Apparatus for generating remote plasma

SUBSTRATE PROCESSING APPARATUS AND SUBSTRATE PROCESSING METHOD

Plasma processing apparatus

Apparatus and method for plasma etching

PLASMA PROCESSING APPARATUS AND PLASMA PROCESSING METHOD

Gas supply system, substrate processing apparatus and gas supply method

GAS SUPPLY SYSTEM, SUBSTRATE PROCESSING APPARATUS AND GAS SUPPLY METHOD

Methods and apparatus for in-situ substrate processing

Film-forming apparatus

Equipment innovations for nano-technology aquipment, especially for plasma growth chambers of carbon nanotube and nanowire

Plasma processing apparatus and plasma processing method

Gas distribution apparatuses and methods for controlling gas distribution apparatuses

Etch chamber

Plasma processing apparatus

Gas dispersion shield and method

GAS SEPARATION TYPE SHOWERHEAD

Gas switching section including valves having different flow coefficients for gas distribution system

Method and apparatus for glow discharge plasma treatment of flexible material at atmospheric pressure

GAS SUPPLY SYSTEM, SUBSTRATE PROCESSING APPARATUS, AND GAS SUPPLY METHOD

Cleaning method used in removing contaminants from a solid yttrium oxide-containing substrate

Chemical vapor deposition apparatus and electrode plate thereof

Highly efficient gas distribution arrangement for plasma tube of a plasma processing chamber

Sputtering apparatus

Shower plate, plasma processing apparatus, and product manufacturing method

ETCHING APPARATUS AND ETCHING METHOD

Plasma processing apparatus

Plasma processing apparatus

Surface-treatment method and equipment

Plasma process device and plasma process method

Gas Supplying unit and substrate processing apparatus

Chamber dry cleaning

Apparatus and process for plasma-enhanced atomic layer deposition

Apparatus and process for plasma-enhanced atomic layer deposition

APPARATUS AND PROCESS FOR PLASMA-ENHANCED ATOMIC LAYER DEPOSITION

APPARATUS AND PROCESS FOR PLASMA-ENHANCED ATOMIC LAYER DEPOSITION

APPARATUS AND PROCESS FOR PLASMA-ENHANCED ATOMIC LAYER DEPOSITION

Method and apparatus for an improved upper electrode plate in a plasma processing system

APPARATUS FOR CYCLICAL DEPOSITING OF THIN FILMS

Electromagnetic treatment in atmospheric-plasma coating process

Plasma treatment apparatus

Apparatus and method for growth of a thin film

Plasma processing chamber

Plasma processing method and plasma processing apparatus

Plasma processing method and apparatus

Hyperthermal neutral beam source and method of operating

Apparatus and methods to remove films on bevel edge and backside of wafer

Method and system for controlling radical distribution

Fast gas switching plasma processing apparatus

Plasma processing device

Method and apparatus for processing substrates

Gas-permeable plasma electrode, method for production of the gas-permeable plasma electrode, and a parallel-plate reactor

Apparatus and method for processing a microfeature workpiece using a plasma

Plasma processing apparatus

Two-piece dome with separate RF coils for inductively coupled plasma reactors

Method and apparatus for an improved upper electrode plate with deposition shield in a plasma processing system

Plasma etching apparatus

Plasma processing apparatus

Method of forming non-conformal layers

Plasma processing method and apparatus

Apparatus and method for removing a photoresist structure from a substrate

Plasma-enhanced cyclic layer deposition process for barrier layers

Microwave plasma processing device and plasma processing gas supply member

Plasma processing apparatus

Electrode assembly and plasma processing apparatus

Method for smoothing a solid surface

Method and apparatus for treating a substrate with dense fluid and plasma

Plasma enhanced atomic layer deposition (PEALD) equipment and method of forming a conducting thin film using the same thereof

