205328 ⎘
Discharge tubes with provision for introducing objects or material to be exposed to the discharge, e.g. for the purpose of examination or processing thereof; Gas-filled discharge tubes; Constructional details of the reactor; Gas supply means Gas control, e.g. control of the gas flow
Substrate processing method and plasma processing apparatus
#1202Substrate support and plasma processing apparatus
#1203SUBSTRATE PROCESSING APPARATUS AND METHOD OF MANUFACTURING SEMICONDUCTOR DEVICE
#1204Plasma immersion methods for ion implantation
#1205Etching method, plasma processing apparatus, and substrate processing system
#1206METHOD OF ETCHING SILICON OXIDE FILM AND PLASMA PROCESSING APPARATUS
#1207Plasma processing apparatus and prediction method of the condition of plasma processing apparatus
#1208Etching method and plasma treatment device
#1209Substrate processing apparatus
#1210Dynamic pressure control for processing chambers implementing real-time learning
#1211Plasma processing apparatus and control method
#1212Plasma probe device, plasma processing apparatus, and control method
#1213Plasma processing apparatus and method for venting a processing chamber to atmosphere
#1214APPARATUS AND METHOD FOR TREATING SUBSTRATE
#1215Plasma processing apparatus
#1216Spacer etching process
#1217Apparatus for conducting plasma surface treatment, board treatment system having the same
#1218Charged particle beam apparatus
#1219Methods of optical device fabrication using an electron beam apparatus
#1220Etching method and substrate processing apparatus
#1221Method to clean SnOfilm from chamber
#1222Film forming method and film forming apparatus
#1223Plasma generator and information processing method
#1224Biphasic plasma microreactor and method of using the same
#1225Enhanced ignition in inductively coupled plasmas for workpiece processing
#1226CHAMBER CONFIGURATIONS FOR CONTROLLED DEPOSITION
#1227PLASMA ETCHING METHOD AND PLASMA ETCHING DEVICE
#1228Shower plate, lower dielectric member and plasma processing apparatus
#1229Gas supply system, plasma processing apparatus, and control method for gas supply system
#1230METHOD OF TREATING A SUBSTRATE AND VACUUM DEPOSITION APPARATUS
#1231Substrate processing apparatus
#1232Semiconductor processing chamber and methods for cleaning the same
#1233Semiconductor processing chambers and methods for cleaning the same
#1234Modifying ferroelectric properties of hafnium oxide with hafnium nitride layers
#1235PLASMA PROCESSING APPARATUS
#1236Etching method, semiconductor manufacturing apparatus, and method of manufacturing semiconductor device
#1237Processing of workpieces using hydrogen radicals and ozone gas
#1238Method and apparatus for controlling a processing reactor
#1239Plasma processing method and plasma processing apparatus
#1240Methods for tuning plasma potential using variable mode plasma chamber
#1241Plasma processing apparatus
#1242Performance calculation method and processing apparatus
#1243Control system for plasma chamber having controllable valve
#1244Etching method and substrate processing apparatus
#1245Electrostatic chuck and plasma processing apparatus
#1246Etching method and substrate processing apparatus
#1247Negative ion irradiation device
#1248PLASMA IN A SUBSTRATE PROCESSING APPARATUS
#1249Plasma processing apparatus, processing system, and method of etching porous film
#1250Plasma processing apparatus and method of operating the same
#1251Plasma apparatus and methods of manufacturing semiconductor device using the same
#1252Point etching module using annular surface dielectric barrier discharge apparatus and method for control etching profile of point etching module
#1253Plasma-enhanced anneal chamber for wafer outgassing
#1254Substrate processing apparatus
#1255HIGH ENERGY ATOMIC LAYER ETCHING
#1256METHOD OF ETCHING POROUS FILM
#1257Personnel-tolerant carbon dioxide beamline variation reduction
