Gas-phase reactor and system having exhaust plenum and components thereof

Plasma processing method

Plasma etching method and plasma etching apparatus

Film forming apparatus, and method of manufacturing semiconductor device

Method of enhancing high-k film nucleation rate and electrical mobility in a semiconductor device by microwave plasma treatment

Edge hump reduction faceplate by plasma modulation

Plasma assisted atomic layer deposition titanium oxide for conformal encapsulation and gapfill applications

Device for Treating an Object with Plasma

Etching method and plasma processing apparatus

Hermetic CVD-cap with improved step coverage in high aspect ratio structures

Plasma processing device and operation method

Tunable multi-zone gas injection system

Nano deposition and ablation for the repair and fabrication of integrated circuits

Gas supplying method and semiconductor manufacturing apparatus

Plasma processing method and plasma processing apparatus

Plasma processing method and plasma processing apparatus

GAS SUPPLY METHOD AND PLASMA PROCESSING APPARATUS

Plasma processing method and plasma processing apparatus

Method of manufacturing semiconductor device

Inline DPS chamber hardware are design to enable axis symmetry for improved flow conductance and uniformity

Low temperature cure modulus enhancement

Method for providing uniform distribution of plasma density in a plasma treatment apparatus

PLASMA ENHANCED CHEMICAL VAPOR DEPOSITION DEVICE

Showerhead-cooler system of a semiconductor-processing chamber for semiconductor wafers of large area

Gas confiner assembly for eliminating shadow frame

Plasma-enhanced etching in an augmented plasma processing system

Apparatus for atomic layering etching

Plasma etching method and plasma etching apparatus

System and methods for plasma application

Substrate processing apparatus, non-transitory computer-readable recording medium and method of manufacturing semiconductor device

Substrate processing apparatus, non-transitory computer-readable recording medium and method of manufacturing semiconductor device

Showerhead electrode assembly in a capacitively coupled plasma processing apparatus

Plasma etching method and semiconductor device manufacturing method

Process feed management for semiconductor substrate processing

Method of manufacturing semiconductor device, substrate processing apparatus and non-transitory computer readable recording medium

Plasma treatment of low-K surface to improve barrier deposition

Apparatus for generating reactive gas with glow discharges and methods of use

Semiconductor system assemblies and methods of operation

Wear amount measuring apparatus and method, temperature measuring apparatus and method and substrate processing system

Substrate treating apparatus and blocker plate assembly

Apparatus for treating wafers using supercritical fluid

Method for etching silicon layer and plasma processing apparatus

Plasma processing method and plasma processing apparatus

ETCHING APPARATUS AND METHOD

Plasma processing apparatus

Plasma processing apparatus

SUBSTRATE TREATING APPARATUS AND METHOD

Methods and apparatus for in-situ cleaning of a process chamber

Mechanisms for supplying process gas into wafer process apparatus

Process chamber apparatus, systems, and methods for controlling a gas flow pattern

Method for high aspect ratio photoresist removal in pure reducing plasma

Etching method and plasma processing apparatus

Methods for barrier layer removal

Multilayer film etching method and plasma processing apparatus

Method for manufacturing semiconductor device

Substrate Treating Apparatus and Method

METHOD FOR INJECTING DOPANT INTO SUBSTRATE TO BE PROCESSED, AND PLASMA DOPING APPARATUS

SEMICONDUCTOR PROCESSING APPARATUS AND PRE-CLEAN SYSTEM

Plasma processing method and plasma processing apparatus

Etching method for substrate to be processed and plasma-etching device

METHOD AND APPARATUS FOR PLASMA IGNITION IN HIGH VACUUM CHAMBERS

PLASMA PROCESSING APPARATUS AND PLASMA PROCESSING METHOD

Plasma processing apparatus and plasma processing method

Method of manufacturing semiconductor device by alternatively increasing and decreasing pressure of process chamber

PLASMA GENERATOR APPARATUS

Method of manufacturing semiconductor device, substrate processing apparatus, and recording medium

HAND-HELD DEVICE AND METHOD OF PLASMA TREATMENT OF A WORKPIECE WITH THE HAND-HELD DEVICE

Shower plate sintered integrally with gas release hole member and method for manufacturing the same

Method for etching organic film and plasma etching device

Method of selectively removing a region formed of silicon oxide and plasma processing apparatus

System, method and apparatus for generating pressure pulses in small volume confined process reactor

