ClassID:

205361

H01J37/32752 - CPC Classification

Classification description:

Discharge tubes with provision for introducing objects or material to be exposed to the discharge, e.g. for the purpose of examination or processing thereof; Gas-filled discharge tubes; Constructional details of the reactor; Means for moving the material to be treated for moving the material across the discharge

Sub-classes:
Recent Application in this class:
#1
20250372354
2025-12-04

SYSTEM AND METHOD FOR PLASMA TREATMENT WITH INDEPENDENT CONTROL OF NEUTRAL PARTICLE AND ION FLUXES

#2
20250037979
2025-01-30

RESILIENT RELEASE LAYER FOR LITHIUM FILM TRANSFER AND ATMOSPHERIC PLASMA ASSISTED REMOVAL OF RESIDUAL RELEASE LAYER

#3
20240321563
2024-09-26

FILM FORMING APPARATUS

#4
20240087853
2024-03-14

PLASMA PROCESSING APPARATUS, PLASMA PROCESSING METHOD, AND SEMICONDUCTOR DEVICE MANUFACTURING METHOD

#5
20220389580
2022-12-08

NON-CONFORMAL PLASMA INDUCED ALD GAPFILL

#6
20220375723
2022-11-24

SYSTEMS AND METHODS FOR MEDICAL PACKAGING

#7
20220372620
2022-11-24

SYSTEMS AND METHODS FOR MEDICAL PACKAGING

#8
20220254613
2022-08-11

Movement systems for sputter coating of non-flat substrates

#9
20220102129
2022-03-31

Apparatus and method for ionizing an analyte, and apparatus and method for analyzing an ionized analyte

#10
20220068644
2022-03-03

Atomic layer deposition using a substrate scanning system

#11
20220068618
2022-03-03

Methods of treating a surface of a polymer material by atmospheric pressure plasma

#12
20210381095
2021-12-09

Vapor deposition apparatus and method for coating a substrate in a vacuum chamber

#13
20210151309
2021-05-20

Apparatus and method for ionizing an analyte, and apparatus and method for analysing an ionized analyte

#14
20210118653
2021-04-22

Film formation device and film formation method

#15
20210050192
2021-02-18

MAGNETRON SPUTTERING DEVICE

#16
20200343079
2020-10-29

Methods of treating a surface of a polymer material by atmospheric pressure plasma

#17
20200340117
2020-10-29

Film formation apparatus and film formation method

#18
20200243309
2020-07-30

APPARATUS AND METHODS FOR DEFINING A PLASMA

#19
20200164672
2020-05-28

Drop-on-demand identification document printing with surface pre-treatment

#20
20190284685
2019-09-19

THIN FILM FORMATION APPARATUS, SPUTTERING CATHODE, AND METHOD OF FORMING THIN FILM

#21
20190180985
2019-06-13

Spatial atomic layer deposition chamber with plasma pulsing to prevent charge damage

#22
20190136379
2019-05-09

Substrate treating apparatus and method

#23
20190019656
2019-01-17

Plasma treatment device and structure of reaction vessel for plasma treatment

#24
20180366150
2018-12-20

Film-forming apparatus and method for manufacturing magnetic recording medium

#25
20180333968
2018-11-22

Hydrophilic and hydrophobic modification of a printing surface

#26
20180257416
2018-09-13

Drop-on-demand identification document printing with surface pre-treatment

#27
20180237912
2018-08-23

Film deposition method and film deposition apparatus

#28
20180130662
2018-05-10

System and method for mitigating oxide growth in a gate dielectric

#29
20180122623
2018-05-03

Wire electric discharge machine

#30
20180100236
2018-04-12

COMMON DEPOSITION PLATFORM, PROCESSING STATION, AND METHOD OF OPERATION THEREOF

#31
20170204510
2017-07-20

SUBSTRATE PROCESSING DEVICE

#32
20170170022
2017-06-15

System and method for mitigating oxide growth in a gate dielectric

#33
20170167019
2017-06-15

PLASMA PROCESSING APPARATUS AND FILM DEPOSITION METHOD

#34
20170133283
2017-05-11

Sensor and adjuster for a consumable

#35
20170076917
2017-03-16

Plasma Module With Slotted Ground Plate

#36
20170062181
2017-03-02

Use of ion beam etching to generate gate-all-around structure

#37
20160369403
2016-12-22

Method of using a multi-pass vacuum coating system

#38
20160340798
2016-11-24

Toroidal plasma processing apparatus with a shaped workpiece holder

#39
20160322218
2016-11-03

Film Forming Method and Film Forming Apparatus

#40
20160293387
2016-10-06

Substrate processing apparatus and substrate processing method

#41
20160284532
2016-09-29

Method of manufacturing semiconductor device, substrate processing apparatus, and recording medium

#42
20160181072
2016-06-23

PLASMA GENERATING DEVICE WITH MOVING CAROUSEL AND METHOD OF USE

#43
20160111254
2016-04-21

Workpiece Processing Method And Apparatus

#44
20160097124
2016-04-07

Apparatus and method of manufacturing display apparatus

#45
20160071708
2016-03-10

METHOD AND APPARATUS FOR SURFACE PROCESSING OF A SUBSTRATE USING AN ENERGETIC PARTICLE BEAM

#46
20160053369
2016-02-25

Open air plasma deposition method

#47
20160030909
2016-02-04

Deposition tool for combinatorial thin film material libraries

#48
20150357161
2015-12-10

Defect control in RF plasma substrate processing systems using DC bias voltage during movement of substrates

