Active gas-generating device and film formation apparatus

ULTRAHIGH SELECTIVE POLYSILICON ETCH WITH HIGH THROUGHPUT

Etching methods

Substrate processing apparatus

PLASMA PROCESSING APPARATUS INCLUDING SHOWER HEAD WITH SUB-GAS PORTS AND RELATED SHOWER HEADS

Apparatus and method for fabricating a semiconductor device

Pre-coating method and film forming method

Etching method and etching apparatus

Plasma processing device

Metal recess for semiconductor structures

Metal recess for semiconductor structures

Additively manufactured gas distribution manifold

A Non-Contact Substrate Carrier for Simultaneous Rotation and Levitation of a Substrate

Substrate chucking and dechucking methods

Substrate processing apparatus, method of manufacturing semiconductor device and electrode fixing part

Etching method and method for manufacturing DRAM capacitor

FREE RADICAL GENERATION DEVICE AND METHODS THEREOF

Deposition apparatus including cleaning gas valve unit and deposition method including the same

A MACHINE AND A PROCESS FOR THE ATMOSPHERIC PLASMA TREATMENT OF DIFFERENT MATERIALS USING GASEOUS MIXTURES COMPRISING CHEMICALS AND/OR MONOMERS

ETCHING METHOD

Substrate processing apparatus, method of manufacturing semiconductor device and non-transistory computer-readable recording medium

Plasma Processing Apparatus and Methods

Chamber conditioning and removal processes

Wafer processing method and wafer processing apparatus

PLASMA ETCHING APPARATUS AND PLASMA ETCHING METHOD

Plasma Processing Apparatus and Method of Manufacturing Semiconductor Device Using the Same

Cooling mechanism utilized in a plasma reactor with enhanced temperature regulation

Processing of semiconductors using vaporized solvents

Plasma processing apparatus

Methods and assemblies using fluorine containing and inert gases for plasma flood gun operation

Multi-zone gas distribution systems and methods

PLASMA PROCESSING APPARATUS

Source material container

Spatial atomic layer deposition chamber with plasma pulsing to prevent charge damage

Gas splitting by time average injection into different zones by fast gas valves

Textured processing chamber components and methods of manufacturing same

Substrate processing apparatus

Advanced coating method and materials to prevent HDP-CVD chamber arcing

Plasma processing apparatus and plasma processing method

APPARATUS FOR TREATING SUBSTRATE AND METHOD FOR TREATING SUBSTRATE

Medical device with plasma modified oxide layer and method of forming such a device

Atomic layer deposition and etch in a single plasma chamber for fin field effect transistor formation

METHOD FOR CLEANING CHAMBER

Activated gas generation apparatus

SPUTTERING APPARATUS AND METHOD FOR MANUFACTURING FILM

Deposition apparatus including upper shower head and lower shower head

INLINE DPS CHAMBER HARDWARE DESIGN TO ENABLE AXIS SYMMETRY FOR IMPROVED FLOW CONDUCTANCE AND UNIFORMITY

PLASMA PROCESSING APPARATUS

Multi-zone cooling of plasma heated window

Multi-source low-power low-temperature plasma polymerized coating device and method

Etch process with rotatable shower head

Method and Apparatus for Anisotropic Pattern Etching and Treatment

SHOWERHEAD AND SUBSTRATE PROCESSING DEVICE INCLUDING THE SAME

Integrating atomic scale processes: ALD (atomic layer deposition) and ALE (atomic layer etch)

Systems and methods for a tunable electromagnetic field apparatus to improve doping uniformity

Plasma processing apparatus and plasma processing method

Gas supply system and gas supply method

Wear amount measuring apparatus and method, temperature measuring apparatus and method and substrate processing system

Chemical vapor deposition apparatus with cleaning gas flow guiding member

Inductively coupled plasma for hydrogenation of type II superlattices

Inductively Coupled Plasma Wafer Bevel Strip Apparatus

Atomic layer etching processes

System and method for substrate processing chambers

Processing device having opening enabling gas to communicate between diffusion path and treatment chamber and member having diffusion path

Ion source for enhanced ionization

Method and apparatus for determining etch process parameters

SUBSTRATE SUPPORTING MEMBER AND SUBSTRATE PROCESSING APPARATUS INCLUDING SAME

Systems and methods for atomic layer deposition

GAS SEPARATION BY ADJUSTABLE SEPARATION WALL

Particle generation preventing method and vacuum apparatus

High energy atomic layer etching

Inductively coupled plasma source

Film formation apparatus

Integrated circuit fabrication system with adjustable gas injector

Temperature control method

Systems and methods for patterning features in tantalum nitride (TaN) layer

Pulsed sputtering apparatus and pulsed sputtering method

Substrate processing chamber having improved process volume sealing

Plasma treatment apparatus and method

Method of manufacturing semiconductor device, substrate processing apparatus, and recording medium