System, method and apparatus for coordinating pressure pulses and RF modulation in a small volume confined process reactor

Dual discharge modes operation for remote plasma

PLASMA CVD APPARATUS, METHOD FOR FORMING FILM AND DLC-COATED PIPE

Plasma generating device

Heated showerhead assembly

PLASMA PROCESSING APPARATUS

PLASMA PROCESSING APPARATUS AND PLASMA PROCESSING METHOD

Method of manufacturing semiconductor device, substrate processing apparatus, and recording medium

Method of cleaning the filament and reactor's interior in FACVD

Recursive pumping for symmetrical gas exhaust to control critical dimension uniformity in plasma reactors

Fast-gas switching for etching

Microwave plasma reactor for manufacturing synthetic diamond material

THIN FILM FORMING APPARATUS

Mixed mode pulsing etching in plasma processing systems

Flow control features of CVD chambers

Methods and apparatus for dual confinement and ultra-high pressure in an adjustable gap plasma chamber

Methods and apparatus for depositing and/or etching material on a substrate

Method of cleaning substrate processing apparatus

Plasma processing chamber with dual axial gas injection and exhaust

Method of depositing a film, recording medium, and film deposition apparatus

Gas diffuser unit, process chamber and wafer processing method

Cleaning method and processing apparatus

Plasma etching method

Process chamber gas flow improvements

Method for controlling in-plane uniformity of substrate processed by plasma-assisted process

Substrate processing apparatus and substrate processing method

Substrate processing apparatus, method of manufacturing semiconductor device, and non-transitory computer-readable recording medium

Antenna for plasma generation, plasma processing apparatus and plasma processing method

Electron beam plasma source with remote radical source

Plasma processing method

Plasma processing apparatus

Deposition apparatus

Gas supply method

Continuous plasma ETCH process

Plasma generation for thin film deposition on flexible substrates

Method of manufacturing semiconductor device using the same

Inert-dominant pulsing in plasma processing systems

IONISATION DEVICE

Conformal oxide dry etch

Pulsed gas plasma doping method and apparatus

Cascade design showerhead for transient uniformity

Plasma process apparatus

Apparatus and methods for reducing particles in semiconductor process chambers

Directing plasma distribution in plasma-enhanced chemical vapor deposition

Plasma emission monitor and process gas delivery system

Toroidal plasma abatement apparatus and method

Plasma processing apparatus and plasma etching apparatus

Method for etching high-K dielectric using pulsed bias power

Method and apparatus for high efficiency gas dissociation in inductive coupled plasma reactor

Pulsed remote plasma method and system

Method and systems for in-situ formation of intermediate reactive species

Enhanced etching processes using remote plasma sources

Plasma processing with preionized and predissociated tuning gases and associated systems and methods

Tunable gas delivery assembly with internal diffuser and angular injection

Plasma etching method and semiconductor device manufacturing method

Plasma processing apparatus

Semiconductor processing systems having multiple plasma configurations

Multiple anode plasma for CVD in a hollow article

Laser-induced gas plasma machining

Methods for plasma processing

Methods for plasma processing

Common deposition platform, processing station, and method of operation thereof

Plasma etching method and plasma etching apparatus

Showerhead electrode assembly with gas flow modification for extended electrode life

Plasma doping apparatus and plasma doping method

Etch process with pre-etch transient conditioning

Apparatus for providing plasma to a process chamber

PLASMA ETCHING METHOD AND PLASMA ETCHING APPARATUS

Method for processing a gas and a device for performing the method

Gas dispersion disc assembly

Methods of manufacturing synthetic diamond material by microwave plasma enhanced chemical vapor deposition from a microwave generator and gas inlet(s) disposed opposite the growth surface area

Plasma processing method and plasma processing apparatus

Plasma generation apparatus, CVD apparatus, and plasma-treated particle generation apparatus

ICP source design for plasma uniformity and efficiency enhancement

Plasma processing apparatus

Plasma etching method

Backing plate for a sputter target, sputter target, and sputter device

Shadow frame support

Pressure controlled heat pipe temperature control plate

Semiconductor reaction chamber showerhead

Plasma mediated ashing processes that include formation of a protective layer before and/or during the plasma mediated ashing process

Plasma processing apparatus

Deposition method and deposition apparatus

Chemical control features in wafer process equipment

Method of plasma etching

Showerhead electrode assembly in a capacitively coupled plasma processing apparatus

