Gas transport system

PROCESSING APPARATUS AND PROCESSING METHOD

Systems for etching a substrate using a hybrid wet atomic layer etching process

Method of simultaneous silicidation on source and drain of NMOS and PMOS transistors

Flowable chemical vapor deposition of metal oxides

METHODS OF PROCESSING SUBSTRATES AND APPARATUSES THEREOF

Internally divisible process chamber using a shutter disk assembly

Method of Manufacturing Semiconductor Device, Substrate Processing Method, Non-transitory Computer-readable Recording Medium and Substrate Processing Apparatus

Apparatuses and methods for avoiding electrical breakdown from RF terminal to adjacent non-RF terminal

MONOPOLE ANTENNA ARRAY SOURCE FOR SEMICONDUCTOR PROCESS EQUIPMENT

SEMICONDUCTOR MANUFACTURING METHOD

SHOWERHEAD WITH CONFIGURABLE GAS OUTLETS

Dry etching gas composition comprising sulfur-containing fluorocarbon compound and dry etching method using the same

Detaching and installing device for gas distribution plate of etching machine, and etching machine

SYSTEM FOR TREATMENT AND/OR COATING OF SUBSTRATES

Gasbox for semiconductor processing chamber

BATCH TYPE SUBSTRATE PROCESSING APPARATUS

METHODS AND APPARATUSES FOR DEPOSITION OF ADHERENT CARBON COATINGS ON INSULATOR SURFACES

Thin film manufacturing apparatus

Substrate processing apparatus, substrate processing system, and maintenance method

ELECTRIC ARC MITIGATING FACEPLATE

Thermal atomic layer etching processes

Thermal atomic layer etching processes

Thermally uniform deposition station

APPARATUS AND METHOD FOR TREATING SUBSTRATE

Plasma processing apparatus and plasma processing method

Showerhead shroud

Magnetron sputtering apparatus and magnetron sputtering method

Gas supply ring and substrate processing apparatus

BEVEL BACKSIDE DEPOSITION ELIMINATION

PLASMA PROCESSING APPARATUS AND PLASMA PROCESSING COIL

Apparatus and method for etching metal nitrides

Method of using dual frequency RF power in a process chamber

Operating method of etching device

Thread profiles for semiconductor process chamber components

METHOD OF MANUFACTURING SEMICONDUCTOR DEVICE

SHOWERHEAD AND SUBSTRATE PROCESSING APPARATUS HAVING THE SAME

SYSTEM AND METHOD OF CLEANING PROCESS CHAMBERS USING PLASMA

Method for Controlling Electrostatic Attractor and Plasma Processing Apparatus

Doping semiconductor films

METHOD FOR RESIDUE NON-UNIFORMITY MODULATION

SHOWERHEAD SHROUD

TEXTURED SILICON SEMICONDUCTOR PROCESSING CHAMBER COMPONENTS

SHOWERHEAD ASSEMBLY WITH RECURSIVE GAS CHANNELS

SHOWERHEAD ASSEMBLY WITH RECURSIVE GAS CHANNELS

Substrate processing apparatus, method of manufacturing semiconductor device and substrate processing method

Film formation apparatus

PLASMA ETCHING METHOD AND PLASMA ETCHING APPARATUS

Deposition method

SEMICONDUCTOR MANUFACTURING APPARATUS

Vacuum processing apparatus and method of cleaning vacuum processing apparatus

In-situ semiconductor processing chamber temperature apparatus

SUBSTRATE TREATING APPARATUS AND COVER RING THEREOF

Wafer processing apparatus and wafer processing method using the same

Methods of treating a surface of a polymer material by atmospheric pressure plasma

Gas cluster assisted plasma processing

Plasma processing systems and methods for chemical processing a substrate

VACUUM PROCESSING APPARATUS

SHOWERHEAD DESIGN TO CONTROL STRAY DEPOSITION

Self-Aligned Double Patterning With Spatial Atomic Layer Deposition

Method and apparatus for atomic layer etching

Generation of Hydrogen Reactive Species For Processing of Workpieces

Substrate processing method

Showerhead With Interlaced Gas Feed And Removal And Methods Of Use

Plasma processing apparatus

SUBSTRATE PROCESSING APPARATUS

FLUORINATED COMPOSITIONS FOR ION SOURCE PERFORMANCE IMPROVEMENTS IN NITROGEN ION IMPLANTATION

INTEGRATED CIRCUIT STRUCTURES INCLUDING A METAL LAYER FORMED USING A BEAM OF LOW ENERGY ATOMS

Plasma-assisted etching of metal oxides

Shower plate, plasma processing apparatus and plasma processing method

Gas supply unit and substrate processing apparatus including the gas supply unit

Thin film deposition process

Methods and systems to modulate film stress

MEMBER FOR SEMICONDUCTOR MANUFACTURING DEVICE

Plasma-enhanced chemical vapor deposition method of forming lithium-based film by using the same

