205327 ⎘
Discharge tubes with provision for introducing objects or material to be exposed to the discharge, e.g. for the purpose of examination or processing thereof; Gas-filled discharge tubes; Constructional details of the reactor Gas supply means
Methods for forming interconnection structures in an integrated cluster system for semicondcutor applications
#2402Temperature ramping using gas distribution plate heat
#2403Plasma processing method
#2404APPROACHES FOR CLEANING A WAFER DURING HYBRID LASER SCRIBING AND PLASMA ETCHING WAFER DICING PROCESSES
#2405PLASMA FORELINE THERMAL REACTOR SYSTEM
#2406Differential silicon oxide etch
#2407Compression member for use in showerhead electrode assembly
#2408Gas supply manifold and method of supplying gases to chamber using same
#2409Apparatus for monitoring gas and plasma process equipment including the same
#2410Plasma source for a plasma CVD apparatus and a manufacturing method of an article using the plasma source
#2411Tunable multi-zone gas injection system
#2412Systems and methods for improving wafer etch non-uniformity when using transformer-coupled plasma
#2413FILM FORMATION APPARATUS AND FILM FORMATION METHOD
#2414Gas cooled substrate support for stabilized high temperature deposition
#2415Nano deposition and ablation for the repair and fabrication of integrated circuits
#2416Batch-type remote plasma processing apparatus
#2417CLEANING PROCESS FOR CLEANING AMORPHOUS CARBON DEPOSITION RESIDUALS USING LOW RF BIAS FREQUENCY APPLICATIONS
#2418PLASMA TREATMENT APPARATUS AND METHOD
#2419Gas supplying method and semiconductor manufacturing apparatus
#2420Plasma processing method and plasma processing apparatus
#2421Plasma processing method and plasma processing apparatus
#2422GAS SUPPLY METHOD AND PLASMA PROCESSING APPARATUS
#2423Method of manufacturing semiconductor device
#2424RPS assisted RF plasma source for semiconductor processing
#2425Cold plasma treatment devices and associated methods
#2426PLASMA PROCESSING DEVICE AND PLASMA PROCESSING METHOD
#2427Ceramic article with reduced surface defect density
#2428Apparatus and method of treating a substrate
#2429Showerhead-cooler system of a semiconductor-processing chamber for semiconductor wafers of large area
#2430Film forming apparatus
#2431Apparatus for atomic layering etching
#2432METHODS AND APPARATUS FOR PROCESSING A SUBSTRATE
#2433Tuning a parameter associated with plasma impedance
#2434Reactive sputtering apparatus
#2435PLASMA PROCESSING APPARATUS
#2436Self-aligned double patterning with spatial atomic layer deposition
#2437Sputtering device and gas supply pipe for sputtering device
#2438System and methods for plasma application
#2439RECESSING ULTRA-LOW K DIELECTRIC USING REMOTE PLASMA SOURCE
#2440Substrate processing apparatus and semiconductor device manufacturing method
#2441Substrate processing apparatus and semiconductor device manufacturing method
#2442Showerhead electrode assembly in a capacitively coupled plasma processing apparatus
#2443Edge seal for lower electrode assembly
#2444Process feed management for semiconductor substrate processing
#2445Plasma block for remote plasma source
#2446Process gas management for an inductively-coupled plasma deposition reactor
#2447Method of manufacturing semiconductor device, substrate processing apparatus and non-transitory computer readable recording medium
#2448Ion beam etching system
#2449Plasma processing apparatus and component thereof including an optical fiber for determining a temperature thereof
#2450Electrostatic chuck and apparatus for processing a substrate including the same
#2451Semiconductor system assemblies and methods of operation
#2452Microwave plasma source and plasma processing apparatus
#2453Substrate treating apparatus and blocker plate assembly
#2454Mechanisms for etching apparatus and etching-detection method
#2455Plasma processing apparatus
#2456Plasma processing apparatus
