205404 ⎘
Discharge tubes with provision for introducing objects or material to be exposed to the discharge, e.g. for the purpose of examination or processing thereof; Gas-filled discharge tubes operating with cathodic sputtering; Constructional aspects of the reactor Collimators, shutters, apertures
PHYSICAL VAPOR DEPOSITION APPARATUS
#2SUBSTRATE PROCESSING APPARATUS
#3HIGH TEMPERATURE ION SOURCE
#4PHYSICAL VAPOR DEPOSITION APPARATUS
#5Methods And Apparatus For Depositing Amorphous Indium Tin Oxide Film
#6SEMICONDUCTOR TOOL FOR COPPER DEPOSITION
#7DELIVERY OF CONFIGURABLE PULSED VOLTAGE WAVEFORMS FOR SUBSTRATE PROCESSING
#8COLLIMATOR FOR PRODUCTION OF PIEZOELECTRIC LAYERS WITH TILTED C-AXIS ORIENTATION
#9HIGH TEMPERATURE ION SOURCE
#10METHOD AND DEVICE FOR PROTECTING OXYGEN-SENSITIVE TARGET MATERIALS IN A COATING SOURCE
#11SHUTTER SYSTEM FOR GAP-FREE SHIELDING OF A COATING SOURCE, AND ASSOCIATED METHOD
#12SPUTTERING APPARATUS
#13SHUTTER DISC FOR A SEMICONDUCTOR PROCESSING TOOL
#14DEPOSITION SYSTEM AND METHOD
#15PHYSICAL VAPOR DEPOSITION APPARATUS
#16PROCESS SHUTTER ARRANGEMENT
#17JET IMPINGEMENT COOLING ASSEMBLY FOR PLASMA WINDOWS POSITIONED IN A BEAM ACCELERATOR SYSTEM
#18PVD SYSTEM AND COLLIMATOR
#19SOFT MAGNETIC MULTILAYER DESPOSITION APPARATUS, METHODS OF MANUFACTURING AND MAGNETIC MULTILAYER
#20DEVICE AND METHOD FOR PLASMA GENERATION IN A WIDE PRESSURE RANGE AND SYSTEM AND METHOD FOR OPTICAL GAS ANALYSIS/DETECTION BY MEANS OF SUCH A DEVICE
#21Sputtering Apparatus
#22FILM FORMING APPARATUS AND FILM FORMING METHOD
#23METHODS AND APPARATUS FOR PHYSICAL VAPOR DEPOSITION (PVD) DIELECTRIC DEPOSITION
#24Vacuum deposition into trenches and vias
#25Film forming position misalignment correction method and film forming system
#26Methods and apparatus for controlling ion fraction in physical vapor deposition processes
#27SEMICONDUCTOR TOOL FOR COPPER DEPOSITION
#28Shutter disc for a semiconductor processing tool
#29IN SITU AND TUNABLE DEPOSITION OF A FILM
#30Slit diaphragm
#31SEMICONDUCTOR TOOL FOR COPPER DEPOSITION
#32SYSTEM FOR DEPOSITING PIEZOELECTRIC MATERIALS, METHODS FOR USING THE SAME, AND MATERIALS DEPOSITED WITH THE SAME
#33METHOD OF OPERATING A PVD APPARATUS
#34Gas injection process kit to eliminate arcing and improve uniform gas distribution for a PVD process
#35PHYSICAL VAPOR DEPOSITION APPARATUS
#36SHUTTER DISK FOR PHYSICAL VAPOR DEPOSITION (PVD) CHAMBER
#37PVD system and collimator
#38IN SITU AND TUNABLE DEPOSITION OF A FILM
#39Cleaning of SIN with CCP plasma or RPS clean
#40Cleaning of sin with CCP plasma or RPS clean
#41Shielding mechanism and thin-film-deposition equipment using the same
#42Shielding device and thin-film-deposition equipment with the same
#43Shielding device and thin-film-deposition equipment with the same
#44Shielding device and thin-film-deposition equipment with the same
#45DEPOSITION SYSTEM AND METHOD
#46Protective shutter for charged particle microscope
#47Sputtering target assembly to prevent overetch of backing plate and methods of using the same
#48Magnetron plasma sputtering arrangement
#49Vacuum processing apparatus
#50PIEZOELECTRIC BULK LAYERS WITH TILTED C-AXIS ORIENTATION AND METHODS FOR MAKING THE SAME
#51Film formation apparatus and film formation method
#52Gas injection process kit to eliminate arcing and improve uniform gas distribution for a PVD process
#53System and method for detecting abnormality of thin-film deposition process
#54Film forming method, film forming apparatus, and program
#55Apparatus and a method for forming patterns on a surface of a substrate plate by a sputtering process
#56Sputtering apparatus and film forming method
#57Deposition system with multi-cathode and method of manufacture thereof
#58Apparatus and method for performing sputtering process
#59Methods and apparatus for controlling ion fraction in physical vapor deposition processes
#60Alignment mask, metal mask assembly, and preparation method therefor
#61Sputtering target assembly to prevent overetch of backing plate and methods of using the same
#62Gasketing and Plasma Ashing for Coated Devices
#63Apparatus for improved anode-cathode ratio for rf chambers
#64Multi-cathode processing chamber with dual rotatable shields
#65Sputtering apparatus
#66SPUTTER DEVICE
#67Film forming apparatus and method
#68High throughput vacuum deposition sources and system
#69Sputtering method and sputtering apparatus
#70METHODS AND APPARATUS FOR CONTROLLING ION FRACTION IN PHYSICAL VAPOR DEPOSITION PROCESSES