#1258Substrate processing apparatus, method of manufacturing semiconductor device, and baffle structure of the substrate processing apparatus
#1259Reaction chamber, dry etching machine and etching method
#1260Showerhead with inlet mixer
#1261Apparatus and method for surface coating by means of grid control and plasma-initiated gas-phase polymerization
#1262Dynamic multi zone flow control for a processing system
#1263Plasma etching method using faraday cage
#1264Shower head assembly and plasma processing apparatus having the same
#1265Plasma abatement system utilizing water vapor and oxygen reagent
#1266WAFER PROCESSING METHOD
#1267Substrate processing apparatus
#1268Controller for controlling core critical dimension variation using flash trim sequence
#1269Large-area high-density plasma processing chamber for flat panel displays
#1270Method of manufacturing semiconductor device, substrate processing apparatus and program
#1271GLOW PLASMA STABILIZATION
#1272Gas flow system
#1273Operating a gas supply device for a particle beam device
#1274Plasma processing method
#1275Substrate processing method and substrate processing apparatus
#1276PLASMA DENSIFICATION WITHIN A PROCESSING CHAMBER
#1277Electrostatic chucking process
#1278Semiconductor device
#1279Surface processing apparatus
#1280Optical filters and methods for forming the same
#1281PLASMA STERILIZATION AND DRYING SYSTEM AND METHODS
#1282MULTIZONE FLOW DISTRIBUTION SYSTEM
#1283Optical system for monitoring plasma reactions and reactors
#1284Plasma reactors having recuperators
#1285REACTION TUBE AND METHOD OF MANUFACTURING SEMICONDUCTOR DEVICE
#1286Chamber with individually controllable plasma generation regions for a reactor for processing a workpiece
#1287Controlling exhaust gas pressure of a plasma reactor for plasma stability
#1288Plasma generating system having thermal barrier between plasma reactor and waveguide
#1289Deposition method
#1290Durable auto-ignition device for plasma reactor
#1291Collecting and recycling rare gases in semiconductor processing equipment
#1292PLASMA PROCESSING METHOD AND PLASMA PROCESSING APPARATUS
#1293Methods and apparatus for etching semiconductor structures
#1294Gas supply apparatus
#1295Sputtering system and method
#1296Semiconductor reaction chamber showerhead
#1297Radiation shield
#1298PLASMA PROCESSING METHOD AND PLASMA PROCESSING APPARATUS
#1299Plasma processing method and plasma processing apparatus
#1300Method and apparatus for filling a recess formed within a substrate surface
#1301FILM FORMING METHOD, METHOD FOR CLEANING PROCESSING CHAMBER FOR FILM FORMATION, AND FILM FORMING APPARATUS
#1302METHOD AND DEVICE FOR PLASMA TREATMENT OF CONTAINERS
#1303Substrate processing apparatus, method of manufacturing semiconductor device and non-transitory computer-readable recording medium
#1304Sputtering apparatus
#1305Substrate processing apparatus and cleaning method
#1306Temperature-controlled plasma generation system
#1307Multi channel splitter spool
#1308Air leak detection in plasma processing apparatus with separation grid
#1309Post Plasma Gas Injection In A Separation Grid
#1310GAS SUPPLY DEVICE
#1311Upper electrode and plasma processing apparatus
#1312Plasma processing apparatus and plasma processing method
#1313Selective growth of metal-containing hardmask thin films
#1314Thermal repeatability and in-situ showerhead temperature monitoring
#1315Metal contamination reduction in substrate processing systems with transformer coupled plasma
#1316Ion source device
#1317Apparatus and method for semiconductor fabrication
#1318Apparatus and method for semiconductor fabrication
#1319Plasma processing apparatus and plasma processing method
#1320Atmospheric plasma device
#1321Atomic layer etch process using plasma in conjunction with a rapid thermal activation process
#1322Capacitively coupled plasma etching apparatus
#1323Capacitively coupled plasma etching apparatus
#1324Fluorine ion implantation system with non-tungsten materials and methods of using