Plasma processing apparatus and method

Shower head

High plasma utilization for remote plasma clean

Apparatus for attachment of semiconductor hardware

Plasma film-forming method and plasma film-forming apparatus

Method and apparatus for pressure control and flow measurement

Atmospheric glow discharge with concurrent coating deposition

Chemical vapor deposition apparatus

O-ringless tandem throttle valve for a plasma reactor chamber

Plasma uniformity control by gas diffuser hole design

Roll-vortex plasma chemical vapor deposition system

Plasma-assisted coating

Plasma uniformity control by gas diffuser curvature

Gas distribution uniformity improvement by baffle plate with multi-size holes for large size PECVD systems

Deposition reactor and method of determining its diffuser

Capacitive coupling plasma processing apparatus and method for using the same

Gas injector and apparatus including the same

High strip rate downstream chamber

System, method and apparatus for self-cleaning dry etch

Pore cathode for the mass production of photovoltaic devices having increased conversion efficiency

Purifier for chemical reactor

Plasma generating electrode, plasma generation device, and exhaust gas purifying device

Gas supply member and plasma processing apparatus

Gas baffle and distributor for semiconductor processing chamber

High density plasma chemical vapor deposition apparatus

Etching Apparatus and Process with Thickness and Uniformity Control

Plasma processing apparatus and semiconductor device manufactured by the same apparatus

Methods of making gas distribution members for plasma processing apparatuses

System and method for anisotropically etching a recess in a silicon substrate

Method and apparatus for chemical plasma processing of plastic container

Plasma etching apparatus and plasma etching method

Plasma reactor for carrying out gas reactions and method for the plasma-supported reaction of gases

Mixing energized and non-energized gases for silicon nitride deposition

Reduced volume, high conductance process chamber

Gas setting method, gas setting apparatus, etching apparatus and substrate processing system

Capacitively coupled plasma reactor with magnetic plasma control

Substrate processing system for performing exposure process in gas atmosphere

Plasma generating electrode, plasma generation device, and exhaust gas purifying device

Dry stripping equipment comprising plasma distribution shower head

Plasma processing system and baffle assembly for use in plasma processing system

Dry etching apparatus having particle removing device and method of fabricating phase shift mask using the same

Plasma cleansing apparatus that eliminates organic and oxidative contaminant and may effectively dissipate heat and eliminate exhaust gas and integrated system for the same

Method and apparatus for deposition of low dielectric constant materials

PLASMA PROCESSING DEVICE HAVING A RING-SHAPED AIR CHAMBER FOR HEAT DISSIPATION

Method and apparatus for determining consumable lifetime

Plasma processing apparatus

Methods and apparatus for downstream dissociation of gases

Plasma processing apparatus with insulated gas inlet pore

Combination of showerhead and temperature control means for controlling the temperature of the showerhead, and deposition apparatus having the same

High density plasma chemical vapor deposition apparatus for manufacturing semiconductor

Substrate processing system for performing exposure process in gas atmosphere

Apparatus for active dispersion of precursors

Self-cooling gas delivery apparatus under high vacuum for high density plasma applications

Plasma-assisted heat treatment

Gas supply unit, substrate processing apparatus, and supply gas setting method

Chemical vapor deposition apparatus and chemical vapor deposition method using the same

Plasma processing apparatus

Methods and apparatus for downstream dissociation of gases

Semiconductor processing apparatus

Plasma reaction chamber and captive silicon electrode plate for processing semiconductor wafers

Plasma film forming system

Substrate processing system for performing exposure process in gas atmosphere

Substrate processing system for performing exposure process in gas atmosphere

Gas-introducing system and plasma CVD apparatus

Etching apparatus and etching method

Substrate processing apparatus, pressure control method for substrate processing apparatus and recording medium having program recorded therein

Apparatus and method for plasma assisted deposition

Gas diffusion plate and manufacturing method for the same

Substrate processing system for performing exposure process in gas atmosphere

Leak judgment method, and computer-readable recording medium with recorded leak-judgment-executable program

