WAFER SUPPORT UNIT AND WAFER TREATMENT SYSTEM INCLUDING THE SAME

Showerhead device for semiconductor processing system

Apparatus and method for treating substrate

Variable mode plasma chamber utilizing tunable plasma potential

APPARATUS AND METHOD FOR PROCESSING SUBSTRATE

Plasma Spreading Apparatus And System

Plasma device using coaxial waveguide, and substrate treatment method

Process control enabled VDC sensor for plasma process

Plasma processing apparatus

Control system for plasma chamber having controllable valve

Plasma Processing Apparatus With Post Plasma Gas Injection

APPARATUS AND METHOD FOR TREATING SUBSTRATE

Atomic layer etching and smoothing of refractory metals and other high surface binding energy materials

SHOWER HEAD UNIT AND SYSTEM FOR TREATING SUBSTRATE WITH THE SHOWER HEAD UNIT

DIAMOND-LIKE CARBON SYNTHESIZED BY ATMOSPHERIC PLASMA

Component for use in plasma processing apparatus, plasma processing apparatus, and method for manufacturing the component

Cleaning method and plasma processing apparatus

APPARATUS AND METHOD FOR TREATING SUBSTRATE

Method and apparatus for actively tuning a plasma power source

Isolated backside helium delivery system

Plasma processing method and plasma processing apparatus

Process and related device for removing by-product on semiconductor processing chamber sidewalls

Substrate processing apparatus and method of manufacturing semiconductor device

Semiconductor chamber coatings and processes

Temperature-controlled chemical processing reactor

Grounding cap module, gas injection device and etching apparatus

Process and related device for removing by-product on semiconductor processing chamber sidewalls

Physical vapor deposition (PVD) chamber with in situ chamber cleaning capability

Baffle implementation for improving bottom purge gas flow uniformity

System and method for extending a lifetime of an ion source for molecular carbon implants

Liner assembly for vacuum treatment apparatus, and vacuum treatment apparatus

CYCLICAL EPITAXIAL DEPOSITION SYSTEM

Faceplate having a curved surface

Atmospheric pressure linear rf plasma source for surface modification and treatment

Apparatus for substrate processing

Plasma etching method

Methods of post treating dielectric films with microwave radiation

Film forming apparatus

Modular microwave plasma source

Corrosion-resistant structure for a gas delivery system in a plasma processing apparatus

CHARGE STRIPPING FOR ION IMPLANTATION SYSTEMS

Surface pretreatment process to improve quality of oxide films produced by remote plasma

Substrate processing chamber

Dynamic multi zone flow control for a processing system

Apparatuses and methods for plasma processing

Surface modified depth controlled deposition for plasma based deposition

Substrate processing apparatus

WAFER PROCESSING METHOD

PLASMA PROCESSING APPARATUS AND PLASMA PROCESSING METHOD

Apparatus and methods for removing contaminant particles in a plasma process

Batch type substrate processing apparatus

High power wafer cooling

DEVICE FOR CONVEYING A GAS INTO A CHEMICAL VAPOUR DEPOSITION REACTOR

Ex situ coating of chamber components for semiconductor processing

Methods of treating a surface of a polymer material by atmospheric pressure plasma

Active gas generation apparatus

Film formation apparatus and film formation method

Matching method and plasma processing apparatus

Systems and methods for suppressing parasitic plasma and reducing within-wafer non-uniformity

DC BIAS CIRCUIT AND GAS DELIVERY SYSTEM FOR SUBSTRATE PROCESSING SYSTEMS

Substrate processing apparatus including edge ring

Cleaning method and plasma processing apparatus

Surface modifying device

Showerhead, semiconductor manufacturing apparatus including the same, and semiconductor manufacturing method

Etching method and plasma processing apparatus

Gas showerhead, manufacturing method, and plasma apparatus including the gas showerhead

Member for plasma processing apparatus and plasma processing apparatus with the same

Member for plasma processing apparatus, plasma processing apparatus with the same and method for using sintered body

MULTIZONE FLOW DISTRIBUTION SYSTEM

SUBSTRATE PROCESSING APPARATUS, METHOD OF MANUFACTURING SEMICONDUCTOR DEVICE, AND RECORDING MEDIUM

Chamber with individually controllable plasma generation regions for a reactor for processing a workpiece

