205368 ⎘
Discharge tubes with provision for introducing objects or material to be exposed to the discharge, e.g. for the purpose of examination or processing thereof; Gas-filled discharge tubes; Constructional details of the reactor; Further details of plasma apparatus not provided for in groups - ; special provisions for cleaning or maintenance of the apparatus Pressure
PLACING UNIT AND PLASMA PROCESSING APPARATUS
#302Method and system for in situ formation of gas-phase compounds
#303Differentially pumped reactive gas injector
#304Slip ring, support mechanism, and plasma processing apparatus
#305CONTAINER PLASMA TREATMENT PROCESS COMPRISING A THERMAL IMAGING PHASE
#306ENDBLOCK FOR ROTATABLE TARGET WITH ELECTRICAL CONNECTION BETWEEN COLLECTOR AND ROTOR AT PRESSURE LESS THAN ATMOSPHERIC PRESSURE
#307Etching process method
#308Cathodic arc deposition apparatus and method
#309Showerhead curtain gas method and system for film profile modulation
#310DODECADON TRANSFER CHAMBER AND PROCESSING SYSTEM HAVING THE SAME
#311Systems and methods for improved semiconductor etching and component protection
#312Plasma processing apparatus and plasma processing method
#313Passivation of laser facets and systems for performing the same
#314Apparatus for plasma treatment and method of operating the apparatus
#315Sputtering apparatus and method of discriminating state thereof
#316Virtual cathode deposition (VCD) for thin film manufacturing
#317Systems and methods for selectively etching film
#318Methods for in-situ chamber clean in plasma etching processing chamber
#319Manufacturing method of magnetoresistive element and vacuum processing apparatus
#320Processing system for small substrates
#321Plasma processing apparatus and method therefor
#322Sputtering apparatus and processing apparatus
#323Pneumatic exhaust system
#324PROTEIN FILM PRODUCTION METHOD
#325Methods for atomic level resolution and plasma processing control
#326Multiple control modes
#327Method and system for controlling ion flux in an RF plasma
#328Plasma diffuser method and apparatus
#329METHOD AND SYSTEM FOR GRAPHENE FORMATION
#330Radio frequency plasma method for uniform surface processing of RF cavities and other three-dimensional structures
#331Time varying segmented pressure control
#332Pulsed remote plasma method and system
#333Method of using a multi-pass vacuum coating system
#334Plasma processing apparatus
#335Plasma generation device
#336Chamber with vertical support stem for symmetric conductance and RF delivery
#337DECOMPRESSION PROCESSING APPARATUS
#338Cross-flow reactor and method
#339Cathodic arc deposition apparatus and method
#340System and method for differential etching
#341PLASMA PROCESSING APPARATUS
#342Plasma processing apparatus and plasma processing method
#343System and method for reducing germs by means of plasma
#344SYSTEMS AND METHODS FOR TREATING MATERIAL SURFACES
#345Method and system for in situ formation of gas-phase compounds
#346Differentially pumped reactive gas injector
#347System for coordinating pressure pulses and RF modulation in a small volume confined process reactor
#348Plasma processing devices having multi-port valve assemblies
#349Methods for high precision plasma etching of substrates
#350Methods for high precision etching of substrates
#351METHOD AND SYSTEM FOR GRAPHENE FORMATION
#352UNITIZED CONFINEMENT RING ARRANGEMENTS AND METHODS THEREOF
#353WAFER ETCHING SYSTEM AND WAFER ETCHING PROCESS USING THE SAME
#354SUBSTRATE COOLING MEMBER, SUBSTRATE PROCESSING DEVICE, AND SUBSTRATE PROCESSING METHOD
#355Plasma processing apparatus and plasma processing method
#356PLASMA ENHANCED CHEMICAL VAPOR DEPOSITION DEVICE
#357Endblock for rotatable target with electrical connection between collector and rotor at pressure less than atmospheric pressure
#358Apparatus for treating wafers using supercritical fluid
#359Method for etching organic film and plasma etching device
#360System, method and apparatus for generating pressure pulses in small volume confined process reactor
#361System, method and apparatus for coordinating pressure pulses and RF modulation in a small volume confined process reactor
#362Sealing groove methods for semiconductor equipment
#363Methods and apparatus for dual confinement and ultra-high pressure in an adjustable gap plasma chamber
#364Methods and apparatus for depositing and/or etching material on a substrate
#365Method of depositing a film, recording medium, and film deposition apparatus
#366Method for neutral beam processing based on gas cluster ion beam technology and articles produced thereby
#367Soft pulsing
#368Method and apparatus for measuring pressure in a physical vapor deposition chamber
#369Chamber cleaning with infrared absorption gas
#370System and method for differential etching
#371Hybrid plasma reactor
#372Adjustment plate and apparatus for treating substrate having the same
#373Pressure control valve assembly of plasma processing chamber and rapid alternating process
#374In-situ reactor cleaning in high productivity combinatorial system
#375Apparatus for changing area ratio in a plasma processing system
#376ETCH process for 3D flash structures
#377SUBSTRATE CLEANING METHOD AND SEMICONDUCTOR MANUFACTURING APPARATUS
#378PRESSURE CONTROL IN CONTINUOUS PLASMA DEPOSITION PROCESSES
#379METHODS FOR IN-SITU CHAMBER DRY CLEAN IN PHOTOMASK PLASMA ETCHING PROCESSING CHAMBER
#380Distributed, concentric multi-zone plasma source systems, methods and apparatus
#381Methods of dechucking and system thereof
#382Reduction of a process volume of a processing chamber using a nested dynamic inert volume
#383Sample processing apparatus, sample processing system, and method for processing sample
#384PLASMA GENERATING APPARATUS
#385Plasma processing apparatus, plasma processing method, and non-transitory computer-readable medium
#386Plasma processing method
#387Deposition system with a rotating drum
#388Distributed multi-zone plasma source systems, methods and apparatus
#389Systems, methods and apparatus for separate plasma source control
#390Methods and apparatuses for controlling gas flow conductance in a capacitively-coupled plasma processing chamber
#391PLASMA PROCESSING APPARATUS
#392Chamber with uniform flow and plasma distribution
#393Apparatus for treating wafers using supercritical fluid
#394UNITIZED CONFINEMENT RING ARRANGEMENTS AND METHODS THEREOF
#395Methods and apparatus for dual confinement and ultra-high pressure in an adjustable gap plasma chamber
#396Methods and apparatus for changing area ratio in a plasma processing system
#397Multi-Pass Vacuum Coating Systems
#398Method and Device for Generating a Low-Pressure Plasma and Applications of the Low-Pressure Plasma
#399Methods and apparatuses for controlling gas flow conductance in a capacitively-coupled plasma processing chamber
#400Apparatus for treating wafers using supercritical fluid
#401Plasma processing apparatus
#402Apparatus and method for preventing corrosion of a vacuum gauge
#403Apparatus and method for plasma coating solid fuels and coated solid fuels produced using same
#404Method of manufacturing semiconductor device
#405Acoustic manipulation of plasma for arbitrary plasma metamaterial formation
#406Microplasma generator with field emitting electrode
#407Reactors and methods for making diamond coatings
#408Electrostatically clamped edge ring