#1325Fluorine ion implantation method and system
#1326Method for manufacturing semiconductor device and film forming apparatus
#1327Film stress control for plasma enhanced chemical vapor deposition
#1328Methods of optical device fabrication using an electron beam apparatus
#1329Ion beam source for optical device fabrication using a segmented ion source having one or more angled surfaces
#1330Methods of optical device fabrication using an ion beam source
#1331Electron beam apparatus for optical device fabrication
#1332Apparatus for selectively etching first region made of silicon nitride against second region made of silicon oxide
#1333Component, method of manufacturing the component, and method of cleaning the component
#1334Plasma processing apparatus and plasma processing method
#1335Gas injector for reaction regions
#1336Plasma treating an implant
#1337Control method and plasma processing apparatus
#1338Method of determining plasma abnormality, method of manufacturing semiconductor device, and substrate processing apparatus
#1339Plasma processing apparatus, calculation method, and calculation program
#1340Substrate treating apparatus and temperature control method for gas distribution plate
#1341Film stack overlay improvement
#1342Substrate processing apparatus, method of manufacturing semiconductor device and non-transitory computer-readable recording medium
#1343Gas diffuser mounting plate for reduced particle generation
#1344INTEGRATING ATOMIC SCALE PROCESSES: ALD (ATOMIC LAYER DEPOSITION) AND ALE (ATOMIC LAYER ETCH)
#1345Plasma etching method for selectively etching silicon oxide with respect to silicon nitride
#1346Plasma diagnostic system and method
#1347Plasma processing apparatus and manufacturing method using the same
#1348Gas injection module, substrate processing apparatus, and method of fabricating semiconductor device using the same
#1349Method and apparatus for non line-of-sight doping
#1350Method for oxidizing a silicon carbide based on microwave plasma at an AC voltage
#1351Processing chamber with substrate edge enhancement processing
#1352Substrate support, plasma processing apparatus, and focus ring
#1353Flow control features of CVD chambers
#1354Substrate processing apparatus
#1355Etching method and plasma processing apparatus
#1356PLASMA GENERATING DEVICE AND PLASMA CLEANING DEVICE
#1357FinFET device and method of forming same
#1358Integrated circuit fabrication system with adjustable gas injector and method utilizing the same
#1359Gas curtain for semiconductor manufacturing system
#1360Cleaning method and plasma processing apparatus
#1361Device for providing gas to a plasma chamber and a plasma processing device including the same
#1362Complementary pattern station designs
#1363HIGH TEMPERATURE COATINGS FOR A PRECLEAN AND ETCH APPARATUS AND RELATED METHODS
#1364Plasma processing apparatus
#1365Plasma processing apparatus
#1366Plasma processing apparatus
#1367Flow through line charge volume
#1368Substrate processing apparatus, method of controlling the same, and storage medium having stored therein program thereof
#1369Systems and methods for a plasma enhanced deposition of material on a semiconductor substrate
#1370Systems and methods for improved semiconductor etching and component protection
#1371Method of forming conformal silicon carbide film by cyclic CVD
#1372Atmospheric pressure plasma device
#1373Substrate treating apparatus, substrate support unit, and substrate treating method
#1374Conditioning of a processing chamber
#1375Ion collector for use in plasma systems
#1376Substrate processing apparatus and substrate processing method
#1377Apparatus and method for treating substrate
#1378System and method for precision formation of a lattice on a substrate
#1379Asymmetric wafer bow compensation by chemical vapor deposition
#1380METHOD AND DEVICE FOR FORMING A LAYER ON A SEMICONDUCTOR SUBSTRATE, AND SEMICONDUCTOR SUBSTRATE
#1381Vacuum pump protection against deposition byproduct buildup
