SUBSTRATE-PROCESSING SYSTEM AND METHOD OF COATING CARBON-PROTECTION LAYER THEREFOR

Textured silicon liners in substrate processing systems

Plasma etching apparatus comprising a nozzle oscillating unit

Toroidal plasma processing apparatus with a shaped workpiece holder

Low volume showerhead with faceplate holes for improved flow uniformity

Radical Reactor With Inverted Orientation

Plasma assisted atomic layer deposition of multi-layer films for patterning applications

Light source apparatus

Plasma treatments for flexures of hard disk drives

Gas inlet element of a CVD reactor with weight-reduced gas outlet plate

Film Forming Method and Film Forming Apparatus

PLASMA TREATING APPARATUS FOR VAPOR PHASE ETCHING AND CLEANING

Dual-channel showerhead for formation of film stacks

Apparatus for thermal control of tubing assembly and associated methods

THIN FILM ENCAPSULATION PROCESSING SYSTEM AND PROCESS KIT PERMITTING LOW-PRESSURE TOOL REPLACEMENT

Plasma processing method and plasma processing apparatus

Method for processing target object

Symmetric plasma process chamber

Symmetric plasma process chamber

Symmetric plasma process chamber

Symmetric plasma process chamber

COMPOSITE CONDUCTING WIRE, METHOD FOR MANUFACTURING THE SAME, AND APPARATUS FOR MANUFACTURING THE SAME

Atomic layer deposition chamber with funnel-shaped gas dispersion channel and gas distribution plate

Method of processing target object to be processed

Method of etching porous film

Plasma generation and control using a DC ring

PATTERN FORMING SYSTEM AND SUBSTRATE PROCESSING SYSTEM

Semiconductor processing with DC assisted RF power for improved control

SUBSTRATE PROCESSING DEVICE

Gas reaction trajectory control through tunable plasma dissociation for wafer by-product distribution and etch feature profile uniformity

Substrate processing apparatus and substrate processing method

Energetic negative ion impact ionization plasma

Fault detection using showerhead voltage variation

Plasma processing apparatus and plasma processing method

Apparatus for thermal control of tubing assembly and associated methods

Suppression of parasitic deposition in a substrate processing system by suppressing precursor flow and plasma outside of substrate region

Vacuum plasma sprayed coating including oxide dispersions

ARTICLE INCLUDING POLYMER HAVING SURFACE WITH LOW COEFFICIENT OF FRICTION AND MANUFACTURING METHOD OF SUCH

Moveable and adjustable gas injectors for an etching chamber

Enhanced etching processes using remote plasma sources

SUBSTRATE PROCESSING APPARATUS, PROGRAM AND METHOD OF MANUFACTURING SEMICONDUCTOR DEVICE

Method of manufacturing semiconductor device, substrate processing apparatus, and recording medium

UPPER ELECTRODE, EDGE RING, AND PLASMA PROCESSING APPARATUS

Plasma reactor having digital control over rotation frequency of a microwave field with direct up-conversion

Substrate Processing Apparatus, Method of Manufacturing Semiconductor Device and Non-Transitory Computer-Readable Recording Medium

Microwave plasma source and plasma processing apparatus

Power supply system, plasma processing apparatus and power supply control method

Minimizing radical recombination using ALD silicon oxide surface coating with intermittent restoration plasma

Plasma nitriding apparatus

Substrate processing apparatus

DECOMPRESSION PROCESSING APPARATUS

Sub-pulsing during a state

SUBSTRATE PROCESSING APPARATUS

Ion-ion plasma atomic layer etch process and reactor

Atomic layer deposition apparatus

Multi-zone reactor, system including the reactor, and method of using the same

Methods for removing particles from etching chamber

Plasma processing device and operation method

Plasma source device and methods

Microwave automatic matcher and plasma processing apparatus

Technique to deposit sidewall passivation for high aspect ratio cylinder etch

PLASMA PROCESSING APPARATUS

Plasma processing member, deposition apparatus including the same, and depositing method using the same

Method and device for producing uniform films on moving substrates and films produced in this way

ATOMIC LAYER DEPOSITION DEVICE HAVING SCAN-TYPE REACTOR AND METHOD OF DEPOSITING ATOMIC LAYER USING THE SAME

Deposition device and deposition method

High-purity fluorinated hydrocarbon, use as a plasma etching gas, and plasma etching method

Silicon nitride film and method of making thereof

PROCESS AND SYSTEM FOR THE SUBMICRON STRUCTURING OF A SUBSTRATE SURFACE

Systems and methods for internal surface conditioning in plasma processing equipment

