205371 ⎘
Discharge tubes with provision for introducing objects or material to be exposed to the discharge, e.g. for the purpose of examination or processing thereof; Gas-filled discharge tubes; Constructional details of the reactor; Further details of plasma apparatus not provided for in groups - ; special provisions for cleaning or maintenance of the apparatus; Pressure; Exhausting Treating effluent gases
PLASMA PROCESSING SYSTEM AND EXHAUST SYSTEM
#2TRAP DEVICE AND EXHAUST DEVICE
#3Methods and Systems for Managing Byproduct Material Accumulation During Plasma-Based Semiconductor Wafer Fabrication Process
#4APPARATUS AND METHOD OF TRAPPING AN EXHAUST MATERIAL FROM A SUBSTRATE-PROCESSING PROCESS AND APPARATUS FOR PROCESSING A SUBSTRATE INCLUDING THE TRAPPING APPARATUS
#5RECIRCULATION CONTROL FOR A PLASMA PROCESS USING A BYPRODUCT CONCENTRATION
#6PLASMA GENERATING DEVICE
#7GAS PROCESSING APPARATUS
#8WAFER PROCESSING APPARATUS
#9PLASMA ABATEMENT TECHNOLOGY UTILIZING WATER VAPOR AND OXYGEN REAGENT
#10PLASMA ABATEMENT TECHNOLOGY UTILIZING WATER VAPOR AND OXYGEN REAGENT
#11SCRUBBER, SUBSTRATE PROCESSING SYSTEM INCLUDING THE SAME, AND SUBSTRATE PROCESSING METHOD USING THE SAME
#12PLASMA PROCESS CONTROL USING FLUORINE RADICAL CONCENTRATIONS
#13SCRUBBER AND TREATMENT METHOD OF SEMICONDUCTOR PROCESS GAS USING THE SAME
#14INDUCTIVELY COUPLED PLASMA DEVICE FOR EXHAUST GAS TREATMENT
#15MECHANISM FOR FILTERING ETCHING BYPRODUCT DURING SEMICONDUCTOR FABRICATION AND METHOD THEREOF
#16APPARATUS WITH HEATED FILTER AND OPERATION METHOD OF THE SAME
#17METHOD AND DEVICE TO DISTRIBUTE GAS INTO A CONTAINER
#18PLASMA-ACTIVATED GAS DISINFECTION DEVICE AND METHOD
#19PLASMA REACTOR FOR INDUCTIVELY COUPLED PLASMA AND METHOD OF ASSEMBLING THE SAME
#20METHOD FOR ORGANIC EFFLUENT ABATEMENT
#21EXHAUST GAS PROCESSING APPARATUS HAVING PLASMA SOURCE AND SUBSTRATE PROCESSING APPARATUS INCLUDING THE SAME
#22CIRCUIT, FAN SYSTEM, AND TRANSFORMER FOR POWER CONVERSION
#23Process stop loss reduction system through rapid replacement of apparatus for trapping of reaction by-product for semiconductor process
#24SCRUBBER SYSTEM AND WET CLEANING METHOD USING THE SAME
#25SEMICONDUCTOR MANUFACTURING FACILITY AND METHOD OF OPERATING THE SAME
#26FLUORINE-DOPED SILICON-CONTAINING MATERIALS
#27OPTICAL ABSORPTION SENSOR FOR SEMICONDUCTOR PROCESSING
#28PLASMA GENERATION APPARATUS
#29PLASMA TREATMENT APPARATUS
#30GAS ABATEMENT BY PLASMA
#31Plasma processing apparatus
#32LOW TEMPERATURE CARBON GAPFILL
#33TRAP DEVICE AND SEMICONDUCTOR MANUFACTURING DEVICE
#34APPARATUS AND METHOD FOR ELECTRON IRRADIATION SCRUBBING
#35PLASMA GENERATING DEVICE
#36Plasma reactor for inductively coupled plasma and method of assembling the same
#37Optical system for monitoring plasma reactions and reactors
#38REDUCTION OF BR2 AND CL2 IN SEMICONDUCTOR PROCESSES
#39SUBSTRATE PROCESSING APPARATUS AND SUBSTRATE PROCESSING METHOD
#40APPARATUS AND METHOD OF TRAPPING AN EXHAUST MATERIAL FROM A SUBSTRATE-PROCESSING PROCESS AND APPARATUS FOR PROCESSING A SUBSTRATE INCLUDING THE TRAPPING APPARATUS
#41PLASMA-GENERATING NOZZLE AND PLASMA DEVICE INCLUDING SAME
#42APPARATUS AND METHOD FOR TREATING SUBSTRATE
#43SUBSTRATE PROCESSING APPARATUS, EXHAUST DEVICE AND METHOD OF MANUFACTURING SEMICONDUCTOR DEVICE
#44Powder removing apparatus using screw cylinder for gas processing facility
#45Methods and apparatus for passivating a target
#46PLASMA CHAMBER WITH ANCILLARY REACTION CHAMBER
#47Substrate processing apparatus, substrate processing method, gas regeneration system, and gas regeneration method
#48Scrubber system and wet cleaning method using the same
#49HIGH EFFICIENCY TRAP FOR PARTICLE COLLECTION IN A VACUUM FORELINE
#50Heat exchanger with multistaged cooling
#51Actively cooled foreline trap to reduce throttle valve drift
#52Waste gas abatement technology for semiconductor processing
#53METHOD AND APPARATUS FOR TREATING DISCHARGE GAS CONTAINING TARGET GAS IN PLASMA STATE
#54Systems and processes for producing fixed-nitrogen compounds
#55Methods and apparatus for passivating a target
#56Optical absorption sensor for semiconductor processing
#57Method and apparatus for deposition cleaning in a pumping line
#58Plasma processing apparatus
#59Plasma abatement system utilizing water vapor and oxygen reagent
#60Optical system for monitoring plasma reactions and reactors
#61Plasma reactors having recuperators
#62Controlling exhaust gas pressure of a plasma reactor for plasma stability
#63Durable auto-ignition device for plasma reactor
#64Reduction of Brand Clin semiconductor processes