IN-SITU DRY CLEAN OF TUBE FURNACE

PLASMA GENERATING DEVICE

Method for manufacturing magnetic tunnel junction element, and inductively coupled plasma processing apparatus

Plasma processing apparatus and prediction method of the condition of plasma processing apparatus

SUBSTRATE TREATING APPARATUS AND SUBSTRATE TREATING METHOD

Plasma processing device

Etching method

System and method for precision formation of a lattice on a substrate

Plasma processing apparatus and method for venting a processing chamber to atmosphere

Sputtering apparatus including gas distribution system

Semiconductor manufacturing apparatus and method of manufacturing semiconductor device

Etching method and etching apparatus

Plasma processing device and plasma processing method

Radiation shield

Method for forming metal oxide layer, and plasma-enhanced chemical vapor deposition device

Method for depositing a silicon nitride film and film deposition apparatus

Method for depositing a silicon nitride film and film deposition apparatus

Method for depositing a silicon nitride film and film deposition apparatus

PLASMA PROCESSING METHOD AND PLASMA PROCESSING APPARATUS

Multi-plate faceplate for a processing chamber

METHODS AND APPARATUSES FOR ETCH PROFILE OPTIMIZATION BY REFLECTANCE SPECTRA MATCHING AND SURFACE KINETIC MODEL OPTIMIZATION

Plasma treatment device and structure of reaction vessel for plasma treatment

Hybrid plasma device for skin beauty and skin regeneration treatments

Germanium etching systems and methods

ELECTROSTATIC SHIELD FOR SUBSTRATE SUPPORT

FLOW GUIDE PLATE, LOWER ELECTRODE ASSEMBLY FOR DRY ETCHING APPARATUS, AND DRY ETCHING APPARATUS

System for backside deposition of a substrate

Ion beam etching apparatus

SUBSTRATE PROCESSING APPARATUS

Method and device for plasma treatment of containers

Lift pin assembly

Processing apparatus for target object and inspection method for processing apparatus

Plasma treatment device and structure of reaction vessel for plasma treatment

Thermal spraying method of component for plasma processing apparatus and component for plasma processing apparatus

SUBSTRATE PROCESSING APPARATUS

Plasma etching method and plasma etching apparatus

Plasma generating unit and plasma processing apparatus

Apparatus and method for plasma synthesis of carbon nanotubes

Sputter devices and methods

Method of inspecting gas supply system

Method of inspecting gas supply system

Methods and apparatuses for increasing reactor processing batch size

Plasma reactor with electrode assembly for moving substrate

Plasma reactor with electrode array in ceiling

Plasma processing method and plasma processing apparatus

Ionization chamber, ion-implantation apparatus and ion-implantation method

Power feed member and substrate processing apparatus

Hollow cathode discharge (HCD) suppressing capacitively coupled plasma electrode and gas distribution faceplate

PLASMA PROCESSING METHOD AND PLASMA PROCESSING DEVICE

Substrate processing method and substrate processing apparatus

PLASMA PROCESSING APPARATUS

Plasma device with an external RF hollow cathode for plasma cleaning of high vacuum systems

Deposition radial and edge profile tunability through independent control of TEOS flow

Electrostatic chuck and plasma processing apparatus

Atmospheric cold plasma jet coating and surface treatment

Monopole antenna array source with gas supply or grid filter for semiconductor process equipment

Monopole antenna array source for semiconductor process equipment

Monopole antenna array source with phase shifted zones for semiconductor process equipment

Plasma-based methods and systems for treating waters with high electrical conductivity and/or low surface tension

WAFER BOAT AND PLASMA TREATMENT DEVICE FOR WAFERS

Method of manufacturing semiconductor device, substrate processing apparatus, and recording medium

SEMICONDUCTOR PROCESSING CHAMBER FOR IMPROVED PRECURSOR FLOW

Plasma processing apparatus

Seasoning process for establishing a stable process and extending chamber uptime for semiconductor chip processing

IN-SITU REMOVAL OF ACCUMULATED PROCESS BYPRODUCTS FROM COMPONENTS OF A SEMICONDUCTOR PROCESSING CHAMBER

APPARATUS AND METHOD FOR SURFACE COATING BY MEANS OF GRID CONTROL AND PLASMA-INITIATED GAS-PHASE POLYMERIZATION

Selective atomic layer deposition with post-dose treatment

Processing method in processing apparatus using halogen-based gas

Plasma processing devices having multi-port valve assemblies

Adjustable extended electrode for edge uniformity control

Atomic layer clean for removal of photoresist patterning scum

Substrate processing apparatus and substrate removing method

Atomic layer etch, reactive precursors and energetic sources for patterning applications