#71Methods and apparatus for physical vapor deposition (PVD) dielectric deposition
#72SUBSTRATE SUPPORT SYSTEM
#73Sputtering method
#74Apparatus for and method of fabricating semiconductor device
#75Biasable flux optimizer / collimator for PVD sputter chamber
#76TARGET ASSEMBLY SHIELD
#77PHYSICAL VAPOR DEPOSITION WITH A DUAL-SHUTTER
#78Film formation apparatus
#79Film-forming device
#80COLLIMATOR FOR SELECTIVE PVD WITHOUT SCANNING
#81Film-forming apparatus, film-forming system, and film-forming method
#82Substrate side-deposition apparatus
#83Methods and apparatus for co-sputtering multiple targets
#84METHODS AND APPARATUS FOR LINEAR SCAN PHYSICAL VAPOR DEPOSITION WITH REDUCED CHAMBER FOOTPRINT
#85Apparatus for depositing material on the surface of a substrate
#86Sputtering device
#87Process integration method to tune resistivity of nickel silicide
#88Pre-clean chamber with integrated shutter garage
#89SHUTTER MECHANISM FOR TARGET, AND FILM-FORMING DEVICE PROVIDED WITH SAME
#90Methods and apparatus for shutter disk assembly detection
#91THERMALLY OPTIMIZED RINGS
#92Piezoelectric bulk layers with tilted c-axis orientation and methods for making the same
#93Apparatus for and method of fabricating semiconductor devices
#94METHOD AND APPARATUS OF FORMING STRUCTURES BY SYMMETRIC SELECTIVE PHYSICAL VAPOR DEPOSITION
#95Collimator, fabrication apparatus including the same, and method of fabricating a semiconductor device using the same
#96Biasable flux optimizer / collimator for PVD sputter chamber
#97Shield for a substrate processing chamber
#98Multi-beam particle beam system
#99Film forming system and method for forming film on substrate
#100Methods and apparatus for substrate edge uniformity
#101Substrate processing apparatus
#102Transparent halo assembly for reduced particle generation
#103Sputtering gap measurement apparatus and magnetron sputtering device
#104Processing apparatus and collimator
#105Processing apparatus and collimator
#106Process integration method to tune resistivity of nickel silicide
#107PVD TOOL TO DEPOSIT HIGHLY REACTIVE MATERIALS
#108PVD TOOL TO DEPOSIT HIGHLY REACTIVE MATERIALS
#109Sputtering apparatus and substrate processing apparatus
#110Reactors for plasma-assisted processes and associated methods
#111High throughput vacuum deposition sources and system
#112Methods and apparatus for multi-cathode substrate processing
#113Processing device, sputtering device, and collimator
#114PROCESSING APPARATUS AND COLLIMATOR
#115PROCESSING DEVICE AND COLLIMATOR
#116Paste method to reduce defects in dielectric sputtering
#117Biasable flux optimizer / collimator for PVD sputter chamber
#118Systems and methods for integrated resputtering in a physical vapor deposition chamber
#119Film forming apparatus
#120Collimator for use in a physical vapor deposition chamber
#121Thermally optimized rings
#122SPUTTERING DEVICE
#123SPUTTERING APPARATUS AND METHOD FOR FORMING SEMICONDUCTOR FILM USING SPUTTERING APPARATUS
#124Multisurface simultaneous sputtering and shuttering
#125METHOD OF MANUFACTURING SEMICONDUCTOR DEVICE AND SPUTTERING APPARATUS
#126Processing apparatus and collimator
#127Methods and apparatus for controlling ion fraction in physical vapor deposition processes
#128Methods for igniting a plasma in a substrate processing chamber
#129Methods and apparatus for processing a substrate
#130Sputtering apparatus and processing apparatus
#131Biasable flux optimizer / collimator for PVD sputter chamber
#132Extreme ultraviolet lithography mask blank manufacturing system and method of operation therefor
#133Acoustic resonator structure with inclined C-axis piezoelectric bulk and crystalline seed layers
#134Multi-stage deposition system for growth of inclined c-axis piezoelectric material structures
#135Methods for fabricating acoustic structure with inclined c-axis piezoelectric bulk and crystalline seed layers
#136Sputtering apparatuses and methods of manufacturing a magnetic memory device using the same
#137Deposition system for growth of inclined c-axis piezoelectric material structures
#138Sputtering apparatus
#139Anode Shield
#140Film forming apparatus
#141Physical vapor deposition system and physical vapor depositing method using the same
#142Shield mask mounting fitting for a sputtering apparatus
#143Magnetron sputtering apparatus
#144Semiconductor device, display device, display module, electronic device, oxide, and manufacturing method of oxide