Deposition reactor with plasma source

Apparatuses and methods for atomic layer deposition

Sputtering device

Apparatus and method for shielding a controlled pressure environment

Plasma-enhanced etching in an augmented plasma processing system

Electrode for plasma processing apparatus, plasma processing apparatus, plasma processing method and storage medium

Atomic layer deposition with plasma source

Etching method

Gas mixing apparatus

Method of operating film deposition apparatus and film deposition apparatus

Contoured showerhead for improved plasma shaping and control

Integrated steerability array arrangement for minimizing non-uniformity and methods thereof

Showerhead insulator and etch chamber liner

Plasma chamber having an upper electrode having controllable valves and a method of using the same

Contamination removal apparatus and method

Proportional and uniform controlled gas flow delivery for dry plasma etch apparatus

Method of processing a semiconductor substrate in a plasma processing apparatus

Plasma processing apparatus

Multiple vapor sources for vapor deposition

Plasma processing apparatus and plasma processing method

Substrate processing device equipped with semicircle shaped antenna

Mixed mode pulsing etching in plasma processing systems

METHODS AND APPARATUSES FOR CONTROLLING PLASMA PROPERTIES BY CONTROLLING CONDUCTANCE BETWEEN SUB-CHAMBERS OF A PLASMA PROCESSING CHAMBER

Substrate processing system, gas supply unit, method of substrate processing, computer program, and storage medium

GAS INJECTOR APPARATUS FOR PLASMA APPLICATOR

Multiple-electrode plasma processing systems with confined process chambers and interior-bussed electrical connections with the electrodes

Gas supply system, substrate processing apparatus and gas supply method

Inert-dominant pulsing in plasma processing systems

HYBRID PULSING PLASMA PROCESSING SYSTEMS

Plasma processing apparatus and plasma processing method

Apparatus and method for reactive ion etching

Plasma processing apparatus and plasma processing method

Pulsed plasma with low wafer temperature for ultra thin layer etches

Method and apparatus for producing silicon nitride film

Gas supply unit, substrate processing apparatus and supply gas setting method

PLASMA ETCHING APPARATUS

Methods for in-situ chamber clean utilized in an etching processing chamber

Apparatus for the deposition of a conformal film on a substrate and methods therefor

Method for manufacturing electrophotographic photosensitive member

Apparatus for changing area ratio in a plasma processing system

Selective suppression of dry-etch rate of materials containing both silicon and nitrogen

Methods for discretized processing and process sequence integration of regions of a substrate

SUBSTRATE CLEANING METHOD AND SEMICONDUCTOR MANUFACTURING APPARATUS

Method for etching high-k dielectric using pulsed bias power

PLASMA REACTOR

PLASMA ETCHING METHOD

Photoresist strip processes for improved device integrity

INDUCTIVE PLASMA SOURCES FOR WAFER PROCESSING AND CHAMBER CLEANING

Distributed, concentric multi-zone plasma source systems, methods and apparatus

Gas supply system

High strip rate downstream chamber

Methods and apparatus for atomic layer etching

Method and device for layer deposition

Plasma treatment apparatus, method for forming film, and method for manufacturing thin film transistor

Apparatuses and methods for atomic layer deposition

PLASMA PROCESSING APPARATUS

PLASMA PROCESSING APPARATUS

APPARATUS AND METHOD FOR COMBINATORIAL PLASMA DISTRIBUTION THROUGH A MULTI-ZONED SHOWERHEAD

Method for providing high etch rate

Plasma processing apparatus and gas supply method therefor

Parallel plate reactor for uniform thin film deposition with reduced tool foot-print

Plasma CVD apparatus

Semiconductor equipment

Apparatus and method for combinatorial gas distribution through a multi-zoned showerhead

Substrate processing apparatus

FLOW DIVIDER SYSTEM

Atomic layer deposition apparatus and process

E-beam enhanced decoupled source for semiconductor processing

Large Area Atmospheric Pressure Plasma Enhanced Chemical Vapor Deposition Apparatus