Plasma processing apparatus and method

Deposition chamber surface enhancement and resulting deposition chambers

Method for treating a substrate

Corrosion resistant apparatus for control of a multi-zone nozzle in a plasma processing system

Apparatus and process for surface treatment of substrate using an activated reactive gas

Plasma processing system and method

Plasma treatment method

Process gas introducing mechanism and plasma processing device

Diffuser gravity support

Apparatus of manufacturing display substrate and showerhead assembly equipped therein

Plasma etching apparatus

Plasma processing apparatus, method for producing reaction vessel for plasma generation, and plasma processing method

Method and apparatus for nitride spacer etch process implementing in situ interferometry endpoint detection and non-interferometry endpoint monitoring

Plasma processing apparatus and method

Plasma processing apparatus and method

Ion sources and ion implanters and methods including the same

Hollow anode plasma reactor and method

Method for controlling the temperature of a gas distribution plate in a process reactor

Dual gas faceplate for a showerhead in a semiconductor wafer processing system

Dual-chamber plasma processing apparatus

Plasma processing apparatus

Apparatus and method for focused electric field enhanced plasma-based ion implantation

Fast isotropic etching system and process for large, non-circular substrates

Uniform etching system and process for large rectangular substrates

Apparatus and method of shaping profiles of large-area PECVD electrodes

Apparatus for fabricating semiconductor device

Film formation apparatus and method for semiconductor process

Processing method for conservation of processing gases

Integration of titanium and titanium nitride layers

Method and apparatus for process control in time division multiplexed (TDM) etch processes

Blocker plate bypass to distribute gases in a chemical vapor deposition system

Shower plate for plasma processing apparatus and plasma processing apparatus

Method of controlling the film properties of PECVD-deposited thin films

Gas blocker plate for improved deposition

Plasma uniformity control by gas diffuser hole design

Method and apparatus for maintaining by-product volatility in deposition process

Plasma method with high input power

Self-cleaning method for plasma CVD apparatus

Multi-piece baffle plate assembly for a plasma processing system

Apparatus including gas distribution member supplying process gas and radio frequency (RF) power for plasma processing

Apparatus including showerhead electrode and heater for plasma processing

Gas distribution system having fast gas switching capabilities

Face shield to improve uniformity of blanket CVD processes

MERIE plasma reactor with overhead RF electrode tuned to the plasma with arcing suppression

Plasma-assisted coating

In-situ dry clean chamber for front end of line fabrication

Apparatus and process for sensing fluoro species in semiconductor processing systems

Apparatus for etching semiconductor samples and a source for providing a gas by sublimation thereto

Method for carrying out homogeneous and heterogeneous chemical reactions using plasma

Method and apparatus for in-situ film stack processing

Apparatus for controlling gas flow in a semiconductor substrate processing chamber

Gas diffusion shower head design for large area plasma enhanced chemical vapor deposition

Substrate support for in-situ dry clean chamber for front end of line fabrication

Lid assembly for front end of line fabrication

Electrical biasing of gas introduction means of plasma apparatus

Generation of uniformly-distributed plasma

Plasma etching apparatus

Apparatus and method for forming thin film using upstream and downstream exhaust mechanisms

Oxide film forming method and oxide film forming apparatus

Apparatus and process for sensing fluoro species in semiconductor processing systems

Method for front end of line fabrication

Insulating film forming method, insulating film forming apparatus, and plasma film forming apparatus

Apparatus and process for sensing fluoro species in semiconductor processing systems

Inductively coupled plasma chemical vapor deposition apparatus

Plasma processing method and plasma processing device

Showerhead mounting to accommodate thermal expansion

Showerheads for providing a gas to a substrate and apparatus

Shower plate having projections and plasma CVD apparatus using same

Plasma reactor overhead source power electrode with low arcing tendency, cylindrical gas outlets and shaped surface