#145One-piece process kit shield
#146Magnetron-sputtering coating system and method, and display substrate
#147Target preparation
#148Film deposition device
#149Collimator for use in substrate processing chambers
#150Rectangular Hollow Sputter Source and Method of use Thereof
#151Method of manufacturing semiconductor device and sputtering apparatus
#152DEPOSITION DEVICE
#153Deposition tool for combinatorial thin film material libraries
#154Sputtering apparatus
#155Holding assembly for substrate processing chamber
#156Sputtering apparatus and method thereof
#157Electronic device manufacturing method and sputtering method
#158Methods and apparatus for improved metal ion filtering
#159Deposition system with multi-cathode and method of manufacture thereof
#160Sputtering apparatus and substrate processing apparatus
#161Sputtering apparatus and substrate processing apparatus
#162Processing apparatus having a first shield and a second shield arranged to sandwich a substrate
#163Magnetron sputtering coating device, a nano-multilayer film, and the preparation method thereof
#164Systems and methods for integrated resputtering in a physical vapor deposition chamber
#165Reactive sputtering apparatus
#166Vacuum-processing apparatus, vacuum-processing method, and storage medium
#167Method for producing a polycrystalline ceramic film
#168Process kit of physical vapor deposition chamber and fabricating method thereof
#169Bipolar collimator utilized in a physical vapor deposition chamber
#170Intaglio printing plate coating apparatus
#171Film forming method, film forming apparatus and control unit for the film forming apparatus
#172Sputtering apparatus
#173Semiconductor device, method for manufacturing the same, and apparatus for manufacturing semiconductor device
#174Electronic component manufacturing method and electrode structure
#175Filters for blocking macroparticles in plasma deposition apparatus
#176Processing apparatus and shield
#177Self-centering process shield
#178Physical vapor deposition RF plasma shield deposit control
#179Finned shutter disk for a substrate process chamber
#180Recycling method for tantalum coil for sputtering and tantalum coil obtained by the recycling method
#181Film-forming apparatus
#182Film-forming apparatus
#183Deposition apparatus and electronic device manufacturing method
#184Film-forming apparatus
#185Thin film forming apparatus and thin film forming method
#186Two piece shutter disk assembly for a substrate process chamber
#187Sputtering apparatus
#188SHIELD MESH FOR SPUTTERING OF A THIN FILM ON A SUBSTRATE
#189Sputtering apparatus including target mounting and control
#190Combinatorial high power coaxial switching matrix
#191SPUTTER GUN SHUTTER
#192MEDIUM FREQUENCY MAGNETRON SPUTTERING DEVICE
#193SPUTTERING DEVICE
#194Electronic device manufacturing method and sputtering method
#195Vacuum deposition apparatus
#196Sputtering apparatus and method of manufacturing electronic device
#197Tantalum coil for sputtering and method for processing the coil
#198FLOW DIVIDER SYSTEM
#199Control of film composition in co-sputter deposition by using collimators
#200FILM FORMING METHOD BY SPUTTERING APPARATUS AND SPUTTERING APPARATUS
#201Sputtering method and sputtering apparatus
#202SPUTTERING APPARATUS AND ELECTRONIC DEVICE MANUFACTURING METHOD
#203Film-Forming apparatus and Film-Forming method
#204FILTER FOR ARC SOURCE
#205SPUTTERING APPARATUS AND MANUFACTURING METHOD OF ELECTRONIC DEVICE
#206Reactive sputtering apparatus
#207FILM-FORMING APPARATUS
#208VACUUM FILM-FORMING APPARATUS AND POSITION DETECTION METHOD FOR SHUTTER PLATE OF VACUUM FILM-FORMING APPARATUS
#209Formation method of coating
#210FILM FORMING METHOD, FILM FORMING APPARATUS AND CONTROL UNIT FOR THE FILM FORMING APPARATUS
#211Method of manufacturing magnetoresistive device and apparatus for manufacturing the same
#212Sputtering apparatus and sputtering method
#213Protective enclosure for an ion gun, device for depositing materials through vacuum evaporation comprising such a protective enclosure and method for depositing materials
#214Sputtering apparatus, sputtering method, and electronic device manufacturing method
#215Reactive sputtering method and reactive sputtering apparatus
#216Sputtering apparatus and electronic device manufacturing method
#217Substrate holding apparatus, mask alignment method, and vacuum processing apparatus using long taper pins and short taper pins for alignment