#1382Methods and Systems for Managing Byproduct Material Accumulation During Plasma-Based Semiconductor Wafer Fabrication Process
#1383Method of manufacturing semiconductor device, and recording medium
#1384Method for high aspect ratio photoresist removal in pure reducing plasma
#1385GAS DISTRIBUTION ASSEMBLIES AND OPERATION THEREOF
#1386Methods and systems for determining a fault in a gas heater channel
#1387Stack of multiple deposited semiconductor layers
#1388Systems and methods for improved performance in semiconductor processing
#1389Method of achieving high selectivity for high aspect ratio dielectric etch
#1390High temperature RF heater pedestals
#1391FILLING A CAVITY IN A SUBSTRATE USING SPUTTERING AND DEPOSITION
#1392Substrate processing apparatus, plurality of electrodes and method of manufacturing semiconductor device
#1393Substrate processing apparatus
#1394Multi-functional protective coating
#1395ELECTRODE ASSEMBLY AND ETCHING APPARATUS
#1396Multi-layer protective coating
#1397Substrate treatment apparatus and manufacturing method of a semiconductor device
#1398Confinement ring with extended life
#1399Semiconductor manufacturing apparatus having an insulating plate
#1400Method for etching an etch layer
#1401Plasma processing apparatus
#1402Plasma treatment method
#1403WATER MOLECULE SUPPLY DEVICE FOR PLASMA TORCH EXCITATION DEVICE
#1404Plasma Device with an External RF Hollow Cathode for Plasma Cleaning of High Vacuum Systems
#1405METHOD OF MANUFACTURING SEMICONDUCTOR DEVICE
#1406Etch process with rotatable shower head
#1407PRESSURE CONTROL RING, PLASMA PROCESSING APPARATUS INCLUDING THE SAME AND METHOD OF MANUFACTURING SEMICONDUCTOR DEVICE
#1408Controlling showerhead heating via resistive thermal measurements
#1409Sensor-to-sensor matching methods for chamber matching
#1410Plasma processing method and plasma ashing apparatus
#1411Normal-incident in-situ process monitor sensor
#1412Compensating chamber and process effects to improve critical dimension variation for trim process
#1413Devices and methods for controlling wafer uniformity in plasma-based process
#1414Gas box for CVD chamber
#1415Method for controlling core critical dimension variation using flash trim sequence
#1416Plasma processing method and plasma processing apparatus
#1417Remote capacitively coupled plasma source with improved ion blocker
#1418MAGNETICALLY ENHANCED AND SYMMETRICAL RADIO FREQUENCY DISCHARGE APPARATUS FOR MATERIAL PROCESSING
#1419Gas distribution plate for thermal deposition
#1420Remote plasma based deposition of boron nitride, boron carbide, and boron carbonitride films
#1421Device and system for energy generation by controlled plasma ignition and incineration
#1422Gas distributor and flow verifier
#1423Substrate processing apparatus
#1424Deposition method
#1425Dielectric gapfill using atomic layer deposition (ALD), inhibitor plasma and etching
#1426Remote hydrogen plasma titanium deposition to enhance selectivity and film uniformity
#1427Resonant structure for electron cyclotron resonant (ECR) plasma ionization
#1428Plasma Spreading Apparatus And System, And Method Of Spreading Plasma In Process Ovens
#1429Electrostatic chuck sidewall gas curtain
#1430Plasma etching method and plasma etching apparatus
#1431Selective growth of metal-containing hardmask thin films
#1432DRY ETCHING DEVICE AND ELECTRODE THEREOF
#1433Device for pulsed laser deposition and a substrate with a substrate surface for reduction of particles on the substrate
#1434Method of achieving high selectivity for high aspect ratio dielectric etch
#1435High bias deposition of high quality gapfill
#1436Method of etching at low temperature and plasma etching apparatus
#1437METHOD OF FORMING METAL FILM AND FILM FORMING APPARATUS
#1438Radical output monitor for a remote plasma source and method of use
#1439PLASMA PROCESSING DEVICE
#1440Nozzle for multi-zone gas injection assembly
#1441Chemical control features in wafer process equipment