Silicon-based deposition for semiconductor processing

PLASMA REACTOR WITH GROUPS OF ELECTRODES

Plasma reactor with electrode filaments extending from ceiling

Process chamber and wafer processing method

PLASMA REACTOR WITH FILAMENTS AND RF POWER APPLIED AT MULTIPLE FREQUENCIES

PLASMA REACTOR WITH PHASE SHIFT APPLIED ACROSS ELECTRODE ARRAY

System for providing multiple surface treatments to three-dimensional objects prior to printing

Method of cleaning and method of plasma processing

Methods for manufacturing semiconductor devices

Position detecting system and processing apparatus

Semiconductor processing device

Processing method

Plasma processing apparatus

Method of processing substrate

Method for inspecting flow rate controller and method for processing workpiece

Fluid control system

Etching method and etching apparatus

Plasma processing apparatus

Pedestal assembly for plasma processing apparatus

Cyclotronic plasma actuator with arc-magnet for active flow control

Multi-zone gas distribution plate (GDP) and a method for designing the multi-zone GDP

PLASMA PROCESSING APPARATUS AND PLASMA PROCESSING METHOD

ALTERNATING BETWEEN DEPOSITION AND TREATMENT OF DIAMOND-LIKE CARBON

Deposition or treatment of diamond-like carbon in a plasma reactor

Etching method and plasma processing apparatus

SUBSTRATE TREATMENT DEVICE AND SUBSTRATE TREATMENT METHOD

Ultrahigh selective nitride etch to form FinFET devices

Method of processing wafer

Techniques and systems for continuous-flow plasma enhanced atomic layer deposition (PEALD)

Techniques and systems for continuous-flow plasma enhanced atomic layer deposition (PEALD)

Side gas injection kit for multi-zone gas injection assembly

System and method for controllable non-volatile metal removal

APPARATUS AND METHOD FOR PRODUCING CARBON NANOTUBES

Film forming method

Liquid treatment apparatus including flow channel, first and second electrodes, insulator surrounding lateral surface of first electrode, gas supply device, and power supply source

DIFFUSER DESIGN FOR FLOWABLE CVD

Pulsing RF power in etch process to enhance tungsten gapfill performance

Process for performing self-limited etching of organic materials

Film deposition method and plasma processing apparatus

Methods and systems for determining a fault in a gas heater channel

CERAMIC METALLIC COATINGS

SUBSTRATE PROCESSING APPARATUS AND SUBSTRATE PROCESSING METHOD

Gas reaction trajectory control through tunable plasma dissociation for wafer by-product distribution and etch feature profile uniformity

Plasma generator assembly for mass spectroscopy

Portable plasma source for optical spectroscopy

Adjustable extended electrode for edge uniformity control

TOROIDAL PLASMA ABATEMENT APPARATUS AND METHOD

Plasma processing method and plasma processing apparatus

Plasma etching method

Distributed, Non-Concentric Multi-Zone Plasma Source Systems, Methods and Apparatus

Methods for removing particles from etching chamber

Substrate processing apparatus

Plasma processing method

APPARATUS FOR VACUUM SPUTTER DEPOSITION AND METHOD THEREFOR

Substrate processing apparatus

Dual PVD Chamber And Hybrid PVD-CVD Chambers

Plasma processing method and plasma processing apparatus

Plasma processing apparatus

Plasma treatment apparatus

Systems and methods for metastable activated radical selective strip and etch using dual plenum showerhead

Technique to deposit sidewall passivation for high aspect ratio cylinder etch

Film forming method, boron film, and film forming apparatus

Method of preparing diamond substrates for CVD nanometric delta doping

Plasma processing apparatus

Plasma polymerization coating apparatus

Atomic layer etch process using plasma in conjunction with a rapid thermal activation process

Substrate processing apparatus

METHOD FOR SUPPLYING GAS, AND PLASMA PROCESSING APPARATUS

Device for treating an object with plasma

Plasma processing apparatus and plasma processing method

Plasma etching method

Plasma processing apparatus

Integration of dual remote plasmas sources for flowable CVD

METHOD FOR TREATING THE SURFACE OF A MOVING FILM, AND FACILITY FOR IMPLEMENTING SAID METHOD

Substrate processing apparatus, method of manufacturing semiconductor device, and baffle structure of the substrate processing apparatus