Method of fabricating two-dimensional layered chalcogenide film

Plasma processing apparatus and method for manufacturing electronic component

Semiconductor manufacturing apparatus

Fabrication of a silicon structure and deep silicon etch with profile control

Selective deposition utilizing masks and directional plasma treatment

Heated air plasma treatment

Plasma processing apparatus and plasma processing method

Sputtering apparatus including gas distribution system

Apparatus and Method for Metastable Enhanced Plasma Ignition

PLASMA TREATING APPARATUS, SUBSTRATE TREATING METHOD, AND METHOD OF MANUFACTURING A SEMICONDUCTOR DEVICE

Plasma processing method and plasma processing apparatus

Plasma processing systems including side coils and methods related to the plasma processing systems

Oxide and metal removal

Plasma processing device with shower plate having protrusion for suppressing film formation in gas holes of shower plate

Apparatus and method for purging gaseous compounds

PATCH PRODUCTION

METHOD OF FORMING FINE PATTERN, METHOD OF MANUFACTURING SEMICONDUCTOR DEVICE, SUBSTRATE PROCESSING APPARATUS AND RECORDING MEDIUM

SEMICONDUCTOR SYSTEM ASSEMBLIES AND METHODS OF OPERATION

MICROWAVE PLASMA PROCESSING DEVICE

Gas distribution system for ceramic showerhead of plasma etch reactor

VACUUM PROCESSING APPARATUS

APPARATUS FOR PLASMA TREATING

Estimation of lifetime remaining for a consumable-part in a semiconductor manufacturing chamber

Plasma processing method and plasma processing apparatus

Plasma-chemical coating apparatus

Internal plasma grid for semiconductor fabrication

LOCAL DRY ETCHING APPARATUS AND LOCAL DRY ETCHING FABRICATION METHOD

Etching source installable in a storage medium processing tool

Vapor deposition apparatus, deposition method, and method of manufacturing organic light-emitting display apparatus by using the same

Contoured showerhead for improved plasma shaping and control

Ceramic gas distribution plate with embedded electrode

Plasma processing apparatus and plasma processing method

Plasma reactor vessel having improved plasma uniformity comprised of a first electrode, a second electrode opposed to the first electrode, and a third electrode between a substrate carrier and the second electrode

Gas intake device of magnetron sputtering vacuum chamber and magnetron sputtering apparatus

Inductively coupled plasma apparatus

Etching method and etching apparatus

High conductance process kit

PLASMA PROCESSING APPARATUS

Tuning a parameter associated with plasma impedance

PLASMA PROCESSING APPARATUS AND METHOD FOR DETERMINING REPLACEMENT OF MEMBER OF PLASMA PROCESSING APPARATUS

Method of manufacturing an upper electrode of a plasma processing device

Shower head for electronic device having dispersion pins fabrication and shower head assembly

Supporting unit and substrate treating apparatus including the same

INTERNAL PLASMA GRID FOR SEMICONDUCTOR FABRICATION

Low contamination chamber for surface activation

PLASMA GENERATING DEVICE WITH MOVING CAROUSEL AND METHOD OF USE

Radical generator and molecular beam epitaxy apparatus

Plasma processing apparatus with shower plate having protrusion for suppressing film formation in gas holes of shower plate

Plasma processing apparatus

SEMICONDUCTOR MANUFACTURING APPARATUS AND SEMICONDUCTOR MANUFACTURING METHOD

Fast-gas switching for etching

Carrier ring structure and chamber systems including the same

Plasma processing apparatus and plasma processing method

LINER ASSEMBLY AND SUBSTRATE PROCESSING APPARATUS HAVING THE SAME

Inlet for effective mixing and purging

Multi-station plasma reactor with RF balancing

Filament holder for hot cathode PECVD source

Plasma processing apparatus and plasma processing method

Plasma processing system with direct outlet toroidal plasma source

Direct outlet toroidal plasma source

Tunable magnetic field to improve uniformity

SUPPORT UNIT AND SUBSTRATE TREATING APPARATUS INCLUDING THE SAME

Plasma processing apparatus

Feedforward temperature control for plasma processing apparatus

Film forming apparatus

Installation and process for the treatment of metallic pieces by a plasma reactor

Methods and systems to enhance process uniformity

Internal plasma grid for semiconductor fabrication

Fast-gas switching for etching

Method of making a nanostructure and nanostructured articles

SUBSTRATE PROCESSING APPARATUS

RADICAL ASSISTED CURE OF DIELECTRIC FILMS

Nozzle and substrate processing apparatus using same

Plasma spark discharge reactor and durable electrode

Display device and apparatus and method for manufacturing the same

ETCH ENHANCEMENT VIA CONTROLLED INTRODUCTION OF CHAMBER CONTAMINANTS

Plasma processing apparatus

PLASMA PROCESSING APPARATUS

METHOD AND DEVICE FOR FORMING PROTRUSION BY MASKING ON SURFACE OF BASIC MATERIAL

Film forming apparatus and shower head

Selective etch for metal-containing materials

Methods for forming a metal silicide interconnection nanowire structure

Method and device for generating an electrical discharge

Apparatus for the plasma treatment of surfaces and a method for treating surfaces with plasma