#1442Apparatus and method for deposition and etch in gap fill
#1443Method for controlling plasma in semiconductor fabrication
#1444APPARATUS AND METHOD FOR PROCESSING SUBSTRATE
#1445Plasma processing apparatus
#1446Plasma processing apparatus and temperature control method
#1447Substrate processing chamber with showerhead having cooled faceplate
#1448Gas-phase chemical reactor and method of using same
#1449Symmetric chamber body design architecture to address variable process volume with improved flow uniformity/gas conductance
#1450Ion beam etching chamber with etching by-product redistributor
#1451Active showerhead
#1452FILM-FORMING METHOD AND FILM-FORMING APPARATUS
#1453Gas distribution system and reactor system including same
#1454Manufacturing method of showerhead for plasma processing apparatus
#1455Plasma processing apparatus and method for plasma processing
#1456Method for dry cleaning a susceptor and substrate processing apparatus
#1457Method of cleaning a substrate processing apparatus and the substrate processing apparatus performing the method
#1458Techniques and apparatus for elongation patterning using angled ion beams
#1459Wet cleaning inside of gasline of semiconductor process equipment
#1460Display device manufacturing apparatus and method
#1461EDGE RING FOCUSED DEPOSITION DURING A CLEANING PROCESS OF A PROCESSING CHAMBER
#1462Method for cleaning gas supply line and processing system
#1463SUBSTRATE PROCESSING APPARATUS AND PROGRAM FOR SUBSTRATE PROCESSING APPARATUS
#1464Method for etching organic region
#1465Processing system and processing method
#1466Extended detachable gas distribution plate and showerhead incorporating same
#1467PLASMA ETCHING METHOD AND PLASMA PROCESSING APPARATUS
#1468Showerhead and substrate processing apparatus
#1469METHOD OF MANUFACTURING SEMICONDUCTOR DEVICE, SUBSTRATE PROCESSING APPARATUS, AND RECORDING MEDIUM
#1470MULTIZONE GAS DISTRIBUTION APPARATUS
#1471PROCESS FOR PREPARING CONTACT LENS WITH FILM BY PLASMA ENHANCED CHEMICAL VAPOR DEPOSITION
#1472FLOW RATE CONTROL METHOD, TEMPERATURE CONTROL METHOD, AND PROCESSING APPARATUS
#1473SUBSTRATE PROCESSING APPARATUS
#1474Plasma treatment device
#1475Search device, search method and plasma processing apparatus
#1476Cleaning method and processing apparatus
#1477METHOD AND APPARATUS FOR PROVIDING RADICAL SPECIES TO A PROCESSING VOLUME OF A PROCESSING CHAMBER
#1478Substrate processing apparatus and method of manufacturing semiconductor device
#1479PLASMA PROCESSING METHOD AND PLASMA PROCESSING APPARATUS
#1480Plasma processing apparatus
#1481Treatment unit for a facility for treating the surface of a substrate in motion, corresponding facility and method of implementation
#1482DIFFUSIVE PLASMA AIR TREATMENT AND MATERIAL PROCESSING
#1483FILM FORMING METHOD AND FILM FORMING APPARATUS
#1484Plasma Enhanced ALD System
#1485VACUUM PROCESSING APPARATUS AND EXHAUST CONTROL METHOD
#1486DC bias in plasma process
#1487Etching method and plasma processing apparatus
#1488Cleaning method and plasma processing apparatus
#1489Substrate processing apparatus, flow rate control method, and storage medium storing flow rate control program
#1490Method of selectively etching first region made of silicon nitride against second region made of silicon oxide
#1491OES device, plasma processing apparatus including the same and method of fabricating semiconductor device
#1492Plasma processing system and plasma processing method
#1493Cyclotronic plasma actuator with arc-magnet for active flow control
#1494Chemical control features in wafer process equipment
#1495RAISING-AND-LOWERING MECHANISM, STAGE AND PLASMA PROCESSING APPARATUS
#1496Method of manufacturing semiconductor device
#1497Asymmetrical sealing and gas flow control device
#1498Etching method and etching apparatus
#1499Target supply device, target material refining method, recording medium having target material refining program recorded therein, and target generator
#1500Vacuum processing apparatus