#2457Remote plasma system and method
#2458Mechanisms for supplying process gas into wafer process apparatus
#2459GAS CLUSTER IRRADIATION MECHANISM, SUBSTRATE PROCESSING APPARATUS USING SAME, AND GAS CLUSTER IRRADIATION METHOD
#2460SUBSTRATE HEATING PEDESTAL HAVING CERAMIC BALLS
#2461SUBSTRATE PROCESSING APPARATUS
#2462Etching method and plasma processing apparatus
#2463Method for manufacturing semiconductor device
#2464Plasma processing device and plasma processing method
#2465DEVICE FOR GENERATING PLASMA AND DIRECTING AN ELECTRON BEAM TOWARDS A TARGET
#2466Substrate processing apparatus and substrate detaching method
#2467Methods for atomic layer etching
#2468PLASMA TREATMENT DEVICE
#2469Plasma-free metal etch
#2470Selective etch for metal-containing materials
#2471Aluminum selective etch
#2472SHOWER HEAD ASSEMBLY, PLASMA PROCESSING APPARATUS AND METHOD FOR MANUFACTURING A SHOWER HEAD ASSEMBLY
#2473Cold plasma treatment devices and associated methods
#2474Nano fluid electrostatic atomization controllable jet minimal quantity lubrication grinding system
#2475Substrate processing apparatus and substrate processing method
#2476Non-ambipolar plasma ehncanced DC/VHF phasor
#2477Radical reactor with inverted orientation
#2478Gas dispersion apparatus
#2479Plasma processing device, plasma processing method and method of manufacturing electronic devices
#2480Etching method for substrate to be processed and plasma-etching device
#2481Plasma processing method and plasma processing apparatus
#2482Substrate treating apparatus and method
#2483Gas supply device and substrate processing apparatus
#2484SIDE STORAGE UNIT FOR REMOVING FUMES AND MANUFACTURING APPARATUS FOR SEMIONDUCTOR DEVICES HAVING THE SAME
#2485Plasma processing apparatus
#2486Plasma processor and plasma processing method
#2487Plasma processor and plasma processing method
#2488Shower plate sintered integrally with gas release hole member and method for manufacturing the same
#2489Power deposition control in inductively coupled plasma (ICP) reactors
#2490Method of etching a boron doped carbon hardmask
#2491Low contamination chamber for surface activation
#2492System for Generating High Speed Flow of an Ionized Gas
#2493PLASMA PROCESSING APPARATUS FOR VAPOR PHASE ETCHING AND CLEANING
#2494Apparatus for growing diamonds by microwave plasma chemical vapour deposition process and substrate stage used therein
#2495Heated showerhead assembly
#2496PLASMA PROCESSING CHAMBER WITH REMOVABLE BODY
#2497Microwave plasma reactor for manufacturing synthetic diamond material
#2498Methods and systems for plasma deposition and treatment
#2499Plasma processing apparatus
#2500Semiconductor reaction chamber with plasma capabilities
#2501METHOD OF MAKING A GAS DISTRIBUTION MEMBER FOR A PLASMA PROCESSING CHAMBER
#2502Plasma-enhanced chemical vapor deposition apparatus and method of manufacturing display apparatus using the same
#2503Methods and systems for plasma deposition and treatment
#2504Ion assisted deposition for rare-earth oxide based coatings on lids and nozzles
#2505Plasma etching apparatus
#2506Methods and systems for plasma deposition and treatment
#2507Plasma processing method
#2508Flow control features of CVD chambers
#2509Ion beam etching system
#2510Microplasma jet devices, arrays, medical devices and methods
#2511Film formation device
#2512Gas diffuser unit, process chamber and wafer processing method
#2513Process chamber gas flow improvements
#2514Coating method for gas delivery system
#2515Substrate processing apparatus and substrate processing method
#2516Apparatus for generating thermodynamically cold microwave plasma
#2517Gas supply method for semiconductor manufacturing apparatus, gas supply system, and semiconductor manufacturing apparatus
#2518Film forming apparatus, film forming method and non-transitory storage medium
#2519Methods and apparatuses for energetic neutral flux generation for processing a substrate
