Etching method

Toroidal plasma channel with varying cross-section areas along the channel

Method and apparatus to prevent deposition rate/thickness drift, reduce particle defects and increase remote plasma system lifetime

SHADOW FRAME SUPPORT

Apparatus for controlling temperature uniformity of a showerhead

Gas supply mechanism and semiconductor manufacturing system

Gas supply mechanism and semiconductor manufacturing apparatus

RPS assisted RF plasma source for semiconductor processing

Baffle plate and showerhead assemblies and corresponding manufacturing method

PLASMA SOURCE AND SUBSTRATE TREATING APPARATUS INCLUDING THE SAME

Plasma-enhanced anneal chamber for wafer outgassing

Plasma processing device, plasma processing method and manufacturing method of electronic device

Substrate processing apparatus

Showerhead, semicondcutor processing apparatus having the same and semiconductor process

METHOD AND APPARATUS FOR CONTROLLING PROCESS WITHIN WAFER UNIFORMITY

Plasma processing method

Plasma processing method

Plasma assisted atomic layer deposition metal oxide for patterning applications

Method of arranging treatment process

Method of generating plasma in remote plasma source and method of fabricating semiconductor device using the same method

METHODS AND APPARATUSES FOR CONTROLLING PLASMA PROPERTIES BY CONTROLLING CONDUCTANCE BETWEEN SUB-CHAMBERS OF A PLASMA PROCESSING CHAMBER

Virtual cathode deposition (VCD) for thin film manufacturing

PLASMA PROCESSING APPARATUS AND METHOD OF MANUFACTURING SEMICONDUCTOR DEVICE

Plasma processing method

Atmospheric pressure pulsed arc plasma source and methods of coating therewith

PLASMA PROCESSING APPARATUS

Showerhead having an extended detachable gas distribution plate

Inductively Coupled Plasma Source for Plasma Processing

Systems and methods for selectively etching film

System and method for increasing electron density levels in a plasma of a substrate processing system

Chemical control features in wafer process equipment

Contamination removal apparatus and method

Substrate supports with multi-layer structure including independent operated heater zones

Methods for selective etching of a silicon material

Atomic layer etching in continuous plasma

Methods and systems to enhance process uniformity

Vacuum processing apparatus

Semiconductor processing systems having multiple plasma configurations

Device for anisotropically etching a substrate, and method for operating a device for anisotropically etching a substrate

PLASMA PROCESSING APPARATUS

Film deposition method

Toroidal plasma abatement apparatus and method

Gas splitting by time average injection into different zones by fast gas valves

Plasma processing method

Method and apparatus for plasma etching

Additively manufactured gas distribution manifold

QUAD CHAMBER AND PLATFORM HAVING MULTIPLE QUAD CHAMBERS

Method and apparatus for anisotropic tungsten etching

Cooled gas feed block with baffle and nozzle for HDP-CVD

Dry etching apparatus

ION SOURCE

Self limiting lateral atomic layer etch

GAS DIFFUSER HAVING GROOVED HOLLOW CATHODES

Systems and methods enabling low defect processing via controlled separation and delivery of chemicals during atomic layer deposition

ADJUSTMENT OF VUV EMISSION OF A PLASMA VIA COLLISIONAL RESONANT ENERGY TRANSFER TO AN ENERGY ABSORBER GAS

FILM FORMING APPARATUS, RECORDING MEDIUM, AND FILM FORMING METHOD

System and method for controllable non-volatile metal removal

Advanced coating method and materials to prevent HDP-CVD chamber arcing

Method for etching high-K dielectric using pulsed bias power

Method and system for in-situ formation of intermediate reactive species

Plasma processing detection indicator using inorganic substance as a color-change layer

Lateral plasma/radical source

Method of measuring gas introducing hole provided in electrode for plasma etching device, electrode, electrode regeneration method, regenerated electrode, plasma etching device, and gas introducing hole state distribution diagram and display method for same

Pneumatic exhaust system

Method of processing workpiece

Counter flow mixer for process chamber

RPS assisted RF plasma source for semiconductor processing

Methods for thin film material deposition using reactive plasma-free physical vapor deposition

Nano deposition and ablation for the repair and fabrication of integrated circuits

Integrating atomic scale processes: ALD (atomic layer deposition) and ALE (atomic layer etch)

