
2008-01-24

Diffuser plate with slit valve compensation

#3263
20080014345
2008-01-17

PROCESSING APPARATUS, EXHAUST PROCESSING PROCESS AND PLASMA PROCESSING PROCESS

#3264
20080011716
2008-01-17

Plasma processing method

#3265
20080011425
2008-01-17

Plasma Processing Apparatus And Method

#3266
20070298189
2007-12-27

Plasma process for surface treatment of workpieces

#3267
20070293043
2007-12-20

Edge gas injection for critical dimension uniformity improvement

#3268
20070286967
2007-12-13

PLASMA PROCESSING APPARATUS AND PLASMA PROCESSING METHOD

#3269
20070284337
2007-12-13

Etching method, plasma processing system and storage medium

#3270
20070281106
2007-12-06

PROCESS CHAMBER FOR DIELECTRIC GAPFILL

#3271
20070266946
2007-11-22

Semiconductor device manufacturing apparatus and method of using the same

#3272
20070264443
2007-11-15

Apparatus and method for avoidance of parasitic plasma in plasma source gas supply conduits

#3273
20070261951
2007-11-15

REACTIVE SPUTTERING ZINC OXIDE TRANSPARENT CONDUCTIVE OXIDES ONTO LARGE AREA SUBSTRATES

#3274
20070261639
2007-11-15

SEMICONDUCTOR MANUFACTURING APPARATUS

#3275
20070256785
2007-11-08

Apparatus for etching high aspect ratio features

#3276
20070254486
2007-11-01

Plasma etch process with separately fed carbon-lean and carbon-rich polymerizing etch gases in independent inner and outer gas injection zones

#3277
20070254483
2007-11-01

Plasma etch process using polymerizing etch gases and an inert diluent gas in independent gas injection zones to improve etch profile or etch rate uniformity

#3278
20070254113
2007-11-01

Plasma processing method for forming a silicon nitride film on a silicon oxide film

#3279
20070251920
2007-11-01

Method of operating a plasma reactor having an overhead electrode with a fixed impedance match element

#3280
20070251642
2007-11-01

Plasma reactor apparatus with multiple gas injection zones having time-changing separate configurable gas compositions for each zone

#3281
20070251453
2007-11-01

Plasma processing apparatus having an evacuating arrangement to evacuate gas from a gas-introducing part of a process chamber

#3282
20070247075
2007-10-25

Plasma etch reactor with distribution of etch gases across a wafer surface and a polymer oxidizing gas in an independently fed center gas zone

#3283
20070246355
2007-10-25

Batch-type remote plasma processing apparatus

#3284
20070243386
2007-10-18

Process for preparation of multi-thin layered structure

#3285
20070235320
2007-10-11

Reactive sputtering chamber with gas distribution tubes

#3286
20070235136
2007-10-11

Reduced contaminant gas injection system and method of using

#3287
20070231992
2007-10-04

Method of removing residue from a substrate

#3288
20070227882
2007-10-04

SPUTTER CHAMBER FOR COATING A SUBSTRATE

#3289
20070227668
2007-10-04

Plasma processing apparatus

#3290
20070227660
2007-10-04

Plasma treatment apparatus

#3291
20070221618
2007-09-27

ETCHING METHOD

#3292
20070221130
2007-09-27

Substrate Processing Apparatus

#3293
20070218687
2007-09-20

Process for producing materials for electronic device

#3294
20070218204
2007-09-20

APPARATUS AND PROCESS FOR SURFACE TREATMENT OF SUBSTRATE USING AN ACTIVATED REACTIVE GAS

#3295
20070209759
2007-09-13

Plasma etching apparatus and plasma etching method

#3296
20070209686
2007-09-13

APPARATUS FOR CLEANING CHAMBER USING GAS SEPARATION TYPE SHOWERHEAD

#3297
20070204907
2007-09-06

Apparatus and method of gas injection sequencing

#3298
20070199657
2007-08-30

Apparatus and method for plasma etching

#3299
20070194039
2007-08-23

Gas port assembly

#3300
20070193688
2007-08-23

Process tuning gas injection from the substrate edge