ClassID:

205362

H01J37/32761 - CPC Classification

Classification description:

Discharge tubes with provision for introducing objects or material to be exposed to the discharge, e.g. for the purpose of examination or processing thereof; Gas-filled discharge tubes; Constructional details of the reactor; Means for moving the material to be treated for moving the material across the discharge Continuous moving

Sub-classes:
Recent Application in this class:
#1
20250125127
2025-04-17

CONTINUOUS PLASMA PROCESSING SYSTEM WITH ADJUSTABLE ELECTRODE

#2
20250125121
2025-04-17

TWO-ELECTRODE CONTINUOUS PLASMA PROCESSING SYSTEM

#3
20240153748
2024-05-09

CONTROL METHOD OF SUBSTRATE PROCESSING APPARATUS AND SUBSTRATE PROCESSING APPARATUS

#4
20230317429
2023-10-05

Device and method for sputtering and depositing metal on surface of magnetic powder materials

#5
20230274920
2023-08-31

SYSTEM AND METHOD FOR MAKING THICK-MULTILAYER DIELECTRIC FILMS

#6
20230227974
2023-07-20

SUBSTRATE PROCESSING APPARATUS AND METHOD

#7
20230143154
2023-05-11

PISTON CRANK AGITATION MECHANISM FOR PHYSICAL VAPOR DEPOSITION CONFORMAL COATINGS ON POWDER

#8
20230005725
2023-01-05

METHOD OF SPUTTER-COATING SUBSTRATES OR OF MANUFACTURING SPUTTER COATED SUBSTRATES AND APPARATUS

#9
20210189567
2021-06-24

Coating apparatus and coating method

#10
20210043474
2021-02-11

PLASMA ETCHING APPARATUS

#11
20200321199
2020-10-08

Methods and systems for generating plasma activated liquid

#12
20190287767
2019-09-19

Treatment unit for a facility for treating the surface of a substrate in motion, corresponding facility and method of implementation

#13
20190259583
2019-08-22

DEVICE FOR PERFORMING ATMOSPHERIC PRESSURE PLASMA ENHANCED CHEMICAL VAPOUR DEPOSITION AT LOW TEMPERATURE

#14
20190112706
2019-04-18

GAS SEPARATION BY ADJUSTABLE SEPARATION WALL

#15
20190017160
2019-01-17

Pretreatment assembly and method for treating work pieces

#16
20180286645
2018-10-04

Plasma processing apparatus

#17
20180269040
2018-09-20

Liquid processing apparatus including container, first and second electrodes, insulator surrounding at least part of side face of the first electrode, gas supply device, metallic member surrounding part of side face of the first electrode, and power source

#18
20180261435
2018-09-13

Liquid treatment apparatus including flow channel, first and second electrodes, insulator surrounding lateral surface of first electrode, gas supply device, and power supply source

#19
20180223414
2018-08-09

Powder coating apparatus

#20
20180130646
2018-05-10

Methods and systems for generating plasma activated liquid

#21
20180100236
2018-04-12

COMMON DEPOSITION PLATFORM, PROCESSING STATION, AND METHOD OF OPERATION THEREOF

#22
20170213708
2017-07-27

Method and apparatus for saving energy while increasing the conveying speed in vacuum coating plants

#23
20170008308
2017-01-12

Plasma generating device

#24
20160254127
2016-09-01

Method and device for producing uniform films on moving substrates and films produced in this way

#25
20160053369
2016-02-25

Open air plasma deposition method

#26
20160010209
2016-01-14

Layer-forming device and injector

#27
20160002785
2016-01-07

Layer-forming device and layer-forming method

#28
20150255252
2015-09-10

Apparatus and method for applying surface coatings

#29
20140212600
2014-07-31

Common deposition platform, processing station, and method of operation thereof

#30
20130108803
2013-05-02

Open air plasma deposition system

#31
20120325147
2012-12-27

Apparatus for depositing a polymer coating containing nanomaterial on a substrate

#32
20120296002
2012-11-22

Surface-treatment method for a fluororesin molded body, and fluororesin molded body

#33
20120255492
2012-10-11

Large Area Atmospheric Pressure Plasma Enhanced Chemical Vapor Deposition Apparatus

#34
20120118733
2012-05-17

MAGNETRON SPUTTERING APPARATUS

#35
20110253674
2011-10-20

Method and chamber for inductively coupled plasma processing for cylinderical material with three-dimensional surface

#36
20110212625
2011-09-01

SUBSTRATE PROCESSING APPARATUS AND METHOD OF MANUFACTURING SEMICONDUCTOR DEVICE

#37
20110209829
2011-09-01

SURFACE TREATMENT APPARATUS

#38
20110203734
2011-08-25

Plasma processing apparatus, magnetoresistive device manufacturing apparatus, magnetic thin film forming method, and film formation control program

#39
20110151138
2011-06-23

Method for depositing film

#40
20110067631
2011-03-24

Arc ion plating apparatus

#41
20110033638
2011-02-10

METHOD AND APPARATUS FOR DEPOSITION ON LARGE AREA SUBSTRATES HAVING REDUCED GAS USAGE

#42
20100326818
2010-12-30

METHOD OF MANUFACTURING SEMICONDUCTOR DEVICE AND SPUTTERING APPARATUS

#43
20100313810
2010-12-16

Continuous film forming apparatus

#44
20100308022
2010-12-09

Method and device for the plasma treatment of running metal substrates

#45
20100273315
2010-10-28

Thin film deposition via charged particle-depleted plasma achieved by magnetic confinement

#46
20100258432
2010-10-14

Sputtering apparatus, sputter deposition method, and analysis apparatus

#47
20100218721
2010-09-02

Hollow-cathode discharge apparatus for plasma-based processing

#48
20100164315
2010-07-01

Processing apparatus

#49
20100117172
2010-05-13

THIN FILM SEMICONDUCTOR ALLOY MATERIAL PREPARED BY A VHF ENERGIZED PLASMA DEPOSITION PROCESS

#50
20100116334
2010-05-13

VHF ENERGIZED PLASMA DEPOSITION PROCESS FOR THE PREPARATION OF THIN FILM MATERIALS

#51
20100089318
2010-04-15

Remote Plasma Apparatus for Manufacturing Solar Cells

#52
20100024729
2010-02-04

METHODS AND APPARATUSES FOR UNIFORM PLASMA GENERATION AND UNIFORM THIN FILM DEPOSITION

#53
20090294279
2009-12-03

SPUTTERING APPARATUS AND FILM FORMING METHOD

#54
20090218214
2009-09-03

BACKSIDE COATING PREVENTION DEVICE, COATING CHAMBER COMPRISING A BACKSIDE COATING PREVENTION DEVICE, AND METHOD OF COATING

#55
20090121604
2009-05-14

Electrode and arrangement with movable shield

#56
20090098311
2009-04-16

METHOD FOR FORMING THIN FILM

#57
20080199629
2008-08-21

Method for depositing a polymer layer containing nanomaterial on a substrate material and apparatus

#58
20080085377
2008-04-10

Plasma treatment apparatus and method for plasma treatment

#59
20070240982
2007-10-18

ARC ION PLATING APPARATUS

#60
20070151842
2007-07-05

APPARATUS FOR REACTIVE SPUTTERING

#61
20060189170
2006-08-24

Plasma treatment apparatus and method for plasma treatment

#62
20050279455
2005-12-22

Plasma reactor for surface modification of objects