Substrate processing apparatus and methods

SEMICONDUCTOR MANUFACTURING APPARATUS AND MANUFACTURING METHOD OF SEMICONDUCTOR DEVICE

TUNABLE GAS DELIVERY ASSEMBLY WITH INTERNAL DIFFUSER AND ANGULAR INJECTION

SUBSTRATE TREATMENT APPARATUS

PROTEIN FILM PRODUCTION METHOD

Uniformity control circuit for use within an impedance matching circuit

Methodology for chamber performance matching for semiconductor equipment

Plasma processing apparatus

PLASMA REACTOR FOR PROCESSING A WORKPIECE WITH AN ARRAY OF PLASMA POINT SOURCES

Plasma etching systems and methods using empirical mode decomposition

Multiple control modes

Plasma etching method

Plasma processing method and plasma processing apparatus

Ion collector for use in plasma systems

PLASMA ETCHING METHOD

Methods and apparatus for uniformly and high-rate depositing low resistivity microcrystalline silicon films for display devices

Process of preparing low dielectric constant thin film layer used in integrated circuit

UPPER ELECTRODE STRUCTURE OF PLASMA PROCESSING APPARATUS, PLASMA PROCESSING APPARATUS, AND OPERATION METHOD THEREFOR

Cyclical plasma etching

Device for Processing Plasma with a Circulation of Process Gas in Multiple Plasmas

Process chamber for cyclic and selective material removal and etching

Seasoning process for establishing a stable process and extending chamber uptime for semiconductor chip processing

ORGANIC ELECTROLUMINESCENT ELEMENT

Pulsing RF power in etch process to enhance tungsten gapfill performance

Atomic layer etching of tungsten and other metals

Self limiting lateral atomic layer etch

TARGET SUPPLY DEVICE, TARGET MATERIAL REFINING METHOD, RECORDING MEDIUM HAVING TARGET MATERIAL REFINING PROGRAM RECORDED THEREIN, AND TARGET GENERATOR

MAGNETIZED EDGE RING FOR EXTREME EDGE CONTROL

METHOD AND SYSTEM FOR GRAPHENE FORMATION

Radio frequency plasma method for uniform surface processing of RF cavities and other three-dimensional structures

Gas delivery system

Chemical vapor deposition tool and operating method thereof

Reaction chamber and plasma processing apparatus

Systems and methods for removing particles from a substrate processing chamber using RF plasma cycling and purging

Pulsed remote plasma method and system

Low-pressure plasma system with sequential control process

Plasma processing apparatus and film formation method

TECHNIQUES AND APPARATUS FOR ANISOTROPIC METAL ETCHING

Plasma processing apparatus

SUBSTRATE PROCESSING APPARATUS, AND STORAGE MEDIUM

Gas supply system, gas supply control method and gas replacement method

INJECTOR FOR SEMICONDUCTOR EPITAXY GROWTH

PLASMA-ENHANCED ETCHING IN AN AUGMENTED PLASMA PROCESSING SYSTEM

Method of manufacturing semiconductor device, substrate processing apparatus, and recording medium

Plasma generation device

Plasma processing apparatus and plasma processing method

SEMICONDUCTOR ELEMENT MANUFACTURING METHOD

Flame-Assisted Flash Sintering

Method and system for controlling plasma in semiconductor fabrication

Plasma assisted atomic layer deposition of multi-layer films for patterning applications

Deposition of silicon and oxygen-containing films without an oxidizer

Inhibitor plasma mediated atomic layer deposition for seamless feature fill

Method of producing processing condition of plasma processing apparatus, and plasma processing apparatus

ATMOSPHERIC-PRESSURE PLASMA TREATMENT SYSTEM

RADIAL-FLOW PLASMA TREATMENT SYSTEM

Non-planar radial-flow plasma treatment system

Gas inlet element of a CVD reactor with weight-reduced gas outlet plate

Sputter unit

Etching method and etching apparatus

Process chamber and semiconductor processing apparatus

ICP SOURCE DESIGN FOR PLASMA UNIFORMITY AND EFFICIENCY ENHANCEMENT

Mixed mode pulsing etching in plasma processing systems

Plasma processing method and plasma processing apparatus

Cobalt etch back

Plasma generating device comprising a rotating body

Atomic layer deposition chamber with funnel-shaped gas dispersion channel and gas distribution plate

Film deposition apparatus and film deposition method

Method for surface treatment of upper electrode, plasma processing apparatus and upper electrode

Control of impedance of RF delivery path

Cold plasma sanitizing device

Method of processing target object to be processed

Method of etching porous film

Substrate support with thermal zones for semiconductor processing

APPLICATION OF ELECTRON-BEAM INDUCED PLASMA PROBES TO INSPECTION, TEST, DEBUG AND SURFACE MODIFICATIONS

Plasma assisted atomic layer deposition titanium oxide for patterning applications

Gas reaction trajectory control through tunable plasma dissociation for wafer by-product distribution and etch feature profile uniformity

Enhanced etching processes using remote plasma sources

Method of manufacturing semiconductor device, substrate processing apparatus, and recording medium