Plasma Processing Apparatus and Opening and Closing Mechanism used therein

Plasma processing apparatus

Plasma processing system including a symmetrical remote plasma source for minimal ion energy

PLASMA PROCESSING APPARATUS

METHOD AND APPARATUS FOR CHARACTERIZING METAL OXIDE REDUCTION

Nanocluster production device

Gas supply delivery arrangement including a gas splitter for tunable gas flow control

SUBSTRATE FOR MOUNTING GAS SUPPLY COMPONENTS AND METHODS THEREOF

Plasma reactor with non-power-absorbing dielectric gas shower plate assembly

Corrosion resistant abatement system

Systems and methods for internal surface conditioning assessment in plasma processing equipment

Temperature control system and temperature control method

Plasma processing device

LOCAL DRY ETCHING APPARATUS

Internally heated porous filter for defect reduction with liquid or solid precursors

Ultra-high speed anisotropic reactive ion etching

Workpiece processing method

Apparatus and method of manufacturing display apparatus

SUBSTRATE PROCESSING METHOD

SYSTEMS AND METHODS OF TREATING A SUBSTRATE

Gas distribution device with actively cooled grid

Guard aperture to control ion angular distribution in plasma processing

Plasma etching method and plasma etching apparatus

Edge-clamped and mechanically fastened inner electrode of showerhead electrode assembly

Auto frequency tuned remote plasma source

Silicon dioxide-polysilicon multi-layered stack etching with plasma etch chamber employing non-corrosive etchants

Increasing the gas efficiency for an electrostatic chuck

Plasma processing apparatus

Heat transfer plate for a showerhead electrode assembly of a capacitively coupled plasma processing apparatus

Plasma Processing Devices Having a Surface Protection Layer

Systems and methods for suppressing parasitic plasma and reducing within-wafer non-uniformity

Method for Increasing Adhesion of Copper to Polymeric Surfaces

PLASMA PROCESSING APPARATUS AND CLEANING METHOD

INTEGRATED PROCESSING FOR MICROCONTAMINATION PREVENTION

Inject insert for EPI chamber

Contact clean in high-aspect ratio structures

Methods and apparatus for controlling photoresist line width roughness with enhanced electron spin control

SEMICONDUCTOR FABRICATING APPARATUS AND METHOD OF FABRICATING SEMICONDUCTOR DEVICE USING THE SAME

Method for supplying gas, and plasma processing apparatus

Substrate processing apparatus

Plasma processing apparatus with gas feed and evacuation conduit

Plasma perforation

Method for void-free cobalt gap fill

Plasma etching apparatus and plasma etching method

SYSTEMS AND METHODS FOR TREATING MATERIAL SURFACES

Plasma uniformity control by gas diffuser hole design

Electric pressure systems for control of plasma properties and uniformity

Plasma apparatus and method of operating the same

Plasma uniformity control by arrays of unit cell plasmas

Process and apparatus for thermochemically hardening workpieces

Method and system for in situ formation of gas-phase compounds

Differentially pumped reactive gas injector

PLASMA DEVICE

Tiled showerhead for a semiconductor chemical vapor deposition reactor

Nozzle for uniform plasma processing

ELECTRON BEAM PLASMA SOURCE WITH ROTATING CATHODE, BACKSIDE HELIUM COOLING AND LIQUID COOLED PEDESTAL FOR UNIFORM PLASMA GENERATION

Grooved insulator to reduce leakage current

Etching method of multilayered film

Etching method of multilayered film

POST-CHAMBER ABATEMENT USING UPSTREAM PLASMA SOURCES

Wafer carrier with independent isolated heater zones

Plasma processing apparatus

PLASMA PROCESSING APPARATUS AND GAS SUPPLY MEMBER

Film forming apparatus and film forming method

Systems and methods for electrical and magnetic uniformity and skew tuning in plasma processing reactors

PLASMA PROCESSING APPARATUS AND PLASMA PROCESSING METHOD

PLASMA GENERATING UNIT AND SUBSTRATE TREATING APPARATUS HAVING THE SAME

System and method for selective coil excitation in inductively coupled plasma processing reactors