Plasma etching apparatus, plasma etching method, and semiconductor device fabrication method including the plasma etching method

PLASMA PROCESSING APPARATUS AND PLASMA PROCESSING METHOD

PLASMA GENERATING DEVICE

Gas nozzle, manufacturing method of gas nozzle, and plasma treatment device

System and method for cleaning surface of substrate using roll-to-roll plasma generating device

PLASMA TREATMENT APPARATUS, SEMICONDUCTOR MANUFACTURING APPARATUS, AND MANUFACTURING METHOD OF SEMICONDUCTOR DEVICE

Plasma processing apparatus and substrate support of plasma processing apparatus

PROCESS KIT WITH PROTECTIVE CERAMIC COATINGS FOR HYDROGEN AND NH3 PLASMA APPLICATION

CORROSION-RESISTANT COMPONENTS

SUBSTRATE TREATING APPARATUS AND SUBSTRATE SUPPORT UNIT

Method of manufacturing semiconductor device, and recording medium

SUBSTRATE PROCESSING APPARATUS, REFLECTOR AND METHOD OF MANUFACTURING SEMICONDUCTOR DEVICE

Method of manufacturing semiconductor device, substrate processing apparatus, and recording medium

Inductively coupled plasma processing apparatus

Shield plate for a CVD reactor

Plasma processing apparatus

PLASMA PROCESSING APPARATUS

Plasma processing apparatus and plasma processing method

Plasma Strip Tool with Multiple Gas Injection

Surface Smoothing of Workpieces

Gas curtain for semiconductor manufacturing system

ANISOTROPIC ETCH APPARATUS WITH LOCAL ETCH DIRECTION ADJUSTMENT CAPABILITY AND METHODS FOR OPERATING THE SAME

STAGE, SUBSTRATE PROCESSING APPARATUS, AND SUBSTRATE PROCESSING METHOD

Modular microwave source with multiple metal housings

Method and apparatus for depositing a multi-sector film on backside of a semiconductor wafer

DRY ETCHING GAS COMPOSITION COMPRISING SULFUR-CONTAINING FLUOROCARBON COMPOUND AND DRY ETCHING METHOD USING THE SAME

CERAMIC TUBE

PLASMA SOURCE AND METHOD FOR PREPARING AND COATING SURFACES USING ATMOSPHERIC PLASMA PRESSURE WAVES

SUBSTRATE PROCESSING APPARATUS

Suppression of parasitic deposition in a substrate processing system by suppressing precursor flow and plasma outside of substrate region

Porous ceramic, member for semiconductor manufacturing apparatus, shower plate and plug

Method and apparatus for formation of protective sidewall layer for bow reduction

Multi-channel plasma reaction cell

PLASMA PROCESSING APPARATUS AND PLASMA PROCESSING METHOD

Integrated showerhead with thermal control for delivering radical and precursor gas to a downstream chamber to enable remote plasma film deposition

PLASMA POLYMERIZATION COATING APPARATUS AND PROCESS

Liquid treatment apparatus

PLASMA PROCESSING DEVICE AND METHOD FOR PROCESSING SAMPLE USING SAME

Directional selective junction clean with field polymer protections

Substrate treating apparatus and method for controlling temperature of ferrite core

Gas delivery system for ion implanter

VACUUM PROCESSING APPARATUS AND SUPPORT SHAFT

Heated ceramic faceplate

Plasma processing apparatus

ETCHING METHOD, METHOD OF REMOVING ETCHING RESIDUE, AND STORAGE MEDIUM

SUBSTRATE SUPPORT ASSEMBLY, SUBSTRATE PROCESSING APPARATUS, AND SUBSTRATE PROCESSING METHOD

ELECTRODE ARRAY

PLASMA PROCESSING APPARATUS

REACTOR, SYSTEM INCLUDING THE REACTOR, AND METHODS OF MANUFACTURING AND USING SAME

Multi-zone plasma-enhanced chemical vapor deposition apparatus and methods for operating the same

Multi-zone plasma-enhanced chemical vapor deposition apparatus and methods for operating the same

Nitriding apparatus and nitriding method

Plasma processing method, plasma processing apparatus, and control apparatus

PLASMA PROCESSING APPARATUS AND PLASMA PROCESSING METHOD

Deposition apparatus including an off-axis lift-and-rotation unit and methods for operating the same

Dry cleaning apparatus and dry cleaning method

QUARTZ COMPONENT WITH PROTECTIVE COATING

Metal oxide preclean chamber with improved selectivity and flow conductance

Methods And Apparatus For Pulsed Inductively Coupled Plasma For Surface Treatment Processing