#2520Aerosol deposition coating for semiconductor chamber components
#2521Plasma processing apparatus
#2522Substrate processing apparatus including processing unit
#2523Antenna for plasma generation, plasma processing apparatus and plasma processing method
#2524Electron beam plasma source with remote radical source
#2525Plasma processing apparatus
#2526Deposition apparatus
#2527ATOMIC LAYER DEPOSITION APPARATUS AND ATOMIC LAYER DEPOSITION METHOD
#2528Plasma processing equipment and gas distribution apparatus thereof
#2529SUBSTRATE HOLDER, SUBSTRATE SUPPORTING APPARATUS, SUBSTRATE PROCESSING APPARATUS, AND SUBSTRATE PROCESSING METHOD USING THE SAME
#2530Gas supply method
#2531Microwave plasma reactor for manufacturing synthetic diamond material
#2532Etching method and apparatus
#2533Pulsed gas plasma doping method and apparatus
#2534Cascade design showerhead for transient uniformity
#2535SOLID SURFACE SMOOTHING METHOD
#2536Film forming apparatus, gas supply device and film forming method
#2537Shower head, plasma processing apparatus and plasma processing method
#2538Plasma process apparatus
#2539Gas nozzle, plasma apparatus using the same, and method for manufacturing gas nozzle
#2540Plasma processing apparatus and shower plate
#2541Moveable and adjustable gas injectors for an etching chamber
#2542Plasma emission monitor and process gas delivery system
#2543TRANSPARENT YTTRIA COATED QUARTZ SHOWERHEAD
#2544Plasma processing apparatus
#2545MULTI-MODE ETCH CHAMBER SOURCE ASSEMBLY
#2546Plasma processing apparatus and plasma etching apparatus
#2547Apparatus for gas injection in a physical vapor deposition chamber
#2548Method and apparatus for measuring pressure in a physical vapor deposition chamber
#2549Method and apparatus for high efficiency gas dissociation in inductive coupled plasma reactor
#2550Selective titanium nitride removal
#2551Insulated semiconductor faceplate designs
#2552SUBSTRATE SUPPORTER AND SUBSTRATE PROCESSING APPARATUS INCLUDING THE SAME
#2553Enhanced etching processes using remote plasma sources
#2554Showerhead support structure for improved gas flow
#2555Ceramic showerhead with embedded RF electrode for capacitively coupled plasma reactor
#2556Plasma processing apparatus
#2557Tunable gas delivery assembly with internal diffuser and angular injection
#2558Plasma processing apparatus
#2559Gas diffusion shower head design for large area plasma enhanced chemical vapor deposition
#2560Combinatorial plasma enhanced deposition and etch techniques
#2561DEPOSITION APPARATUS AND METHOD OF MANUFACTURING ORGANIC LIGHT EMITTING DISPLAY APPARATUS USING THE SAME
#2562Methods for plasma processing
#2563Linear plasma source
#2564Method and apparatus for purging and plasma suppression in a process chamber
#2565RF choke for gas delivery to an RF driven electrode in a plasma processing apparatus
#2566Methods for plasma processing
#2567Capacitively coupled remote plasma source
#2568Showerhead having a detachable gas distribution plate
#2569Plasma processing apparatus
#2570High efficiency plasma source
#2571Showerhead electrode assembly with gas flow modification for extended electrode life
#2572Plasma reactor for carrying out gas reactions and method for the plasma-supported reaction of gases
#2573Film formation device, substrate processing device, and film formation method
#2574Non-local plasma oxide etch
#2575Apparatus for providing plasma to a process chamber
#2576Temperature controlled showerhead
#2577Gas dispersion disc assembly
#2578Atomic layer deposition apparatus and method
#2579Remote plasma system and method
#2580Plasma processing apparatus, plasma processing method and storage medium
#2581Thin film forming apparatus and thin film forming method using the same
#2582Vapor deposition apparatus
#2583Plasma processing method and plasma processing apparatus
#2584Method to control amorphous oxide layer formation at interfaces of thin film stacks for memory and logic components