Plasma reactor for processing gas

SUBSTRATE PROCESSING APPARATUS AND SUBSTRATE PROCESSING METHOD

Plasma etching apparatus and plasma etching method

Thermal atomic layer etching processes

Thermal atomic layer etching processes

Method of etching film and plasma processing apparatus

Apparatus and method for processing substrate

Plasma etching method and plasma etching apparatus

Ion beam device and cleaning method for gas field ion source

Gas supply apparatus

Systems and methods for continuously supplying negative ions using multi-pulsed plasma sources

Electrostatic chuck and processing apparatus

Electrostatic chuck and processing apparatus

Substrate processing method and substrate processing apparatus

DEPOSITION PROCESSING METHOD AND PLASMA PROCESSING APPARATUS

Reduction of Brand Clin semiconductor processes

Variable depth edge ring for etch uniformity control

Resist removing method and resist removing apparatus

SUBSTRATE PROCESSING APPARATUS

Plasma processing apparatus

Atomic layer deposition apparatus and method for processing substrates using an apparatus

Producing method for producing magnesium hydride, power generation system using magnesium hydride, and producing apparatus for producing magnesium hydride

Film formation via pulsed RF plasma

Gas supply member, plasma processing apparatus, and method for forming coating film

Gas Supply With Angled Injectors In Plasma Processing Apparatus

Recursive inject apparatus for improved distribution of gas

Substrate processing apparatus

Plasma reactor for ultra-high aspect ratio etching and etching method thereof

Argon addition to remote plasma oxidation

Apparatuses and methods for avoiding electrical breakdown from RF terminal to adjacent non-RF terminal

SUBSTRATE PROCESSING APPARATUS

PLASMA PROCESSING APPARATUS

Multi zone gas injection upper electrode system

SiC MEMBER AND MANUFACTURING METHOD THEREOF

DEVICE FOR INTERNALLY COATING CONTAINERS

Showerhead having a detachable gas distribution plate

Surface modifying device

Loadlock integrated bevel etcher system

Ozone treatment for selective silicon nitride etch over silicon

Method for controlling electrostatic chuck and plasma processing apparatus

COIL AND WINDOW FOR PLASMA PROCESSING SYSTEM

Workpiece unit

Method of manufacturing semiconductor device, substrate processing apparatus and non-transitory computer-readable recording medium

Substrate processing apparatus, method of manufacturing semiconductor device, and non-transitory computer-readable recording medium

Apparatus for plasma processing and method of etching

Apparatus for distributing gas, and apparatus and method for processing substrate

Substrate processing apparatus, method of manufacturing semiconductor device, and recording medium

Apparatus for thermal control of tubing assembly and associated methods

SUBSTRATE PROCESSING APPARATUS, A NON-TRANSITORY COMPUTER-READABLE RECORDING MEDIUM

Processing chamber mixing systems

Methods and apparatus for enhancing selectivity of titanium and titanium silicides during chemical vapor deposition

Substrate processing apparatus

Silicon mandrel etch after native oxide punch-through

Surface smoothing of workpieces

SYSTEMS AND METHODS FOR STORAGE AND SUPPLY OF F3NO-FREE FNO GASES AND F3NO-FREE FNO GAS MIXTURES FOR SEMICONDUCTOR PROCESSES

PLASMA ETCHING DEVICE WITH PLASMA ETCH RESISTANT COATING

Method and apparatus for supplying improved gas flow to a processing volume of a processing chamber

VACUUM CHAMBER OPENING SYSTEM

Apparatus and method for coating and in particular plasma coating of containers

Showerhead having a detachable high resistivity gas distribution plate

Deposition apparatus including a heat dissipation member

Integration of materials removal and surface treatment in semiconductor device fabrication

Multi-layer plasma resistant coating by atomic layer deposition

Symmetric plasma process chamber

ETCHING DEVICE AND OPERATING METHOD THEREOF

Active gas generation apparatus including a metal housing, first and second auxiliary members, and a housing contact

Plasma processing apparatus and plasma processing method

Metal contact landing structure

Showerhead and method for manufacturing the same

Substrate processing apparatus, method of manufacturing semiconductor device and non-transitory computer-readable recording medium

Gas diffuser mounting plate for reduced particle generation

Mounting table and charge neutralization method for target object

Plasma etching method for selectively etching silicon oxide with respect to silicon nitride