PLASMA PROCESSING METHOD

Ion implantation system and method

Plasma processing apparatus and plasma generation antenna

Plasma generator apparatus

Electrode having gas discharge function and plasma processing apparatus

Substrate cleaning apparatus and vacuum processing system

Gas supply system, substrate processing apparatus and gas supply method

PLASMA PROCESSING METHOD AND PLASMA PROCESSING APPARATUS

Method extending the service interval of a gas distribution plate

Plasma CVD device and method of manufacturing silicon thin film

ETCH PROCESSING CHAMBER

Method for operating substrate processing apparatus

PLASMA PROCESSING APPARATUS AND PLASMA PROCESSING METHOD

Plasma treatment device and plasma treatment method

Plasma processing method and plasma processing apparatus

SEMICONDUCTOR PROCESSING SYSTEM AND METHODS USING CAPACITIVELY COUPLED PLASMA

Clamped showerhead electrode assembly

Method of joining components for a composite showerhead electrode assembly for a plasma processing apparatus

REMOTE HYDROGEN PLASMA SOURCE OF SILICON CONTAINING FILM DEPOSITION

PLASMA GENERATING APPARATUS

DUAL ZONE GAS INJECTION NOZZLE

INDUCTIVE PLASMA SOURCE

VACUUM PROCESSING APPARATUS AND VACUUM PROCESSING METHOD

Rapid and uniform gas switching for a plasma etch process

Inductively coupled plasma source for plasma processing

Plasma deposition device

Method of ionization

PLASMA APPARATUS

PROCESSING APPARATUS

Substrate processing apparatus, method of manufacturing semiconductor device, and baffle structure of the substrate processing apparatus

Extended Reactor Assembly with Multiple Sections for Performing Atomic Layer Deposition on Large Substrate

Plasma processing apparatus and method of producing amorphous silicon thin film using same

Manufacturing method of crystalline semiconductor film and manufacturing method of semiconductor device

Plasma processing apparatus, plasma processing method, method for cleaning plasma processing apparatus and pressure control valve for plasma processing apparatus

SHOWERHEAD CONFIGURATIONS FOR PLASMA REACTORS

METHODS AND APPARATUS FOR DEPOSITING A UNIFORM SILICON FILM WITH FLOW GRADIENT DESIGNS

Shower plate having different aperture dimensions and/or distributions

Gas flow distribution receptacles, plasma generator systems, and methods for performing plasma stripping processes

METHOD FOR SELECTIVE OXIDATION, DEVICE FOR SELECTIVE OXIDATION, AND COMPUTER-READABLE MEMORY MEDIUM

Methods for controlling bevel edge etching in a plasma chamber

Methods for discretized processing and process sequence integration of regions of a substrate

Electrode plate for plasma etching and plasma etching apparatus

Gas switching section including valves having different flow coefficients for gas distribution system

Plasma deposition

Methods for discretized processing and process sequence integration of regions of a substrate

Methods for discretized processing and process sequence integration of regions of a substrate

Gas supply member, plasma treatment method, and method of forming yttria-containing film

Method of supplying etching gas and etching apparatus

Plasma processing chamber with dual axial gas injection and exhaust

Method for fabricating semiconductor device and plasma doping apparatus

Distributed multi-zone plasma source systems, methods and apparatus

PLASMA REACTOR

PLASMA REACTOR

Systems, methods and apparatus for separate plasma source control

Dual plasma volume processing apparatus for neutral/ion flux control

Methods and apparatuses for controlling gas flow conductance in a capacitively-coupled plasma processing chamber

REACTOR AND METHOD FOR PRODUCTION OF NANOSTRUCTURES

Reactive sputtering chamber with gas distribution tubes

Vapor-phase process apparatus, vapor-phase process method, and substrate

Methods for discretized processing and process sequence integration of regions of a substrate

Semiconductor fabrication apparatus and temperature adjustment method

Method and apparatus for removing photoresist

Vapor-phase process apparatus, vapor-phase process method, and substrate

MASS FLOW CONTROL SYSTEM, PLASMA PROCESSING APPARATUS, AND FLOW CONTROL METHOD

Apparatuses and methods for atomic layer deposition

PLASMA ENHANCED MATERIALS DEPOSITION SYSTEM

Coaxial hollow cathode plasma assisted directed vapor deposition and related method thereof

VACUUM PROCESSING APPARATUS

Plasma processing apparatus and gas supply member support device

Thin Film Deposition Apparatus

Plasma processing apparatus and processing gas supply structure thereof

Method of improving film non-uniformity and throughput

THIN FILM FORMING APPARATUS AND THIN FILM FORMING METHOD

Plasma processing apparatus and processing gas supply structure thereof