#218System and apparatus to facilitate physical vapor deposition to modify non-metal films on semiconductor substrates
#219PROCESS KIT FOR RF PHYSICAL VAPOR DEPOSITION
#220DEVICE FOR FORMING FILM
#221Rotary magnet sputtering apparatus
#222METHOD OF MANUFACTURING SEMICONDUCTOR DEVICE AND SPUTTERING APPARATUS
#223DRY ETCHING METHOD, MAGNETO-RESISTIVE ELEMENT, AND METHOD AND APPARATUS FOR MANUFACTURING THE SAME
#224Sputtering apparatus
#225Deposition apparatus and electronic device manufacturing method
#226SPUTTERING APPARATUS, DOUBLE ROTARY SHUTTER UNIT, AND SPUTTERING METHOD
#227PZT Depositing Using Vapor Deposition
#228CHARGED PARTICLE BEAM PVD DEVICE, SHIELDING DEVICE, COATING CHAMBER FOR COATING SUBSTRATES, AND METHOD OF COATING
#229Apparatus and method for making sputtered films with reduced stress asymmetry
#230Shaped anode and anode-shield connection for vacuum physical vapor deposition
#231Shutter disk having a tuned coefficient of thermal expansion
#232Apparatus and method for sputtering target debris reduction
#233WAFER PROCESSING DEPOSITION SHIELDING COMPONENTS
#234APPARATUS AND METHOD FOR UNIFORM DEPOSITION
#235Method for depositing multilayer coatings
#236Sputtering apparatus and method for controlling the same
#237Base substrate for epitaxial diamond film, method for producing the base substrate for epitaxial diamond film, epitaxial diamond film produced with the base substrate for epitaxial diamond film, and method for producing the epitaxial diamond film
#238SPUTTERING APPARATUS
#239Method for depositing electrically insulating layers
#240Method of manufacturing magnetoresistive device
#241Method for producing a directional layer by cathode sputtering, and device for implementing the method
#242Sputtering apparatus
#243Method and Apparatus for Producing Controlled Stresses and Stress Gradients in Sputtered Films
#244Processing system for producing a negative ion plasma
#245Vacuum Film Forming Apparatus
#246Surface-treating apparatus
#247Plasma Doping With Electronically Controllable Implant Angle
#248Method and apparatus for manufacturing cleaned substrates or clean substrates which are further processed
#249Film-forming system, film-forming method, insulating film, dielectric film, piezoelectric film, ferroelectric film, piezoelectric element and liquid discharge system
#250Process for forming thin film and system for forming thin film
#251Deposition apparatus and deposition method
#252Sputtering apparatus including novel target mounting and/or control
#253Adjustable suspension assembly for a collimating lattice
#254Sputtering apparatus and anti-adhesion plate therefor
#255Process kit and target for substrate processing chamber
#256Magnetic filter for physical vapor deposition equipment
#257Magnetron sputtering system for large-area substrates having removable anodes
#258Low voltage sputtering for large area substrates
#259Process for physical vapor deposition of a chalcogenide material layer and chamber for physical vapor deposition of a chalcogenide material layer of a phase change memory device
#260Cross-contaminant shield in sputtering system
#261Top shield for sputtering system
#262Method for depositing multilayer coatings
#263Sputtering device
#264Sputtering apparatus and method for forming metal silicide layer using the same
#265Shield unit for TiN sputtering apparatus, method of coating the same, and sputtering method
#266Oscillating shielded cylindrical target assemblies and their methods of use
#267Coil constructions configured for utilization in physical vapor deposition chambers, and methods of forming coil constructions
#268Vacuum treatment system
#269Sputter coating system
#270Physical vapor deposition apparatus for depositing thin multilayer films and methods of depositing such films
#271Holding device for a screen
#272Single piece coil support assemblies, coil constructions and methods of assembling coil constructions
#273[ADJUSTABLE COLLIMATOR AND SPUTTERING APPARATUS WITH THE SAME]
#274Coating installation
#275Device for targeted application of deposition material to a substrate
#276System method and collimator for oblique deposition
#277Methods and apparatus for depositing amorphous indium tin oxide film
#278Thin-film-deposition equipment for detecting shielding mechanism
#279Double-layer shielding device and thin-film-deposition equipment with the same
#280Filtered cathodic arc method, apparatus and applications thereof
#281Sputtering shield