Plasma processing apparatus

Apparatus for sterilising an instrument channel of a surgical scoping device

Methods of encapsulation

DEVICE AND METHOD FOR PLASMA TREATMENT OF ELECTRONIC MATERIALS

Active gas generating apparatus

Member for plasma processing devices

Flow control features of CVD chambers

Substrate processing apparatus

Method of processing target object

Etching method

Inductive plasma source with metallic shower head using b-field concentrator

High density carbon films for patterning applications

Charged particle beam apparatus

Plasma processing apparatus and plasma processing method

Flow through line charge volume

Systems and methods for a plasma enhanced deposition of material on a semiconductor substrate

Systems and methods for improved semiconductor etching and component protection

Substrate processing apparatus and substrate processing method

Plasma processing apparatus and precoating method

Showerhead faceplate having flow apertures configured for hollow cathode discharge suppression

Systems and methods for coating surfaces

Substrate processing apparatus having a gas-mixing manifold

Plasma processing apparatus and method

Plasma etching systems and methods with secondary plasma injection

GAS SUPPLY DEVICE

Ceramic foam for helium light-up suppression

Plasma processing apparatus

Plasma processing apparatus

SEMICONDUCTOR MANUFACTURING APPARATUS AND METHOD FOR OPERATING THE SAME

Dry Ashing by Secondary Excitation

Plasma film forming method

DUAL FREQUENCY SILANE-BASED SILICON DIOXIDE DEPOSITION TO MINIMIZE FILM INSTABILITY

HEAT CONDUCTIVE SPACER FOR PLASMA PROCESSING CHAMBER

Methods and systems for determining a fault in a gas heater channel

Methods and systems for controlling wafer fabrication process

Semiconductor substrate supports with embedded RF shield

Substrate processing apparatus

Dry cleaning apparatus and dry cleaning method

Screwless semiconductor processing chambers

Method for improving deposition process

Baffle plate for controlling wafer uniformity and methods for making the same

METHODS AND APPARATUS FOR PLASMA LINERS WITH HIGH FLUID CONDUCTANCE

ASSEMBLY AND METHOD FOR THE TREATMENT OF OBJECTS

Method of depositing silicon nitride

PLASMA PROCESSING APPARATUS

Physical vapor deposition (PVD) chamber with reduced arcing

Mounting structures for flow substrates

Remote plasma source cleaning nozzle for cleaning a gas distribution plate

Wafer to wafer bonding method and wafer to wafer bonding system

Substrate processing apparatuses and substrate processing methods

Chamber liner

Multi-port gas injection system and reactor system including same

Optically transparent pedestal for fluidly supporting a substrate

Substrate support apparatus and plasma processing apparatus having the same

Apparatuses and methods for avoiding electrical breakdown from RF terminal to adjacent non-RF terminal

Apparatus for depositing metal films with plasma treatment

Nozzle for uniform plasma processing

DEVICE AND METHOD FOR REMOVING A LAYER FROM A SUBSTRATE

Surface modified depth controlled deposition for plasma based deposition

Electrostatic chuck and plasma processing apparatus including the same

Toroidal plasma processing apparatus with a shaped workpiece holder

Nozzle for multi-zone gas injection assembly

Chemical control features in wafer process equipment

Apparatus and method for deposition and etch in gap fill

Substrate processing chamber including conical surface for reducing recirculation

Adjustable fastening device for plasma gas injectors

Method for controlling plasma in semiconductor fabrication

APPARATUS FOR SUPPRESSING PARASITIC PLASMA IN PLASMA ENHANCED CHEMICAL VAPOR DEPOSITION CHAMBER

Plasma generating apparatus

Plasma processing apparatus

Generation of hydrogen reactive species for processing of workpieces

Plasma-based process for production of F and HF from benign precursors and use of the same in room-temperature plasma processing

Loadlock integrated bevel etcher system

Dry ashing by secondary excitation

Substrate support pedestal

Systems and methods for tuning to reduce reflected power in multiple states

Model generation apparatus, model generation program, and model generation method

SYSTEMS AND METHODS FOR ETCHING OXIDE NITRIDE STACKS

Microwave plasma generating device for plasma oxidation of SiC

Systems and methods for radial and azimuthal control of plasma uniformity

Spherical carbon allotropes for lubricants

Control of on-wafer cd uniformity with movable edge ring and gas injection adjustment

Radical deactivation component, plasma processing apparatus using the same and radical deactivation method

PROCESSING APPARATUS, MEMBER, AND TEMPERATURE CONTROL METHOD

Plasma generation apparatus

Volume scanning electron microscopy of serial thick tissue sections with gas cluster milling

Single process volume to perform high-pressure and low-pressure processes with features to reduce cross-contamination