#65Abatement and strip process chamber in a dual load lock configuration
#66Methods and Systems for Managing Byproduct Material Accumulation During Plasma-Based Semiconductor Wafer Fabrication Process
#67Substrate processing apparatus
#68Method and apparatus for deposition cleaning in a pumping line
#69WATER MOLECULE SUPPLY DEVICE FOR PLASMA TORCH EXCITATION DEVICE
#70Apparatus with multistaged cooling
#71Abatement and strip process chamber in a dual loadlock configuration
#72PLASMA PROCESSING DEVICE
#73Method and apparatus for gas abatement
#74Plasma foreline thermal reactor system
#75Plasma treatment apparatus
#76Plasma processing apparatus and plasma processing method
#77Plasma abatement technology utilizing water vapor and oxygen reagent
#78Apparatus for collection and subsequent reaction of liquid and solid effluent into gaseous effluent
#79TOROIDAL PLASMA ABATEMENT APPARATUS AND METHOD
#80PLASMA ABATEMENT TECHNOLOGY UTILIZING WATER VAPOR AND OXYGEN REAGENT
#81APPARATUS FOR VACUUM SPUTTER DEPOSITION AND METHOD THEREFOR
#82Ethylene disposal apparatus and ethylene disposal method using same
#83Apparatus for exhaust cooling
#84Plasma abatement solids avoidance by use of oxygen plasma cleaning cycle
#85Toroidal plasma abatement apparatus and method
#86Vacuum evacuation system
#87Method and apparatus for valve deposition cleaning and prevention by plasma discharge
#88Method of cooling a composition using a hall effect enhanced capacitively coupled plasma source, an abatement system, and vacuum processing system
#89Apparatus and methods for generating reactive gas with glow discharges
#90Plasma induced flow electrode structure, plasma induced flow generation device, and method of manufacturing plasma induced flow electrode structure
#91Ventilation systems for use with a plasma treatment system
#92Apparatus for treating a gas in a conduit
#93PLASMA ABATEMENT USING WATER VAPOR IN CONJUNCTION WITH HYDROGEN OR HYDROGEN CONTAINING GASES
#94Abatement system having a plasma source
#95Capacitively coupled plasma source for abating compounds produced in semiconductor processes
#96Corrosion resistant abatement system
#97Reagent delivery system freeze prevention heat exchanger
#98Apparatus for treating a gas in a conduit
#99Method for preventing explosion of exhaust gas in decompression processing apparatus
#100Plasma reactor for abatement of hazardous material
#101Exhaust system
#102Hall effect enhanced capacitively coupled plasma source, an abatement system, and vacuum processing system
#103Trap assembly in film forming apparatus
#104Substrate processing apparatus and substrate detaching method
#105Toroidal plasma abatement apparatus and method
#106Abatement and strip process chamber in a dual loadlock configuration
#107Apparatus for treating an exhaust gas in a foreline
#108PLASMA REACTOR FOR REMOVAL OF CONTAMINANTS
#109Exhaust gas treatment system
#110RF coupled plasma abatement system comprising an integrated power oscillator
#111Electrode for plasma generation
#112Method of treating a gas stream
#113Chamber with uniform flow and plasma distribution
#114Substantially Non-Oxidizing Plasma Treatment Devices and Processes
#115Plasma reactor for abating hazardous materials and driving method thereof
#116Microwave plasma reactor
#117PROCESSING APPARATUS, EXHAUST PROCESSING PROCESS AND PLASMA PROCESSING PROCESS
#118PROCESSING APPARATUS, EXHAUST PROCESSING PROCESS AND PLASMA PROCESSING PROCESS
#119Apparatus For Treating A Gas Stream
#120PROCESSING APPARATUS, EXHAUST PROCESSING PROCESS AND PLASMA PROCESSING PROCESS
#121Chamber isolation valve RF grounding
#122PROCESSING APPARATUS, EXHAUST PROCESSING PROCESS AND PLASMA PROCESSING PROCESS
#123Exhaust assembly for a plasma processing system
#124TREATMENT OF EFFLUENT IN THE DEPOSITION OF CARBON-DOPED SILICON
#125Method for Generating a Cold Plasma for Sterilizing a Gaseous Medium and Device Therefor
#126Exhaust assembly for plasma processing system and method
#127PROCESSING APPARATUS, EXHAUST PROCESSING PROCESS AND PLASMA PROCESSING PROCESS
#128EXHAUST PROCESSING METHOD, PLASMA PROCESSING METHOD AND PLASMA PROCESSING APPARATUS
#129Chamber isolation valve RF grounding
#130Method and apparatus for process monitoring and control
#131Plasma generating electrode, plasma generation device, and exhaust gas purifying device
#132Plasma generating electrode, plasma generation device, and exhaust gas purifying device
#133Method and apparatus for maintaining by-product volatility in deposition process
#134System and method for ventilation in the fabrication of integrated circuits
#135PLASMA PROCESSING MATERIAL RECLAMATION AND REUSE