Thermal repeatability and in-situ showerhead temperature monitoring

Dynamic phased array plasma source for complete plasma coverage of a moving substrate

Apparatus and method for handling an implant

RF ion source with dynamic volume control

METHOD FOR CONTROLLING A GAS SUPPLY TO A PROCESS CHAMBER, CONTROLLER FOR CONTROLLING A GAS SUPPLY TO A PROCESS CHAMBER, AND APPARATUS

Process feed management for semiconductor substrate processing

Methods and systems to modulate film stress

Apparatus and method for augmenting the volume of atmospheric pressure plasma jets

Active showerhead

PLASMA PROCESSING APPARATUS

PLASMA PROCESSING APPARATUS

Plasma process apparatus

SUBSTRATE SUPPORT UNIT, SUBSTRATE TREATING APPARATUS INCLUDING THE SAME, AND METHOD FOR CONTROLLING THE SAME

Cobalt etch back

Method and apparatus for plasma etching

COMMON DEPOSITION PLATFORM, PROCESSING STATION, AND METHOD OF OPERATION THEREOF

Atomic Layer Deposition with Plasma Source

Method of etching porous film

Apparatus for radical-based deposition of dielectric films

Control system for plasma chamber having controllable valve and method of using the same

CVD reactor and method for nanometric delta doping of diamond

Plasma processing apparatus

Silicon-based deposition for semiconductor processing

PLASMA SCREEN FOR PLASMA PROCESSING CHAMBER

LOW PRESSURE LIFT PIN CAVITY HARDWARE

PLASMA TREATMENT APPARATUS HAVING DUAL GAS DISTRIBUTION BAFFLE FOR UNIFORM GAS DISTRIBUTION

Exhaust apparatus and substrate processing apparatus having an exhaust line with a first ring having at least one hole on a lateral side thereof placed in the exhaust line

Method for inspecting shower plate of plasma processing apparatus

Plasma processing method and plasma processing device

Substrate processing apparatus and substrate processing method

Process chamber having tunable showerhead and tunable liner

Systems and methods of treating a substrate

Substrate processing apparatus and substrate processing method

TEMPERATURE-CONTROLLED CHALCOGEN VAPOR DISTRIBUTION APPARATUS AND METHOD FOR UNIFORM CIGS DEPOSITION

Pressure purge etch method for etching complex 3-D structures

Integrating atomic scale processes: ALD (atomic layer deposition) and ale (atomic layer etch)

SPUTTERING APPARATUS INCLUDING GAS DISTRIBUTION SYSTEM

Apparatus and method for treating substrate

Apparatus for manufacturing a second substrate on a first substrate including removal of the first substrate

Method and system for high temperature clean

Processing apparatus and processing method, and gas cluster generating apparatus and gas cluster generating method

Gas supply system, substrate processing system and gas supply method

Substrate processing device

Selective atomic layer deposition with post-dose treatment

Apparatus and method for deposition and etch in gap fill

Apparatus and method for processing gas, and storage medium

Uniformity control circuit for use within an impedance matching circuit

Inductive Plasma Source

Coil filament for plasma enhanced chemical vapor deposition source

Microwave supply apparatus, plasma processing apparatus, and plasma processing method

Plasma processing apparatus

Showerhead curtain gas method and system for film profile modulation

Etching process method

Advanced exhaust system

Plasma processing apparatus and particle adhesion preventing method

Plasma processing method

Localized process control using a plasma system

Apparatus and methods for reducing particles in semiconductor process chambers

Substrate processing apparatus

Systems and methods for a plasma enhanced deposition of material on a semiconductor substrate

Systems and methods for improved semiconductor etching and component protection

Filling a cavity in a substrate using sputtering and deposition

METHODS AND APPARATUSES FOR CONTROLLING TRANSITIONS BETWEEN CONTINUOUS WAVE AND PULSING PLASMAS

ETCHING METHOD

Adjustable side gas plenum for edge rate control in a downstream reactor

Increasing the gas efficiency for an electrostatic chuck

Method for etching silicon layer and plasma processing apparatus

DIELECTRIC WINDOW SUPPORTING STRUCTURE FOR INDUCTIVELY COUPLED PLASMA PROCESSING APPARATUS

RF ANTENNA STRUCTURE FOR INDUCTIVELY COUPLED PLASMA PROCESSING APPARATUS

Systems and methods for a tunable electromagnetic field apparatus to improve doping uniformity

GAS SUPPLY STRUCTURE FOR INDUCTIVELY COUPLED PLASMA PROCESSING APPARATUS

Multi-zone gas distribution plate (GDP) and a method for designing the multi-zone GDP