#2585Methods for atomic layer etching
#2586Plasma processing apparatus
#2587Plasma processing device
#2588Chemical control features in wafer process equipment
#2589Showerhead electrode assembly in a capacitively coupled plasma processing apparatus
#2590Plasma processing apparatus and plasma processing method
#2591Apparatus and method for purging gaseous compounds
#2592Controlling temperature in substrate processing systems
#2593Methods and apparatus for providing a gas mixture to a pair of process chambers
#2594Sputtering device
#2595Process gas management for an inductively-coupled plasma deposition reactor
#2596Apparatus and method for shielding a controlled pressure environment
#2597Gas distribution showerhead for inductively coupled plasma etch reactor
#2598Variable showerhead flow by varying internal baffle conductance
#2599Electrode for plasma processing apparatus, plasma processing apparatus, plasma processing method and storage medium
#2600Gas mixing apparatus
#2601Processing apparatus
#2602Plasma enhanced chemical vapor deposition apparatus and method for controlling the same
#2603Suppression of parasitic deposition in a substrate processing system by suppressing precursor flow and plasma outside of substrate region
#2604PLASMA GENERATOR AND CLEANING/PURIFICATION APPARATUS USING SAME
#2605Contoured showerhead for improved plasma shaping and control
#2606Integrated steerability array arrangement for minimizing non-uniformity and methods thereof
#2607Showerhead insulator and etch chamber liner
#2608Plasma chamber having an upper electrode having controllable valves and a method of using the same
#2609Contamination removal apparatus and method
#2610Apparatus for plasma treatment and method for plasma treatment
#2611Compression member for use in showerhead electrode assembly
#2612Manufacturing method of top plate of plasma processing apparatus
#2613Proportional and uniform controlled gas flow delivery for dry plasma etch apparatus
#2614Plasma resistant ceramic coated conductive article
#2615Method of processing a semiconductor substrate in a plasma processing apparatus
#2616Gas lock, and coating apparatus comprising a gas lock
#2617Method for distributing gas for a bevel etcher
#2618APPARATUS FOR THE DEPOSITION OF DIAMONDS BY MICROWAVE PLASMA CHEMICAL VAPOUR DEPOSITION PROCESS AND SUBSTRATE STAGE USED THEREIN
#2619Shower head apparatus and method for controlling plasma or gas distribution
#2620Methods and apparatus for supplying process gas in a plasma processing system
#2621Methods and apparatus for correcting for non-uniformity in a plasma processing system
#2622Hollow cathode device and method for using the device to control the uniformity of a plasma process
#2623Ceramic article with reduced surface defect density and process for producing a ceramic article
#2624Processing gas diffusing and supplying unit and substrate processing apparatus
#2625Plasma film deposition device
#2626Adjustable nozzle for plasma deposition and a method of controlling the adjustable nozzle
#2627Semiconductor processing system and methods using capacitively coupled plasma
#2628Substrate processing system, gas supply unit, method of substrate processing, computer program, and storage medium
#2629Electroless copper deposition
#2630Multiple-electrode plasma processing systems with confined process chambers and interior-bussed electrical connections with the electrodes
#2631Methods for atomic layer etching
#2632Gas feed insert in a plasma processing chamber and methods therefor
#2633Multi zone gas injection upper electrode system
#2634Dual zone temperature control of upper electrodes
#2635Gas supply system, substrate processing apparatus and gas supply method
#2636Apparatus and method for reactive ion etching
#2637Gas dispersion apparatus
#2638Plasma processing apparatus
#2639Systems Comprising Silicon Coated Gas Supply Conduits And Methods For Applying Coatings