Method of manufacturing semiconductor device, substrate processing apparatus, and recording medium

Semiconductor manufacturing apparatus and semiconductor manufacturing method

Plasma enhanced ALD system

Ultrathin atomic layer deposition film accuracy thickness control

GROUND STATE HYDROGEN RADICAL SOURCES FOR CHEMICAL VAPOR DEPOSITION OF SILICON-CARBON-CONTAINING FILMS

Technique to deposit sidewall passivation for high aspect ratio cylinder etch

Continuous-wave laser-sustained plasma illumination source

Methods for removing particles from etching chamber

Cross-flow reactor and method

System and method for controllable non-volatile metal removal

Technique to deposit sidewall passivation for high aspect ratio cylinder etch

SILICON ETCH PROCESS WITH TUNABLE SELECTIVITY TO SiO2 AND OTHER MATERIALS

SUBSTRATE PROCESSING APPARATUS AND SUBSTRATE PROCESSING METHOD

DRY ETCHING DEVICE AND DRY ETCHING METHOD

Image reversal with AHM gap fill for multiple patterning

Deposition device and deposition method

Method for producing micro plasma with biocompatibility

Method for controlling a gas supply to a process chamber, controller for controlling a gas supply to a process chamber, and apparatus

Method and device for the plasma-catalytic conversion of materials

Fabrication of a silicon structure and deep silicon etch with profile control

Selective deposition utilizing masks and directional plasma treatment

Sputtering apparatus including gas distribution system

Apparatus and a method for plating an Nd—Fe—B magnet

Metal doping of amorphous carbon and silicon films used as hardmasks in substrate processing systems

Methods for decreasing carbon-hydrogen content of amorphous carbon hardmask films

Plasma processing method and plasma processing apparatus

PLASMA PROCESSING APPARATUS

SUBSTRATE PROCESSING APPARATUS AND METHOD OF MANUFACTURING SEMICONDUCTOR DEVICE

Method of plasma-enhanced atomic layer etching

Method of manufacturing semiconductor device, substrate processing apparatus, and recording medium

Contoured showerhead for improved plasma shaping and control

Method and apparatus for anisotropic tungsten etching

Isotropic atomic layer etch for silicon and germanium oxides

Evacuation method and vacuum processing apparatus

Substrate processing apparatus

SILICON ETCH AND CLEAN

Low contamination chamber for surface activation

GAS SUPPLY SYSTEM

Plasma processing apparatus with shower plate having protrusion for suppressing film formation in gas holes of shower plate

Plasma processing apparatus

Fast-gas switching for etching

Device of changing gas flow pattern and a wafer processing method and apparatus

REMOTE DELIVERY OF CHEMICAL REAGENTS

COMBINED HEAT TREAT AND THIN FILM COATING PROCESS

Inlet for effective mixing and purging

Target age compensation method for performing stable reactive sputtering processes

Plasma assisted atomic layer deposition titanium oxide for conformal encapsulation and gapfill applications

Technique to deposit sidewall passivation for high aspect ratio cylinder etch

Plasma etching method

METHOD AND APPARATUS FOR PLASMA IGNITION IN HIGH VACUUM CHAMBERS

Filament holder for hot cathode PECVD source

Open plasma lamp for forming a light-sustained plasma

Plasma processing system with direct outlet toroidal plasma source

Direct outlet toroidal plasma source

Etch process with pre-etch transient conditioning

Methods and systems to enhance process uniformity

Gas ring for plasma system and method of manufacturing the same

Surface treated aluminum nitride baffle

Fast-gas switching for etching

Plasma processing apparatus and plasma processing method

Plasma processing apparatus

Plasma processing apparatus

Film forming apparatus and shower head

Atomic Layer Deposition (ALD) Apparatus

System, method and apparatus for RF power compensation in a plasma processing system

Gas supply delivery arrangement including a gas splitter for tunable gas flow control

SEMICONDUCTOR MANUFACTURING APPARATUS, SEMICONDUCTOR MANUFACTURING METHOD, AND FLOW RATE ADJUSTING MECHANISM

Plasma etching method and plasma etching apparatus

Inert-dominant pulsing in plasma processing systems

Ultra-high speed anisotropic reactive ion etching

Apparatus and method of manufacturing display apparatus

Methods of vapor deposition with multiple vapor sources

Apparatus and method of manufacturing fin-FET devices

Substrate Processing Apparatus, Method of Manufacturing Semiconductor Device and Non-Transitory Computer-Readable Recording Medium

Gas distribution device with actively cooled grid

Silicon etch process with tunable selectivity to SiOand other materials

Increasing the gas efficiency for an electrostatic chuck

Method of manufacturing semiconductor device, substrate processing apparatus, and non-transitory computer-readable recording medium