ETCHING APPARATUS AND ETCHING METHOD

Plasma Assisted Parylene Deposition

METHODS AND APPARATUS FOR CLEANING A SHOWERHEAD

Preclean chamber upper shield with showerhead

Faceplate with edge flow control

Systems and processes for producing fixed-nitrogen compounds

Plasma generating apparatus and gas treating apparatus

Method for forming precoat film and method for forming silicon-containing film

Method of forming a nitrogen-containing carbon film and system for performing the method

Plasma processing apparatus and plasma processing method

Lid stack for high frequency processing

Substrate support

Substrate processing method and substrate processing apparatus

Gas supply determination method and plasma generator

Ion implanter toxic gas delivery system

MULTI-PORT GAS INJECTION SYSTEM AND REACTOR SYSTEM INCLUDING SAME

OBJECT PROCESSING APPARATUS

Substrate processing apparatus and method of manufacturing semiconductor device

Etching method and plasma processing apparatus

Plasma polymerization apparatus and plasma polymerization method using the same

DOUBLE-SIDED DEPOSITION APPARATUS AND METHOD

SPECIFIC TYPE ION SOURCE AND PLASMA FILM FORMING APPARATUS

SUBSTRATE PROCESSING APPARATUS

Substrate processing apparatus and substrate processing method

SUBSTRATE PROCESSING METHOD AND SUBSTRATE PROCESSING APPARATUS

Extreme ultraviolet light generation apparatus, extreme ultraviolet light generation system, and electronic device manufacturing method

Heat shield for chamber door and devices manufactured using same

Method of etching and apparatus for plasma processing

THIN FILM FORMING DEVICE AND THIN FILM FORMING METHOD USING THE SAME

Substrate support assembly with arc resistant coolant conduit

Low resistance confinement liner for use in plasma chamber

SUBSTRATE PROCESSING METHOD AND SUBSTRATE PROCESSING APPARATUS

Plasma processing device

Plasma system and method of mixing plasma and water mist

INTEGRATED ATOMIC LAYER PASSIVATION IN TCP ETCH CHAMBER AND IN-SITU ETCH-ALP METHOD

APPARATUS FOR TREATING SUBSTRATE AND METHOD FOR TREATING SUBSTRATE

CERAMIC SHOWER HEAD AND CHEMICAL VAPOR DEPOSITION DEVICE INCLUDING SAME

Substrate processing apparatus

Stage and plasma processing apparatus

LARGE-AREA VHF PECVD CHAMBER FOR LOW-DAMAGE AND HIGH-THROUGHPUT PLASMA PROCESSING

Method and system for forming metal-insulator-metal capacitors

Substrate processing apparatus and method of processing a substrate

Cleaning method and plasma processing apparatus

System dedicated for parts cleaning

Substrate processing method and substrate processing apparatus

RECONDITIONING OF REACTIVE PROCESS CHAMBER COMPONENTS FOR REDUCED SURFACE OXIDATION

SUBSTRATE PROCESSING METHOD, GAS FLOW EVALUATION SUBSTRATE AND SUBSTRATE PROCESSING APPARATUS

Method and apparatus for parts cleaning

Process chamber and exhaust liner system therefor

Electron cyclotron rotation (ECR)-enhanced hollow cathode plasma source (HCPS)

Deposition radial and edge profile tunability through independent control of TEOS flow

Lids and lid assembly kits for atomic layer deposition chambers

SHOWER HEAD ASSEMBLY

PROCESSING APPARATUS AND PROCESSING METHOD

Plasma etching method using gas molecule containing sulfur atom

Active gas generation apparatus and deposition processing apparatus

Cold plasma generating apparatus and multi-cold plasma array apparatus comprising the same

Plasma processing apparatus

SUPPORT ASSEMBLY

Substrate processing apparatus, material layer deposition apparatus, and atmospheric pressure chemical vapor deposition apparatus

Interconnect structures and methods and apparatuses for forming the same

Sputtering apparatus including gas distribution system

Gas supply system and gas supply method

Thin film formation apparatus and method using plasma

Symmetric plasma source to generate pie-shaped treatment

Showerhead faceplate having flow apertures configured for hollow cathode discharge suppression

Anodized titanium material and method for producing the same

Stage and substrate processing apparatus

PLASMA GENERATING DEVICE, SUBSTRATE PROCESSING APPARATUS, AND METHOD OF MANUFACTURING SEMICONDUCTOR DEVICE

Plasma generating device, substrate processing apparatus, and method of manufacturing semiconductor device

Plasma processing method, and element chip manufacturing method

Method of plasma etching

Methods and systems for advanced ion control for etching processes

Substrate processing method

Coating apparatus and coating method

Coating apparatus and coating method

Substrate processing apparatus, substrate retainer and method of manufacturing semiconductor device