#2640Mixed acid cleaning assemblies
#2641Methods for mixed acid cleaning of showerhead electrodes
#2642Window and mounting arrangement for twist-and-lock gas injector assembly of inductively coupled plasma chamber
#2643Gas supply unit, substrate processing apparatus and supply gas setting method
#2644Symmetric plasma process chamber
#2645Cold plasma treatment devices and associated methods
#2646Cold plasma treatment devices and associated methods
#2647Cold plasma treatment devices and associated methods
#2648Cold plasma treatment devices and associated methods
#2649Batch-type remote plasma processing apparatus
#2650PLASMA ETCHING METHOD
#2651Cold Plasma Sterilization Devices and Associated Methods
#2652Harmonic cold plasma devices and associated methods
#2653Harmonic cold plasma devices and associated methods
#2654Cold plasma treatment devices and associated methods
#2655Apparatus including gas distribution member supplying process gas and radio frequency (RF) power for plasma processing
#2656Method for manufacturing electrophotographic photosensitive member
#2657METHOD AND APPARATUS FOR GAS DISTRIBUTION AND PLASMA APPLICATION IN A LINEAR DEPOSITION CHAMBER
#2658SUBSTRATE CLEANING METHOD AND SEMICONDUCTOR MANUFACTURING APPARATUS
#2659Method for etching high-k dielectric using pulsed bias power
#2660FILM DEPOSITION APPARATUS, SUBSTRATE PROCESSING APPARATUS, AND PLASMA GENERATING DEVICE
#2661Plasma Deposition of Amorphous Semiconductors at Microwave Frequencies
#2662Gasket with positioning feature for clamped monolithic showerhead electrode
#2663SPUTTER-ETCH TOOL AND LINERS
#2664Plasma processing apparatus and plasma processing method
#2665High strip rate downstream chamber
#2666Methods and apparatus for atomic layer etching
#2667Plasma processing method and apparatus
#2668Substrate processing apparatus
#2669SILICON OXIDE FILM FORMING METHOD AND PLASMA OXIDATION APPARATUS
#2670Plasma treatment apparatus, method for forming film, and method for manufacturing thin film transistor
#2671Substrate processing apparatus and electrode structure
#2672Multiple gas plasma forming method and ICP source
#2673METHODS AND APPARATUS FOR CONTROLLING PHOTORESIST LINE WIDTH ROUGHNESS WITH ENHANCED ELECTRON SPIN CONTROL
#2674APPARATUS AND METHOD FOR COMBINATORIAL PLASMA DISTRIBUTION THROUGH A MULTI-ZONED SHOWERHEAD
#2675Gas distribution showerhead for inductively coupled plasma etch reactor
#2676Gas distribution system for ceramic showerhead of plasma etch reactor
#2677Plasma processing apparatus and gas supply method therefor
#2678POROUS CERAMIC GAS DISTRIBUTION FOR PLASMA SOURCE ANTENNA
#2679Plasma CVD apparatus
#2680Apparatus and method for combinatorial gas distribution through a multi-zoned showerhead
#2681Substrate processing apparatus
#2682APPARATUS AND METHOD FOR FOCUSED ELECTRIC FIELD ENHANCED PLASMA-BASED ION IMPLANTATION
#2683Methods of cooling process chamber components
#2684ELECTRODE UNIT, SUBSTRATE PROCESSING APPARATUS, AND TEMPERATURE CONTROL METHOD FOR ELECTRODE UNIT
#2685Support assembly
#2686Film deposition method and film deposition apparatus
#2687Plasma processing apparatus
#2688Clamped monolithic showerhead electrode
#2689Large Area Atmospheric Pressure Plasma Enhanced Chemical Vapor Deposition Apparatus
#2690Determination method, control method, determination apparatus, pattern forming system and program
#2691PLASMA PROCESSING APPARATUS AND PLASMA PROCESSING METHOD
#2692Plasma processing apparatus
#2693Electrode assembly and plasma processing apparatus
#2694Plasma processing apparatus and plasma generation antenna
#2695Plasma generator apparatus
#2696Ceiling electrode plate and substrate processing apparatus
#2697Substrate cleaning apparatus and vacuum processing system
#2698Gas supply system, substrate processing apparatus and gas supply method
#2699FILM FORMATION APPARATUS
#2700Method for removing oxides