Heat transfer plate for a showerhead electrode assembly of a capacitively coupled plasma processing apparatus

Dual Plasma Volume Processing Apparatus for Neutral/Ion Flux Control

Apparatus and method for continuous synthesis of carbon film or inorganic material film

Ultrahigh selective polysilicon etch with high throughput

Contact clean in high-aspect ratio structures

Method for supplying gas, and plasma processing apparatus

Method for void-free cobalt gap fill

Method for void-free cobalt gap fill

Method to tune TiOstoichiometry using atomic layer deposited Ti film to minimize contact resistance for TiO/Ti based MIS contact scheme for CMOS

Plasma etching apparatus and plasma etching method

Tiled showerhead for a semiconductor chemical vapor deposition reactor

Gas-flow control method for plasma apparatus

Plasma generation chamber with smooth plasma resistant coating

PLASMA DEVICE

System for coordinating pressure pulses and RF modulation in a small volume confined process reactor

Plasma reactor having an array of plural individually controlled gas injectors arranged along a circular side wall

Vertically integrated wafers with thermal dissipation

Method of conditioning vacuum chamber of semiconductor substrate processing apparatus

Plasma processing devices having multi-port valve assemblies

Apparatus for manufacturing display device and method of manufacturing display device

Substrate manufacturing method and substrate manufacturing apparatus

PLASMA PROCESSING APPARATUS AND PLASMA PROCESSING METHOD

Method for etching high-K dielectric using pulsed bias power

Method of generating plasma in remote plasma source and method of fabricating semiconductor device using the same method

Semiconductor reaction chamber with plasma capabilities

SYSTEMS AND METHODS FOR PRODUCING ENERGETIC NEUTRALS

Pulsed Sputtering Apparatus and Pulsed Sputtering Method

Chemical control features in wafer process equipment

Plasma processing apparatus and plasma processing method

Multiple point gas delivery apparatus for etching materials

Chamber design for semiconductor processing

Apparatus for radical-based deposition of dielectric films

Plasma processing apparatus and method of manufacturing semiconductor device

Multi-zone gas injection assembly with azimuthal and radial distribution control

Method for etching insulation film

LOW COST WIDE PROCESS RANGE MICROWAVE REMOTE PLASMA SOURCE WITH MULTIPLE EMITTERS

Plasma process chambers employing distribution grids having focusing surfaces thereon enabling angled fluxes to reach a substrate, and related methods

METHOD AND SYSTEM FOR GRAPHENE FORMATION

Dual chamber plasma etcher with ion accelerator

Dual chamber plasma etcher with ion accelerator

Method for manufacturing semiconductor device, method for processing substrate, substrate processing apparatus and recording medium

Flame-assisted flash sintering

Substrate etching apparatus and substrate analysis method

Peroxide-vapor treatment for enhancing photoresist-strip performance and modifying organic films

Continuous plasma etch process

Electrode plate for plasma etching and plasma etching apparatus

Workpiece processing chamber having a thermal controlled microwave window

Hollow cathode discharge (HCD) suppressing capacitively coupled plasma electrode and gas distribution faceplate

Apparatus for treating substrate and method for treating substrate

Method of manufacturing semiconductor device, substrate processing apparatus, and recording medium

Plasma processing method and plasma processing apparatus

Method for forming self-aligned contacts/vias with high corner selectivity

Methods for removing particles from etching chamber

UNITIZED CONFINEMENT RING ARRANGEMENTS AND METHODS THEREOF

Plasma apparatus and method of fabricating semiconductor device using the same

Atomic layer deposition with plasma source

Low volume showerhead with porous baffle

Method of manufacturing semiconductor device, substrate processing apparatus, and recording medium

Plasma processing method and plasma processing apparatus

Systems and methods for providing gases to a process chamber

Plasma device

Inductive plasma source with high coupling efficiency

Plasma etching method and plasma etching apparatus

Symmetric chamber body design architecture to address variable process volume with improved flow uniformity/gas conductance

Resin container coating device

Methods for Discretized Processing and Process Sequence Integration of Regions of a Substrate

Toroidal Plasma Channel with Varying Cross-Section Areas Along the Channel

Method of manufacturing semiconductor device, substrate processing apparatus, and non-transitory computer-readable recording medium

Cooling mechanism utlized in a plasma reactor with enhanced temperature regulation

Method for producing micro plasma with biocompatibility

Open plasma lamp for forming a light-sustained plasma

Replaceable upper chamber parts of plasma processing apparatus

Substrate processing apparatus, method for manufacturing semiconductor device and computer-readable recording medium

Methods for plasma processing