Higher power density downstream plasma

Electrode assembly and method for producing an electrode plate

Process for producing materials for electronic device

Plasma processing method and apparatus

Plasma reactor with minimal D.C. coils for cusp, solenoid and mirror fields for plasma uniformity and device damage reduction

Method and apparatus for backside polymer reduction in dry-etch process

Plasma processing system

Etching apparatus and etching method

Gas distribution plate assembly for plasma reactors

Deposition chamber and method for depositing low dielectric constant films

Plasma processor electrode and plasma processor

Showerhead electrode assembly for plasma processing apparatuses

Plasma processing apparatus and evacuation ring

Edge flow faceplate for improvement of CVD film properties

Pump baffle and screen to improve etch uniformity

Method and apparatus for substrate temperature control

Shower head structure for processing semiconductor

Flat panel display manufacturing apparatus

Method and apparatus for improved electrode plate

Chemical vapor deposition apparatus and methods

Semiconductor manufacturing apparatus

System, method and apparatus for self-cleaning dry etch

Plasma processing equipment

Processing device, electrode, electrode plate, and processing method

Plasma chemical vapor deposition apparatus having an improved nozzle configuration

Plasma processing apparatus and method

Plasma processing method and apparatus

System and method for gas distribution in a dry etch process

Method and apparatus for dry etching

Gas injection for uniform composition reactively sputter-deposited thin films

Method and system for introduction of an active material to a chemical process

Plasma etcher

Gas reaction chamber system having gas supply apparatus

Gas distribution plate fabricated from a solid yttrium oxide-comprising substrate

Microwave plasma processing apparatus for semiconductor element production

Variable gas conductance control for a process chamber

Method and apparatus for detecting a leak of external air into a plasma reactor

Device for fixing a gas showerhead or target plate to an electrode in plasma processing systems

Apparatus and method for plasma etching

Gas temperature control for a plasma process

Delivery system for PECVD powered electrode

Atmospheric glow discharge with concurrent coating deposition

Substrate temperature control in an ALD reactor

Plasma film forming system

Etching apparatus and method

Sputtering system

Method and apparatus for delivering process gas to a process chamber

Method for providing uniform removal of organic material

Roll-vortex plasma chemical vapor deposition method

Capacitively coupled plasma reactor with magnetic plasma control

Plasma processing apparatus

Upper electrode and plasma processing apparatus

Suspended gas distribution manifold for plasma chamber

Showerhead assembly and apparatus for manufacturing semiconductor device having the same

Spiral gas flow plasma reactor

Film forming device

Apparatus and method for plasma coating solid fuels and coated solid fuels produced using same

Radical-activated etching of metal oxides

Polygonal toroidal plasma source

Neutral radical etching of dielectric sacrificial material from reentrant multi-layer metal structures

Integration of materials removal and surface treatment in semiconductor device fabrication

Plasma generation system

Acoustic manipulation of plasma for arbitrary plasma metamaterial formation

Seedless particles with carbon allotropes

Multi regime plasma wafer processing to increase directionality of ions

Reactors and methods for making diamond coatings

Microwave chemical processing reactor

Microwave chemical processing

RF ion source with dynamic volume control

Atomic layer etching for enhanced bottom-up feature fill

Chemical modification of hardmask films for enhanced etching and selective removal

Method of manufacturing semiconductor device

Plasma etching of dielectric sacrificial material from reentrant multi-layer metal structures

Low temperature atmospheric pressure plasma applications

Mask shrink layer for high aspect ratio dielectric etch

Oxide etch selectivity systems and methods

Gas nozzle and plasma device employing same

Selective titanium nitride etch

Argon and helium plasma apparatus and methods

Substrate processing apparatus, method of manufacturing semiconductor device and non-transitory computer-readable recording medium

Shower head gas injection apparatus with secondary high pressure pulsed gas injection