Deposition of metal doped amorphous carbon film

Microwave plasma spectrometer using dielectric resonator

PLASMA CVD DEVICE AND PLASMA CVD METHOD

Placing bed structure, treating apparatus using the structure, and method for using the apparatus

Data analysis method for plasma processing apparatus, plasma processing method and plasma processing apparatus

Dual-plenum showerhead with interleaved plenum sub-volumes

PLASMA GENERATING APPARATUS USING DUAL PLASMA SOURCE AND SUBSTRATE TREATING APPARATUS INCLUDING THE SAME

Plasma-processing apparatus with upper electrode plate and method for performing plasma treatment process

Film forming device

Semiconductor reaction chamber with plasma capabilities

Apparatus and method for tuning a plasma profile using a tuning electrode in a processing chamber

Gas cooled plasma spraying device

SYSTEMS AND METHODS FOR PRODUCING ENERGETIC NEUTRALS

Layer-forming device and injector

Component for use in plasma processing apparatus, plasma processing apparatus, and method for manufacturing the component

Plasma source

Chemical control features in wafer process equipment

Showerhead having a detachable high resistivity gas distribution plate

Ceramic showerhead including central gas injector for tunable convective-diffusive gas flow in semiconductor substrate processing apparatus

Multiple point gas delivery apparatus for etching materials

Substrate treating apparatus

Method of patterning a low-k dielectric film

Multi-zone gas injection assembly with azimuthal and radial distribution control

Plasma reactor with highly symmetrical four-fold gas injection

PLASMA PROCESSING APPARATUS

Method of multiple zone symmetric gas injection for inductively coupled plasma

Film forming method and film forming apparatus

Multi-zone heated ESC with independent edge zones

Selective titanium nitride removal

Peroxide-vapor treatment for enhancing photoresist-strip performance and modifying organic films

Non-local plasma oxide etch

Method of manufacturing semiconductor device, substrate processing apparatus, and recording medium

Apparatus and method for mass analyzed ion beam

Plasma processing apparatus and cleaning method

Defect control in RF plasma substrate processing systems using DC bias voltage during movement of substrates

Defect control and stability of DC bias in RF plasma-based substrate processing systems using molecular reactive purge gas

Electrode plate for plasma etching and plasma etching apparatus

IMPEDANCE MATCHING SLUG, IMPEDANCE MATCHING DEVICE, ELECTROMAGNETIC WAVE TRANSMISSION DEVICE, ELECTROMAGNETIC WAVE RADIATION DEVICE, AND PLASMA PROCESSING APPARATUS

GAS DISTRIBUTION APPARATUS AND SUBSTRATE PROCESSING APPARATUS INCLUDING SAME

Hybrid plasma source

Plasma processing method and apparatus

DEVICE FOR PROVIDING A FLOW OF PLASMA

Plasma processing apparatus and method

Apparatus for treating substrate and method for treating substrate

Superhydrophobic compositions and coating process for the internal surface of tubular structures

Plasma processing apparatus

Plasma processing method and plasma processing apparatus

Substrate processing apparatus, method of manufacturing semiconductor device and non-transitory computer-readable recording medium

Etching method

Method for manufacturing semiconductor device, ion beam etching device, and control device

Plasma source

Gas distribution showerhead for inductively coupled plasma etch reactor

SYSTEM AND METHOD FOR TREATING SUBSTRATE

Low volume showerhead with porous baffle

Film forming method and film forming apparatus

Dry etching method

Plasma-generating unit and substrate treatment apparatus including the same

Plasma processing method and plasma processing apparatus

Substrate processing apparatus

PLASMA POLISH FOR MAGNETIC RECORDING MEDIA

Gas injection system with precursor for planar deprocessing of semiconductor devices using a focused ion beam

Plasma processing device, and plasma processing method

PLASMA PROCESSING APPARATUS AND PLASMA PROCESSING METHOD

PLASMA PROCESSING METHOD AND PLASMA PROCESSING APPARATUS

Configuration independent gas delivery system

Monolithic ceramic component of gas delivery system and method of making and use thereof

Device and method for manufacturing a semiconductor structure

Electrostatic remote plasma source system and method

COMBINED INDUCTIVE AND CAPACITIVE SOURCES FOR SEMICONDUCTOR PROCESS EQUIPMENT

Plasma electrode device and method for manufacturing the same

Replaceable upper chamber parts of plasma processing apparatus

Generation of compact alumina passivation layers on aluminum plasma equipment components

Gas supply pipe, and gas treatment equipment

Conditioned semiconductor system parts

Methods and apparatus for material processing using dual source cyclonic plasma reactor

Tightly fitted ceramic insulator on large area electrode

Substrate processing apparatus, method for manufacturing semiconductor device and computer-readable recording medium

Methods for plasma processing