Etching method and etching apparatus

Apparatus for use with hydrogen radicals and method of using same

Method of manufacturing semiconductor device and semiconductor manufacturing apparatus

Radical source with contained plasma

GAS SPRAYER FOR SUBSTRATE TREATMENT DEVICE, AND SUBSTRATE

PLASMA SOURCE AND PLASMA PROCESSING APPARATUS

Method of processing target object

Method for processing workpiece

Extended detachable gas distribution plate and showerhead incorporating same

Remote modular high-frequency source

Modular high-frequency source with integrated gas distribution

Substrate processing systems including gas delivery system with reduced dead legs

Processing of workpieces with reactive species generated using alkyl halide

PLASMA PROCESSING APPARATUS, PLASMA CONTROL METHOD, AND COMPUTER STORAGE MEDIUM

Substrate processing apparatus and substrate processing method

Showerhead with interlaced gas feed and removal and methods of use

METHOD OF MANUFACTURING SEMICONDUCTOR DEVICE, SUBSTRATE PROCESSING APPARATUS, AND RECORDING MEDIUM

Plasma processing apparatus and plasma processing method

Semiconductor processing chamber for multiple precursor flow

Method of manufacturing semiconductor device having higher exhaust pipe temperature and non-transitory computer-readable recording medium

Etching method and plasma processing apparatus

SEMICONDUCTOR CHAMBER COATINGS AND PROCESSES

APPARATUS AND METHOD FOR PROCESSING SUBSTRATE

PLASMA PROCESSING APPARATUS INCLUDING GAS DISTRIBUTION PLATE

Advanced methods for plasma systems operation

Jacking tool and semiconductor process apparatus having the same

Plasma gun for treating tumors in vivo and use method thereof

Method and apparatus for reducing particle defects in plasma etch chambers

Selective atomic layer etching of semiconductor materials

PLASMA PROCESSING APPARATUS

Reactor, system including the reactor, and methods of manufacturing and using same

Plasma processing apparatus

Treatment unit for a facility for treating the surface of a substrate in motion, corresponding facility and method of implementation

Distributed electrode array for plasma processing

THIN FILM FORMATION APPARATUS, SPUTTERING CATHODE, AND METHOD OF FORMING THIN FILM

Plasma processing method and plasma processing apparatus

Plasma processing system, electron beam generator, and method of fabricating semiconductor device

Process window widening using coated parts in plasma etch processes

Heater support kit for bevel etch chamber

METHOD AND APPARATUS FOR MANUFACTURING SEMICONDUCTOR DEVICE

Fast response pedestal assembly for selective preclean

Quartz component with protective coating

Upper electrode and plasma processing apparatus

Showerhead with reduced backside plasma ignition

Suppression of parasitic deposition in a substrate processing system by suppressing precursor flow and plasma outside of substrate region

Multi-plate electrostatic chucks with ceramic baseplates

Apparatus for detecting or monitoring for a chemical precursor in a high temperature environment

Apparatus and methods for removing contaminant particles in a plasma process

Low-pressure plasma chamber, low-pressure plasma installation and method for producing a low-pressure plasma chamber

DEVICE FOR PERFORMING ATMOSPHERIC PRESSURE PLASMA ENHANCED CHEMICAL VAPOUR DEPOSITION AT LOW TEMPERATURE

Facility for treating the surface of a moving substrate in a controlled atmosphere, and method for defining the size thereof

Temperature controlled showerhead

Cold Plasma Treatment Devices and Associated Methods

Plasma processing apparatus

Reactor design for large-area VHF plasma processing with improved uniformity

Vacuum treatment chamber and method of manufacturing a vacuum treated plate-shaped substrate

Semiconductor processing chamber multistage mixing apparatus and methods

Thermal atomic layer etching processes

APPARATUS AND METHOD FOR ANISOTROPIC DRIE ETCHING WITH FLUORINE GAS MIXTURE

Etching substrates using ALE and selective deposition

Plasma processing apparatus

TAPERED UPPER ELECTRODE FOR UNIFORMITY CONTROL IN PLASMA PROCESSING

Thermal atomic layer etching processes

NON-CONTACT PHYSICAL ETCHING SYSTEM

Advanced temperature monitoring system and methods for semiconductor manufacture productivity

Argon addition to remote plasma oxidation

Plasma beam penetration of millimeter scale holes with high aspect ratios

Apparatus and method for fabricating a semiconductor device

Pre-coating method and film forming method