Modular high-frequency source with integrated gas distribution

CHAMBER WITH INDUCTIVE POWER SOURCE

Apparatus for detecting or monitoring for a chemical precursor in a high temperature environment

Etching method and etching apparatus

Substrate processing method

Gas-dispersing apparatus for multiple chemical resources

Process and device for diamond synthesis by CVD

Piping assembly and substrate processing apparatus

Substrate processing apparatus having electrostatic chuck and substrate processing method

Plasma source for rotating susceptor

Apparatus and method for film formation

SUBSTRATE SUPPORT PLATE, SUBSTRATE PROCESSING APPARATUS INCLUDING THE SAME, AND SUBSTRATE PROCESSING METHOD

Method for treating substrate and apparatus for treating substrate

Method for etching film and plasma processing apparatus

SUBSTRATE PROCESSING APPARATUS AND SEMICONDUCTOR DEVICE MANUFACTURING METHOD USING THE SAME

Corrosion-resistant gas delivery assembly, and plasma processing apparatus

Plasma generation device and plasma irradiation method

Liner assemblies for substrate processing systems

Heater support kit for bevel etch chamber

PLASMA PROCESSING APPARATUS

Plasma processing apparatus and plasma processing method

Plasma processing apparatus and method of manufacturing semiconductor device using the same

Chamber components for gas delivery modulation

Plasma processing apparatus

Plasma processing method

Multi-function equipment implementing fabrication of high-k dielectric layer

Gas supply system, substrate processing apparatus, and control method for gas supply system

Plasma ashing for coated devices

ATTRACTING METHOD, MOUNTING TABLE, AND PLASMA PROCESSING APPARATUS

High density plasma chemical vapor deposition chamber and method of using

Apparatus, probe assembly and methods for treating containers

Apparatus and methods for selectively etching films

Plasma processing method and plasma processing apparatus

PLASMA PROCESSING APPARATUS

PLASMA ETCHING DEVICE WITH PLASMA ETCH RESISTANT COATING

Electron beam generator, plasma processing apparatus having the same and plasma processing method using the same

Substrate processing method, substrate processing apparatus and substrate processing system

Gas supply assembly and substrate processing apparatus including the same

Reactor system including a gas distribution assembly for use with activated species and method of using same

Substrate processing device having connection plates, substrate processing method

Substrate processing method, method for manufacturing semiconducor device, and plasma processing apparatus

Apparatus and method for processing substrate and method of manufacturing semiconductor device using the method

Monolithic modular microwave source with integrated process gas distribution

Mechanism for creating vacuum in processing apparatus

Dielectric member, structure, and substrate processing apparatus

RF choke for gas delivery to an RF driven electrode in a plasma processing apparatus

Clean isolation valve for reduced dead volume

Susceptor having cooling device

Modular reactor for microwave plasma-assisted deposition

Substrate processing method and substrate processing apparatus

Manufacturing method of three-dimensional semiconductor device

Mounting table and plasma processing apparatus

Plasma processing apparatus

Plasma-based process for production of F and HF from benign precursors and use of the same in room-temperature plasma processing

PLASMA PROCESSING APPARATUS AND METHOD

Plasma processing apparatuses including multiple electron sources

Semiconductor processing chamber

Plasma processing machine

Plasma processing apparatus, processing method, and upper electrode structure

PLASMA PROCESSING APPARATUS AND TEMPERATURE CONTROL METHOD

Method and device for hydrogen sulfide dissociation in electric arc

Plasma processing system and method of processing substrate

Side inject designs for improved radical concentrations

Etching method and etching apparatus

Substrate support with real time force and film stress control

Method to clean SnOfilm from chamber

Substrate support unit and substrate processing apparatus including the same

High frequency antenna and plasma processing device

Substrate supporting plate, thin film deposition apparatus including the same, and thin film deposition method

Substrate processing method, pressure control apparatus and substrate processing system

Microwave plasma source for spatial plasma enhanced atomic layer deposition (PE-ALD) processing tool

Substrate processing apparatus

Capacitive element and plasma processing device

Plasma processing apparatus

Adjustable fastening device for plasma gas injectors

Manifold valve for multiple precursors

Chamber cleaning device and chamber cleaning method

SUBSTRATE TREATMENT DEVICE

Adjustable fastening device for plasma gas injectors

PLASMA PROCESSING DEVICE MEMBER AND PLASMA PROCESSING DEVICE

METHODS AND APPARATUS FOR DUAL CHANNEL SHOWERHEADS

Multidimensional printer

NANOSECOND PULSER RF ISOLATION

Apparatus and method for treating substrate

Plasma etching method using faraday box

Substrate treating apparatus and substrate treating system having the same

Showerhead

APPARATUS FOR PROCESSING SUBSTRATE

Flowable film curing using H2 plasma