#49
20150279401
2015-10-01

MAGNETIC RECORDING MEDIUM, METHOD FOR MANUFACTURING SAME, AND FILM-FORMING APPARATUS

#50
20150255252
2015-09-10

Apparatus and method for applying surface coatings

#51
20150111391
2015-04-23

Substrate treating apparatus and method

#52
20140212600
2014-07-31

Common deposition platform, processing station, and method of operation thereof

#53
20140170859
2014-06-19

Film formation device, substrate processing device, and film formation method

#54
20140144877
2014-05-29

Plasma generating device with moving carousel and method of use

#55
20140110059
2014-04-24

Atmospheric-pressure plasma processing apparatus for substrates

#56
20140014499
2014-01-16

Deposition system with electrically isolated pallet and anode assemblies

#57
20130220795
2013-08-29

Sputtering apparatus including target mounting and control

#58
20130108803
2013-05-02

Open air plasma deposition system

#59
20120325147
2012-12-27

Apparatus for depositing a polymer coating containing nanomaterial on a substrate

#60
20120248328
2012-10-04

Apparatus and method for multiple slot ion implantation

#61
20120125258
2012-05-24

Extended Reactor Assembly with Multiple Sections for Performing Atomic Layer Deposition on Large Substrate

#62
20120073501
2012-03-29

PROCESS CHAMBER FOR DIELECTRIC GAPFILL

#63
20120064260
2012-03-15

SURFACE WAVE PLASMA CVD APPARATUS AND FILM FORMING METHOD

#64
20120021592
2012-01-26

Apparatus and method for doping

#65
20120021252
2012-01-26

Treating Surface of Substrate Using Inert Gas Plasma in Atomic Layer Deposition

#66
20110305836
2011-12-15

Atomic layer deposition apparatus and thin film forming method

#67
20110220486
2011-09-15

Method of producing α crystal structure-based alumina films

#68
20110201150
2011-08-18

Sputtering Apparatus, Thin-Film Forming Method, and Manufacturing Method for a Field Effect Transistor

#69
20110174775
2011-07-21

SURFACE PROCESSING APPARATUS

#70
20110155057
2011-06-30

PLASMA PROCESS APPARATUS

#71
20110132755
2011-06-09

IN-LINE SYSTEM FOR MANUFACTURING SOLAR CELL

#72
20110120374
2011-05-26

System and method for mitigating oxide growth in a gate dielectric

#73
20110014424
2011-01-20

PLASMA TREATMENT APPARATUS AND METHOD FOR TREATMENT OF A SUBSTRATE WITH ATMOSPHERIC PRESSURE GLOW DISCHARGE ELECTRODE CONFIGURATION

#74
20100313810
2010-12-16

Continuous film forming apparatus

#75
20100288630
2010-11-18

Physical vapor deposition device

#76
20100155227
2010-06-24

SPUTTERING APPARATUS AND FILM FORMING METHOD

#77
20100089318
2010-04-15

Remote Plasma Apparatus for Manufacturing Solar Cells

#78
20100080933
2010-04-01

Multi-electrode PECVD source

#79
20090194507
2009-08-06

APPARATUS AND METHOD FOR CLEANING, ETCHING, ACTIVATION AND SUBSEQUENT TREATMENT OF GLASS SURFACES, GLASS SURFACES COATED BY METAL OXIDES, AND SURFACES OF OTHER SI02-COATED MATERIALS

#80
20090186469
2009-07-23

Apparatus and method for doping

#81
20090169751
2009-07-02

Multi-Pass Vacuum Coating Systems

#82
20090098306
2009-04-16

Method and apparatus for surface processing of a substrate using an energetic particle beam

#83
20080317968
2008-12-25

TILTED PLASMA DOPING

#84
20080251208
2008-10-16

Plasma treatment apparatus

#85
20080230372
2008-09-25

Deposition system with electrically isolated pallet and anode assemblies

#86
20080210547
2008-09-04

Sputtering apparatus and film-forming processes

#87
20080210546
2008-09-04

Sputtering apparatus, method for producing a transparent electroconductive film

#88
20080199629
2008-08-21

Method for depositing a polymer layer containing nanomaterial on a substrate material and apparatus

#89
20080164147
2008-07-10

Film forming apparatus

#90
20080131336
2008-06-05

Plasma processing apparatus

#91
20080128089
2008-06-05

PLASMA PROCESSING APPARATUS

#92
20080070389
2008-03-20

Apparatus and method for doping

#93
20080061041
2008-03-13

Plasma treatment apparatus and plasma treatment method

#94
20080061034
2008-03-13

ETCHING APPARATUS AND ETCHING METHOD USING THE SAME

#95
20080053988
2008-03-06

Plasma generation apparatus and workpiece processing apparatus using the same

#96
20080050882
2008-02-28

System and method for mitigating oxide growth in a gate dielectric

#97
20080011599
2008-01-17

Sputtering apparatus including novel target mounting and/or control

#98
20070281106
2007-12-06

PROCESS CHAMBER FOR DIELECTRIC GAPFILL

#99
20070123041
2007-05-31

Apparatus and method for surface processing such as plasma processing

#100
20070028837
2007-02-08

AN APPARATUS FOR PLASMA TREATMENT

#101
20060278524
2006-12-14

System and method for modulating power signals to control sputtering

#102
20060236931
2006-10-26

Tilted Plasma Doping

#103
20060231390
2006-10-19

Temperature control of pallet in sputtering system

#104
20060006348
2006-01-12

Apparatus and method for doping

#105
20060006059
2006-01-12

Method for preparing alumna coating film having alpha-type crystal structure as primary structure

#106
20050199492
2005-09-15

Sputtering device

#107
20050161317
2005-07-28

Plasma processing system